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| Number | Title | Issue Date |
| 8009275 | Movable stage apparatus An exposure apparatus that includes a movable stage apparatus. The movable stage apparatus includes a master stage on which a reflecting master is to be mounted, in which, when a space is divided by a plane including a reflection surface of the master, a guide surfa... | 08/30/2011 |
| 7999919 | Substrate holding technique Disclosed is technology for holding a substrate and, specifically, an object holding apparatus including a chuck for holding an object, a holding unit for holding the chuck, a generating unit provided in the holding unit, for generating a field related to an attract... | 08/16/2011 |
| 7978309 | Clamping apparatus capable of fixing a film and image processing apparatus utilizing the same A clamping apparatus capable of fixing a roll film is disclosed. The clamping apparatus includes: a carrier comprising a slot; a cover positioned in the slot; and a cannelure formed between the cover and the carrier, for guiding the film inserted from the first film... | 07/12/2011 |
| 7952686 | Stage apparatus, exposure apparatus, and device manufacturing method A stage apparatus that includes a stage and moves the stage in at least a first direction. The stage apparatus also includes a plurality of holding units fixed on the stage to extend in the first direction, in which the first direction is a longitudinal direction. E... | 05/31/2011 |
| 7933000 | Device manufacturing method, method for holding a patterning device and lithographic apparatus including an applicator for applying molecules onto a clamp area of a patterning device A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a... | 04/26/2011 |
| 7929117 | Apparatus for real-time contamination, environmental, or physical monitoring of a photomask An apparatus for real-time contamination, environmental, or physical monitoring of a photomask. The apparatus includes a photomask having a patterned region configured to correspond to features of an integrated circuit and a sensor physically coupled with the photom... | 04/19/2011 |
| 7911588 | Exposure apparatus and original An exposure apparatus configured to expose a pattern of an original onto a substrate includes a wire electrode row that includes plural parallel wire electrodes, and that is opposed to the original, and a power source that applies an AC voltage to the plural wire el... | 03/22/2011 |
| 7869003 | Lithographic apparatus and device manufacturing method with reticle gripper A reticle gripper to hold a reticle of a lithographic apparatus is presented. The reticle gripper includes three gripper structures to contact the surface of the reticle. Each of the three gripper structures determines a position with respect to the reticle gripper ... | 01/11/2011 |
| 7864300 | Door opening and closing unit to control door rotating speed and image forming apparatus having the same A door opening and closing unit is provided for an image forming apparatus. The image forming apparatus includes a main body, and a door rotatably mounted on the main body. The door opening and closing unit includes a door speed control unit coupling the door to the... | 01/04/2011 |
| 7843552 | Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neut... | 11/30/2010 |
| 7839489 | Assembly of a reticle holder and a reticle A system for use in a lithographic apparatus includes an assembly of a reticle and a reticle holder. The reticle includes a marker. The system also includes a position detector arranged to detect the reticle marker to position the reticle with respect to the reticle... | 11/23/2010 |
| 7826038 | Method for adjusting lithographic mask flatness using thermally induced pellicle stress A method for adjusting the flatness of a lithographic mask includes determining an initial mask flatness of the mask, determining an applied stress for bringing the mask to a desired mask flatness, and determining a mounting temperature of a pellicle frame to be mou... | 11/02/2010 |
| 7817252 | Holder for carrying a photolithography mask in a flattened condition A holder is described for carrying a photolithography mask in a flattened condition. The holder may include a mask chuck and may be able to flatten a mask for use in photolithography. In one example, the holder may include a substrate and a plurality of independentl... | 10/19/2010 |
| 7812929 | Electrostatic chuck with temperature sensing unit, exposure equipment having the same, and method of detecting temperature from photomask Disclosed is an electrostatic chuck with a temperature sensing unit, exposure equipment having the electrostatic chuck, and a method of detecting temperature on photomask surfaces. The temperature sensing unit and method of detecting temperature may include obtainin... | 10/12/2010 |
| 7808616 | Reticle transport apparatus, exposure apparatus, reticle transport method, and reticle processing method A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle being covered by a cover. A cover manipulator, in the processing atmosph... | 10/05/2010 |
| 7804583 | EUV reticle handling system and method An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. A method f... | 09/28/2010 |
| 7782446 | Stage system and lithographic apparatus comprising such stage system A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators to act on the stage, at least two sensors to measure a position dependent parameter of the stage and to provide a respective sensor signal. The at least two sensors ... | 08/24/2010 |
| 7773198 | Filtered device container assembly with shield for a reticle A device container assembly (30) for storing a reticle (26) includes a device container (246) and a shield assembly (250). The device container (246) encircles the reticle (26). Further, the device container (246) inc... | 08/10/2010 |
| 7692770 | Proximity type exposure apparatus An apparatus and method for aligning a substrate and a mask are discussed. In one aspect of the present invention, the apparatus includes a mask stage, wherein the mask stage includes a mask fixing stage configured to fixedly support a mask; a base stage supporting ... | 04/06/2010 |
| 7679722 | Reticle management systems and methods Reticle management systems and methods. The system comprises at least one reticle and at least one cabinet with an inert gas environment. The cabinet comprises a plurality of storage spaces. When the reticle is put in a storage space, the cabinet identifies the reti... | 03/16/2010 |
| 7675607 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed having a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the support including a suppo... | 03/09/2010 |
| 7671970 | Stage apparatus with two patterning devices, lithographic apparatus and device manufacturing method skipping an exposure field pitch In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length o... | 03/02/2010 |
| 7667822 | Lithographic apparatus and stage apparatus A lithographic apparatus includes a support constructed to support a patterning device. The patterning device is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The support includes a force actuator devic... | 02/23/2010 |
| 7659966 | Container and method of transporting substrate using the same An exposure apparatus for performing exposure of a substrate to light via a reticle. The apparatus includes a first stage configured to hold a chuck. The chuck has a support base with an electrode, and forms a container, for one of the substrate and the reticle, tog... | 02/09/2010 |
| 7656507 | Processing unit, exposure apparatus having the processing unit, and protection unit A processing unit including a supply section for storing a mask having a patterned surface having a pattern to be exposed to a plate, the supply section being maintained under atmospheric pressure, a process chamber for processing the plate, the process chamber bein... | 02/02/2010 |
| 7643130 | Position measuring apparatus and positional deviation measuring method A position measuring apparatus includes a holder having storage spaces in which a three-point support member for supporting a backside of a substrate being a mask at three points, and a vacuum chuck member for holding a backside of a substrate being a mask are prepa... | 01/05/2010 |
| 7639345 | Lithographic apparatus The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic app... | 12/29/2009 |
| 7633600 | Lithographic apparatus and device manufacturing method A lithographic apparatus has a patterning support holding a patterning device. At least one position sensor measures a position of the patterning device relative to the patterning support, and generates a measuring signal. A positioning device controls a position of... | 12/15/2009 |
| 7626682 | Reticle stages for lithography systems and lithography methods Reticle stages for lithography systems and lithography methods are disclosed. In a preferred embodiment, a lithography reticle stage includes a first region adapted to support a first reticle, and at least one second region adapted to support a second reticle. ... | 12/01/2009 |
| 7626683 | Exposure apparatus and device manufacturing method An exposure apparatus configured to expose a substrate to light to transfer a pattern of a reticle onto the substrate includes a reticle stage configured to mount the reticle, a structure configured to support the reticle stage, a plurality of first supporting membe... | 12/01/2009 |
| 7619718 | Method and system for active purging of pellicle volumes The present invention provides methods and systems for fast purging of pellicle volumes. A purge device has a base which is enclosed in a controlled environment filled with purge gas. The base has a cavity formed on a surface therein. The cavity receives a reticle-p... | 11/17/2009 |
| 7551265 | Contact material and system for ultra-clean applications Techniques for minimizing contamination by particles that wear off of components that come into and out of contact with each other. The invention involves forming at least one of the components out of a magnetic material so that the particles that wear off of the co... | 06/23/2009 |
| 7548304 | Chuck plate assembly with cooling means The invention provides a chuck plate assembly that includes a shadow mask formed with a predetermined pattern; a shadow mask frame holding the shadow mask and having heat-radiating and cooling functions; a substrate aligned with the shadow mask and onto which deposi... | 06/16/2009 |
| 7528937 | Dual-sided substrate measurement apparatus and methods An apparatus for measuring the relative positions of frontside and backside alignment marks located on opposite sides of a substrate is disclosed. The apparatus includes upper and lower optical systems that allow for simultaneous imaging of frontside and backside al... | 05/05/2009 |
| 7525644 | Container and exposure apparatus having the same A container including at least two structural members welded to each other to define an inside space, and a material containing an organic compound provided in the inside space, in which in at least one structural member of the at least two structural members has (i... | 04/28/2009 |
| 7515250 | In-situ interferometer arrangement An in-situ interferometer includes an image modifying optic that produces light ray bundles. The light ray bundles are projected onto a reticle with a plurality of measurement fiducials encoded onto a face of the reticle. The measurement fiducials are exposed onto a... | 04/07/2009 |
| 7499149 | Holographic mask for lithographic apparatus and device manufacturing method A holographic mask includes a plurality of pixels each imparting a calculated phase and/or amplitude change to the projection beam to provide an image that is parallel to the mask. The holographic mask is used displaced from the best object plane of the projection l... | 03/03/2009 |
| 7489389 | Stage device with frame-shaped member movable in at least three degrees of freedom within a two-dimensional plane A stage device includes a stage and a frame-shaped member that move in three degrees of freedom directions in a two-dimensional plane while floating above a surface plate. The stage also holds an object. First fixed elements and second fixed elements are fitted to t... | 02/10/2009 |
| 7477358 | EUV reticle handling system and method An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclos... | 01/13/2009 |
| 7468783 | Exposure apparatus, control method for the same, and device manufacturing method An exposure apparatus which can change a reticle efficiently with a simple arrangement is provided. When changing the reticle, a table is moved to a predetermined change operation position. At this time, a second magnet is retreated to a position where a repulsion f... | 12/23/2008 |
