Bizarre Patents
Wearable Device For Feeding and Observing Birds and Other Flying Animals
A device for feeding and observing flying animals comprising a hat, a support mounted on the hat and extending outward from the hat, and a feeder mounted on the support.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8031338 | Measuring Forster resonance energy transfer with polarized and depolarized light The present invention provides improved methods for assessing Förster resonance energy transfer using polarized light. Specifically, the methods rely on measuring depolarized light emitted by fluorescent acceptor molecules. ... | 10/04/2011 |
| 7920259 | Arrangement for an optical system for polarization-dependent, time-resolved optical spectroscopy, optical measurement systems and method for the polarization-dependent spectroscopic analysis of measurement light The invention is directed to an arrangement for an optical system for polarization-dependent, time-resolved optical spectroscopy, in particular a spectrometer that includes a polarization device which has a crystal polarizer and includes a light entry area which is ... | 04/05/2011 |
| 7911608 | Spectroscopic determination of enantiomeric purity A new method and strategy for the quantitative determination of enantiomeric purity that combines polarimetry, spectroscopy, and chemometric modeling. Spectral data is collected after a light beam is passed through a first polarimeter, a sample of a chiral compound,... | 03/22/2011 |
| 7616308 | Optical measurement apparatus and method An optical measurement apparatus and method a method for performing modulation spectroscopy measurement of a sample comprising: delivering an incident probe beam to a sample at a known spot; modulating reflectance of the probe beam with a pump beam which periodicall... | 11/10/2009 |
| 7532325 | Method and apparatus for the separation of fluoroscence and elastic scattering produced by broadband illumination using polarization discrimination techniques An apparatus for separating fluorescent light from light elastically scattered/reflected from a material illuminated with a broadband illumination source includes a polarization discriminator, which separates the substantially polarized elastically scattered/reflect... | 05/12/2009 |
| 7471392 | Polarimetric scatterometry methods for critical dimension measurements of periodic structures An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polari... | 12/30/2008 |
| 7456956 | Vibrational circular dichroism spectrometer using reflective optics A spectrometer generates Vibrational Circular Dichroism (VCD) measurements having an exceedingly high signal-to-noise ratio, as well as a greater wavelength range over which measurements may be accurately provided. This is achieved by utilizing reflective optics (pr... | 11/25/2008 |
| 7428043 | Apparatus for ascertaining the light power level of a light beam, and scanning microscope An apparatus for ascertaining properties of a light beam, comprises a means for splitting a measured beam out from the light beam and comprises at least one detector that at least partially receives the measured beam. A polarization-influencing means is arranged in ... | 09/23/2008 |
| 7411674 | Polarizing monochromator A polarizing monochromator comprising a uniaxial birefringent crystal prism, the prism has the geometry of a triangular block having a triangular base, a face including a side of the hypotenuse is an input-output face, where light enters and exits, and a face includ... | 08/12/2008 |
| 7372565 | Spectrometer measurement of diffracting structures A normal incidence reflectometer includes a rotatable analyzer/polarizer for measurement of a diffracting structure. Relative rotation of the analyzer/polarizer with respect to the diffracting structure permits analysis of the diffracted radiation at multiple polari... | 05/13/2008 |
| 7365845 | Optical spectrum analyzer An optical spectrum analyzer measures to-be-measured light while carrying out calibration processing for correcting wavelength information of spectrum data of the to-be-measured light by a wavelength information correction device through a storage device based on th... | 04/29/2008 |
| 7349103 | System and method for high intensity small spot optical metrology An apparatus and method for examining features of a sample with a broadband beam of light obtained from a long-wavelength source that may include two distinct emitters that emit a long-wavelength radiation and a short-wavelength source that emits a short-wavelength ... | 03/25/2008 |
| 7343094 | Transmission characteristics evaluation system and pseudo transmission path apparatus thereof A transmission characteristics evaluation system can measure the dispersion tolerance and the insertion loss gradient tolerance at a high precision with reduced number of working steps for the measurement in evaluating the transmission characteristics of an optical ... | 03/11/2008 |
| 7336361 | Spectroscopic ellipsometer and polarimeter systems A spectroscopic ellipsometer or polarimeter system having a source of a polychromatic beam of electromagnetic radiation, a polarizer, a stage for supporting a material system, an analyzer, a dispersive optics and a detector system which comprises a multiplicity of d... | 02/26/2008 |
| 7333200 | Overlay metrology method and apparatus using more than one grating per measurement direction A method of controlling the lithography process used to fabricate patterns on layers of a semiconductor wafer is disclosed. The method includes providing at least two scatterometry targets, each target having a first pattern formed in an upper layer substantially al... | 02/19/2008 |
| 7327457 | Apparatus and method for optical characterization of a sample over a broadband of wavelengths while minimizing polarization changes An apparatus and method for optically characterizing the reflection and transmission properties of a sample with a beam of light having a small diameter on a surface of the sample over a broadband of wavelengths, from 190 nm to 1100 nm. Reflective optical components... | 02/05/2008 |
| 7317530 | Combined spatial filter and relay systems Low aberration relay systems modified to perform as spatial filters in reflectometer, spectrophotometer, ellipsometer, polarimeter and the like systems. ... | 01/08/2008 |
| 7317531 | Apparatus and methods for detecting overlay errors using scatterometry Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. In one embodiment, a method for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structur... | 01/08/2008 |
| 7304737 | Rotating or rotatable compensator system providing aberation corrected electromagnetic raadiation to a spot on a sample at multiple angles of a incidence Spectroscopic ellipsometer systems which include polarizer and analyzer elements which remain fixed in position during data acquisition while at least one continuously rotating or step-wise rotatable compensator imposes a continuously variable or plurality of sequen... | 12/04/2007 |
| 7304792 | System for sequentially providing aberation corrected electromagnetic radiation to a spot on a sample at multiple angles of incidence A system for sequentially providing electromagnetic radiation to a spot on a sample at different angles of incidence, and after reflection therefrom into a detector. The system includes a plurality of spherical mirrors, and a refractive element for correcting aberra... | 12/04/2007 |
| 7301634 | Apparatus and methods for detecting overlay errors using scatterometry Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sample, an in... | 11/27/2007 |
| 7289213 | Apparatus and methods for detecting overlay errors using scatterometry Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, t... | 10/30/2007 |
| 7283237 | Overlay targets with isolated, critical-dimension features and apparatus to measure overlay An optical metrology system is disclosed which is configured to minimize the measurement of specularly reflected light and measure primarily scattered light. The system is similar to prior art beam profile measurements but includes a movable baffle to selectively bl... | 10/16/2007 |
| 7280212 | Apparatus and methods for detecting overlay errors using scatterometry Disclosed is a method of determining an overlay error between two layers of a multiple layer sample. For each of a plurality of periodic targets that each have a first structure formed from a first layer and a second structure formed from a second layer of the sampl... | 10/09/2007 |
| 7277171 | Flying mobile on-board ellipsometer, polarimeter, reflectometer and the like systems A substantially self-contained “on-board” material system investigation system functionally mounted on a three dimensional locational system to enable positioning at desired locations on, and distances from, the surface of a large sample, including the capabilit... | 10/02/2007 |
| 7272324 | Equalization of optical signals Methods for performing time-domain equalization of an information signal represented by an optical signal are provided. A representative method includes: receiving the optical signal; optically splitting the optical signal into beams; optically delaying at least one... | 09/18/2007 |
| 7260248 | Image processing using measures of similarity The invention provides methods of relating a plurality of images based on measures of similarity. The methods of the invention are useful in the segmentation of a sequence of colposcopic images of tissue, for example. The methods may be applied in the determination ... | 08/21/2007 |
| 7256890 | Spectroscope and microspectroscope equipped therewith A spectroscope capable of suppressing the dimension and the cost with avoiding a problem caused by polarization dependency of the diffraction grating. The spectroscope includes a polarizing beam splitter plate 3 that divides the light from an input fiber 1... | 08/14/2007 |
| 7253900 | Ellipsometer or polarimeter and the like system with multiple detector element detector in environmental control chamber including secure sample access A spectrophotometer, ellipsometer or polarimeter or the like system with a spectroscopic source of wavelengths and a detector with multiple detector elements for simultaneous monitoring of a number of wavelengths in an environmental control chamber which optionally ... | 08/07/2007 |
| 7253896 | Filter A filter for use in a spectrometer to filter transmitted radiation and wherein the filter has a birefringent element responsive to an applied signal, a first polarizer for polarizing the radiation transmitted by a sample, a second polarizer for polarizing the radiat... | 08/07/2007 |
| 7253897 | Optical spectrum analyzer An optical spectrum analyzer (OSA) 10 sequentially or selectively samples (or filters) a spectral band(s) 11 of light from a broadband optical input signal 12 and measures predetermined optical parameters of the optical signal (e.g., spectral pr... | 08/07/2007 |
| 7248362 | Small-spot spectrometry instrument with reduced polarization and multiple-element depolarizer therefor A small-spot imaging, spectrometry instrument for measuring properties of a sample has a polarization-scrambling element, such as a birefringent plate depolarizer, incorporated between the polarization-introducing components of the system, such as the beamsplitter, ... | 07/24/2007 |
| 7248375 | Critical dimension analysis with simultaneous multiple angle of incidence measurements A method and apparatus are disclosed for evaluating relatively small periodic structures formed on semiconductor samples. In this approach, a light source generates a probe beam which is directed to the sample. In one preferred embodiment, an incoherent light source... | 07/24/2007 |
| 7248364 | Apparatus and method for optical characterization of a sample over a broadband of wavelengths with a small spot size An apparatus and method for optically characterizing the reflection and transmission properties of a sample with a beam of light having a small diameter on a surface of the sample over a broadband of wavelengths, from 190 nm to 1100 nm. Reflective optical components... | 07/24/2007 |
| 7245376 | Combined spatial filter and relay systems in rotating compensator ellipsometer/polarimeter Low aberration relay systems modified to perform as spatial filters in rotating compensator ellipsometer, polarimeter and the like systems. ... | 07/17/2007 |
| 7242477 | Apparatus and methods for detecting overlay errors using scatterometry Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. A sample having a plurality of periodic targets that each have a first structure in a first layer and a second structure in a second layer is provided. The... | 07/10/2007 |
| 7236244 | Alignment target to be measured with multiple polarization states An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns at multiple polarization states and comparing the resulting intensities of the polari... | 06/26/2007 |
| 7230704 | Diffracting, aperiodic targets for overlay metrology and method to detect gross overlay A method for measuring overlay in semiconductor wafers includes a calibration phase in which a series of calibration samples are analyzed. Each calibration sample has an overlay that is known to be less than a predetermined limit. A difference spectrum for a pair of... | 06/12/2007 |
| 7230703 | Apparatus and method for measuring overlay by diffraction gratings A method for measuring overlay in a sample includes obtaining an image of an overlay target that includes a series of grating stacks each having an upper and lower grating, each grating stack having a unique offset between its upper and lower grating. The image is o... | 06/12/2007 |
| 7230705 | Alignment target with designed in offset An alignment target includes periodic patterns on two elements. The alignment target includes two locations, at least one of which has a designed in offset. In one embodiment, both measurement locations have a designed in offset of the same magnitude but opposite di... | 06/12/2007 |
