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Pizza Pie With Concentric Rings of Crust
A pizza mold for forming a plurality of concentric raised ridges of dough (i.e., crust) on the surface of a pizza pie.
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| Number | Title | Issue Date |
| 7333200 | Overlay metrology method and apparatus using more than one grating per measurement direction A method of controlling the lithography process used to fabricate patterns on layers of a semiconductor wafer is disclosed. The method includes providing at least two scatterometry targets, each target having a first pattern formed in an upper layer substantially al... | 02/19/2008 |
| 7317531 | Apparatus and methods for detecting overlay errors using scatterometry Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. In one embodiment, a method for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structur... | 01/08/2008 |
| 7301634 | Apparatus and methods for detecting overlay errors using scatterometry Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an in... | 11/27/2007 |
| 7289213 | Apparatus and methods for detecting overlay errors using scatterometry Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, t... | 10/30/2007 |
| 7280212 | Apparatus and methods for detecting overlay errors using scatterometry Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sampl... | 10/09/2007 |
| 7242477 | Apparatus and methods for detecting overlay errors using scatterometry Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. A sample having a plurality of periodic targets that each have a first structure in a first layer and a second structure in a second layer is provided. The... | 07/10/2007 |
| 7236244 | Alignment target to be measured with multiple polarization states An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns at multiple polarization states and comparing the resulting intensities of the polari... | 06/26/2007 |
| 7230705 | Alignment target with designed in offset An alignment target includes periodic patterns on two elements. The alignment target includes two locations, at least one of which has a designed in offset. In one embodiment, both measurement locations have a designed in offset of the same magnitude but opposite di... | 06/12/2007 |
| 7230746 | 3D display A method of generating a Computer Generated Hologram (CGH) using the diffraction specific algorithm allows a curved wavefront to be produced from a single hogel, rather than the planar waves of the prior art. This allows a wavefront from a singel hogel to generate a... | 06/12/2007 |
| 7170604 | Overlay metrology method and apparatus using more than one grating per measurement direction An overlay target includes two pairs of test patterns used to measure overlay in x and y directions, respectively. Each test pattern includes upper and lower grating layers. A single pitch (periodic spacing) is used for all gratings. Within each test pattern, the up... | 01/30/2007 |
| 7161684 | Apparatus for optical system coherence testing The present invention is directed at a coherence test reticle or lithographic plate, and a method for testing the coherence of a laser beam using the test reticle. The quality or coherence of the laser beam is measured by illuminating the test reticle and recording ... | 01/09/2007 |
| 7159479 | Active damper for stabilized mirrors An active damping method for a stabilized mirror, and a corresponding active damper apparatus, comprising providing a tachometer measuring speed of a motor driving the mirror, employing compensation electronics receiving input from said tachometer and the motor, and... | 01/09/2007 |
| 7061615 | Spectroscopically measured overlay target An overlay target for spectroscopic measurement includes at least two diffraction gratings, one grating overlying the other. The diffraction gratings may include an asymmetry relative to each other in order to improve resolution of the presence as well as the direct... | 06/13/2006 |
| 7046361 | Positioning two elements using an alignment target with a designed offset An alignment system for aligning two elements includes an alignment target with periodic patterns on each element. The alignment target includes two locations, at least one of which has a designed in offset. If desired, both locations may have designed in offsets of... | 05/16/2006 |
| 6992764 | Measuring an alignment target with a single polarization state An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns with an incident beam having a single polarization state and detecting the intensity ... | 01/31/2006 |
| 6970255 | Encoder measurement based on layer thickness An encoder includes a layer on the scale that has a thickness that varies as a function of position along the length of the scale. The position of the sensor head with respect to the scale may be determined by measuring the thickness of the layer or index of refract... | 11/29/2005 |
| 6958819 | Encoder with an alignment target An encoder uses an alignment target that includes periodic patterns on the movable element and the stationary element. The alignment target may include at least two measurement locations, each location having a different offset between the periodic pattern on the mo... | 10/25/2005 |
| 6949462 | Measuring an alignment target with multiple polarization states An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns at multiple polarization states and comparing the resulting intensities of the polari... | 09/27/2005 |
| 6151103 | Method and system for improved optical imaging in microlithography An improved microlithographic imaging system (100) is disclosed. The system comprises a filter (183) substantially aligned with a first image plane, adjacent to an aperture (185). The filter is formed in response to an image projected by a light source (1... | 11/21/2000 |
| 5959776 | Method and apparatus of Fourier manipulation in an optic lens or mirror train An optical system is provided with an adaptable window element at a Fourier plane for spatial filtering. Having a window element made up of individually addressable pixels provides a substantial improvement in the spatial filtering adaptability and precis... | 09/28/1999 |
| 5698350 | Light exposure method for the fabrication of semiconductor devices A light exposure method for fabrication of a semiconductor device and a dummy mask used therefor, capable of forming an ultra-fine pattern by diffracting incident light while controlling or cutting off light components vertically incident on a mask formed... | 12/16/1997 |
| 5587834 | Semiconductor device manufacturing method and projection exposure apparatus using the same A semiconductor device manufacturing method is disclosed, which includes the steps of illuminating obliquely an original having a grating-like pattern, with a light beam having a main wavelength λ, and projecting a portion of diffraction light produced b... | 12/24/1996 |
| 5571641 | Diffraction mask for the fabrication of semiconductor devices A dummy mask used in the fabrication of semiconductor devices, capable of forming an ultra-fine pattern by diffracting incident light while controlling or cutting off light components vertically incident on a mask formed with a pattern, thereby increasing... | 11/05/1996 |
| 5546225 | High resolution printing technique by using improved mask pattern and improved illumination system In a method of manufacturing a lithographic mask by generating a plurality of light-shielding or transparent pattern elements with respect to a predetermined energy beam on a predetermined original plate on the basis of design data defining shapes and lay... | 08/13/1996 |
| 5499137 | Exposure method and apparatus therefor In an exposure method of illuminating a pattern formed on a mask with illumination light from an illumination optical system, and projecting/exposing an image of the pattern on a photosensitive substrate through a projection optical system, the pattern in... | 03/12/1996 |
| 5452002 | Color data image encoding method and apparatus with spectral zonal filter A video color encoding apparatus (10 ) having a lens (14) for focusing an image (16) on an imaging element (20). The imaging element (20) has a monochromatic CCD imager (22) and a tricolor grating assembly (26) interposed between the CCD imager (22) and t... | 09/19/1995 |
| 5446587 | Projection method and projection system and mask therefor A projection method uses a modified illumination method for a lithography process of semiconductor device, and a projection system and mask use the projection method. An object is exposed by removing the vertical incident component of light passed through... | 08/29/1995 |
| 5440426 | Optical spatial filtering for attenuating the zero diffractive orders of mutually incoherent light beams Method and apparatus for forming an image of an object by optical projection with a focusing system comprising the steps of collimating a set of at least two mutually incoherent light beams from the light source to fall on the object from directions that ... | 08/08/1995 |
| 5331370 | Method and apparatus for determining a feature-forming variant of a lithographic system A method of determining a feature-forming variant, such as focus or exposure, for a lithographic system or the like includes Fourier processing that extracts a figure of merit. In a preferred embodiment, the lithographic system fabricates a series of form... | 07/19/1994 |
| 5307184 | Exposure apparatus An exposure apparatus capable of making exposure for concentric circular periodic grating is provided with a quarter-wave plate (4), an ND filter (8a) having step-wisely different transmissions with boundaries of circle or a group of circles, an axially s... | 04/26/1994 |
| 5170063 | Inspection device for detecting defects in a periodic pattern on a semiconductor wafer An inspection device for detecting defects in a periodic pattern on a semiconductor wafer includes a laser oscillator. In the exposure process, light emitted from the laser oscillator is divided into a subject beam and a reference beam. The subject beam i... | 12/08/1992 |
| 5144460 | High contrast-resolution camera A method and apparatus for registering an image using coherent radiation. Spatial homodyne means are employed to generate component signals which comprise a homodyne equivalent of the image, and the component signals of the homodyne equivalent are registe... | 09/01/1992 |
| 5138468 | Keyless holographic lock A keyless holographic locking device that uses a matched optical filter to store in form of a hologram a unique identificaton such as a fingerprint of an authorized user, a source of coherent light that provides the illumination, and an input element for ... | 08/11/1992 |
| 4651297 | Two-dimensional image correlator The electro-optical correlator performs pattern-recognition by forming the columnar dot product of an input image with a reference image at video through-put rates. The correlator incorporates an analog-to-digital converter for digitizing the input-image ... | 03/17/1987 |
| 4231656 | Apparatus and method of converting an image on a transparency to line art on a recording medium An apparatus and method of converting an image on a transparency such as photographic film to line art on a recording medium so that the line art may be microfilmed. The invention, through the use of optical processing techniques, greatly simplifies the c... | 11/04/1980 |
| 4183623 | Tomographic cross-sectional imaging using incoherent optical processing A method of constructing cross-section images similar to "computer assisted tomography," using optical data processing to replace the computer. The method uses incoherent light in the optical processor, thereby avoiding the noise and diffraction patterns ... | 01/15/1980 |
| 4118107 | Optical detection of geometric configurations The specification discloses an optical technique for retrieving images of geometric shapes from a cluttered background in a photographic record by means of amplitude and phase filters configured according to the particular shape sought to be retrieved. A ... | 10/03/1978 |
| 4108538 | Frequency plane filters for an optical processor for synthetic aperture radar An air-borne radar system for terrain-imaging employs a sidelooking synthetic-aperture radar that records reflected signals on photographic film. Range data has a constant focal length whereas data in an azimuth direction has a focal length that varies as... | 08/22/1978 |
| 4067645 | Minimum mean-square error linear optical filter A method of forming a minimum mean-square error linear filter photographically is disclosed. The optimum filter may be obtained photographically. In one form, a first photographic negative of a monolayer of cells having a high percentage of cells of the g... | 01/10/1978 |
| 4035062 | Method and apparatus for producing an image from a transparent object The contrast produced from a photographic transparency is controlled by placing the transparency between a pair of partially reflecting mirrors forming walls of an optical cavity. Mirrors are used to trap a collimated laser beam illuminating the transpare... | 07/12/1977 |
