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| Number | Title | Issue Date |
| 8159654 | Pressure body and pellicle mounting apparatus A pressure body comprises: three or more pressure pins 40 that come into contact with a photomask 70 at downward positions in a pressure direction D; a main body 10 provided with an opening 16, the opening 16 supporting the pressur... | 04/17/2012 |
| 7777864 | Device and method for controlling close contact of near-field exposure mask, and near-field exposure mask for the same A near-field exposure apparatus for exposing a substrate to light via an exposure mask under a condition that the exposure mask is close to the substrate. The apparatus includes a pressure adjustable container to control a relative position of the exposure mask to t... | 08/17/2010 |
| 7733463 | Lithographic apparatus and device manufacturing method A support constructed to support a patterning object, the patterning object being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, is disclosed, wherein the support comprises a plurality of structures ha... | 06/08/2010 |
| 7525645 | Exposure apparatus and method, and mask stage therefor In an embodiment a mask stage is used for an exposure process. The mask stage includes a first module. The first module includes a plurality of support surfaces on which a plurality of masks are mounted. The first module has a substantially cylindrical shape having ... | 04/28/2009 |
| 7428084 | Scanner with removable image guides A scanner has a transport system for transporting a document along a transport path for scanning by at least a first camera. A first removable image guide is disposed between the first camera and a first side of the document. The first removable image guide has a fi... | 09/23/2008 |
| 7423733 | Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, ... | 09/09/2008 |
| 7319507 | Apparatus and method for removing contaminant on original, method of manufacturing device, and original At least one exemplary embodiment is directed to an apparatus which includes an original stage, to hold an original, which moves in a scan direction, an illumination optical system configured to illuminate the original held by the original stage with exposure light,... | 01/15/2008 |
| 7315032 | Lithographic apparatus and a device manufacturing method A lithographic apparatus including an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning configured to impart the projection beam with a pattern in its cross-section; a substrate table c... | 01/01/2008 |
| 7315354 | Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method A near-field exposure method wherein a pressure difference is applied between a front face and a rear face of an elastically deformable exposure mask to cause deformation of the exposure mask in accordance with a substrate to be exposed, and to cause the exposure ma... | 01/01/2008 |
| 7312853 | Exposure apparatus and exposing method for elastically deforming a contact mask with control data An exposure apparatus for exposing an object to be exposed by elastically deforming an exposing mask having a micro-opening pattern so as to bring the exposing mask into contact with the object includes a compression/decompression section for elastically deforming t... | 12/25/2007 |
| 7300051 | Rippler for a paper deliverer A rippler may be installed on a paper deliverer used in conjunction with a paper sheeter, in between the vacuum belts of the sheeter. The rippler includes an upwardly projecting ridge, causing paper passing over it to develop a ripple, thereby increasing the rigidit... | 11/27/2007 |
| 7264853 | Attaching a pellicle frame to a reticle A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass ... | 09/04/2007 |
| 7262828 | Near-field photomask and near-field exposure apparatus including the photomask A near-field photomask includes a light shield film having openings to constitute a light shield portion. The photomask can be used to expose an exposure target with near-field light generated through the openings. The openings formed in the light shield film includ... | 08/28/2007 |
| 7263240 | Method, system, and software for improving signal quality using pyramidal decomposition A method, system, and software are disclosed for improving the quality of a signal. A base signal is recursively decomposed for a desired number of pyramid levels. The decomposed signal from the lowest level is modified to generate a preprocessed signal. The preproc... | 08/28/2007 |
| 7252182 | Vibration isolation structure for image forming apparatus A vibration isolation structure for an image-forming apparatus includes an exposure unit disposed in a vehicle compartment, for applying radiation to a subject and capturing a radiation image of the subject; a support post fixedly mounted in the compartment of the v... | 08/07/2007 |
| 7253883 | Machine for exposing printed circuit panels with gas balloons and mechanical spacers The invention relates to an exposure machine for printed circuit panels. The machine comprises: a support (26) for said panel (24); a moving artwork support (10) comprising a substantially rect... | 08/07/2007 |
| 7248332 | Lithographic apparatus and device manufacturing method A lithographic apparatus is provided with a charged object on a projection system of the lithographic apparatus, a substrate table of the lithographic apparatus, or both that is configured to have an electric charge to attract particles thereto. ... | 07/24/2007 |
| 7245092 | Alignment stage apparatus, exposure apparatus, and semiconductor device manufacturing method An alignment stage apparatus including a vacuum chamber, a linear motor including a plurality of coils to drive a stage, a coil selector which selectively energizes the plurality of coils, and a storage box arranged to store the coil selector. The interior of the st... | 07/17/2007 |
| 7240438 | Aligning apparatus An aligning apparatus includes a loading plate to load at least one alignment object; first and second alignment bars to align the at least one alignment object loaded on the loading plate, wherein the first and second alignment bars are bent by a force greater than... | 07/10/2007 |
| 7239376 | Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices In a projection apparatus for projecting optical images, an optical mask support stage having a pair of separated arms. Each arm being provided with a respective mask chucking bar that supports a respective edge of a thin glass mask and applies to the respective edg... | 07/03/2007 |
| 7236239 | Illumination system and exposure apparatus Disclosed is an illumination system for illuminating a surface to be illuminated, with light from a light source, the illumination system including a first optical integrator having a plurality of lens groups, for forming a plurality of first secondary light sources... | 06/26/2007 |
| 7230681 | Method and apparatus for immersion lithography An apparatus for holding a wafer and a method for immersion lithography. The apparatus, including a wafer chuck having a central circular vacuum platen, an outer region, and a circular groove centered on the vacuum platen, a top surface of the vacuum platen recessed... | 06/12/2007 |
| 7210259 | Film holder A film holder includes a base, a cover, and a flattening mechanism. The base has a film panel for receiving a film and a plurality of sliding slots formed at its two opposite sides. The cover is mounted on the base and is slidable on the base in a first direction, a... | 05/01/2007 |
| 7207558 | Apparatus for the transport of sheets A conveying apparatus for transporting sheets to a sheet processing machine, in particular a printing press, has a suction belt table between a sheet in-feed and the sheet-processing machine. A transport belt of the suction belt table is formed with at least two row... | 04/24/2007 |
| 7196769 | Exposure apparatus and device manufacturing method An exposure apparatus for projecting a pattern of an original onto a substrate using exposure light includes a projection optical system to project the pattern onto the substrate; a shielding structure, having an opening through which the exposure light passes, to s... | 03/27/2007 |
| 7196827 | Image reading apparatus and image forming apparatus An image reading apparatus is capable of preventing generation of a streaked image or the like while maintaining the requisite precision level for the original reading position. The image reading apparatus includes a lead roller for supplying an original, a platen g... | 03/27/2007 |
| 7180572 | Immersion optical projection system An immersion optical projection system for photolithography is provided. A transparent plate is located between a last lens element and the wafer during a usage of the system. The transparent plate has a lens-side surface and a wafer-side surface. The system is adap... | 02/20/2007 |
| RE39441 | Printer with vacuum platen having bimetallic valve sheet providing selectable active area A printer has a media transport with a rigid, air-transmissive platen. A movable air-transmissive flexible web overlays the platen. A suction device communicates with the platen to draw air through the web and through the platen such that a sheet of media carried on... | 12/26/2006 |
| 7145642 | Wafer support device and a wafer support method A wafer support device having a fixed base, a guiding device, a movable base disposed so as to move in a vertical direction with respect to the fixed base by the guiding device, a first pressing device pressing the movable base, a θ stage rotatably disposed on the ... | 12/05/2006 |
| 7145701 | Scanner comprising a housing configured to facilitate manual removal of an object from the scanner platen A scanner comprises a housing including a top wall defining an opening, the top wall of the housing further comprising an upper surface framing the opening. The upper surface of the top wall further comprises a horizontal planar portion and an object removal guide s... | 12/05/2006 |
| 7139066 | Reticle carrier including reticle positioning and location means A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticle positioning members. The cover portion is adapted to sealingly mate... | 11/21/2006 |
| 7135692 | Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation ... | 11/14/2006 |
| 7136141 | Lithographic apparatus with debris suppression, and device manufacturing method A lithographic projection apparatus is disclosed. The apparatus includes a radiation system that includes a radiation source and an illumination system that supplies a beam of radiation, and a support structure that supports a patterning structure. The patterning st... | 11/14/2006 |
| 7116394 | Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles... | 10/03/2006 |
| 7110099 | Determination of center of focus by cross-section analysis Methods for determination of parameters in lithographic devices and applications by cross-section analysis of scatterometry models, including determination of center of focus in lithography devices and applications. Control methods are provided for process control o... | 09/19/2006 |
| 7102127 | Mechanized retractable pellicles and methods of use Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths outside the visible spectrum include a pellicle that is readily retracted during exposure or to provide access to the photomask. The pellicle can be transpare... | 09/05/2006 |
| 7095482 | Multiple system vibration isolator A vibration isolator (200) for isolating a first assembly (206) from vibration from a second assembly (208) includes a first system (202) and a second system (204) coupled to the first system (202). In one embodiment, the fi... | 08/22/2006 |
| 7061590 | Pellicle distortion reduction The invention provides systems and a method for reducing pellicle distortion. One feature of the invention reduces distortion of a pellicle by providing an airtight mounting structure for coupling a pellicle to a mask; and a port on the mounting structure though whi... | 06/13/2006 |
| 7050145 | Device for copying both sides of an object in a single pass using an office copier A device for use with a copier to make copies of both sides of a document or other objects in a single pass. The device is configured to rest on a copier platen without being attached to the platen and without deriving power from the copier. A document holder in the... | 05/23/2006 |
| 7034924 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes at least one object support structure in a high vacuum chamber. The object support structure includes a carrier device in which a number of dividing walls are provided forming a number of compartments in the carrier device. At least... | 04/25/2006 |
