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Class 372/56 - Metal vapor


Subclass of Class 372 - Coherent light generators
Definition: Subject matter wherein the gas is a vaporized metal.
No. of patents: 223
Last issue date: 09/28/2010


1            
NumberTitleIssue Date
7804877Atomic lasers with exciplex assisted absorption
The present invention provides in one of the embodiments for either a continuous wave (cw) or pulsed alkali laser having an optical cavity resonant at a wavelength defined by an atomic transition, a van der Waals complex within the optical cavity, the van der Waals ...
09/28/2010
7804876Optically pumped alkali laser and amplifier using helium-3 buffer gas
In one embodiment, a laser oscillator is provided comprising an optical cavity, the optical cavity including a gain medium including an alkali vapor and a buffer gas, the buffer gas including 3He gas, wherein if 4He gas is also present in the b...
09/28/2010
7586968Heater-attached alkali-encapsulated cell and alkali laser apparatus
An alkali-encapsulated cell internally having an alkali metal vapor G encapsulated is provided with first and second heaters 11, 12. The alkali-encapsulated cell 10 has first and second end faces 10a, 10b opposed to each oth...
09/08/2009
7382816Two-stage laser pulse energy control device and two-stage laser system
A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 become...
06/03/2008
7372056LPP EUV plasma source material target delivery system
An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt...
05/13/2008
7369597Laser output light pulse stretcher
Providing a high peak power short pulse duration gas discharge laser output pulse comprises a pulse stretcher a laser output pulse optical delay initiating optic diverting a portion of the output laser pulse into an optical delay having an optical delay path and com...
05/06/2008
7365349EUV light source collector lifetime improvements
An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plas...
04/29/2008
7355191Systems and methods for cleaning a chamber window of an EUV light source
Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation....
04/08/2008
7321607External optics and chamber support system
A gas discharge laser and method of operating same is disclosed which may comprise a gas discharge laser chamber support structure comprising a first support arm attached to a mounting table; a gas discharge laser chamber slideably engaging the first support arm; an...
01/22/2008
7317179Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate
Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective el...
01/08/2008
7317536Spectral bandwidth metrology for high repetition rate gas discharge lasers
A bandwidth meter apparatus and method for measuring the bandwidth of a spectrum of light emitted from a laser input to the bandwidth meter which may comprise an optical bandwidth monitor providing a first output representative of a first parameter which is indicati...
01/08/2008
7295591Long-pulse pulse power system for gas discharge laser
A long pulse pulse power system for gas discharge lasers. The system includes a sustainer capacitor for accepting a charge from a high voltage pulse power source. A peaking capacitor with a capacitance value of less than half the sustainer capacitance provides the h...
11/13/2007
7291853Discharge produced plasma EUV light source
An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members...
11/06/2007
7286575Diode pumped alkali vapor fiber laser
A method and apparatus is provided for producing near-diffraction-limited laser light, or amplifying near-diffraction-limited light, in diode pumped alkali vapor photonic-band-gap fiber lasers or amplifiers. Laser light is both substantially generated and propagated...
10/23/2007
7283575Narrow band electric discharge gas laser having improved beam direction stability
An electric discharge, narrow band gas laser with improvements in wavelength stability. Improvements result from reduced laser beam directional fluctuations or fast correction of those fluctuations. Applicant has discovered, using an extremely sensitive knife edge o...
10/16/2007
7283576Optically-pumped DUV atomic vapor lasers
Optically-pumped group IIB atomic vapor lasers emitting at discrete wavelengths shorter than 230 nm are disclosed. This laser device utilizes an active medium comprising a mixture of a group IIB atomic vapor and one or more buffer gases placed within a doubly-resona...
10/16/2007
7277188Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate
Systems and methods are disclosed for focusing a beam for an interaction with a film deposited on a substrate wherein the focused beam defines a short axis and a long axis. In one aspect, the system may include a detecting system to analyze light reflected from the ...
10/02/2007
7277464Method and apparatus for controlling the output of a gas discharge laser system
The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine. ...
10/02/2007
7251264Distributed bragg reflector for optoelectronic device
This disclosure concerns devices such as DBRs, one example of which includes at least one first mirror layers having an oxidized region extending from an edge of the DBR to an oxide termination edge that is situated greater than a first distance from the edge of the...
07/31/2007
7230964Lithography laser with beam delivery and beam pointing control
The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam ...
06/12/2007
7217941Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one ...
05/15/2007
7218661Line selected Ftwo chamber laser system
An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a pa...
05/15/2007
7212078Method and assembly for providing impedance matching network and network assembly
An impedance matching network and network assembly employ one or more variable inductive elements, wherein one or more of the variable inductive elements includes a high temperature ferrite core, a helical coil, and a means for physically translating the magnetic co...
05/01/2007
7209507Method and apparatus for controlling the output of a gas discharge MOPA laser system
A method and apparatus are disclosed for controlling the output of a two chamber gas discharge laser comprising an oscillator gas discharge laser and an amplifier gas discharge laser that may comprise establishing a multidimensional variable state space comprising a...
04/24/2007
7203216Timing control for two-chamber gas discharge laser system
Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to...
04/10/2007
7196342Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a...
03/27/2007
7190707Gas discharge laser light source beam delivery unit
A beam delivery unit and method of delivering a laser beam from a laser light source for excimer or molecular fluorine gas discharge laser systems in the DUV and smaller wavelengths is disclosed, which may comprise: a beam delivery enclosure defining an output laser...
03/13/2007
7180083EUV light source collector erosion mitigation
An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interac...
02/20/2007
7167499Very high energy, high stability gas discharge laser surface treatment system
A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in the substrate of a workpiece is disclosed which may comprise, a multichamber laser system comprising, a first laser unit comprising, a fi...
01/23/2007
7154928Laser output beam wavefront splitter for bandwidth spectrum control
Apparatus/method providing bandwidth control in narrow band short pulse duration gas discharge laser output light pulse beam producing systems, producing a beam comprising pulses at selected pulse repetition races, e.g., comprising a dispersive bandwidth selection o...
12/26/2006
7149234High repetition rate gas discharge laser with precise pulse timing control
A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred...
12/12/2006
7145931Diode pumped alkali-molecular lasers and amplifiers
Optically-pumped mid-infrared vibrational-rotational transition gas lasers and amplifiers with improved efficiency and practicality. Inventive laser and amplifier devices include: laser active media comprising a mixture of alkali vapor, selected hetero-nuclear molec...
12/05/2006
7141806EUV light source collector erosion mitigation
An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials creat...
11/28/2006
7139301Laser spectral engineering for lithographic process
An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum neede...
11/21/2006
7106776Discharge-pumped “dressed-atom” coherent light amplifier and generators
A novel practicable type of gaseous optical gain medium for efficiently generating intense, highly monochromatic, continuous-wave (CW) or pulsed, coherent light beams is disclosed. Gain results from nonlinear optical pumping of a gas of Λ-type “three-level” ato...
09/12/2006
7088759Resonator box to laser cavity interface for chemical laser
A laser system (52A) is illustrated having a laser cavity (54) that generates a laser beam (78). An outcoupling resonator box (62) has a reflective mirror (70) therein. A return resonator box (64) has a reflective mirror (
08/08/2006
7088758Relax gas discharge laser lithography light source
An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a disp...
08/08/2006
7085302Laser apparatus, exposure apparatus and method
There is to provide a laser apparatus that emits a laser beam by exciting gas enclosed in a chamber, including a gas characteristic detecting mechanism for detecting a characteristic of the gas in the chamber, and a calculation mechanism for calculating an oscillati...
08/01/2006
7082148Diode pumped alkali vapor fiber laser
A method and apparatus is provided for producing near-diffraction-limited laser light, or amplifying near-diffraction-limited light, in diode pumped alkali vapor photonic-band-gap fiber lasers or amplifiers. Laser light is both substantially generated and propagated...
07/25/2006
7079564Control system for a two chamber gas discharge laser
The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam...
07/18/2006
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