Bizarre Patents
An enclosure for small animals which is wearable on the front or back of an animate being.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8189195 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method A method of measuring a property of a substrate includes generating a patterned mask configured to cause a radiation beam passing through the mask to acquire the pattern, simulating radiating the substrate with a patterned radiation beam that has been patterned usin... | 05/29/2012 |
| 8125642 | Process to optically align a photoreceiver with a laser transmitter source in a laser rangefinder system A process for optically aligning a laser rangefinder that includes the steps of providing a laser rangefinder having a laser source, a photodetector lens and a photodetector, providing a fiber optic travel path, aligning the laser source to the fiber optic travel pa... | 02/28/2012 |
| 8094310 | Optical alignment tool and method of alignment An alignment tool for use in calibrating an optical bench and/or alignment of an optical system such as a collector optical system for EUV and X-ray applications is disclosed. The optical system includes multiple nested mirrors attached to a mechanical support. The ... | 01/10/2012 |
| 8085400 | Alignment device and method for optical system An alignment device is provided for aligning a primary mirror with a secondary mirror in an optical system having the primary mirror and the secondary mirror arranged so as to face each other along the optical axis. The alignment device has a dichroic film formed on... | 12/27/2011 |
| 8049891 | Adjustment method for position detection apparatus, exposure apparatus, and device fabrication method The present invention provides an adjustment method for a position detection apparatus which comprises an optical system including first and second optical members whose positions can be changed, and detects a position of an object, comprising the steps of calculati... | 11/01/2011 |
| 7999939 | Real time telecentricity measurement Systems and methods are provides for measuring and correcting for a given telecentricity in a lithographic apparatus. A radiation beam is partitioned into a plurality of beams, each of which is modulated using an array of individually controllable elements and proje... | 08/16/2011 |
| 7940392 | Lithographic apparatus, device manufacturing method and device manufactured thereby The X, Y and Rz positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be... | 05/10/2011 |
| 7940391 | Pre-aligned metrology system and modules A Pre-Aligned Metrology System comprising a number of Pre-Aligned Metrology Assemblies and Pre-Aligned Metrology Modules for measuring a target on a wafer. The Pre-Aligned Metrology Assemblies and Pre-Aligned Metrology Modules can reduce the maintenance down time an... | 05/10/2011 |
| 7859667 | Slide misload detection system and method A system and method for determining whether one or more slides are loaded properly within a cassette. Each slide includes one or more transparent regions and one or more non-transparent regions. The slides are between a light source and a sensor. The light source ge... | 12/28/2010 |
| 7852478 | Detecting assembly for a multi-axis machine tool A detecting assembly for multi-axis machine tools having a spindle and a turntable and has a detector, a lens device and a computer. The detector is connected to the spindle and has a mounting frame and two detecting segments. The mounting frame is connected to the ... | 12/14/2010 |
| 7847938 | Alignment system for optical lithography An alignment system for optical lithography uses cameras fixed to a movable stage and to a lithography unit to view unique microscopic non-uniformities that are inherent to the surface of a work piece, e.g., metal or ceramic microcrystalline grains, for position ref... | 12/07/2010 |
| 7777884 | Method and system for optimizing sub-nanometer critical dimension using pitch offset A method and a system are provided for calibrating metrological tools used to measure features of a semiconductor device. A critical dimension (CD) ruler defines a known pitch plus a pitch offset. A photoresist layer is measured to determine a measured pitch whereup... | 08/17/2010 |
| 7724370 | Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell Each target used in a method of measuring overlay using a scatterometer includes a first portion and a second portion, the first portion has features varying only in a first direction and the second portion has features only varying in a second direction. The first ... | 05/25/2010 |
| 7671990 | Cross hatched metrology marks and associated method of use The present invention is directed to novel metrology marks and methods for their use. The marks comprise cross hashed overlay metrology marks formed on a substrate including a plurality of target regions. The mark including a first grating structure formed in one la... | 03/02/2010 |
| 7561270 | Lithographic apparatus, device manufacturing method and device manufactured thereby The X, Y and Rz positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be... | 07/14/2009 |
| 7525659 | System for detection of water defects Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane... | 04/28/2009 |
| 7511816 | Methods and systems for determining drift in a position of a light beam with respect to a chuck Methods and systems for determining drift in a position of a light beam with respect to a chuck are provided. One method includes illuminating a surface with the light beam. The surface has a predetermined position with respect to the chuck during illumination. The ... | 03/31/2009 |
| 7508514 | Correction of off-axis translation of optical elements in an optical zoom assembly A laser beam may be used to provide a virtual reference axis of travel for the in-axis direction of motion of lenses in a zoom assembly to be positioned during a zoom operation. The virtual reference axis is projected along the optical axis, parallel to existing mec... | 03/24/2009 |
| 7436513 | Wafer pre-alignment apparatus and method A wafer pre-alignment apparatus according to this invention includes a wafer rotating member, a rotation detecting member, a light emitting member for emitting light toward the periphery of the wafer, a COD linear sensor linearly arranged and signal processing membe... | 10/14/2008 |
| 7433038 | Alignment of substrates for bonding An alignment apparatus for a substrate bonding system is provided with a first optical arm arranged to direct onto a detector radiation from a first alignment mark on a first substrate, and a second optical arm arranged to direct onto the detector radiation from a s... | 10/07/2008 |
| 7414713 | Method of measuring focal point, instrument used therefor, and method of fabricating semiconductor device A shape value of a pattern having a pivotal characteristic is measured (step S1), an exposure energy variation is detected from the measured value, a first data base is accessed using a result of the measurement of the shape value (Step S2), an exposur... | 08/19/2008 |
| 7414722 | Alignment measurement arrangement and alignment measurement method The invention provides an alignment measurement arrangement having a broadband source, an optical system and a detector. The broadband source is arranged to generate a radiation beam with a first and second range of wavelengths. The optical system is arranged to rec... | 08/19/2008 |
| 7405810 | Method and apparatus for positioning a substrate on a substrate table The invention relates to a method for positioning a substrate relative to a substrate table, is presented. When the substrate is positioned on the substrate table for a first time, a first relative position of the substrate with respect to the substrate table is det... | 07/29/2008 |
| 7397039 | Real-time compensation of mechanical position error in pattern generation or imaging applications Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in “real time”) are provided. For some embodiments, rather than rely on two dimensional position measurements, measurem... | 07/08/2008 |
| 7388663 | Optical position assessment apparatus and method A lithographic apparatus comprises a substrate table that supports a substrate having alignment marks on a surface thereof. The apparatus further comprises a frame moveable relative to the substrate to provide for a scanning or stepping mode of operation. An array o... | 06/17/2008 |
| 7385700 | Management system, apparatus, and method, exposure apparatus, and control method therefor An exposure apparatus performs AGA measurement by using a predetermined sample shot group formed on a wafer, and decides an alignment parameter. The exposure apparatus executes wafer alignment processing and exposure processing by using the alignment parameter. The ... | 06/10/2008 |
| 7375361 | Optical alignment device for machine tool The orientation of a machine 2 relative to a work-piece 10 is manually controlled by means of an alignment device 4. The device 4 includes a light source 24 rigidly attached to a foot 12 that is resiliently movably attached ... | 05/20/2008 |
| 7375795 | Lithographic apparatus, device manufacturing method, and device manufactured thereby Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-sec... | 05/20/2008 |
| 7369215 | Laser crystallization apparatus A laser crystallization apparatus has a light source, a phase shifter which modulates a laser light from the light source, an illumination system which is provided between the light source and the phase shifter, homogenizes a light intensity of the laser light from ... | 05/06/2008 |
| 7369216 | Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby A lithographic system includes a radiation system configured to provide a beam of radiation; an illumination system configured to condition the beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the pro... | 05/06/2008 |
| 7369237 | Substrate processing apparatus and substrate processing system It is an object of the present invention to provide a substrate processing apparatus, comprising a housing body mounting unit that is capable of mounting a plurality of housing bodies which can house a plurality of substrates, a processing apparatus main body for pr... | 05/06/2008 |
| 7368206 | Automated overlay metrology system Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectrosco... | 05/06/2008 |
| 7365295 | Image inspection system for correcting focal position in autofocusing An image inspection system includes a mount stage for a subject; an observation optical system for imaging light reflected by the subject; a focal position moving mechanism for relatively moving a position of the observation optical system in a depth direction of fo... | 04/29/2008 |
| 7365848 | System and method using visible and infrared light to align and measure alignment patterns on multiple layers A system and method are used to increase alignment accuracy of feature patterns through detection of alignment patterns on both a surface layer and at least one below surface layers of an object. Visible light is used to detect alignment patterns on the surface laye... | 04/29/2008 |
| 7362436 | Method and apparatus for measuring optical overlay deviation An apparatus and method analyze overlay deviation in alignment between a first mark and a second mark that are formed on a substrate. In particular, a relationship between changes in overlay deviation values and changes in focus position of the substrate for a plura... | 04/22/2008 |
| 7362424 | Compositions and methods for drop boundary detection and radiation beam alignment The invention provides an apparatus and method for determining the position of a radiation beam. The apparatus includes (a) a first reflective surface and a second reflective surface, the reflective surfaces being placed to form the reflective exterior of a wedge; (... | 04/22/2008 |
| 7356936 | Apparatus and method for measuring coating accumulations in a spray booth A method and apparatus are provided for viewing an object (such as a coating overspray accumulation) disposed in a difficult to view area (such as the underside of a lower trough or weir of a cleaning apparatus) and for measuring a distance between first and second ... | 04/15/2008 |
| 7359053 | Optical array with beam alignment feature An array of optical elements for processing a spatially dispersed optical beam including monitoring optical elements for determining the position of the optical beam in the array is disclosed. The monitoring optical elements have a width that varies in ay direction ... | 04/15/2008 |
| 7348574 | Position measurement system and lithographic apparatus A position measurement system for measuring a position of an object is described, the system including: a first incremental measurement unit for measuring a first number of first distance steps in a distance between a reference frame and the object, wherein the firs... | 03/25/2008 |
| 7339676 | Optical method and system for the characterization of laterally-patterned samples in integrated circuits Disclosed is a method for characterizing a sample having a structure disposed on or within the sample, comprising the steps of applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in the sample, applying a second pulse o... | 03/04/2008 |
