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| Number | Title | Issue Date |
| 8169694 | Catoptric objectives and systems using catoptric objectives In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements ima... | 05/01/2012 |
| 8004755 | Catoptric objectives and systems using catoptric objectives In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has ... | 08/23/2011 |
| 7990609 | Catadioptric imaging system with prolate spheroidal-shaped mirrors A catadioptric imaging optical system of a high numerical aperture in which various aberrations are properly corrected without using a reflection surface having an aspherical shape of high order or a reciprocal optical element. The catadioptric imaging optical syste... | 08/02/2011 |
| 7869122 | Catadioptric projection objective A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first inte... | 01/11/2011 |
| 7859748 | Microlithographic reduction projection catadioptric objective A photolithographic reduction projection catadioptric objective includes a first optical group having an even number of at least four mirrors and having a positive overall magnifying power, and a second substantially refractive optical group more image forward than ... | 12/28/2010 |
| 7848016 | High-NA projection objective A catadioptric projection objective for imaging a pattern provided in an object surface onto an image surface of the projection objective has an object-side imaging subsystem for creating a final intermediate image closest to the image surface from radiation coming ... | 12/07/2010 |
| 7697198 | Catadioptric projection objective A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a fir... | 04/13/2010 |
| 7679821 | Catadioptric projection objective A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first inte... | 03/16/2010 |
| 7672047 | Catadioptric projection objective A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first inte... | 03/02/2010 |
| 7508580 | 8-mirror microlithography projection objective A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S1), a second mirror (S2), a third mirror (S3), a four... | 03/24/2009 |
| 7450299 | Broadband telescope The light of a broad energy band can be observed by reflecting the light of the broad energy band, for example, the light from the visible light region to the x-ray region at a high reflectance respectively, by a composite telescope including a normal incidence opti... | 11/11/2008 |
| 7436589 | Reflective-type projection optical system and exposure apparatus equipped with said reflective-type projection optical system A reflective-type projection optical system has 8 reflective mirrors that form a reduced image of a first surface on a second surface. A first reflective imaging optical system (G1) forms an intermediate image of the first surface, and a second reflective ima... | 10/14/2008 |
| 7414781 | Catoptric objectives and systems using catoptric objectives In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements ima... | 08/19/2008 |
| 7408703 | Wide-angle imaging optical system and wide-angle imaging apparatus surveillance imaging apparatus vehicle-mounted imaging apparatus and projection apparatus using the wide-angle imaging optical system A wide-angle imaging optical system includes a refractive optical system (3), a reflective optical system, and an image-forming optical system (5). The reflective optical system includes a first reflection surface (1) that directly reflects rays... | 08/05/2008 |
| 7390101 | Off-axis two-mirror re-imaging infrared telescope An infrared telescope utilizes two mirrors in an off-axis, eccentric-pupil, re-imaging configuration. To improve the image quality of traditional two mirror telescopes, the reflective surfaces of both the primary and secondary mirrors are ellipsoidal. The ellipsoida... | 06/24/2008 |
| 7385755 | Adjustable mirror An adjustable mirror includes first and second fluids in contact over a meniscus extending transverse an optical axis. The fluids are substantially immiscible and have different indices of refraction. A reflective surface extends transverse the optical axis. A menis... | 06/10/2008 |
| 7385756 | Catadioptric projection objective A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first inte... | 06/10/2008 |
| 7372624 | 8-mirror microlithography projection objective A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes eight mirrors. The light path is provided via the eight mirrors, and is free of obscuration... | 05/13/2008 |
| 7358498 | System and a method for a smart surveillance system A radiation surveillance sensor system includes a radiation responsive sensor, a lightweight, radiation reflective member for selectively adjusting the incident radiation path to the sensor, and power means for controlling the position of the reflective member to ac... | 04/15/2008 |
| 7359115 | Sample observation method, microscope, and solid immersion lens, optical contact liquid used in the method Optical contact liquid containing an amphipathic molecule is dripped onto a semiconductor device which is a sample as an inspection object (S104), and a solid immersion lens is set thereon (S105). The inserted position of the solid immersion lens is th... | 04/15/2008 |
| 7355678 | Projection system for EUV lithography An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a sec... | 04/08/2008 |
| 7347566 | Projection lens unit and rear projection type image display system An inexpensive projection lens unit in a rear projection type image display system, having a short focal distance (wide angle of viewing field), high focus and high contrast, and as well, including a power lens made of a glass material having a high refractive index... | 03/25/2008 |
| 7348565 | Illumination system particularly for microlithography There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element ... | 03/25/2008 |
| 7348575 | Projection optical system, exposure apparatus, and exposure method A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic ab... | 03/25/2008 |
| 7344282 | Optical sheet and backlight assembly of liquid crystal display with the same An optical sheet includes a substrate onto which light is incident, and a convex part protruded from the substrate by a predetermined thickness. A thickness of the convex part increases from an edge to a center thereof. ... | 03/18/2008 |
| 7333271 | Dichroic mangin mirror An optical system having at least one dichroic Mangin mirror. The optical system has a front-end optical sub-system or a light source operative to emit an optical beam. The optical beam is dispersed into at least a first color beam and a second color beam and has ce... | 02/19/2008 |
| 7329886 | EUV illumination system having a plurality of light sources for illuminating an optical element There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength ≦193 nm, and an optical element. The first light source illuminates a first area of... | 02/12/2008 |
| 7312463 | Projection optical system, exposure apparatus, and exposure method A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic ab... | 12/25/2007 |
| 7309870 | Projection optical system, exposure apparatus, and exposure method A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic ab... | 12/18/2007 |
| 7293882 | Optical relay An optical relay includes a first lens, a lens module, and a second lens. The first lens is configured to receive modulated light from a first spatial light modulator. The first lens is configured to refract the modulated light into the lens module. The lens module ... | 11/13/2007 |
| 7283206 | Projection optical system, exposure apparatus, and device manufacturing method A projection optical system has at least eight reflecting mirrors and is relatively compact in the radial direction. The eight reflecting mirrors (M1˜M8) form a reduced image of a first surface on a second surface. A first reflecting image forming opt... | 10/16/2007 |
| 7274513 | Off-axis projection optics and extreme ultraviolet lithography apparatus employing the same Off-axis projection optics that includes first and second mirrors positioned off-axis and sharing a confocal point that are arranged to reduce linear astigmatism. If a distance between an object plane and the first mirror is l1, an incident angle of light... | 09/25/2007 |
| 7268956 | Solid catadioptric lens with two viewpoints A dual viewpoint solid catadioptric lens has a first spherical refractive surface S1 having a center C1 located on an optical axis of the lens and having a radius r1, and a second spherical refractive surface S2 having a center C2 ... | 09/11/2007 |
| 7268948 | Optical element and optical scanning device using the same To obtain an optical element capable of obtaining uniform anti reflection characteristics over the whole optical surface having a finite curvature of the optical element, a plurality of convex optical pieces having an anti reflection function are provided on a surfa... | 09/11/2007 |
| 7268952 | Catadioptric projection system, and exposure apparatus having the same A catadioptric projection system for forming an intermediate image of a first object plural times, and images the intermediate image onto a second object includes at least two deflective reflectors, a lens unit arranged in an optical path between the two deflective ... | 09/11/2007 |
| 7248667 | Illumination system with a grating element An illumination system, particularly for wavelengths ≦100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged downstream to the grating element in the beam path from the object pl... | 07/24/2007 |
| 7237915 | Catadioptric projection system for 157 nm lithography A photolithographic reduction projection catadioptric objective includes a first optical group G1 including an even number of at least four mirrors M1–M6; and a second at least substantially dioptric optical group G2 imageward than the ... | 07/03/2007 |
| 7239453 | Projection optical system and projection exposure apparatus A catadioptric projection optical system includes a first optical system, for receiving light from an object, a second optical system, for forming an image of the object on an image plane, and a third optical system disposed optically between the first optical syste... | 07/03/2007 |
| 7236297 | Gregorian optical system with non-linear optical technology for protection against intense optical transients An optical system comprising a concave primary mirror reflects light through an intermediate focus to a secondary mirror. The secondary mirror re-focuses the image to a final image plane. Optical limiter material is placed near the intermediate focus to optically li... | 06/26/2007 |
| 7232233 | Catoptric reduction projection optical system and exposure apparatus using the same A catoptric reduction projection optical system that uses light of light with a wavelength of 200 nm or less includes six light-reflecting mirrors arranged from an object side to an image side such that said mirrors basically form a coaxial system, wherein a third m... | 06/19/2007 |
