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A method for inducing cats to exercise consists of directing a beam of invisible light produced by a hand-held laser apparatus onto the floor or wall.
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| Number | Title | Issue Date |
| 8154794 | Imaging lens and method of manufacturing the same There is provided an imaging lens including: a transparent substrate; an upper lens disposed on a top of the transparent substrate; and a lower lens disposed on a bottom of the transparent substrate to correspond to the upper lens, wherein one of the upper and lower... | 04/10/2012 |
| 7948674 | Electro-optic windows An electro-optic window is made of a material substantially transparent to infra-red radiation and is treated to have reduced RF transmission characteristics by the provision of carbon nanotubes within the window or on at least one, surface thereof. ... | 05/24/2011 |
| 7835070 | Synthetic quartz member, exposure apparatus, and method of manufacturing exposure apparatus An exposure apparatus includes an illumination optical system configured to illuminate a mask with a laser beam having a wavelength shorter than 250 nm, and a projection optical system configured to project and expose a pattern image of the mask onto an exposed subs... | 11/16/2010 |
| 7710640 | Projection objective of a microlithographic projection exposure apparatus A projection objective for a microlithographic projection exposure apparatus. The projection objective can project an image of a mask that can be set in position in an object plane onto a light-sensitive coating layer that can be set in position in an image plane. T... | 05/04/2010 |
| 7672044 | Lens made of a crystalline material As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one det... | 03/02/2010 |
| 7518789 | Broad band deep ultraviolet/vacuum ultraviolet catadioptric imaging system A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing t... | 04/14/2009 |
| 7492509 | Projection optical system A projection optical system comprises a plurality of lenses disposed along an optical axis of the projection optical system; wherein the plurality of lenses is dividable into four non-overlapping groups of lenses of positive and negative refractive powers, wherein t... | 02/17/2009 |
| 7489441 | Monocrystalline optical component with curved surface and multilayer coating An optical component has a substrate, on which at least one curved substrate surface is formed that defines an optical axis of the optical component, wherein the substrate surface is coated with a multilayer coating that is active in the ultraviolet region at a desi... | 02/10/2009 |
| 7442734 | Coating composition and optical article There is provided a coating composition which can be applied to a substrate such as a plastic lens so as to form a photochromic coating layer having good photochromic properties and excellent adhesion to the substrate on the surface of the substrate. This com... | 10/28/2008 |
| 7431984 | Hybrid lens using translucent ceramic A hybrid lens (3) has a structure in which a resin layer (2) composed of an ultraviolet curable resin is formed on the surface of a lens base material (1) composed of translucent ceramic. The lens base material (3) is composed of transluc... | 10/07/2008 |
| 7423805 | Ultra-broadband UV microscope imaging system with wide range zoom capability An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, contin... | 09/09/2008 |
| 7400445 | Optical filters for accelerated weathering devices Optical filters comprising a small concentration of visible light absorbing components optionally in combination with small concentrations of ultraviolet and infared absorbing components suitable for use in an illuminator for an accelerated weathering device and met... | 07/15/2008 |
| 7382526 | Optical system An optical system projecting onto an image plane an object that is disposed at infinity by an intermediate image. The optical system includes a front group and a relay optic, each including a plurality of lenses, the intermediate image disposed between the front gro... | 06/03/2008 |
| 7369303 | Dual band lens system incorporating molded chalcogenide An image forming system and lens system including at least one molded chalcogenide lens element and configured to simultaneously image light at the medium wave infrared region (MWIR) and the long wave infrared region (LWIR) at a common focal plane. ... | 05/06/2008 |
| 7365909 | Fabrication methods for micro compounds optics Methods for fabricating refractive element(s) and aligning the elements in a compound optic, typically to a zone plate element. The techniques are used for fabricating micro refractive, such as Fresnel, optics and compound optics including two or more optical elemen... | 04/29/2008 |
| 7355678 | Projection system for EUV lithography An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a sec... | 04/08/2008 |
| 7347567 | Arrangement for projecting an image onto a projection surface and associated transformation lens system The invention relates to an arrangement for projecting an image, which is made of pixels, onto a projection surface, including at least one light source whose intensity can be altered and which emits a light beam, also including a deflection device which deflects th... | 03/25/2008 |
| 7342647 | Compact laser altimeter system A laser-based altimeter for use on-board an aircraft comprises: a first housing including a hollow cavity and an exit aperture, and a second housing including a hollow cavity and an entrance aperture. A laser source and a plurality of first optical elements are fixe... | 03/11/2008 |
| 7321465 | Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lenses A numerical optimizing method serves to reduce harmful effects caused by intrinsic birefringence in lenses of a fluoride crystal material of cubic crystal structure in an objective, particularly a projection objective for a microlithography system. Under the optimiz... | 01/22/2008 |
| 7317179 | Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective el... | 01/08/2008 |
| 7317583 | High numerical aperture projection system and method for microlithography The present invention relates to a high numerical aperture exposure system having a wafer. The exposure system in the present invention includes a beam-splitter, a reticle, a reticle optical group, where the reticle optical group is placed between the reticle and th... | 01/08/2008 |
| 7315033 | Method and apparatus for reducing biological contamination in an immersion lithography system Disclosed are a method of reducing biological contamination in an immersion lithography system and an immersion lithography system configured to reduce biological contamination. A reflecting element and/or an irradiating element is used to direct radiation to kill b... | 01/01/2008 |
| 7307783 | Catadioptric imaging system employing immersion liquid for use in broad band microscopy A reduced size catadioptric inspection system employing a catadioptric objective and immersion substance is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, ... | 12/11/2007 |
| 7301605 | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices A projection exposure apparatus includes a projection optical system, which is arranged in an optical path between a first surface and a second surface, projects a pattern on a negative plate arranged on the first surface onto a workpiece arranged on the second surf... | 11/27/2007 |
| 7301695 | Anti-reflective film and optical element having anti-reflective film In an anti-reflective film including alternating layers of high refractive-index layers and low refractive-index layers, by designing such that a designed central wavelength λ0 is within a wavelength range of 141 nm to 189 nm, and that when the first to ... | 11/27/2007 |
| 7294814 | Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the same A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are matched to given image errors and their correction. The invention is s... | 11/13/2007 |
| 7291853 | Discharge produced plasma EUV light source An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members... | 11/06/2007 |
| 7292388 | Lens made of a crystalline material As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one det... | 11/06/2007 |
| 7285787 | Epi-illumination microscope and fluorescence filter set A microscope has a light source that emits light to illuminate a sample, a first wavelength selection member that selectively transmits the light from the light source, a light splitter that reflects the light from the first wavelength selection member to epi-illumi... | 10/23/2007 |
| 7280145 | Camera and image pick-up device unit having an optical member that is vibrated to remove dust A camera is provided that includes a dust-proofing member which has a transparent portion through which a visible light component is transmitted among beams incident from a photographing lens and which absorbs an infrared component, opposed to the front of an image ... | 10/09/2007 |
| 7280273 | Method and system for simultaneously imaging in the near infrared and short wave infrared spectrums An image forming system and lens system configured to simultaneously image light at the short wave infrared region (SWIR) and the near infrared region (NIR). ... | 10/09/2007 |
| 7277188 | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate Systems and methods are disclosed for focusing a beam for an interaction with a film deposited on a substrate wherein the focused beam defines a short axis and a long axis. In one aspect, the system may include a detecting system to analyze light reflected from the ... | 10/02/2007 |
| 7262920 | Optical element and manufacturing method therefor An optical element and a manufacturing method therefor, an exposure apparatus, and a device manufacturing method that can reduce the effect of intrinsic birefringence under high NA conditions. According to an optical element as one aspect of the present invention, a... | 08/28/2007 |
| 7256932 | Optical system for ultraviolet light An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or ... | 08/14/2007 |
| 7245361 | Method for evaluating refractive index homogeneity of optical member A method for evaluating the refractive index homogeneity of an optical member includes passing light through an optical member (1) used for photolithography. The side surface (1a) with respect to the optical axis (AX) of the optical member (1... | 07/17/2007 |
| 7242843 | Extended lifetime excimer laser optics The invention is directed to hermetically sealed optical lithography components or elements that are hermetically sealed by a durable coat of a hermetically sealing material selected from the group consisting of oxide and fluorinated oxide films. The durable coating... | 07/10/2007 |
| 7239447 | Objective with crystal lenses An objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens is disclosed. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with ... | 07/03/2007 |
| 7239453 | Projection optical system and projection exposure apparatus A catadioptric projection optical system includes a first optical system, for receiving light from an object, a second optical system, for forming an image of the object on an image plane, and a third optical system disposed optically between the first optical syste... | 07/03/2007 |
| 7235478 | Polymer spacer formation A polymer spacer material may increase the dimensions of the patterned photoresist that is used as a mask to etch the layers below the photoresist, which in turn translates into smaller dimensions etched into the underlying materials. This allows for the formation o... | 06/26/2007 |
| 7232778 | Synthetic quartz glass ingot, synthetic quartz glass, and methods of manufacture thereof In a synthetic quartz glass ingot which is produced by vapor phase hydrolyzing or oxidatively decomposing a silica-forming starting compound in an oxyhydrogen flame such that silica growth in a direction occurs at a silica particle deposition and melting face, stria... | 06/19/2007 |
