Did You Know...
...that the Band-Aid Bandage was invented by a Johnson & Johnson employee whose wife had cut herself? Earl Dickson's wife was rather accident prone, so he set out to develop a bandage that she could apply without help. He placed a small piece of gauze in the center of a small piece of surgical tape, and what we know today as the Band Aid bandage was born!
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| Number | Title | Issue Date |
| 7869121 | Small ultra-high NA catadioptric objective using aspheric surfaces A relatively high NA objective employed for use in imaging a specimen is provided. The objective includes a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive th... | 01/11/2011 |
| 7672043 | Catadioptric imaging system exhibiting enhanced deep ultraviolet spectral bandwidth A relatively high spectral bandwidth objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective includes a lens group having at least one focusing lens configured to receive light energy and form an intermediate ima... | 03/02/2010 |
| 7583433 | Multi mirror system for an illumination system There is provided a multi-mirror-system for an illumination system, especially for lithography with wavelengths ≦193 nm. The system includes light rays traveling along a light oath from an object plane to an image plane, and an arc-shaped field in the image plane,... | 09/01/2009 |
| 7423805 | Ultra-broadband UV microscope imaging system with wide range zoom capability An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, contin... | 09/09/2008 |
| 7405871 | Efficient EUV collector designs A collector that includes a laser produced plasma (LPP) extreme ultra violet (EUV) light source and a first optical path from the source to a mirror. The mirror is the first mirror that light emitted from the source and traveling along the first optical path impinge... | 07/29/2008 |
| 7369302 | Day/night weapon sight assembly for use on weapon without change in eye relief A day/night weapon sight assembly that consists of daytime sight and a nighttime sight allows the use of both sights without change in eye relief even when the nighttime sight is attached to the rear end of the daytime sight. This is achieved by supporting the dayti... | 05/06/2008 |
| 7362508 | Projection optical system and method for photolithography and exposure apparatus and method using same Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ... | 04/22/2008 |
| 7359114 | Clip-on night vision device A night viewer (10) is adaptable to generate an enhanced image suitable for viewing through an optical scope (16). An input end (18) of the viewer (10) receives the image to be enhanced through an objective lens (20). An image enha... | 04/15/2008 |
| 7319509 | Attenuator for attenuating wavelengths unequal to a used wavelength There is provided an attenuator for attenuating electromagnetic radiation of wavelengths Unequal to a used wavelength, including a grating element having i) grating grooves that produce a grating period (p), and ii) a grating plane. The grating period (p) is least a... | 01/15/2008 |
| 7301694 | Off-axis projection optical system and extreme ultraviolet lithography apparatus using the same Example embodiments are directed to an off-axis projection optical system including first and second mirrors that are off-axially arranged. The tangential and sagittal radii of curvature of the first mirror may be R1t and R1s, respectively. The... | 11/27/2007 |
| 7268956 | Solid catadioptric lens with two viewpoints A dual viewpoint solid catadioptric lens has a first spherical refractive surface S1 having a center C1 located on an optical axis of the lens and having a radius r1, and a second spherical refractive surface S2 having a center C2 ... | 09/11/2007 |
| 7256932 | Optical system for ultraviolet light An optical system for ultraviolet light having wavelengths λ≦200 nm, which may be designed in particular as a catadioptric projection objective for microlithography, has a plurality of optical elements including optical elements made of synthetic quartz glass or ... | 08/14/2007 |
| 7248401 | Common-aperture multispectral objective A common-aperture, multispectral device uses a folded beamsplitter to simultaneously image near infrared (NIR) and long wave infrared (LWIR) spectral bands. The folded-path optical design makes the sensor extremely compact and lightweight without compromising the F/... | 07/24/2007 |
| 7248667 | Illumination system with a grating element An illumination system, particularly for wavelengths ≦100 nm, with an object plane and a field plane, comprises a grating element and a physical diaphragm in a diaphragm plane, which is arranged downstream to the grating element in the beam path from the object pl... | 07/24/2007 |
| 7245352 | Alignment using latent images Systems and techniques for alignment with latent images. In one implementation, a method includes detecting a location of a latent image on a substrate, repositioning the substrate based on the detected location of the latent image, and patterning the substrate.... | 07/17/2007 |
| 7239443 | Condenser optic with sacrificial reflective surface Employing collector optics that has a sacrificial reflective surface can significantly prolong the useful life of the collector optics and the overall performance of the condenser in which the collector optics are incorporated. The collector optics is normally subje... | 07/03/2007 |
| 7196343 | Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby An optical element including an anti-reflection (AR) coating is configured to reflect Extreme-Ultra-Violet (EUV) radiation only. ... | 03/27/2007 |
| 7196841 | Lighting system, particularly for use in extreme ultraviolet (EUV) lithography A lighting system, particularly for use in extreme ultraviolet (EUV) lithography, comprising a projection lens for producing semiconductor elements for wavelengths ≦193 nm is provided with a light source, an object plane, an exit pupil, a first optical element hav... | 03/27/2007 |
| 7180658 | High performance catadioptric imaging system A reduced size catadioptric objective and system is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range. Elements are less than 100 mm in diameter. The objective... | 02/20/2007 |
| 7180067 | Infrared imaging system with ellipsoid reflective warm baffle and method An infrared imaging system uses an uncooled elliptical surface section between reflective surfaces to allow a detector to perceive a cold interior of a vacuum chamber rather than a warmer surface of a structure or housing. In this way, background infrared radiation ... | 02/20/2007 |
| 7119969 | Pixel matched camera optics An optical system and method comprising acquiring radiation in a plurality of spectral bands, each acquired by a discrete collector, receiving the acquired radiation in one or more of the spectral bands with one or more afocal zoom optics, each receiving radiation f... | 10/10/2006 |
| 7084412 | Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm There is provided a collector unit for illumination systems with a wavelength of ≦193 nm, preferably ≦126 nm, and especially preferably in the region of EUV wavelengths. Rays of a beam bundle impinge on the collector unit, and the beam bundle emerges from an obj... | 08/01/2006 |
| 7081992 | Condenser optic with sacrificial reflective surface Employing collector optics that have a sacrificial reflective surface can significantly prolong the useful life of the collector optics and the overall performance of the condenser in which the collector optics are incorporated. The collector optics are normally sub... | 07/25/2006 |
| 7075721 | Compensator for radially symmetric birefringence A birefringence correction is incorporated into an optical imaging system for imaging with deep ultraviolet light. Optical elements which exhibit an intrinsic birefringence with deep ultraviolet light are arranged in a fashion that renders accumulated birefringence ... | 07/11/2006 |
| 7057647 | Dual-mode camera system for day/night or variable zoom operation A dual camera system uses a single lens and no moving parts in the optical path. A single lens directs a desired scene to a partially reflective beamsplitting mirror, thence to a pair of image sensors. For day/night operation, one sensor may be optimized for nightti... | 06/06/2006 |
| 7050237 | High-efficiency spectral purity filter for EUV lithography An asymmetric-cut multilayer diffracts EUV light. A multilayer cut at an angle has the same properties as a blazed grating, and has been demonstrated to have near-perfect performance. Instead of having to nano-fabricate a grating structure with imperfections no grea... | 05/23/2006 |
| 7049597 | Multi-mode optical imager A common aperture, multi-mode optical imager for imaging electromagnetic radiation bands from a field of two or more different wavelengths is described. Fore-optics are provided to gather and direct electromagnetic radiation bands forming an image into an aperture o... | 05/23/2006 |
| 7050235 | Diffractive optical spectral filter having arbitrary amplitude and phase response A diffractive optical filter having a fractional level density s[j] and a transfer function C[m] that is an approximation to a desired Hermitian, passive transfer function B[m] is provided. The fractional level density s[j] is obtained by Fourier (or inverse Fourier... | 05/23/2006 |
| 7046338 | EUV condenser with non-imaging optics An illumination system and condenser for use in photolithography in the extreme ultraviolet wavelength region has a first non-imaging optic element collecting electromagnetic radiation from a source and creates a desired radiance distribution. A second non-imaging o... | 05/16/2006 |
| 7034320 | Dual hemispherical collectors A system and method for collecting radiation, which may be used in a lithography illumination system. The system comprises a first surface shaped to reflect radiation in a first hemisphere of a source to illuminate in a second hemisphere of the source; and a second ... | 04/25/2006 |
| 7034998 | Method of connecting a multiplicity of optical elements to a basic body In a method of connecting a multiplicity of optical elements (9) to a basic body (8), in particular for producing a faceted mirror (1), for example for beam mixing and field imaging for an EUV lighting system, the individual optical elements ( | 04/25/2006 |
| 7012759 | Zoom lens system A zoom lens system is disclosed. The zoom lens system forms a final image of an object and a first intermediate real image between the object and the final image. The zoom lens system includes a first optical unit located between the object and the first intermediat... | 03/14/2006 |
| 6999231 | Miniature high-resolution multi-spectral objective lens A multi-spectral objective lens comprising a primary lens for receiving light reflected from an object, the light including wavelengths in the SWIR and LWIR spectral bands, and optical elements spaced from the receiving means for simultaneously imaging the SWIR ligh... | 02/14/2006 |
| 6964485 | Collector for an illumination system with a wavelength of less than or equal to 193 nm There is provided a collector for guiding light with a wavelength of ≦193 nm onto a plane. The collector includes a first mirror shell for receiving a first ring aperture section of the light and irradiating a first planar ring section of the plane with a first ir... | 11/15/2005 |
| 6963395 | Method and apparatus for inspecting an EUV mask blank An apparatus and method for at-wavelength EUV mask-blank characterization for inspection of moderate and low spatial frequency coating uniformity using a synchrotron or other source of EUV light. The apparatus provides for rapid, non-destruction, non-contact, at-wav... | 11/08/2005 |
| 6930760 | Lithographic apparatus, device manufacturing method, and device manufactured thereby In a lithographic projection apparatus, a grating spectral filter is used to filter an EUV projection beam. The grating spectral filter is preferably a blazed, grazing incidence, reflective grating. Cooling channels may be provided in or on the rear of the grating s... | 08/16/2005 |
| 6908200 | Reflection optical device, and reflection solid-state optical device, imaging device comprising this, multiwavelength imaging device, video camera, and monitoring device mounted on vehicle Two reflection surfaces that are a first reflection surface (2) and a second reflection surface (3), each in a non-axisymmetric form, are disposed in the stated order in a direction in which light fluxes travel, and bring light fluxes from an object in... | 06/21/2005 |
| 6897434 | All-fiber photon-pair source for quantum communications A source and/or method of generating quantum-correlated and/or entangled photon pairs using parametric fluorescence in a fiber Sagnac loop. The photon pairs are generated in the 1550 nm fiber-optic communication band and detected by a detection system including InGa... | 05/24/2005 |
| 6894299 | Apparatus and method for treating products with ultraviolet light Apparatus and method for treating a product with ultraviolet light. The apparatus includes a chamber having an inlet and an outlet, and an interior space between the inlet and the outlet. An ultraviolet light permeable conveyor is configured to move the product thro... | 05/17/2005 |
| 6885503 | Achromatic fresnel optics based lithography for short wavelength electromagnetic radiations A lithography apparatus having achromatic Fresnel objective (AFO) that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index ch... | 04/26/2005 |
