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| Number | Title | Issue Date |
| 7957057 | Microscope optical system, microscope, and virtual slide forming system An observation field of view of a microscope can be moved without moving or changing an objective lens and without varying position or state of a sample. A microscope optical system has a mirror that changes the direction of the optical path by reflection and is loc... | 06/07/2011 |
| 7903330 | Microscope having a sensor operating in non-contact fashion A microscope having a mechanically adjustable zoom system (7) and/or a mechanically adjustable focus system is described, which microscope is equipped at least one manually movable adjusting element (2) for adjusting the zoom system (7) and/or t... | 03/08/2011 |
| 7880963 | Zoom microscope It is an object to provide a zoom microscope of a simple structure which can expand a variable-power range. In order to achieve the object thereof, the zoom microscope includes a replaceable infinity correction objective lens, an aperture stop, an afocal zoom system... | 02/01/2011 |
| 7821705 | Zoom microscope including an image-acquisition optical path and an observation optical path The exposure time for obtaining a bright image in an image-acquisition optical system can be reduced, and shifting of an image visually observed in an observation optical system is prevented, thus enabling stable observation. A microscope including an image-acquisit... | 10/26/2010 |
| 7791794 | Surgical microscope having an OCT-system A surgical microscope (100) has viewing beams (109a, 109b) passing through a microscope imaging optic which includes a microscope main objective system (101) having a magnification system of variable magnification. The micro... | 09/07/2010 |
| 7773297 | Scanning microscope and adjusting method for the same A scanning microscope includes an objective lens for focusing illumination light onto a specimen; a scanning device for deflecting and scanning the illumination light; a pupil-projection optical system for illuminating a pupil of the objective lens with the scanned ... | 08/10/2010 |
| 7630113 | Microscope optical system, microscope, and virtual slide forming system An observation field of view of a microscope can be moved without moving or changing an objective lens and without varying position or state of a sample. A microscope optical system has a mirror that changes the direction of the optical path by reflection. The mirro... | 12/08/2009 |
| 7593157 | Zoom microscope It is an object to provide a zoom microscope of a simple structure which can expand a variable-power range. In order to achieve the object thereof, the zoom microscope includes a replaceable infinity correction objective lens, an aperture stop, an afocal zoom system... | 09/22/2009 |
| 7423805 | Ultra-broadband UV microscope imaging system with wide range zoom capability An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, contin... | 09/09/2008 |
| 7372626 | Device for sequential observation of samples and methods using same The invention concerns methods and devices for observing or analysing samples on a support. More particularly, it concerns a device for sequential observation of several samples arranged on a common plate (19) comprising an objective (15) for observing... | 05/13/2008 |
| 7371510 | Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; havi... | 05/13/2008 |
| 7372541 | Lithographic apparatus and device manufacturing method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.... | 05/13/2008 |
| 7372542 | Immersion exposure technique An exposure apparatus for exposing a substrate to light via a reticle. The apparatus includes a substrate stage configured to hold the substrate and to move, a projection optical system configured to project a pattern of the reticle onto the substrate, a flat plate ... | 05/13/2008 |
| 7369305 | Optical zoom system for a light scanning electron microscope For a confocal scanning electron microscope (1) an optical zoom system (41) is provided, which not only makes a zoom function possible, in that a variable magnification of an image is possible, but rather which additionally produces a pupil image in th... | 05/06/2008 |
| 7369217 | Method and device for immersion lithography The present invention relates to an immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation. Said system comprising a source emitting electromagnetic radiati... | 05/06/2008 |
| 7365827 | Lithographic apparatus and device manufacturing method A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts. ... | 04/29/2008 |
| 7362511 | Zoom lens system for microscope and microscope using the same A zoom lens system for a microscope includes, in the following order from the object side, a first lens group having a positive refractive power, a second lens group having a negative refractive power, a third lens group having a positive refractive power, and a fou... | 04/22/2008 |
| 7359117 | Illumination device for microscope A illumination device for microscope, which has a illumination axis, includes illumination unit, which emits rays of illumination light, for illuminating a specimen, a field stop projection lens, which is located on the illumination axis between the illumination uni... | 04/15/2008 |
| 7359030 | Lithographic apparatus and device manufacturing method A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out wi... | 04/15/2008 |
| 7359595 | Adaptive transmitter arrangement for optical fiber communications and related method An arrangement for optical fibre communications, for used, e.g., in millimetre (MM) fibre transmission systems includes: a source (1) of optical radiation defining an offset launch path of optical radiation (R) into an optic... | 04/15/2008 |
| 7359034 | Exposure apparatus and device manufacturing method An exposure apparatus in which by filling at least a portion between a projection optical system and a substrate with a liquid and by projecting an image of a pattern onto the substrate via said projection optical system and said liquid, said substrate is exposed, s... | 04/15/2008 |
| 7355674 | Lithographic apparatus, device manufacturing method and computer program product Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity. ... | 04/08/2008 |
| 7352433 | Lithographic apparatus and device manufacturing method Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of t... | 04/01/2008 |
| 7352434 | Lithographic apparatus and device manufacturing method In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedba... | 04/01/2008 |
| 7352440 | Substrate placement in immersion lithography A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position o... | 04/01/2008 |
| 7352435 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithogr... | 04/01/2008 |
| 7349162 | Immersion microscope objective The invention is directed to an immersion microscope objective. An objective of this kind has an adjusting element, for example, a correction ring, by which it can be adjusted to different immersion media. In an advantageous manner, the objective can also be adjuste... | 03/25/2008 |
| 7349064 | Immersion exposure technique An exposure apparatus having a projection optical system configured to project a pattern of an original to a substrate and exposing a substrate to light via the original with a gap between the substrate and the projection optical system being filled with liquid. The... | 03/25/2008 |
| 7339750 | Focusing a laser beam A device for focusing a laser beam includes a first telescopic configuration and a second telescopic configuration. The first telescopic configuration includes a collimating optical element for collimating the laser beam and a downstream focusing optical element for... | 03/04/2008 |
| 7338439 | Condensing optical system, confocal optical system, and scanning confocal endoscope A condensing optical system, suitable for a scanning confocal optical system (having a composition for scanning a beam spot on a subject surface by swinging a point source of light) and capable of satisfactorily suppressing various aberrations and reducing loss of l... | 03/04/2008 |
| 7330238 | Lithographic apparatus, immersion projection apparatus and device manufacturing method A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid betwee... | 02/12/2008 |
| 7326522 | Device manufacturing method and a substrate A method of reducing the effect of bubbles on the imaging quality of an immersion lithography apparatus, in which a top coating is applied to a substrate to keep bubbles away from a radiation sensitive layer of the substrate. ... | 02/05/2008 |
| 7327513 | Method and apparatus for viewing target Apparatus and method for viewing a target. A primary lens produces an image plane of the target, and an optical magnifier in an optical path of the primary lens magnifies a region of the image plane, providing a magnified image. A detector receives the magnified ima... | 02/05/2008 |
| 7324185 | Lithographic apparatus and device manufacturing method In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under th... | 01/29/2008 |
| 7321415 | Environmental system including vacuum scavenge for an immersion lithography apparatus An environmental system controls an environment in a gap between an optical assembly and a device and includes a fluid barrier and an immersion fluid system. The fluid barrier is positioned near the device. The immersion fluid system delivers an immersion fluid that... | 01/22/2008 |
| 7321108 | Dynamic focusing method and apparatus A method and apparatus for dynamically focusing an imaging mechanism on a moving target surface having a variable geometry is herein disclosed. Apparatus for focusing an imaging mechanism may include an objective, a prism, or another optical device that forms part o... | 01/22/2008 |
| 7317507 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as c... | 01/08/2008 |
| 7317504 | Lithographic apparatus and device manufacturing method A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in th... | 01/08/2008 |
| 7304715 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern i... | 12/04/2007 |
| 7295283 | Lithographic apparatus and device manufacturing method A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system... | 11/13/2007 |
