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Apparatus for Simulating a High Five
A self-righting hand-arm configuration which is adapted to pivot when struck by a user, thereby simulating a "high five."
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| Number | Title | Issue Date |
| 7952721 | Optical linear and rotation displacement sensor A system includes a measuring tool, a fixture, and a rotatable target. The measuring tool includes a light source, an imaging device, and an electronic circuit. The fixture allows the rotatable target to rotate about an axis. The rotatable target includes a surface ... | 05/31/2011 |
| 7929147 | Method and system for determining an optimized artificial impedance surface A method and system for determining an optimized artificial impedance surface is disclosed. An artificial impedance pattern is calculated on an impedance surface using an optical holographic technique given an assumed surface wave profile and a desired far field rad... | 04/19/2011 |
| 7924431 | Method of measuring properties of particles and corresponding apparatus A method of measuring properties of particles includes generating a beam of radiation (IW); illuminating with the beam (IW) an observation region (MR) which is transited by a particle (B). A portion of the beam (IW) gives rise to radiation (SW) which is scattered by... | 04/12/2011 |
| 7924432 | Three-dimensional interferometric microscopy A statistically sparse subset of switchable optical sources in a sample is activated, and the activated switchable optical sources are excited such that optical beams are emitted from the activated switchable optical sources along at least two optical paths. A first... | 04/12/2011 |
| 7916304 | Systems and methods for 3-dimensional interferometric microscopy In one embodiment, an apparatus comprises an optical system with multiple detectors and a processor. The optical system is configured to produce images of an optical source in a first dimension and a second dimension substantially orthogonal to the first dimension a... | 03/29/2011 |
| 7898671 | Interferometer having a mirror system for measuring a measured object An interferometric measuring device for measuring a measured object, in particular for thickness measurement of the measured object. A special-purpose objective having a mirror system is provided, which includes at least one first deflection mirror and one second de... | 03/01/2011 |
| 7891016 | Automatic landing method and apparatus for scanning probe microscope using the same Disclosed herein are an automatic landing method for a scanning probe microscope and an automatic landing apparatus using the same. The method comprises irradiating light to a cantilever using a light source; collecting interference fringes generated by the light be... | 02/15/2011 |
| 7864334 | Interferometric defect detection Methods and systems for using common-path interferometry are described. In some embodiments, a common-path interferometry system for the detection of defects in a sample is described. An illumination source generates and directs coherent light toward the sample. An ... | 01/04/2011 |
| 7839509 | Method of measuring deep trenches with model-based optical spectroscopy The invention represents an improved method of measuring trenches on semiconductor wafers with optical spectroscopy. According to the described method, it is possible to characterize not only depth but also shape of the trench. The advancement is achieved by improve... | 11/23/2010 |
| 7738113 | Wafer measurement system and apparatus A method and apparatus for the measurement of wafer thickness, flatness and the trench depth of any trenches etched thereon using the back surface of the wafer to accurately measure the back side of a trench, rendering the trench an effective bump, capable of being ... | 06/15/2010 |
| 7656537 | Device for determining the position of spaced-apart areas in transparent and/or diffuse objects The invention is directed to a device for determining the thickness, distance and/or profile of areas of a transparent and/or diffuse object that are spaced apart, in particular for measuring distances in the eye. In the device for determining position using an inte... | 02/02/2010 |
| 7557930 | Bessel beam interferometer and measurement method A measurement method and apparatus rely upon the coherent optical interference between a reference beam and a diffractionless sensing beam having an optical path length that has been disturbed. The interference pattern can be analyzed to determine a measurement para... | 07/07/2009 |
| 7528959 | Apparatus and method for sizing nanoparticles based on interferometric field detection Light from a laser source is split into a reference arm and a detection arm. The light in the detection arm is focused into a channel containing particles to be detected and is backscattered by the particles. The light in the reference arm is attenuated. The attenua... | 05/05/2009 |
| 7499179 | Measurement method and apparatus, exposure apparatus, exposure method, and adjusting method A measurement method for measuring a position of an aperture stop in an optical system includes the steps of measuring a light intensity distribution of light that passes the aperture stop, at a position that is optically conjugate with a pupil position in the optic... | 03/03/2009 |
| 7486403 | Droplet shape measuring method and apparatus In order to accurately measure a shape feature of a minute droplet arranged on a substrate by a simple method, with respect to the droplet, the substrate is perpendicularly irradiated with laser light to cause diffracted light fluxes generated during passage of the ... | 02/03/2009 |
| 7486404 | Size difference measuring method and size difference measuring apparatus A size difference measuring method comprising: an optical interference measuring step without wringing, of obtaining, through simultaneous measurement of interference fringes, size information relating to the end standards which are set between interferometers, by a... | 02/03/2009 |
| 7424144 | Method for checking periodic structures on lithography masks The invention, which relates to a method for checking periodic structures on lithography masks, in which an image of the structure of the lithography mask is generated by an imaging optic of a microscope, provides a method for inspecting structures on lithography ma... | 09/09/2008 |
| 7420688 | Scanning, self-referencing interferometer A scanning, self-referencing interferometer may include a scanning mechanism to scan a path length of a test beam portion of a laser beam. The scanning, self-referencing interferometer may also include a beam adjustment mechanism to control positioning of a centroid... | 09/02/2008 |
| 7372579 | Apparatus and method for monitoring trench profiles and for spectrometrologic analysis An apparatus for monitoring a trench profile of a substrate includes a radiation-emitting unit for irradiating the substrate with infrared radiation. The intensity and/or polarization state of the infrared radiation reflected from the substrate is measured at a mult... | 05/13/2008 |
| 7372393 | Method and system for determining unwrapped phases from noisy two-dimensional wrapped-phase images A method converts an input image of noisy wrapped phases to an output image of absolute unwrapped phases. The noisy wrapped phases in the input image are represented as a set of re-wrapped phases and a set of phase shifts. The set of re-wrapped phases are partitione... | 05/13/2008 |
| 7365857 | Precompensation of polarization errors in heterodyne interferometry Apparatus and methods for adjusting the polarizations of the components of an input beam to reduce leakage caused by imperfections in an interferometer are disclosed. The apparatus includes an interferometer positioned to receive an input beam that includes two comp... | 04/29/2008 |
| 7362421 | Analysis of signal oscillation patterns A method for identifying and determining the frequency of scattered radiation fringe patterns for applications such as particle or droplet sizing and laser Doppler velocimetery. The method utilizes a series of windowed Fourier transforms performed on an intensity pr... | 04/22/2008 |
| 7359064 | Quantum positioning systems and methods Included in this disclosure is a quantum positioning system (QPS) that includes a corner cube reflector and a plurality of baselines. Each baseline may include an interferometer, which may include a photon source, a beam splitter, and a photon detector. The interfer... | 04/15/2008 |
| 7359057 | Method and apparatus for measuring small shifts in optical wavelengths A method and apparatus for detecting small shifts in optical wavelength is provided. Light having a known wavelength is directed towards a target volume in the atmosphere. Light reflected from the target volume is received and mixed with differentially delayed copie... | 04/15/2008 |
| 7355171 | Method and apparatus for process monitoring and control A method and apparatus for real-time monitoring of a gaseous environment during a semiconductor process. The method utilizes metastable electronic energy transfer to excite and ionize the chamber gaseous effluent and correlates the fluorescence signals from the exci... | 04/08/2008 |
| 7345771 | Apparatus and method for measurement of critical dimensions of features and detection of defects in UV, VUV, and EUV lithography masks Methods and apparatus are disclosed for measurement of critical dimensions (CD) of features and detection of defects in reflecting UV, VUV, and EUV lithography masks and in transmitting UV and VUV lithography masks. The measured CD's may be used in the determination... | 03/18/2008 |
| 7339676 | Optical method and system for the characterization of laterally-patterned samples in integrated circuits Disclosed is a method for characterizing a sample having a structure disposed on or within the sample, comprising the steps of applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in the sample, applying a second pulse o... | 03/04/2008 |
| 7330275 | Method and system for determining the position and alignment of a surface of an object in relation to a laser beam The present invention generally relates to a method and system for determining the position and alignment of a plane in relation to an intersecting axis and using that known position and alignment to allow for corrections to be made when using the plane as a referen... | 02/12/2008 |
| 7320518 | Ophthalmic apparatus An ophthalmic apparatus comprising: an illuminating optical system which projects light to an examinee' eye; an image pickup unit which color-photographs an interference image caused by interference of light reflected by a tear layer of the eye; and an analyzing par... | 01/22/2008 |
| 7319531 | Method for measuring a thickness of a coating A method for measuring a thickness of a coating of a constructional unit, in particular a heat-compatible coating on a component of a gas turbine, includes measuring coordinates of the constructional unit three-dimensionally with a measuring device, in particular an... | 01/15/2008 |
| 7319528 | Surface texture measuring instrument A surface texture measuring instrument provided with a near-field measuring unit (30) including a near-field probe (33) that forms a near-field light at a tip end thereof when a laser beam is irradiated, a laser source (35) that generates the la... | 01/15/2008 |
| 7312877 | Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy A method of measuring properties of a substrate, the method involving: illuminating a spot on the substrate with a standing wave measurement beam to generate a return measurement beam, the standing wave measurement beam characterized by a standing wave pattern; gene... | 12/25/2007 |
| 7292964 | Translating of geometric models into block diagram models Methods and systems for translating models generated in one modeling environment into models that can be used in other modeling environments are disclosed. Models are created using different data formats in different modeling environments. These data formats are gen... | 11/06/2007 |
| 7292393 | Variable illuminator and speckle buster apparatus Disclosed is an apparatus for illuminating a sample. In one embodiment, this apparatus includes a laser for outputting an incident laser beam towards a sample and a first diffractive element having a plurality of diffraction pattern portions. The first diffractive e... | 11/06/2007 |
| 7292346 | Triangulation methods and systems for profiling surfaces through a thin film coating An optical system includes a photolithography system, a low coherence interferometer, and a detector. The photolithography system is configured to illuminate a portion of an object with a light pattern and has a reference surface. The low coherence interferometer ha... | 11/06/2007 |
| 7288068 | Automatic optimization for ultrasound medical imaging Methods and systems are provided for automatic optimization for ultrasound medical imaging. In one approach, velocity values are unwrapped to avoid aliasing artifacts. Multi-dimensional phase unwrapping is applied to the velocity data. The unwrapped velocity informa... | 10/30/2007 |
| 7281801 | Tear dynamics measured with optical coherence tomography A system and method are provided for measuring the thickness of a tear film layer and the heights of tear menisci around upper and lower eyelids of an eye. A plurality of images are acquired between consecutive blinks the eye using optical coherence tomography (OCT)... | 10/16/2007 |
| 7280187 | Method for resolving phase in electronic speckle interferometry The invention is a method of determining the phase difference between two interferometric images. The method includes the steps of measuring the intensities of the two beam arms, and measuring the intensities of the interfering beam arms at two different times (two ... | 10/09/2007 |
| 7268887 | Overlapping common-path interferometers for two-sided measurement Two common-path interferometers share a measuring cavity for measuring opposite sides of opaque test parts. Interference patterns are formed between one side of the test parts and the reference surface of a first of the two interferometers, between the other side of... | 09/11/2007 |
| 7259873 | Method for measuring the dimension of a non-circular cross-section of an elongated article in particular of a flat cable or a sector cable Method for measuring the cross-sectional dimension of an elongated profile having rounded or sharp edges, in particular of a flat or sector cable by illuminating the article with light sources and determination of a plurality of shadow borders and calculating the pa... | 08/21/2007 |
