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Class 359/656 - Microscope objective


Subclass of Class 359 - Optical: systems and elements
Definition: Subject matter wherein the focal length of the lens is relatively
No. of patents: 236
Last issue date: 01/17/2012


1            
NumberTitleIssue Date
8098441Objective lens for endoscopes
An objective lens for endoscopes has a front lens unit and a rear lens unit with an aperture stop between them. The front lens unit includes a first lens element with negative refracting power and a second lens element with positive refracting power, and the rear le...
01/17/2012
8054558Multiple magnification optical system with single objective lens
A multiple magnification optical system has a single objective focused upon a specimen at a given working distance. A graded-index lens receives light passing through the objective from the specimen. A beam splitter splits the light exiting the gradient-index lens i...
11/08/2011
7907348Microscope objective
The invention relates to a microscope objective with preferably anti-symmetric lenses or lens groups with an optical magnification of −100 and a visual field factor of 20. According to the invention the microscope objective consists of 9 lenses with 3 cemen...
03/15/2011
7889432Immersion microscope objective lens
An immersion microscope objective lens of the present invention has: in order from an object, a first lens group G1 having positive refractive power and having a cemented lens of a plano convex lens having a plane facing the object and a meniscus lens having ...
02/15/2011
7876505Objective lens simultaneously optimized for pupil ghosting, wavefront delivery and pupil imaging
An objective lens includes multiple optical elements disposed between a first end and a second end, each optical element oriented along an optical axis. Each optical surface of the multiple optical elements provides an angle of incidence to a marginal ray that is ab...
01/25/2011
7848027Objective lens
An objective lens OL includes, in order from an object, a first lens group G1 having positive refractive power, a second lens group G2 having positive refractive power, a diffractive optical element GD forming a diffractive optical surface D thereon, a...
12/07/2010
7826143Optical system with wavelength selecting device
The object is to provide an optical system with a wavelength selecting device. According to one aspect of the present invention, an optical system with a wavelength selecting device includes, in order from an object along an optical axis, an objective optical system...
11/02/2010
7821720Endoscope objective lens with large entrance pupil diameter and high numerical aperture
An endoscope objective lens for collecting combined bright field (white light) and fluorescence images includes a negative lens group, a stop, and a positive lens group. The lens has a combination of large entrance pupil diameter (≧0.4 mm) for efficiently collecti...
10/26/2010
7782539Immersion microscope objective
An immersion microscope objective includes a system of several optical lenses or lens groups between which air spaces are provided and an adjusting device for adapting the immersion microscope objective to different immersion mediums for correcting imaging errors wh...
08/24/2010
7738180Objective optical system for endoscopes
An objective optical system for endoscopes has, in order form the object side, a single lens with negative power, a cemented lens with positive power, and an image sensor unit. The cemented lens has a plano-convex lens, located at the image-side end, with a convex s...
06/15/2010
7660045Object lens and condenser
An object lens includes a first optical system that obtains a magnified image of an object, a second optical system that guides dark field illumination light to the object, a barrel that contains the first optical system and the second optical system and has an opti...
02/09/2010
7643216Microscope objective
The invention is directed to an objective, particularly for telescope-type stereomicroscopes. The objective comprises two lens groups, a first lens group and a second lens group. The first lens group, which faces the object plane, has a positive refractive power and...
01/05/2010
7619829Immersion objective lens, fluorometric analyzer, and inverted microscope
An immersion objective lens includes a front lens, a lens frame which supports the front lens, and a liquid preventive frame which is attached around the lens frame. The liquid preventive frame includes a liquid bulb holding wall which holds a liquid supplied onto t...
11/17/2009
7602555Observation or measurement means and observation or measurement system provided with the same, feeble light image pickup optical system and microscope apparatus provided with the same, microscope system provided with the microscope apparatus, and observation apparatus and observation system provided with the same
An observation or measurement device has, at least, an infinity-corrected objective lens and an imaging lens, and satisfies a condition, 4.56≦D·NA′≦30 (mm), where D is the parfocal distance of the objective lens and NA′ is the numerical aperture of the imag...
10/13/2009
7586688Electronic microscope
The invention relates to a microscope having an optics system which represents an object on an image sensor and a screen that shows the image data provided by the image sensor and which is the only output medium for visually observing the object, wherein the represe...
09/08/2009
7561338Microscope objective system
A microscope objective system including an objective, which includes an illumination beam path via which illumination radiation from a source is directed onto an object to be examined, as well as a partial detection beam path surrounding at least part of the illumin...
07/14/2009
7561339Objective for stereomicroscopes
The invention is directed to an objective for telescope-type stereomicroscopes with magnification that can be adjusted at post-magnification systems. The objective, which comprises two lens groups LG1 and LG2, satisfies the two conditions DAP
07/14/2009
7486445Immersion type microscope objective
An immersion type microscope objective is configured by, in order from the object side to an image side, a positive lens group Ga including a cemented lens obtained by cementing a plano-convex lens whose plane surface faces the object side to a meniscus lens whose c...
02/03/2009
7471458Objective for an observation device, a microscope, and a method for adjusting an objective
The invention concerns an objective (1) for an observation device (10), whereby the objective comprises an objective-lens-system, which consists of a first optical subcomponent (11, 14) on the object side and a second, optical subcomponent (1...
12/30/2008
7432974Image pickup device and image pickup optical system
An optical system enables images of a wide range of natural subjects to be well reproduced with their colors, and provides an image pickup system including, at least, an image pickup optical system, an electronic image pickup device having three or more different sp...
10/07/2008
7411201Projection objective for a microlithographic projection exposure apparatus
A projection objective of a microlithographic projection exposure apparatus has a last optical element on the image side which is plane on the image side and which, together with an image plane of the projection objective, delimits an immersion space in the directio...
08/12/2008
7388714Independent focus compensation for a multi-axis imaging system
A multiple-axis imaging system having optical elements whose optimal image positions can be individually adjusted, comprising a plurality of optical array elements having respective optical axes and being individually disposed with respect to one another to image re...
06/17/2008
7382542High-aperture optical imaging system, particularly for microscopes
The invention is directed to a high-aperture optical imaging system, particularly for microscopes, which comprises an objective and a tube lens unit and in which the objective has a magnification of less than or equal to 40× and a numerical aperture of greater than...
06/03/2008
7372541Lithographic apparatus and device manufacturing method
In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space....
05/13/2008
7372634Reticle-masking objective with aspherical lenses
A reticle-masking (REMA) objective for imaging an object plane onto an image plane has a condenser portion, an intermediate portion, and a field lens portion. The three portions together have no more than 10 lenses with a combined total of no more than five aspheric...
05/13/2008
7365827Lithographic apparatus and device manufacturing method
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts. ...
04/29/2008
7359115Sample observation method, microscope, and solid immersion lens, optical contact liquid used in the method
Optical contact liquid containing an amphipathic molecule is dripped onto a semiconductor device which is a sample as an inspection object (S104), and a solid immersion lens is set thereon (S105). The inserted position of the solid immersion lens is th...
04/15/2008
7359030Lithographic apparatus and device manufacturing method
A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out wi...
04/15/2008
7355674Lithographic apparatus, device manufacturing method and computer program product
Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity. ...
04/08/2008
7352433Lithographic apparatus and device manufacturing method
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of t...
04/01/2008
7352435Lithographic apparatus and device manufacturing method
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithogr...
04/01/2008
7352434Lithographic apparatus and device manufacturing method
In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedba...
04/01/2008
7349162Immersion microscope objective
The invention is directed to an immersion microscope objective. An objective of this kind has an adjusting element, for example, a correction ring, by which it can be adjusted to different immersion media. In an advantageous manner, the objective can also be adjuste...
03/25/2008
7333265Microscope apparatus
Provided is a microscope having an immersion objective lens, a nozzle, and a liquid supplying mechanism. The immersion objective lens condenses light from a sample through liquid. The nozzle supplies the liquid to an upper surface of the immersion objective lens. Th...
02/19/2008
7326522Device manufacturing method and a substrate
A method of reducing the effect of bubbles on the imaging quality of an immersion lithography apparatus, in which a top coating is applied to a substrate to keep bubbles away from a radiation sensitive layer of the substrate. ...
02/05/2008
7317504Lithographic apparatus and device manufacturing method
A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in th...
01/08/2008
7312921Microscope and sample observation method
For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an...
12/25/2007
7310187Projection objective, especially for microlithography, and method for adjusting a projection objective
A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry ob...
12/18/2007
7304715Lithographic apparatus and device manufacturing method
A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern i...
12/04/2007
7304789Microscope system and objective unit
A microscope system includes a light source and an objective unit. The objective unit includes an objective optical system, including a small-diameter distal optical system arranged at an end brought near to or into contact with a specimen, for focusing light from t...
12/04/2007
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