Bizarre Patents
Crispy Chip Sandwich and Process of Producing a Sandwich Product
A food product comprising a multilayer cookie or snack having outer layers formed from a crispy type edible food product such as a potato chip or corn chip, etc. with an intermediate marshmallow layer being in contact with the inner surface of each crispy chip and one or more filler substances.
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| Number | Title | Issue Date |
| 8102541 | Apparatus and method for measuring structures on a mask and or for calculating structures in a photoresist resulting from the structures An apparatus (1) for measuring structures (3) on a mask (2) and for calculating structures in a photoresist on a wafer resulting from the structures (3) on the mask (2) is disclosed, wherein the apparatus (1) comprises at le... | 01/24/2012 |
| 8064071 | Floating sheet measurement apparatus and method A sheet measurement apparatus has a sheet disposed in a melt. The measurement system uses a beam to determine a dimension of the sheet. This dimension may be, for example, height or width. The beam may be, for example, collimated light, a laser, x-rays, or gamma ray... | 11/22/2011 |
| 8049903 | High resolution monitoring of CD variations An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of... | 11/01/2011 |
| 8004694 | System for indirectly measuring a geometric dimension related to an opening in an apertured exterior surface of a part based on direct measurements of the part when fixtured at a measurement station A system for indirectly measuring a geometric dimension related to an opening in an apertured exterior surface of a part such as an ammunition case based on direct measurements of the part when fixtured at a measurement station is provided. The system includes first... | 08/23/2011 |
| 7969585 | Geometric measurement system and method of measuring a geometric characteristic of an object A geometric measurement system is adapted to precisely measure one or more surfaces of objects such as corneas, molds, contact lenses in molds, contact lenses, or other objects in a fixture. The geometric measurement system can employ one or more of three possible m... | 06/28/2011 |
| 7969584 | Measuring method including measuring angle of concave portion and irradiating light over concave portion The measuring method for providing a precise determination of a geometry of a concave portion is provided. The measuring method includes: measuring an angle of a side wall of a concave portion with a bottom surface thereof formed in an insulating film (operation S | 06/28/2011 |
| 7948642 | Optical measuring apparatus, optical measuring method, and optical measurement processing program An optical measuring apparatus includes a light transmission unit, a light reception unit, a measurement value calculation unit, and a correction unit. The light transmission unit forms a beam of light that focuses in a measurement area where a measurement target ob... | 05/24/2011 |
| 7933026 | High resolution monitoring of CD variations An optical metrology method is disclosed for evaluating the uniformity of characteristics within a semiconductor region having repeating features such a memory die. The method includes obtaining measurements with a probe laser beam having a spot size on the order of... | 04/26/2011 |
| 7916311 | Method and system for inspecting blade tip clearance A method for inspecting blade tip clearance between at least one rotor blade and a case spaced radially outward from the rotor blade is provided. The method includes inserting a probe into an aperture defined in the case and emitting electromagnetic energy into the ... | 03/29/2011 |
| 7903264 | Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus Wavelength dispersion of intensity of light reflected from an evaluation object is measured. A complex refractive index of a substance forming the evaluation object and the environment are prepared. Virtual component ratios comprising a mixture ratio of the substanc... | 03/08/2011 |
| 7884950 | Substrate processing method, program, computer-readable storage medium, and substrate processing system In a pattern measuring unit installed in a coating and developing treatment system, the height of a pattern formed on a substrate is measured using the Scatterometry method. Based on the measured height of the pattern, an appropriate number of rotations of the subst... | 02/08/2011 |
| 7880902 | Contactless optical probe and device and method making use thereof The probe comprises a light source (20), means for shaping (24, 25, 21) the beam emitted by said light source and the beam coming from a surface arranged close to a target distance, an optical detector unit (22), comprising a pinhole diaphragm (... | 02/01/2011 |
| 7876458 | Highlighting gaps in a surface A surface gap detector facilitates determining conformance of a surface of an object by providing a light source integrated into the detector that diffusely illuminates the surface of the object so that a user may observe the light that passes between the detector a... | 01/25/2011 |
| 7864343 | Method and system for measuring patterned structures A method of preparation of reference data for measuring the profile of a patterned structure for use in control of a manufacturing process, the method including: providing a model for generating profiles based on the manufacturing process; generating the profiles by... | 01/04/2011 |
| 7852493 | Optical recording of the spatial shape of bodies and body parts with sections that in part are not optically visible There is described a method and an apparatus for the optical 3D digitization of bodies and body parts which reveal non-visible regions which therefore cannot be detected by the 3D digitizer. A mechanical aid is fixed at these regions and protrudes into the measureme... | 12/14/2010 |
| 7826071 | Parametric profiling using optical spectroscopic systems A gallery of seed profiles is constructed and the initial parameter values associated with the profiles are selected using manufacturing process knowledge of semiconductor devices. Manufacturing process knowledge may also be used to select the best seed profile and ... | 11/02/2010 |
| 7826072 | Method for optimizing the configuration of a scatterometry measurement system The present application discloses a method of model-based measurement of semiconductor device features using a scatterometer system. The method includes at least the following steps. A cost function is defined depending upon a plurality of variable parameters of the... | 11/02/2010 |
| 7821653 | Portable electronic measuring device and method A portable electronic device for measuring a distance D1 between two points E1, E2, includes a visible and rotatable light emitter, an angle computing unit, a distance computing unit and an output unit. The light emitter generates a rotatable li... | 10/26/2010 |
| 7821654 | System for scatterometric measurements and applications Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eige... | 10/26/2010 |
| 7817288 | Device and method for measuring profiles of electron beam and laser beam A device for measuring profiles of an electron beam and a laser beam is provided with a profile measuring device 30 for measuring cross-section profiles of the beams in the vicinity of a collision position where an electron beam 1 and a laser beam 3... | 10/19/2010 |
| 7804606 | Portable electronic measuring device and method A method for measuring a distance D2 between two points includes following steps. A first surface of a portable electronic device is parallel to a line defined by the two points. A distance D2 between the first surface and the line is obtained. A visib... | 09/28/2010 |
| 7791740 | Method and system for measuring patterned structures A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by... | 09/07/2010 |
| 7764388 | Autofocus control voltage for indicating package dimensions A system and method for determining dimensions of a package during imaging for supply chain management is provided. The system and method utilize a value of an auto focus control voltage when an image of a package is in focus to calculate a magnification ratio. The ... | 07/27/2010 |
| 7755775 | Broadband optical metrology with reduced wave front distortion, chromatic dispersion compensation and monitoring Apparatus and method for examining a sample with a broadband radiation while preserving a small spot and low wave front distortion. The apparatus has a broadband source for generating the broadband radiation and a first reflective optics that employ toroidal mirrors... | 07/13/2010 |
| 7742177 | Noise-reduction metrology models The invention can provide apparatus and methods for processing wafers using Noise-Reduction (N-R) metrology models that can be used in Double-Patterning (D-P) processing sequences, Double-Exposure (D-E) processing sequences, or other processing sequences. ... | 06/22/2010 |
| 7715026 | Method, apparatus, and system for non-contact manual measurement of a wheel profile A method, apparatus and system for non-contact measurement of a railway wheel profile are disclosed herein. To measure the wheel profile, a laser having a distance displacement sensor and angular displacement sensor projects a beam of light onto the surface of a rai... | 05/11/2010 |
| 7688456 | Assessment and optimization for metrology instrument Methods and related program product for assessing and optimizing metrology instruments by determining a total measurement uncertainty (TMU) based on precision and accuracy. The TMU is calculated based on a linear regression analysis and removing a reference measurin... | 03/30/2010 |
| 7679758 | Fastener inspection system and method A method of optically inspecting a fastener to determine whether it meets two or more dimensional parameters is provided. The method includes using centrifugal force to place the fastener in a predetermined location. Two or more sets of image data of the fastener ar... | 03/16/2010 |
| 7667858 | Automated process control using optical metrology and a correlation between profile models and key profile shape variables A process step in fabricating a structure on a wafer in a wafer application having one or more process steps and one or more process parameters is controlled by determining a correlation between a set of profile models and one or more key profile shape variables. Ea... | 02/23/2010 |
| 7663768 | Method and system for measuring patterned structures A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by... | 02/16/2010 |
| 7656542 | Method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece In a measuring system, a method for evaluating parameters of a workpiece includes measuring a periodic structure, such as a grating, on the workpiece to produce image data. An orientation of features in the image data, produced by higher order diffractions from the ... | 02/02/2010 |
| 7649636 | Optical metrology system and metrology mark characterization device An optical metrology system is disclosed that has a measuring system configured to irradiate a metrology mark and record a portion of a reflected, a transmitted, or both, electromagnetic field and a characterization device configured to determine from the recorded f... | 01/19/2010 |
| 7639375 | Determining transmittance of a photomask using optical metrology Transmittance of a photomask is determined using optical metrology. In particular, reflectance of a portion of the photomask is determined by directing an incident beam of light at the portion of the photomask. The reflectance is determined by measuring light diffra... | 12/29/2009 |
| 7636171 | Storage media monitoring method for archive management A method is provided for monitoring degradation of a data storage medium. Multiple reactive elements are provided in the data storage medium. Properties of each one of these elements is determined, prior or subsequent to data being stored in the medium, to generate ... | 12/22/2009 |
| 7626710 | Method and system for measuring patterned structures A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by... | 12/01/2009 |
| 7626711 | Method and system for measuring patterned structures A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by... | 12/01/2009 |
| 7623251 | Geometric measurement system and method of measuring a geometric characteristic of an object A geometric measurement system is adapted to precisely measure one or more surfaces of objects such as corneas, molds, contact lenses in molds, contact lenses, or other objects in a fixture. The geometric measurement system can employ one or more of three possible m... | 11/24/2009 |
| 7619753 | Method for measuring dimensions and optical system using the same A method of measuring dimensions for an optical system to measure the critical dimension of a sample object according to this aspect of the present invention includes the steps of preparing a plurality of standard objects, selecting a predetermined focus metric algo... | 11/17/2009 |
| 7619754 | Curved sensor array apparatus and methods Curved sensor array configurations and methods of processing the data gathered by the sensors. A 2 dimensional embodiment comprises singular ring of sensors that can monitor sources in a 2 dimensional plane. A sensor directly facing a target produces a maximum respo... | 11/17/2009 |
| 7616329 | System and method for inspecting railroad track A system and method for inspecting railroad track is disclosed. The disclosed system includes lasers, cameras, and a processor. The lasers are positioned adjacent the track. The laser emits a beam of light across the railroad track, and the camera captures images of... | 11/10/2009 |
