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| Number | Title | Issue Date |
| 7561346 | Angular shear plate One or more disc-shaped angular shear plates each include a region thereon having a thickness that varies with a nonlinear function. For the case of two such shear plates, they are positioned in a facing relationship and rotated relative to each other. Light passing... | 07/14/2009 |
| RE40743 | Projection exposure system having a reflective reticle A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided whic... | 06/16/2009 |
| 7391580 | Ultra compact mono-bloc catadioptric imaging lens A mono-bloc catadioptric imaging lens comprising a solid body and a single-focal Maksutov type construction characterized by two refractive surfaces and two reflective surfaces wherein all surfaces are surfaces of revolution and wherein at least one surface is asphe... | 06/24/2008 |
| 7358982 | Imaging device for a printing press An imaging device (10) for a printing form (12), in particular in a printing unit (82) of a printing press (84), having at least one light source (14) and an imaging optics (18) for projecting the at least one light source (... | 04/15/2008 |
| 7346261 | Image display apparatus There disclosed is an image display apparatus having a light source, a scanning member for deflecting a light from the light source to scan a predetermined surface with the light to form a two-dimensional image thereon, a first optical system for guiding a light def... | 03/18/2008 |
| 7317583 | High numerical aperture projection system and method for microlithography The present invention relates to a high numerical aperture exposure system having a wafer. The exposure system in the present invention includes a beam-splitter, a reticle, a reticle optical group, where the reticle optical group is placed between the reticle and th... | 01/08/2008 |
| 7317571 | Catadioptric projection optical system, exposure apparatus having the same, device fabrication method A catadioptric projection optical for forming an image of the intermediate image onto a second object, the catadioptric projection optical system include, a first dioptric group including a first lens group that has a positive refractive power and a second lens grou... | 01/08/2008 |
| 7283203 | Roll printer with decomposed raster scan and X-Y distortion correction A reflecting Offner-like optical system is described which is suitable for use in a photolithographic system in which the magnification is approximately 1 to 1, and where the format is flexible. The primary mirror is split into two halves, which are movable with res... | 10/16/2007 |
| 7259827 | Diffuser unit, lithographic apparatus, method for homogenizing a beam of radiation, a device manufacturing method and device manufactured thereby A lithographic apparatus is provided with a diffuser unit including a fluid that includes diffuser particles that are able to diffuse rays in a beam of radiation used to illuminate an object, for example a mask or a wafer. The diffuser particles may be solid particl... | 08/21/2007 |
| 7253970 | Reflective optical system A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the ... | 08/07/2007 |
| 7239453 | Projection optical system and projection exposure apparatus A catadioptric projection optical system includes a first optical system, for receiving light from an object, a second optical system, for forming an image of the object on an image plane, and a third optical system disposed optically between the first optical syste... | 07/03/2007 |
| 7199862 | Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system The present invention is a catadioptric system having a reticle optical group, a beam splitter, an aspheric mirror, a baffle plate, a folding mirror and a semiconductor wafer optical group. The reticle optical group, the beam splitter and the semiconductor wafer opt... | 04/03/2007 |
| 7170688 | Retroreflective device comprising gradient index lenses A retroreflective device comprising a substantially spherical graded refractive index lens, referred to as a GRIN-sphere lens (2), a reflective part for retroreflecting (6) a radiation beam (B) passing through the graded refractive index lens and, at l... | 01/30/2007 |
| 7145637 | Illumination system having a more efficient collector optic An illumination system having a light source is disclosed, the light source having a source size and emitting radiant power in a spatial angle element Ω(α), α indicating the aperture angle, a collector, which collects radiant power from the source up to a first m... | 12/05/2006 |
| RE39296 | Catadioptric projection systems Catadioptric projection systems are disclosed for projecting an illuminated region of a reticle onto a corresponding region on a substrate. The systems are preferably used with ultraviolet light sources (e.g., 193 nm). The systems comprise a first imaging system, a ... | 09/19/2006 |
| 7102828 | Optical element and manufacturing method thereof An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, a... | 09/05/2006 |
| 7099087 | Catadioptric projection objective There is provided a catadioptric projection objective that includes (a) an object plane having a rectangular object field, and (b) a beam splitter situated in a light path after the object plane, having a rectangular surface adapted to the object field and having an... | 08/29/2006 |
| 7092168 | Projection optical system and projection exposure apparatus A catadioptric projection optical system for projecting an image of an object onto an image plane through two intermediate image formations. The catadioptric projection optical system includes a first optical system, for receiving light from the object, including a ... | 08/15/2006 |
| 7088526 | Lens collimator and method of producing optical signals with reduced aberrations A lens collimator according to the present invention includes a plurality of lens elements bonded together. The lens elements, preferably three, each include spherical surfaces and are generally concentrically disposed relative to each other. The lens elements are a... | 08/08/2006 |
| 7075726 | Projection optical system and projection exposure apparatus A projection optical system projects an image of an object onto an image plane, and includes a first imaging optical system for forming an image of the object, and a second imaging optical system for re-imaging the image upon the image plane, wherein the first and s... | 07/11/2006 |
| 7072102 | Methods for reducing polarization aberration in optical systems An optical system includes multiple cubic crystalline optical elements and one or more uniaxial birefringent elements in which the crystal lattices of the cubic crystalline optical elements are oriented with respect to each other to reduce the effects of intrinsic b... | 07/04/2006 |
| 7053986 | Projection optical system, exposure apparatus, and device manufacturing method A projection optical system projects an image of a first object onto a second object. A first imaging optical system forms a first intermediate image of the first object, and is a refractive optical system. A second imaging optical system forms a second intermediate... | 05/30/2006 |
| 7046459 | Catadioptric reductions lens A catadioptric projection lens for imaging a pattern arranged in an object plane while creating a real intermediate image, having a catadioptric first lens section having a concave mirror and a beam-deflection device, as well as a dioptric second lens section that f... | 05/16/2006 |
| 7019909 | Optical system, image display apparatus, and image taking apparatus A small optical system that is capable of widening an angle of view is provided. This optical system is provided with a first surface having a reflecting action and a second surface that reflects a light beam reflected on this first surface toward the first surface ... | 03/28/2006 |
| RE39024 | Exposure apparatus having catadioptric projection optical system To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plant. A light beam from an object surface travels through a first converging group to enter a beam... | 03/21/2006 |
| 6995918 | Projection optical system and projection exposure apparatus A projection optical system for projecting an image of an object onto an image plane. The projection optical system includes a first imaging optical system for forming an image of the object in which the first imaging optical system includes a first mirror for refle... | 02/07/2006 |
| 6995833 | Projection optical system, exposure apparatus, and device manufacturing method A projection optical system for projecting an image of a first object onto a second object includes a first imaging optical system that forms a first intermediate image of the first object, and includes a lens, a second imaging optical system that forms a second int... | 02/07/2006 |
| 6985308 | Telecommunications optical processor A demultiplexer for use in a wavelength-division multiplexed optical system including a first positive lens group, a negative lens group, and a second positive lens group in order from a dispersive element and a reflective element. In some embodiments the reflective... | 01/10/2006 |
| 6972830 | Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system The present invention is a catadioptric system having a reticle optical group, a beam splitter, an aspheric mirror, a baffle plate, a folding mirror and a semiconductor wafer optical group. The reticle optical group, the beam splitter and the semiconductor wafer opt... | 12/06/2005 |
| 6919997 | Compact device for imaging a printing form A compact device for imaging (10) a printing form (12), including a number of light sources (14) as well as imaging optics (18) for producing a number of image spots (16) of the light sources (14) on the printing form (12... | 07/19/2005 |
| 6898025 | Projection aligner and optical system therefor A projection optical system, which is telecentric with respect to an object side and an image side, projects a pattern onto an image plane, which is substantially parallel with the pattern, at a substantial equi-magnification. The projecting optical system is provid... | 05/24/2005 |
| 6836379 | Catadioptric objective A catadioptric objective is provided with a beam splitter surrounded at least partially by a mount, with a mirror, with a plurality of lenses and with a λ/4 plate arranged between the mirror and the beam splitter. Arranged between the beam splitter and the mount on... | 12/28/2004 |
| 6829096 | Bi-directional wavelength division multiplexing/demultiplexing devices A bi-directional wavelength division multiplexing/demultiplexing device is disclosed. In an exemplary embodiment, the bi-directional wavelength division multiplexing/demultiplexing device comprises a diffraction grating for combining a plurality of monochromatic opt... | 12/07/2004 |
| 6807013 | Projection aligner The projection aligner for transferring an image of a mask pattern of a mask onto an object to be exposed comprises a projection optical system that forms the image of the mask pattern onto the object, an expansion ratio determiner that measures lengths of the objec... | 10/19/2004 |
| 6801371 | Dressing mirror with multiple functions The present invention of a multi-functional dressing mirror is applied to a portable case body for containing a plane mirror inside, in addition, the outer covering, a convex mirror made from materials showing the effect of light transmission, can be used to magnify... | 10/05/2004 |
| 6683726 | Image display apparatus An image display apparatus has a reflective display element for displaying a two-dimensional image on a display plane, a light source for emitting illuminating light for illuminating said display plane, a magnifier optical system for magnifying and projec... | 01/27/2004 |
| 6678056 | Jamin-type interferometers and components therefor A retroreflector has three mutually-orthogonal reflective surfaces arranged around an optical axis. The reflective surfaces stop short of the optical axis to provide a central region of the retroreflector which transmits incident light and a peripheral re... | 01/13/2004 |
| 6665126 | Projection exposure lens with aspheric elements A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system ... | 12/16/2003 |
| 6636349 | Reflection and refraction optical system and projection exposure apparatus using the same An imaging optical system includes a polarization beam splitter, a quarter waveplate, a reflection mirror and polarization state changing unit. The beam from an object plane is projected by way of the polarization beam splitter and the quarter waveplate t... | 10/21/2003 |
| 6590718 | Projection exposure system having a reflective reticle A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided which superposes the illumin... | 07/08/2003 |
