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| Number | Title | Issue Date |
| 7995213 | Measurement method, measurement apparatus, exposure apparatus, and device fabrication method A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three differe... | 08/09/2011 |
| 7948638 | Scanning interferometric methods and apparatus for measuring aspheric surfaces and wavefronts Interferometric scanning method(s) and apparatus for measuring test optics having aspherical surfaces including those with large departures from spherical. A reference wavefront is generated from a known origin along a scanning axis. A test optic is aligned on the s... | 05/24/2011 |
| 7924437 | Measurement method and apparatus, exposure apparatus A measurement method for measuring a wavefront aberration of a target optical system using a measurement apparatus that measures the wavefront aberration of the target optical system by detecting an interference pattern includes the steps of measuring as a system pa... | 04/12/2011 |
| 7924436 | Method for approximating an influence of an optical system on the state of polarization of optical radiation A method for approximating an influence of an optical system on the state of polarization of optical radiation comprises the steps of providing incoming optical radiation for the optical system in several incoming states of polarization, including at least one incom... | 04/12/2011 |
| 7911624 | Device and method for the interferometric measurement of phase masks A device and method for the interferometric measurement of phase masks, particularly from lithography. Radiation passing through a coherence mask is brought to interference by a diffraction grating. A phase mask is arranged in or near the pupil plane of the first im... | 03/22/2011 |
| 7869058 | Apparatuses and methods for evaluating performance of optical systems A system for evaluation of optical quality of an optical device includes a light source configured to generate light, the generated light be received by an optical device. An interferometric lens apparatus is removably mounted to the optical device to generate inter... | 01/11/2011 |
| 7821648 | Measurement method, a measurement apparatus, and a computer-readable recording medium A measurement method for measuring a shape of a target using an interference pattern includes the steps of converting a first interference pattern into a first shape of the target (S103 to S105), obtaining a second interference pattern at a position wh... | 10/26/2010 |
| 7796274 | System for measuring the image quality of an optical imaging system A measuring system (100) for the optical measurement of an optical imaging system (150), which is provided to image a pattern arranged in an object surface (155) of the imaging system in an image surface (156) of the imaging system, compr... | 09/14/2010 |
| 7773233 | Method of measuring wavefront retardance aberration based on wavefront and birefringent characteristics A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three differe... | 08/10/2010 |
| 7768653 | Method and system for wavefront measurements of an optical system A wavefront measurement system includes a source of electromagnetic radiation. An illumination system delivers the electromagnetic radiation to an object plane. A source of a diffraction pattern is in the object plane. A projection optical system projects the diffra... | 08/03/2010 |
| 7760366 | System for measuring the image quality of an optical imaging system A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an obje... | 07/20/2010 |
| 7760365 | Aspheric lens surface-decenter measuring method and apparatus A relationship between surface decenter of a lens 1 under test and surface-decenter comatic aberration and a relationship between surface tilt of the lens 1 under test and surface-tilt comatic aberration are calculated by computer simulation. The surfa... | 07/20/2010 |
| 7746479 | Wavefront-aberration measuring device and exposure apparatus including the device A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing thro... | 06/29/2010 |
| 7724376 | Wavefront-aberration measuring method and device, and exposure apparatus including the device The disclosure describes obtaining a first reference wavefront generated from a object plane mask slit, obtaining a second reference wavefront generated from a first image plane mask slit, measuring a wavefront of a target optical system including a reference wavefr... | 05/25/2010 |
| 7705998 | Method for evaluating an optical imaging process A method includes calculating destructive interference conditions between two linearly s-polarized waves and between two linearly p-polarized waves, respectively, in dependence on varying parameters of the s- and p-polarized waves, representing the destructive inter... | 04/27/2010 |
| 7692799 | Measurement apparatus, exposure apparatus, and device fabrication method The invention provides a measurement apparatus which measures a wavefront aberration of an optical system to be measured, the apparatus includes a measurement mask which is inserted on an object plane of the optical system to be measured, and includes a plurality of... | 04/06/2010 |
| 7688453 | Interferometry testing of lenses, and systems and devices for same Modified MZ (Mach-Zender) interferometers preferably are utilized to analyze the transmitted, aspherical wavefront of an ophthalmic lens by mounting the lens in a cuvette having a rotatable carousel that can hold multiple lenses. Fresh, temperature controlled, salin... | 03/30/2010 |
| 7675629 | Exposure apparatus and device manufacturing method using a common path interferometer to form an interference pattern and a processor to calculate optical characteristics of projection optics using the interference pattern An exposure apparatus including an illumination system which illuminates an original, and projection optics which project a pattern of the original illuminated by the illumination system onto a substrate. The apparatus includes an interferometer which forms an inter... | 03/09/2010 |
| 7663765 | Refractive-index measurement system and method for measuring refractive-index A refractive-index measurement system includes a light source, a first beam splitter, a first reflective mirror, a second reflective mirror, a second beam splitter, a container, a first polarizer, and a second polarizer. The first beam splitter splits light emitted ... | 02/16/2010 |
| 7623247 | Wavefront-aberration measuring device and exposure apparatus including the device A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing thro... | 11/24/2009 |
| 7619747 | Lithographic apparatus, analyzer plate, subassembly, method of measuring a parameter of a projection system and patterning device An analyzer plate positioned between a projection system and a radiation sensor is illuminated by a projected beam of radiation. The analyzer plate includes two crossing regions, each of which transmits radiation with a different polarization direction. The beam of ... | 11/17/2009 |
| 7619748 | Exposure apparatus mounted with measuring apparatus An exposure apparatus for exposing a pattern of a mask onto an object using light from a light source, includes a projection optical system for projecting the pattern onto the object, and a measuring apparatus for measuring, as an interference fringe, optical perfor... | 11/17/2009 |
| 7609390 | Measurement method and apparatus, exposure apparatus A measurement method for measuring a wavefront aberration of a target optical system using a measurement apparatus that measures the wavefront aberration of the target optical system by detecting an interference pattern includes the steps of measuring as a system pa... | 10/27/2009 |
| 7605926 | Optical system, method of manufacturing an optical system and method of manufacturing an optical element A method of positioning optical elements relative to each other uses an interferometer apparatus comprising a plurality of holograms generating beams of adjustment measuring light which are incident on optical surfaces of the optical elements. Interference patterns ... | 10/20/2009 |
| 7602504 | Exposure apparatus and device manufacturing method An exposure apparatus, which equipped with a projection optical system that is configured to project a pattern of an original onto a substrate, includes an interferometer configured to measure a wavefront in a first direction and a wavefront in a second direction of... | 10/13/2009 |
| 7602503 | Methods for measuring a wavefront of an optical system A method for measuring a wavefront of an optical system. A first step of the method includes directing electromagnetic radiation uniformly at an object plane having a first grating positioned therein. Lines of the first grating comprise a plurality of dots. A second... | 10/13/2009 |
| 7576870 | Measurement apparatus, exposure apparatus, and device fabrication method A measurement apparatus which measures a wavefront aberration of an optical system to be measured, the apparatus comprises a detection unit configured to detect an interference pattern formed by light having passed through a mask inserted on an object plane of the o... | 08/18/2009 |
| 7528963 | Method and system for wavefront measurements of an optical system A wavefront measurement system includes a source of electromagnetic radiation. An illumination system delivers the electromagnetic radiation to an object plane. A source of a diffraction pattern is in the object plane. A projection optical system projects the diffra... | 05/05/2009 |
| 7518735 | Measurement method and apparatus, exposure apparatus, and device manufacturing method A measurement method for measuring a wavefront aberration of a target optical system using an interference pattern formed by a light from a first image side slit, and a light from a second image side slit, the first and second image side slits being located at an im... | 04/14/2009 |
| 7508527 | Apparatus and method of in situ and ex situ measurement of spatial impulse response of an optical system using phase-shifting point-diffraction interferometry A point diffraction interferometer for measuring properties of a spatial impulse response function, the interferometer including: a source for generating a source beam; an optical system; an optical element including a test object located in an object plane of the o... | 03/24/2009 |
| 7463365 | Measurement method and apparatus, exposure apparatus, and device manufacturing method A measurement method for measuring a wavefront aberration of a target optical system using an interference pattern formed by a light from a first image side slit, and a light from a second image side slit, the first and second image side slits being located at an im... | 12/09/2008 |
| 7443515 | Apparatus for measuring optical properties of tested optical system using interference A measuring apparatus for measuring the optical properties of an optical system including a mask with a slit and a window, upon which different light beams are focused to derive an interference pattern. The interference pattern can be used to obtain optical properti... | 10/28/2008 |
| 7443516 | Optical-distortion correcting apparatus and optical-distortion correcting method A reference-height calculating unit calculates an original height of a distortion detecting mirror when a distortion detecting mirror and a reference mirror are set in parallel to each other. A height measuring unit measures mirror heights when the distortion detect... | 10/28/2008 |
| 7440116 | Surface profiling apparatus with reference calibrator and method of calibrating same A broad band surface profiling apparatus including a reference calibrator for calibrating the apparatus to compensate for surface features of the reference surface. A user is instructed to conduct calibration measurement operations using a calibration sample having ... | 10/21/2008 |
| 7436521 | Optical measuring apparatus and operating method for imaging error correction in an optical imaging system A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of radiation information, for example interference information, which is ... | 10/14/2008 |
| 7428058 | Apparatus and method for in situ and ex situ measurements of optical system flare Apparatus and methods for in situ and ex situ measurements of spatial profiles of the modulus of the complex amplitude and intensity of flare generated by an optical system. The in situ and ex situ measurements comprise interferometric and non-interferometric measur... | 09/23/2008 |
| 7428059 | Measurement method and apparatus, exposure apparatus, and device manufacturing method A measurement method measures a wavefront aberration of a target optical system using an interference pattern formed by lights from first and second image side slits. The first image side slit has a width equal to or smaller than a diffraction limit of the target op... | 09/23/2008 |
| 7417745 | Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the imag... | 08/26/2008 |
| 7408652 | Device and method for the optical measurement of an optical system by using an immersion fluid A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent ... | 08/05/2008 |
| 7408651 | Method and system for wavefront measurements of an optical system A wavefront measurement system includes a source of electromagnetic radiation. An illumination system delivers the electromagnetic radiation to an object plane. A source of a diffraction pattern is in the object plane. A projection optical system projects the diffra... | 08/05/2008 |
