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| Number | Title | Issue Date |
| 8123371 | All-reflective afocal telescope derived from the first two mirrors of a focal three-mirror anastigmat telescope An all-reflective optical system includes a primary mirror of ellipsoidal configuration, a secondary mirror of hyperboloidal configuration facing the primary mirror, and an eye-piece that includes: a positive-powered tertiary mirror having a majority of positive pow... | 02/28/2012 |
| 8011793 | Wide field four mirror telescope using off-axis aspherical mirrors A telescope has an entrance pupil region; a first concave mirror (M1) belonging to a first rotationally symmetric aspheric surface and reflecting light passing through the entrance pupil region; a second convex mirror (M2) belonging to a second rotatio... | 09/06/2011 |
| 7682031 | Catoptric objectives and systems using catoptric objectives In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has ... | 03/23/2010 |
| 7556389 | Pointable optical system with coude optics having a short on-gimbal path length A coude gimbal structure includes a two-axis gimbal system having an outer gimbal pivotable about a first rotational axis, and an inner gimbal supported on the outer gimbal and pivotable about a second rotational axis which intersects the first rotational axis at an... | 07/07/2009 |
| 7470033 | Reflection-type projection-optical systems, and exposure apparatus comprising same Projection-optical systems are disclosed that have a large image-side NA of, e.g., ≧0.45, and that allow inspection for surface-shape errors of reflecting surfaces with prescribed precision. A first reflective image-forming optical system forms an intermediate ima... | 12/30/2008 |
| 7375798 | Projection system for EUV lithography There is provided an EUV optical projection system. The system includes a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror situated in an optical path from an object plane to an image plane, for imaging an object in ... | 05/20/2008 |
| 7360906 | Projection optical system unit and projection-type image display apparatus using the same A projection optical system unit has a lower pedestal. The lower pedestal has first and second tubular portions opened to each other. An image formation device holding plate for a DMD is mounted on the first tubular portion at a side where one opening is formed. A m... | 04/22/2008 |
| 7359050 | Compact triple pass hyperspectral imager A compact, triple pass hyperspectral imager (spectrometer). The hyperspectral imager (imaging system) of this invention includes an optical sub-system, a reflective slit element, a reflective dispersive element located substantially at a front plane, the front plane... | 04/15/2008 |
| 7355678 | Projection system for EUV lithography An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a sec... | 04/08/2008 |
| 7347572 | Telescope mirror for high bandwidth free space optical data transmission Optical mirror elements for high bandwidth free space optical communication are produced by an electroforming replication technique. Onto the precision surface of a mandrel that is a negative of the required optical surface a layer of metal is deposited forming an e... | 03/25/2008 |
| 7348565 | Illumination system particularly for microlithography There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element ... | 03/25/2008 |
| 7341357 | Projection display apparatus A projection display apparatus includes an image forming element, and an imaging optical system made up of a plurality of reflectors for projecting an image formed by the image forming element to provide an enlarged version of the image, wherein at least one of the ... | 03/11/2008 |
| 7329886 | EUV illumination system having a plurality of light sources for illuminating an optical element There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength ≦193 nm, and an optical element. The first light source illuminates a first area of... | 02/12/2008 |
| 7329016 | Foot inspection mirror The present invention relates generally to a foot inspection mirror and, more particularly, to a foot inspection device comprised of an assembly of mirrors positioned in such an array so as to assist diabetics and other users in visually self-inspecting all sides of... | 02/12/2008 |
| 7324269 | Projection optical system, exposure apparatus and device fabricating method A projection optical system is provided for projecting a pattern on an object plane onto an image plane in a reduced size. The projection optical system has six reflective surfaces that include, in order of reflecting light from the object plane, a first reflective ... | 01/29/2008 |
| 7322708 | Mirror, optical imaging system and use thereof The invention relates to a mirror (1), for use in optical imaging systems, whereby the mirror is connected at the edge thereof to a reinforcing element (3), at least partly surrounding the mirror and the reinforcing element also fixes the relative posi... | 01/29/2008 |
| 7319783 | Methods for minimizing aberrating effects in imaging systems A method for reducing optical distortion within an optical system employing adaptive optics, includes modifying phase of a wavefront of the optical system with a wavefront coding element. Image data of the optical system is post-processed to remove phase effects ind... | 01/15/2008 |
| 7319556 | Wide field of view telescope A wide field of view telescope having two concave and two convex reflective surfaces, each with an aspheric surface contour, has a flat focal plane array. Each of the primary, secondary, tertiary, and quaternary reflective surfaces are rotationally symmetric about t... | 01/15/2008 |
| 7317180 | Imaging optical system and endoscope provided with imaging optical system An imaging optical system includes a spherical or nearly spherical viewing port, an objective lens that includes an aspheric surface and is formed as a single lens element, and a solid-state image sensor that receives an image formed by the imaging optical system. S... | 01/08/2008 |
| 7312462 | Illumination system having a nested collector for annular illumination of an exit pupil There is provided an illumination system. The illumination system includes a source for light having a wavelength ≦193 nm, a field plane, and a collector having a mirror shell for receiving a part of the light. The mirror shell is arranged so that a real image of ... | 12/25/2007 |
| 7301694 | Off-axis projection optical system and extreme ultraviolet lithography apparatus using the same Example embodiments are directed to an off-axis projection optical system including first and second mirrors that are off-axially arranged. The tangential and sagittal radii of curvature of the first mirror may be R1t and R1s, respectively. The... | 11/27/2007 |
| 7297898 | Laser processing machine In a laser processing machine for processing workpieces using a laser beam (2), a telescope (1) for widening the laser beam (2) comprises an ellipsoidal mirror (3) and a paraboloidal mirror (4) whose axes of rotation (6) ext... | 11/20/2007 |
| 7295293 | Apparatus and method for testing a reflector coating A method of testing a coating on a reflector having a first focal point includes placing a mirror at the first focal point of the reflector and angled to orient with an area on the coating. Electromagnetic (EM) radiation is directed to the mirror which then directs ... | 11/13/2007 |
| 7283206 | Projection optical system, exposure apparatus, and device manufacturing method A projection optical system has at least eight reflecting mirrors and is relatively compact in the radial direction. The eight reflecting mirrors (M1˜M8) form a reduced image of a first surface on a second surface. A first reflecting image forming opt... | 10/16/2007 |
| 7283313 | Bulk-shaped lens, light-emitting unit, and lighting equipment The lens embraces a bulk-shaped lens body identified by a top surface, a bottom surface and a contour surface, and a well-shaped concavity is implemented in the inside of the lens body, aligned from the bottom surface toward the top surface. The lens body has geomet... | 10/16/2007 |
| 7281809 | Open lattice mirror structure and method of making same A method of making a mirror structure includes assembling a supporting isogrid framework, assembling an isogrid back plane, interconnecting the supporting isogrid framework with the isogrid back plane by a truss core, and disposing an optical surface on the supporti... | 10/16/2007 |
| 7274507 | Two-mirror telescope with central spider support for the secondary mirror A telescope has a primary light mirror structure including a central base, and a concave primary mirror having a central opening in which the central base is received and extending radially outwardly from the central opening. The concave primary mirror has an inner ... | 09/25/2007 |
| 7268855 | Projection optical system Disclosed is a projection optical system for projecting a pattern of a mask placed on an object plane, onto a substrate placed on an image plane. The projection optical system is arranged so that an intermediate image of the pattern formed on the mask, is formed bet... | 09/11/2007 |
| 7268956 | Solid catadioptric lens with two viewpoints A dual viewpoint solid catadioptric lens has a first spherical refractive surface S1 having a center C1 located on an optical axis of the lens and having a radius r1, and a second spherical refractive surface S2 having a center C2 ... | 09/11/2007 |
| 7260251 | Systems and methods for minimizing aberrating effects in imaging systems An imaging system for reducing aberrations from an intervening medium, and an associated method of use are provided. The system may be an optical or task-based optical imaging system including optics, such as a phase mask, for imaging a wavefront of the system to an... | 08/21/2007 |
| 7252389 | Projection optical system A projection optical system is disclosed with which undistorted images can be obtained at any image position within a specification range, and whose projection angle can be changed. The projection optical system includes a plurality of optical elements and a first o... | 08/07/2007 |
| 7251412 | Backlight modules using diffraction optical elements Direct backlight modules using diffraction optical elements are provided. A direct backlight module includes a light source and a diffraction optical element, wherein the diffraction optical element is disposed above the light source. By properly arranging the phase... | 07/31/2007 |
| 7248667 | Illumination system with a grating element An illumination system, particularly for wavelengths ≦100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged downstream to the grating element in the beam path from the object pl... | 07/24/2007 |
| 7244954 | Collector having unused region for illumination systems using a wavelength ≦193 nm There is provided a collector for illumination systems for light having a wavelength ≦193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the fir... | 07/17/2007 |
| 7237914 | Light condenser A light condenser suitable for EUV lithography that includes reflective rings concentric to an optical axis. Each ring has a reflective surface to reflect light rays emanating from a light source so that the light rays converge towards a mask to produce Köhler illu... | 07/03/2007 |
| 7237915 | Catadioptric projection system for 157 nm lithography A photolithographic reduction projection catadioptric objective includes a first optical group G1 including an even number of at least four mirrors M1–M6; and a second at least substantially dioptric optical group G2 imageward than the ... | 07/03/2007 |
| 7239453 | Projection optical system and projection exposure apparatus A catadioptric projection optical system includes a first optical system, for receiving light from an object, a second optical system, for forming an image of the object on an image plane, and a third optical system disposed optically between the first optical syste... | 07/03/2007 |
| 7232233 | Catoptric reduction projection optical system and exposure apparatus using the same A catoptric reduction projection optical system that uses light of light with a wavelength of 200 nm or less includes six light-reflecting mirrors arranged from an object side to an image side such that said mirrors basically form a coaxial system, wherein a third m... | 06/19/2007 |
| 7224441 | Projection optical system, exposure apparatus, and device manufacturing method A projection optical system for projecting a pattern on an object plane onto an image plane includes first to sixth reflective surfaces in order to reflect light from the object plane, wherein A1=θ21/θ11, B1=θ31/θ11, 1.5 | 05/29/2007 |
| 7212353 | Optical element, optical system, and optical device Provided is a compact optical element that secures an optical path length and improves manufacturing precision economically. The optical element includes a transparent member having a first and second refracting surface, and reflecting surfaces. Light entering the t... | 05/01/2007 |
