Did You Know...
...that it was melting ice cream that inspired the invention of the outboard motor? It was a lovely August day and Ole Evinrude was rowing his boat to his favorite island picnic spot. As he rowed, he watched his ice cream melt and wished he had a faster way to get to the island. At that moment the idea for the outboard motor was born!
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| Number | Title | Issue Date |
| 8189173 | Polarization control apparatus and method Apparatus and methods are used to control a polarization state of a radiation beam. A polarization control unit is configured to modulate a polarization state of at least a part of a radiation beam. A determination arrangement is configured to subsequently determine... | 05/29/2012 |
| 8179520 | Optical element, projection optical system, exposure apparatus, and device fabrication method The present invention provides an optical element which is used for light having a wavelength not more than 250 nm, and receives a light beam at a maximum incident angle not less than 55°, wherein the optical element includes an optical thin film in an effective ap... | 05/15/2012 |
| 8164741 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a... | 04/24/2012 |
| 8164740 | Illumination system coherence remover with two sets of stepped mirrors A coherence remover is provided. In an embodiment the coherence remover includes a first mirror and a second mirror coupled to the first mirror. The coherence remover is configured to receive an input beam. Each of the first and second mirrors is configured to refle... | 04/24/2012 |
| 8159651 | Illumination system coherence remover with a series of partially reflective surfaces A coherence remover includes a first partially reflective surface and a second partially reflective surface. The coherence remover is configured to receive an input beam. Each of the first and second reflective surfaces is configured to reflect a respective portion ... | 04/17/2012 |
| 8139202 | Apparatus and a method for illuminating a light-sensitive medium The invention relates to an illumination unit for point illumination of a medium comprising a plurality of light emitters in the form of light guides, which are arranged to illuminate at least one illumination face via a light valve arrangement, said light valve arr... | 03/20/2012 |
| 8120752 | Lithographic apparatus A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of ... | 02/21/2012 |
| 8115904 | Illumination system for sizing focused spots of a patterning system for maskless lithography An optical system for producing a pattern of focused spots, such as a maskless lithographic projection system, includes an illuminator, a pattern generator, and an imager. The illuminator includes a light source for generating a light beam, a homogenizer for evenly ... | 02/14/2012 |
| 8107054 | Microlithographic projection exposure apparatus The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes a... | 01/31/2012 |
| 8098366 | Optical system, in particular of a microlithographic projection exposure apparatus An optical system, in particular of a microlithographic projection exposure apparatus, includes an optical system axis and a polarization-influencing optical arrangement, wherein said arrangement has a polarization-influencing optical element which includes an optic... | 01/17/2012 |
| 8085384 | Exposure apparatus An exposure apparatus that exposes a pattern of an original onto a substrate includes a condenser optical system configured to split light from a light source into plural rays, to condense the plural rays at different positions on the original, and to make a central... | 12/27/2011 |
| 8081296 | Illumination optical apparatus, exposure apparatus, and device manufacturing method An illumination optical apparatus of the present invention includes an illumination optical system having a plurality of reflection mirrors arranged to guide illumination light flux to an irradiated plane. A first partial field stop is arranged in an optical path of... | 12/20/2011 |
| 8081295 | Projection exposure method and projection exposure system therefor In the case of a projection exposure method for exposing a radiation-sensitive substrate, arranged in the region of an image surface of a projection objective, with at least one image of a pattern of a mask arranged in the region of an object surface of the projecti... | 12/20/2011 |
| 8064043 | Shutter blade apparatus, shutter unit, image pickup apparatus, exposure apparatus, and method of manufacturing device A shutter blade apparatus includes a shutter blade; a first pushing member including two first pushing portions configured to push a first surface of the shutter blade; and a second pushing member including a second pushing portion configured to push a second surfac... | 11/22/2011 |
| 8059261 | Masking device, lithographic apparatus, and device manufacturing method A lithographic projection apparatus having a masking device for obscuring part of at least one of a patterning device used for patterning a projection beam before imaging the patterned beam onto a substrate. The masking device includes a first masking structure to o... | 11/15/2011 |
| 8049866 | Method and apparatus for variable polarization control in a lithography system A polarization control device for a lithography system selectively polarizes light in horizontal, vertical and/or circular orientations. A pair of relatively rotatable quarter-wave plates move to provide the desired polarization. When the quarter-wave plates are at ... | 11/01/2011 |
| 8045139 | Exposure apparatus capable of asymmetrically adjusting light intensity An exposure apparatus of a semiconductor device may include an exposure light source; an asymmetric adjustment filter for asymmetrically adjusting intensity of a light which passes through the exposure light source; a photomask for passing the light of which intensi... | 10/25/2011 |
| 8035803 | Subsystem of an illumination system of a microlithographic projection exposure apparatus In general, in one aspect, the disclosure features an illumination system for a microlithographic projection exposure apparatus configured so that during operation the illumination system illuminates a reticle plane of the microlithographic projection exposure appar... | 10/11/2011 |
| 8035804 | Exposure apparatus and device manufacturing method A scanning exposure apparatus which exposes a substrate is disclosed. The apparatus comprises an illumination system configured to illuminate an illumination region of an original, a projection optical system configured to project a pattern of the original onto the ... | 10/11/2011 |
| 8018578 | Pellicle, lithographic apparatus and device manufacturing method A pellicle for integrated circuit equipment operating in an EUV range includes a multi-layered structure of alternating layers. The pellicle is constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity o... | 09/13/2011 |
| 8004658 | Lighting optical device, exposure system, and exposure method An illumination optical apparatus is able to accomplish desired annular illumination, circular illumination, and so on, without substantial influence of the zero-order light from a diffractive optical element. The illumination optical apparatus comprises a diffracti... | 08/23/2011 |
| 7982855 | Illuminator for a photolithography device The invention relates to an illuminator for a photolithography device. The invention comprises: a source (1′) of a light beam (10) which is used to illuminate a mask (8) and to expose an area of a wafer (W); at least one main array (4) ... | 07/19/2011 |
| 7982856 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a... | 07/19/2011 |
| 7982854 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source for producing light in the EUV region. The projection exposure system further comprises a f... | 07/19/2011 |
| 7965381 | Self-aligned, sub-wavelength optical lithography Embodiments of the invention provide a method and an apparatus for performing self-aligned, sub-wavelength optical lithography. One embodiment provides a region of photoresist above a conductive surface having a plurality of periodically arrayed openings extending t... | 06/21/2011 |
| 7961297 | Method for determining intensity distribution in the image plane of a projection exposure arrangement A method for determining intensity distribution in the focal plane of a projection exposure arrangement, in which a large aperture imaging system is emulated and a light from a sample is represented on a local resolution detector by an emulation imaging system. A de... | 06/14/2011 |
| 7961298 | Polarization rotator and a crystalline-quartz plate for use in an optical imaging system A polarization rotator and crystalline quartz plate for use with an optical imaging system. The system has several imaging optical components (L1-L16) sequentially arranged along an optical axis (16), a means for creating radially polarized ligh... | 06/14/2011 |
| 7956987 | Measurement apparatus, exposure apparatus, and device manufacturing method A measurement apparatus includes a polarization controller which controls polarization of light, a wavefront dividing unit which divides a wavefront of the light, a polarizing unit which polarizes the light, a detector which detects the light, a first driving unit w... | 06/07/2011 |
| 7952685 | Illuminator for a lithographic apparatus and method An illuminator for a lithographic apparatus, the illuminator including an illumination mode defining element and a plurality of polarization modifiers, the polarization modifiers being moveable into or out of partial intersection with a radiation beam having an angu... | 05/31/2011 |
| 7940375 | Transmission filter apparatus A transmission filter apparatus for spatially dependent intensity filtering of an incident light distribution, and illumination systems containing the same. The light transmission filter apparatus contains at least one retardation device (23) that can be oper... | 05/10/2011 |
| 7932998 | Exposure apparatus having the same ID bias An exposure apparatus includes an exposure light source generating light to be emitted to photomask, a projection lens for projecting the light having passed through the photomask to wafer, and a transmittance adjustment filter in projection lens the transmittance a... | 04/26/2011 |
| 7929116 | Polarized radiation in lithographic apparatus and device manufacturing method A lithographic apparatus uses polarized light to improve the imaging properties such as exposure latitude, while maintaining and extending the lifetime of an illumination system in a lithographic apparatus. ... | 04/19/2011 |
| 7884922 | Illumination system for microlithography An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a pred... | 02/08/2011 |
| 7880863 | Lithography system with illumination monitor A lithographic system including a light source configured to provide a light beam, a mask stage configured to hold a mask having a mask pattern, a wafer stage having a surface configured to hold a wafer having a plurality of dies, and an illumination monitor having ... | 02/01/2011 |
| 7872731 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes a polarization changing element including at least two wedge-shaped optically active members configured to rotate the polarization direction of at least a portion of the radiation beam with a predetermined angle with respect to the ... | 01/18/2011 |
| 7864297 | Light blocking device and exposure apparatus A light blocking device includes a deformable member deformable in a first direction and elongating in a second direction intersecting with the first direction, a plurality of light blocking plates arrayed along the second direction, each of the plurality of light b... | 01/04/2011 |
| 7864296 | Exposure apparatus, setting method, and exposure method having the same An exposure apparatus for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes a measuring part for obtaining polarization information of the light that has passed the optical system, the polarization informat... | 01/04/2011 |
| 7847921 | Microlithographic exposure method as well as a projection exposure system for carrying out the method In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarizati... | 12/07/2010 |
| 7847920 | Illumination system and polarizer for a microlithographic projection exposure apparatus An illumination system for illuminating a reticle that moves along a scanning direction in a microlithographic projection exposure apparatus has an optical axis and an optical component producing an illumination angle distribution of the projection light. In accorda... | 12/07/2010 |
| 7830496 | Method of exposing substrate with one polarization mask and at least two lights and apparatus for performing the same In a method of exposing a substrate to light and an apparatus for performing the method, a first optical unit configured to generate at least two lights and including a photomask, the at least two lights having pattern information of the photomask, and a second opti... | 11/09/2010 |
