Quotables
"What, sir, would you make a ship sail against the wind and currents by lighting a bonfire under her deck? I pray you, excuse me, I have not the time to listen to such nonsense."
Napoleon Bonaparte ; When told of the Robert Fulton steamboat
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8169595 | Optical apparatus and method for modifying the imaging behavior of such apparatus The disclosure relates to an optical apparatus including a light source that emits light in the form of light pulses having a pulse frequency, and including at least one optical element. The disclosure also relates to a projection exposure machine including a pulsed... | 05/01/2012 |
| 8085383 | System, method, and apparatus for scanning detector for fast and frequent illumination uniformity correction module Provided is a reticle masking blade system, including a reticle-masking blade device. Also included is a detector array mounted on an edge of a blade of the blade device. ... | 12/27/2011 |
| 7973909 | Method and apparatus for using a synchrotron as a source in extreme ultraviolet lithography One embodiment of the present invention provides a method to facilitate using a synchrotron as a source in an extreme ultraviolet lithography (EUVL) system, wherein the synchrotron's energy decreases over time. The EUVL system can includes a stepper which uses a ste... | 07/05/2011 |
| 7965380 | Lithographic apparatus and device manufacturing method Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the ima... | 06/21/2011 |
| 7907255 | Lithographic apparatus and device manufacturing method A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between ... | 03/15/2011 |
| 7760328 | Exposure apparatus and exposing method and method of manufacturing a printed wiring board The mask-less exposure apparatus includes: a stage which moves with the substrate having a photosensitive resin layer with sensitivity to ultraviolet radiation formed thereon; a first light source for emitting light containing a wavelength component in the wavelengt... | 07/20/2010 |
| 7751031 | Light application apparatus, crystallization apparatus and optical modulation element assembly A light application apparatus includes an optical modulation element provided with a plurality of phase steps, a light beam which is entered into the optical modulation element being phase-modulated by the phase steps and exits from the optical modulation element as... | 07/06/2010 |
| 7728955 | Lithographic apparatus, radiation supply and device manufacturing method A system for controlling the radiation dose in a pulse of radiation having a relatively large dose, in which a pulsed beam of radiation is divided into a plurality of pulsed sub-beams of radiation and the radiation dose of the pulses is adjusted after the radiation ... | 06/01/2010 |
| 7633599 | Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light An apparatus for changing an intensity distribution of a light within an illumination field includes a structure configured to be positioned within the illumination field so that a first portion of the light within the illumination field impinges upon the structure,... | 12/15/2009 |
| 7612868 | Exposure apparatus and method of manufacturing device An exposure apparatus which exposes a substrate to pulsed light supplied from a light source, includes an input device, and a controller configured to periodically change a wavelength of the pulsed light emitted by the light source, wherein the controller is configu... | 11/03/2009 |
| 7595863 | Lithographic apparatus, excimer laser and device manufacturing method A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch... | 09/29/2009 |
| 7561253 | Method for a multiple exposure, microlithography projection exposure installation and a projection system In a method for multiply exposing at least one substrate coated with a photosensitive layer, a first exposure is carried out in accordance with a first set of exposure parameters on a first projection system (17), and a second exposure is carried out in accor... | 07/14/2009 |
| 7525641 | System and method for uniformity correction A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformit... | 04/28/2009 |
| 7522265 | Optical aligner using a compensation light An optical aligner includes a light source for generating an exposure light, an irradiation optical system for irradiating the exposure light onto a reticle, a projection optical system for transmitting the exposure light passed by the reticle to project the image o... | 04/21/2009 |
| 7499147 | Generation method of light intensity distribution, generation apparatus of light intensity distribution, and light modulation element assembly A generation method of a light intensity distribution uses a first light modulation element and a second light modulation element which are arranged to be apart from each other by a distance D and face each other in parallel to optically modulate a light beam which ... | 03/03/2009 |
| 7486383 | Direct exposure apparatus and direct exposure method A direct exposure apparatus having a light source for projecting light onto an exposure target or, more specifically, an exposure target substrate, comprises: measuring means for measuring the illuminance distribution of light on an area corresponding to the exposur... | 02/03/2009 |
| 7480030 | Method and device for lithography by extreme ultraviolet radiation The invention relates to a method and device for photolithography by extreme ultraviolet radiation, using a source resulting from the excitation of plasma by several lasers. The object which is to be photoengraved is displaced behind an irradiation window. The radia... | 01/20/2009 |
| 7477356 | Exposure apparatus An exposure apparatus for performing exposure of an object to light. A measuring device measures a wavelength spectrum of the light. A processor calculates a center wavelength of light based on the measured wavelength spectrum, and a main controller determines wheth... | 01/13/2009 |
| 7456934 | Exposure apparatus and device manufacturing method An exposure apparatus configured to expose a substrate via a reticle includes a light source emitting light, a measuring device performing measurement of a wavelength spectrum of the light emitted from the light source, and a controller. The controller calculates a ... | 11/25/2008 |
| 7453551 | Increasing pulse-to-pulse radiation beam uniformity A system is used to substantially reduce divergence of a beam traveling between master and power oscillators, for example in a laser beam source. The system comprises the first and second oscillators and a beam conditioning device. The first oscillator is configured... | 11/18/2008 |
| 7443486 | Method for predicting a critical dimension of a feature imaged by a lithographic apparatus A lithographic apparatus includes an illuminator configured to condition a beam of radiation and a support configured to hold a patterning device. The patterning device is configured to pattern the beam of radiation according to a desired pattern. The lithographic a... | 10/28/2008 |
| 7423730 | Lithographic apparatus A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning d... | 09/09/2008 |
| 7423729 | Method of monitoring the light integrator of a photolithography system A method of monitoring a light integrator of a photolithography system, wherein the photolithography system comprises a light source for illuminating different fields of a photosensitive layer and a light integrator for measuring the actual exposure doses of the ill... | 09/09/2008 |
| 7408616 | Microlithographic exposure method as well as a projection exposure system for carrying out the method In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarizati... | 08/05/2008 |
| 7403266 | Maskless lithography systems and methods utilizing spatial light modulator arrays A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the ligh... | 07/22/2008 |
| 7382438 | Lithographic apparatus and device manufacturing method A lithographic apparatus having a controller that sets at least one lithographic apparatus parameter such that the difference between the critical dimension of pattern features formed on the substrate in regions of relatively high and relatively low pattern feature ... | 06/03/2008 |
| 7372056 | LPP EUV plasma source material target delivery system An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt... | 05/13/2008 |
| 7372541 | Lithographic apparatus and device manufacturing method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.... | 05/13/2008 |
| 7372623 | Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby A multi-layered spectral purity filter improves the spectral purity of extreme ultra-violet (EUV) radiation and also collects debris emitted from a radiation source. ... | 05/13/2008 |
| 7367119 | Method for forming a reinforced tip for a probe storage device Systems and methods in accordance with the present invention can include a tip contactable with a media. In an embodiment, the tip comprises a substantially hollow structure formed of a metal. The tip can be formed by depositing a first metal layer over silicon ther... | 05/06/2008 |
| 7369217 | Method and device for immersion lithography The present invention relates to an immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation. Said system comprising a source emitting electromagnetic radiati... | 05/06/2008 |
| 7369216 | Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby A lithographic system includes a radiation system configured to provide a beam of radiation; an illumination system configured to condition the beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the pro... | 05/06/2008 |
| 7365349 | EUV light source collector lifetime improvements An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plas... | 04/29/2008 |
| 7365827 | Lithographic apparatus and device manufacturing method A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts. ... | 04/29/2008 |
| 7365862 | Methods and apparatus for inspecting an object A method for generating a mask for use with a light measurement system that includes a light source for projecting light onto an object, and an imaging sensor for receiving light reflected from the object. The method includes determining a profile of the object to b... | 04/29/2008 |
| 7362508 | Projection optical system and method for photolithography and exposure apparatus and method using same Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ... | 04/22/2008 |
| 7362416 | Exposure apparatus, evaluation method and device fabrication method An exposure apparatus for exposing a pattern of a mask onto an object, said exposure apparatus includes a light source part that includes a generating mechanism for generating a plasma, a condenser mirror for condensing a light radiated from the plasma, and a vacuum... | 04/22/2008 |
| 7362413 | Uniformity correction for lithographic apparatus A uniformity correction module for improving the uniformity of a radiation distribution in a rectangular illumination slit having two longer sides and two shorter sides, including a plurality of movable blades arranged along each long side of the illumination slit a... | 04/22/2008 |
| 7361457 | Real-time configurable masking Methods, systems, and media to define a portion of a circuit pattern with a source of real-time configurable imaging are disclosed. Embodiments include hardware and/or software for directing a beam through a mask onto a wafer surface to outline a circuit pattern hav... | 04/22/2008 |
| 7359030 | Lithographic apparatus and device manufacturing method A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out wi... | 04/15/2008 |
