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| Number | Title | Issue Date |
| 8189194 | Direct illumination machine vision technique for processing semiconductor wafers A vision system is provided to determine a positional relationship between a semiconductor wafer on a platen and an element on a processing machine, such as a printing screen, on a remote side of the semiconductor wafer from the platen. A source directs ultraviolet ... | 05/29/2012 |
| 8159673 | Light amount detector, misalignment amount detector, and image density detector A light amount detector includes a light emitter, a light receiver, and a light amount detection unit. The light emitter emits light on a detection pattern formed on a detection surface of an image carrier. The light receiver detects diffused light reflected from th... | 04/17/2012 |
| 8159674 | Exposure method and exposure device An exposure method capable of performing accurate exposure without using a large photomask. The exposure method performs exposure while relatively moving a photomask above a substrate and includes a step of performing position correction of the photomask by performi... | 04/17/2012 |
| 8139216 | Optical package alignment systems and protocols Methods of positioning an optical unit in an optical package are provided. According to one method, a partially assembled optical package is provided. The wavelength conversion device within the package comprises a conversion layer having a waveguide portion formed ... | 03/20/2012 |
| 8139217 | Alignment systems and methods for lithographic systems An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determi... | 03/20/2012 |
| 8134708 | Method of measuring numerical aperture of exposure machine, control wafer, photomask, and method of monitoring numerical aperture of exposure machine A method of measuring a numerical aperture of an exposure machine is described. A control wafer having vernier marks thereon and an aberration mask having pinholes therein are provided, wherein each pinhole corresponds to a vernier mark in position. A lithography pr... | 03/13/2012 |
| 8111398 | Method of measurement, an inspection apparatus and a lithographic apparatus According to an example, a first layer of a substrate comprises a plurality of gratings having a periodicity P. A second layer of the substrate comprises a plurality of gratings, overlapping with the first set of gratings, and having a periodicity of NP, where N is ... | 02/07/2012 |
| 8094309 | Line of sight adjustment method for optical systems A line of sight adjustment device (LSAD) employs a simple yet robust structure and method to adjust the line of sight (or boresight) of a telescope, clip-on night sight, night vision sight, day scope, or other optical sighting device. In one embodiment, the LSAD inc... | 01/10/2012 |
| 8054465 | Position measurement method A part of a plate of a predetermined shape detachably mounted on a moving body is detected by an alignment system while the position of the moving body is measured by a measurement unit that sets a movement coordinate system of the movement body, and based on the de... | 11/08/2011 |
| 8049890 | System and method for passive alignment of components in an optical bench A system and method for facilitating passive alignment of an optical component in an optical bench. A groove is etched into the optical bench. The groove has two sections. The first section is configured to act as an optical guide. The second section is configured t... | 11/01/2011 |
| 8045164 | Position finding system and method for use in aligning laser device with an optical fiber A position finding system and method may be used to find an alignment position of a laser device relative to an optical fiber such as an angled optical fiber. The laser device may be positioned “off-axis” relative to the optical fiber such that light from the la... | 10/25/2011 |
| 8004678 | Wafer level alignment structures using subwavelength grating polarizers In one embodiment, a wafer alignment system, comprises a radiation source to generate radiation, a radiation directing assembly to direct at least a portion of the radiation onto a surface of a wafer, the radiation having a polarization state, an optical analyzer to... | 08/23/2011 |
| 7986409 | Method for determining the centrality of masks A method for determining the centrality of masks is disclosed. The mask is positioned in a coordinate measuring device on a measurement table displaceable in a direction perpendicular to the optical axis of an imaging measurement system in an interferometrically mea... | 07/26/2011 |
| 7965390 | Automatic sample alignment system and method of use A system which automatically reduces change in effective angle and plane of incidence of a reflected focused beam of electromagnetic radiation entering a detector, via use of a detector with dimensions less than is the spatial spread of a reflected focused beam at a... | 06/21/2011 |
| 7911612 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method An overlay target on a substrate is disclosed, the overlay target including a periodic array of structures wherein every nth structure is different from the rest of the structures. The periodic array is desirably made of two interlaced gratings, one of th... | 03/22/2011 |
| 7880880 | Alignment systems and methods for lithographic systems An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determi... | 02/01/2011 |
| 7835001 | Method of aligning a substrate, mask to be aligned with the same, and flat panel display apparatus using the same A method of aligning a substrate includes forming a first alignment hole in the substrate, preparing a mask with a second alignment hole narrower than the first alignment hole, modifying a surface reflectance around either the first alignment hole or the second alig... | 11/16/2010 |
| 7830513 | Optical interrogation system and microplate position correction method An optical interrogation system and method are described herein that are capable of detecting and correcting a positional misalignment of a label independent detection (LID) microplate so that the LID microplate can be properly interrogated after being removed from ... | 11/09/2010 |
| 7791726 | Tool positioning and/or identification device and method A device for exchanging data, such as a position or an identification, between a tool and a tool receiving structure. The device includes: an elongated track of sensors arranged in the receiving structure; and at least one sensor activating element arranged on the t... | 09/07/2010 |
| 7755761 | Self-normalizing contour drilling machine A self-normalizing contour surface drilling apparatus drills holes into contour surfaces with the drill bit of the apparatus oriented normally to the contour surface. The apparatus first determines a location of a hole to be drilled and the orientation of the drill ... | 07/13/2010 |
| 7751045 | Methods and system for aligning optical packages A method for aligning a beam spot with a waveguide portion of a wavelength conversion device includes scanning a beam spot over the input face of the wavelength conversion device while measuring the output intensity of the device such that an output intensity for ea... | 07/06/2010 |
| 7715007 | Lateral shift measurement using an optical technique Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectiv... | 05/11/2010 |
| 7684038 | Overlay metrology target In one embodiment, a metrology target for determining a relative shift between two or more successive layers of a substrate may comprise; an first structure on a first layer of a substrate and an second structure on a successive layer to the first layer of the subst... | 03/23/2010 |
| 7636162 | Microchip testing device Microchip testing device having a chip holder that can be exactly positioned and from which adhered sample liquid can be removed easily. The microchip testing device has a chip holder, with a cover and a box area, mounted on a measurement stage, a microchip that has... | 12/22/2009 |
| 7602489 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes a displacement measuring system to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least three coplanar degrees of freedom (x, y, Rz) of an orthogonal x-y-z coordinate s... | 10/13/2009 |
| 7602491 | Optical gain approach for enhancement of overlay and alignment systems performance A resultant image of a grating target may be obtained by dividing an image of the target into first and second portions and optically modifying the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern... | 10/13/2009 |
| 7602490 | Liquid ejecting head alignment apparatus and liquid ejecting head alignment method The invention provides a liquid ejecting head alignment apparatus that is used for positional determination and adhesion of nozzle plates and a fixation member, each of the nozzle plates having nozzle openings through which each of a plurality of liquid ejecting hea... | 10/13/2009 |
| 7593104 | Method for manufacturing optical module, positioning apparatus, evaluation method and evaluation apparatus for evaluating optical module A method for evaluating an optical module, the optical module including a light emitting element and a supporting member for supporting an end of an optical fiber for communications, by which relative positions of the light emitting element and the supporting member... | 09/22/2009 |
| 7586608 | Wafer-level testing of optical and optoelectronic chips This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light from top of the wafer. ... | 09/08/2009 |
| 7542141 | Stage controller and exposure method in which position of the stage is controlled based on position measurements of first and second laser interferometers An apparatus including a stage configured to be moved. A first laser interferometer measures a position of the stage in a first direction. A second laser interferometer measures a position of the stage in the first direction. A control unit (i) obtains a position of... | 06/02/2009 |
| 7508512 | Continuous optical self-alignment for light curtains and optical presence sensors for simplification and maintenance of alignment Systems and methods are disclosed that facilitate tolerating and/or correcting light beam misalignment in a light-emitting device, such as a light curtain. Attributes of the light beam can be assessed and compared to predetermined threshold values to evaluate whethe... | 03/24/2009 |
| 7508513 | Measuring apparatus and measuring method A measuring apparatus and a measuring method are provided, with which an accurate length measurement and position checking are achieved using a simple structure. The measuring apparatus according to the present invention is provided with a first and a second paralle... | 03/24/2009 |
| 7480051 | Apparatus and method for hard-docking a tester to a tiltable imager An apparatus and method are disclosed for hard-docking of a tester head to a DUT, while permitting the angular alignment of a specimen to be inspected to the optical axis of an optical testing tool. In one example, a system for orthogonal alignment of a specimen to ... | 01/20/2009 |
| 7471395 | Light-emitting module and methods for optically aligning and assembling the same An optical alignment method is for a light-emitting module that includes a housing unit, a light-emitting unit disposed in the housing unit, and a lens unit. The optical alignment method includes: (a) through image-capturing techniques, finding a light-emitting poin... | 12/30/2008 |
| 7466412 | Method of detecting displacement of exposure position marks Exposure position marks are reliably recognized and the displacement of an exposure position is correctly and efficiently detected based on measurement results produced by recognizing the marks. The exposure position marks are constructed of a first pattern made up ... | 12/16/2008 |
| 7466411 | Replacement and alignment of laser The present invention relates to embodiments of: (1) a unitary holographic drive head assembly mounting structure; (2) an assembly comprising a unitary holographic drive head assembly mounting structure and a plurality of holographic drive head components and/or sub... | 12/16/2008 |
| 7456966 | Alignment mark system and method to improve wafer alignment search range The present invention is a system and method for use with alignment marks and search algorithms of diffraction pattern detection tools. The system and method of the invention significantly increases the capture range of diffraction pattern detection methods and enab... | 11/25/2008 |
| 7446872 | Positioning apparatus and positioning method using the same An apparatus for positioning a transport system and a load port is described, including a signal emitting unit disposed on the transport system and a positioning board on the load port. The signal emitting unit has two positioning points thereon capable of emitting ... | 11/04/2008 |
| 7443505 | Optical alignment method and apparatus In disclosed optical alignment method and apparatus thereof, external reflection entering laser diode by feedback from transmission line of low cost bidirectional optical transceiver module without optical isolator for subscribers is reduced so as to reduce RIN cons... | 10/28/2008 |
| 7417580 | Object detection system and object detection method An object detection system includes a radar detection means (2), an image detection means (3), and a collating means (4). The collating means (4) performs a collation between an object detected by the radar detection means (2) in a... | 08/26/2008 |
