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| Number | Title | Issue Date |
| 8189174 | Lithographic apparatus provided with a swap bridge A lithographic apparatus includes two stages that are each configured to hold a substrate, wherein each stage is provided with a short stroke module to move a table with a substrate and a long stroke module to move the short stroke module of that stage. The lithogra... | 05/29/2012 |
| 8184266 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes an illumination system, a support, a substrate table, a projection system, and an actuator. The illumination system is configured to condition a radiation beam. The support is constructed to support a patterning device. The patterni... | 05/22/2012 |
| 8174680 | Substrate handler, lithographic apparatus and device manufacturing method An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The a... | 05/08/2012 |
| 8159652 | Positioning apparatus, exposure apparatus using thereof and device manufacturing method A positioning apparatus including a movable member having a plurality of magnets, and a plurality of coils arranged in X- and Y-axial directions, for displacing the movable member in the X- and Y-axial directions, and in a rotational direction around the Z-axis.... | 04/17/2012 |
| 8159653 | Substrate position detection apparatus, and method of adjusting a position of an imaging component of the same A method is disclosed for adjusting an arrangement of coordinates in an imaging area of an imaging component in a substrate imaging plane in a substrate position detection apparatus that detects a position of a substrate in accordance with an image taken of a circum... | 04/17/2012 |
| 8154708 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. ... | 04/10/2012 |
| 8154709 | Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus A method of placing a substrate onto a surface of a substrate holder, in which the surface is provided with a plurality of burls. Substrate placement data for allowing placement of the substrate at a certain position with respect to a position of the plurality of bu... | 04/10/2012 |
| 8149387 | Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus A method is provided for placing a substrate onto a surface of a substrate holder, the surface having a plurality of burls. First substrate placement data is calculated. This data enables placement of the substrate at a certain position with respect to a position of... | 04/03/2012 |
| 8144310 | Positioning system, lithographic apparatus and device manufacturing method A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to... | 03/27/2012 |
| 8144309 | Imprint lithography A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge o... | 03/27/2012 |
| 8134257 | Lithographic apparatus having a lorentz actuator with a composite carrier An actuator is configured to produce a displacement force between a first and a second part to displace the first and second parts relative to each other. The Actuator includes a first magnet subassembly, attached to one of a first and a second part, and an electric... | 03/13/2012 |
| 8134689 | Dual stage positioning and switching system The present invention has disclosed a dual stage positioning and switching system, which comprises at least a base, a first object stage positioning unit disposed on the base for a first workstation, and a second object stage positioning unit for a second workstatio... | 03/13/2012 |
| 8130365 | Immersion flow field maintenance system for an immersion lithography machine An immersion flow field maintenance system for an immersion lithography machine. The machine includes a projection objective lens, a wafer stage for supporting the wafer, and an immersion supplying system distributed around the lens for producing an immersion flow f... | 03/06/2012 |
| 8125616 | Lithographic apparatus with pre-formed flexible transportation line A lithographic apparatus includes, in an embodiment, an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cros... | 02/28/2012 |
| 8115906 | Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method A movable body system is equipped with a stage having a stage main section which moves along an XY plane and a stage which is finely movable in a direction (a Z-axis direction) orthogonal to the XY plane and a tilt direction with respect to the XY plane, and a measu... | 02/14/2012 |
| 8115905 | Lithographic apparatus and device manufacturing method A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts. ... | 02/14/2012 |
| 8111381 | Positioning apparatus, exposure apparatus and device manufacturing method A positioning apparatus includes a stage movable on a base, an actuator which drives the stage and a driver which supplies current to the actuator. The apparatus further includes a current supply path having a plurality of parallel paths connecting the driver and th... | 02/07/2012 |
| 8102513 | Method for positioning an object by an electromagnetic motor, stage apparatus and lithographic apparatus A method for positioning an object by an electromagnetic motor which, in use, produces a plurality of primary forces and a pitch torque associated with the primary forces. The method includes a cycle which includes: determining the desired forces and torques for pos... | 01/24/2012 |
| 8102512 | Substrate holding device, exposure apparatus, and device manufacturing method To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus (PH) is provided with a base material (PHB), a first holding portion (PH1) formed on the base material (PH... | 01/24/2012 |
| 8085385 | Movable body drive method and movable body drive system, and pattern formation method and pattern formation apparatus A first positional information of a wafer stage is measured using an interferometer system such as, for example, a Z interferometer. At the same time, a second positional information of the wafer stage is measured using a surface position measurement system such as,... | 12/27/2011 |
| 8077290 | Exposure apparatus, and device manufacturing method An apparatus includes a stage configured to hold a substrate and to be moved, a measurement station including a measurement device configured to measure, with respect to each of a plurality of measurement points in a surface of the substrate held by the stage, a pos... | 12/13/2011 |
| 8064045 | Method of transferring a substrate, transfer system and lithographic projection apparatus The invention relates to a method of transferring a substrate from a first substrate holder to a second substrate holder in a lithographic projection apparatus by using a transfer unit on the basis of transfer data available thereto. The second substrate holder has ... | 11/22/2011 |
| 8064044 | Exposure apparatus, exposure method, and device producing method An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (10). The exposure apparatus (EX) has a pressure adjustme... | 11/22/2011 |
| 8035805 | Driving apparatus and exposure apparatus, and device fabrication method A guide includes a brittle material layer and a magnetically attracting magnetic body, e.g., a metal layer. A recess and a projection are formed on the metal layer. The brittle material layer is made of, e.g., a sprayed ceramic material and covers the recess formed ... | 10/11/2011 |
| 8031328 | Positioning apparatus A positioning apparatus includes a moving member, an actuator, and a controller. The moving member can move in at least a first direction. The actuator is provided along the first direction. The controller controls a current applied to the actuator in order to suppo... | 10/04/2011 |
| 8027027 | Exposure apparatus, and device manufacturing method A lithographic projection apparatus includes a substrate table that holds a substrate, a projection system that projects a patterned beam of radiation onto the substrate, and a liquid confinement structure that confines a liquid in a space between the projection sys... | 09/27/2011 |
| 8027028 | Precise positioning system for dual stage switching exposure A precise positioning system for dual stage switching exposure, which includes a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafe... | 09/27/2011 |
| 8023106 | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method Positional information of a wafer stage in a Z-axis direction and a tilt direction with respect to the XY plane (for example, a θy direction) is measured, using a surface position measurement system, such as, for example, a Z head and the like, and the wafer stage ... | 09/20/2011 |
| 8023105 | Compact projection exposure device and associated exposure process performed by the device for exposing film-shaped tape to form circuit patterns The present invention relates to provide a projection exposure device having a small volume, thereby not occupying a large installation space. The projection exposure device is configured to transfer patterns formed on a mask to a surface of film-shaped tape on an u... | 09/20/2011 |
| 8013981 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes a movable table constructed and arranged to transport an object to a position in a beam path in a vacuum chamber, a first capacitor electrode and a second capacitor electrode attached to the table, a first inductor assembly coupled ... | 09/06/2011 |
| 8013982 | Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method A drive unit drives a wafer stage in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale that is measured by the encoder. In t... | 09/06/2011 |
| 7999918 | Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method A laser beam emitted by an encoder main body enters a wafer table via a PBS from the outside, and reaches a grating at a point that is located right under exposure area, and is diffracted by the grating. Then, by receiving interference light of a first polarized com... | 08/16/2011 |
| 7982857 | Stage apparatus, exposure apparatus, and exposure method with recovery device having lyophilic portion A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the hol... | 07/19/2011 |
| 7978307 | Gas bearing, and lithographic apparatus provided with such a bearing A gas bearing has a first bearing part defining a first bearing surface and a second bearing part defining a second bearing surface. Between the first bearing surface and the second bearing surface there is a gap. A gas supply device supplies a gas to the gap. The f... | 07/12/2011 |
| 7978308 | Lithographic apparatus and device manufacturing method A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed, the apparatus including a substrate table constructed to hold a substrate, a first clamping system configured to clamp the substrate table to a substrate ... | 07/12/2011 |
| 7973910 | Stage apparatus and exposure apparatus A stage apparatus includes: a moving stage, which moves along a movement plane; a first moving table, which holds a specimen while being able to move with respect to the moving stage; and a second moving table, which is provided on the moving stage and, when the fir... | 07/05/2011 |
| 7969557 | Exposure apparatus, and device manufacturing method A lithographic projection apparatus includes a substrate table that holds a substrate, a projection system that projects a patterned beam of radiation onto the substrate, and a liquid confinement structure that confines a liquid in a space between the projection sys... | 06/28/2011 |
| 7961299 | Transfer device The present invention relates to a transfer device that can feed a work in a stable condition without applying it any excess loads. The transfer device for feeding a tape-shaped work to a process stage standing in an upright position, which is placed on one side of ... | 06/14/2011 |
| 7948609 | Lithographic apparatus, stage system and stage control method In an embodiment, a lithographic apparatus includes a stage system including a movable stage, and a stage control system to control a position of the stage in response to a setpoint signal. The stage control system includes a feedback control loop to control the pos... | 05/24/2011 |
| 7944546 | Exposure apparatus and device manufacturing method An exposure apparatus comprises a component configured to project a pattern of an original onto a substrate, a structure configured to support the component, a support configured to support the structure, a gas spring which is located between the structure and the s... | 05/17/2011 |
