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A method of swing on a swing is disclosed, in which a user positioned on a standard swing suspended by two chains from a substantially horizontal tree branch induces side to side motion by pulling alternately on one chain and then the other.
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| Number | Title | Issue Date |
| 8189172 | Lithographic apparatus and method Systems and methods are provided for measuring aberration in a lithographic apparatus. A radiation beam is modulated using an array of individually controllable elements, and the modulated beam is projected using a projection system. A pattern is provided on the arr... | 05/29/2012 |
| 8174677 | Illumination optical system for microlithography The disclosure provides an illumination optical system for microlithography that is designed so that, even with a change of illumination setting (e.g., a change in the given illumination conditions in the object field), variation of illumination parameters over the ... | 05/08/2012 |
| 8174678 | Lithographic apparatus with adjusted exposure slit shape enabling reduction of focus errors due to substrate topology and device manufacturing method A lithographic apparatus includes an illumination system to condition a radiation beam; a patterning device support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned ... | 05/08/2012 |
| 8169594 | Illumination system of a microlithographic projection exposure apparatus An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane). The transmittance d... | 05/01/2012 |
| 8164738 | Illumination optical system, exposure apparatus, and device manufacturing method In an illumination optical system arranged to illuminate an illumination target plane by using light from a light source, the illumination optical system includes a prism unit arranged to refract the light, an optical integrator arranged to form a plurality of light... | 04/24/2012 |
| 8164739 | Controlling fluctuations in pointing, positioning, size or divergence errors of a beam of light for optical apparatus A system and method are used for controlling fluctuations in one or more of a beam pointing error, a beam positioning error, a beam size error or a beam divergence error of a beam of light in a lithography system. An optical apparatus may comprise a first beam contr... | 04/24/2012 |
| 8154707 | Illumination optical system and exposure apparatus having the same An illumination optical system for illuminating an object surface using light from a light source, the illumination optical system includes, a first optical system that includes a movable unit that is movable along an optical axis, said first optical system guiding ... | 04/10/2012 |
| 8154706 | Scanning optical device, image forming apparatus using the same, and method of adjusting scanning optical device A scanning optical device including a plurality of light source devices 1a-1d, a light beam converting system 3 for converting the light focus state of the plurality of light beams emitted from light emitting members of the light s... | 04/10/2012 |
| 8144308 | Spatial light modulation unit, illumination optical apparatus, exposure apparatus, and device manufacturing method This invention relates to an illumination optical apparatus capable of forming a pupil intensity distribution of a desired shape and desired illuminance and, in turn, capable of realizing illumination conditions of great variety. The illumination optical apparatus h... | 03/27/2012 |
| 8139200 | Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion... | 03/20/2012 |
| 8134687 | Illumination system of a microlithographic exposure apparatus An illumination system of a microlithographic exposure apparatus has an optical axis and a beam transforming device. This device includes a first mirror with a first reflective surface having a shape that is defined by rotating a straight line, which is inclined wit... | 03/13/2012 |
| 8130364 | Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, projected images of the projection optical systems are formed to be accurately continuous to enable satisfactory pattern transfer. A first projection optica... | 03/06/2012 |
| 8111380 | Write-pattern determination for maskless lithography A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light mo... | 02/07/2012 |
| 8111379 | Automated determination of height and tilt of a substrate surface within a lithography system Method and apparatus are provided for automated determination and adjustment of height and tilt of a substrate surface within a lithography system. The method includes: directing a beam of light onto the substrate surface, which reflects off the substrate surface as... | 02/07/2012 |
| 8111378 | Exposure method and apparatus, and device production method Disclosed is an exposure method which illuminates a first object with an exposure beam and exposes a second object with the exposure beam through the first object and a projection optical system, wherein at least a part of one of the first object and the projection ... | 02/07/2012 |
| 8102510 | Projection optical system, exposure apparatus and device fabricating method There is provided a projection optical system for projecting a pattern on an object surface onto an image surface in a reduced size. The projection optical system includes six reflective surfaces that includes, in order of reflecting light from the object surface, a... | 01/24/2012 |
| 8098365 | Illumination optical system, exposure apparatus, and device manufacturing method An illumination optical system which illuminates a plane to be illuminated using light from a light source, includes a first integrator and a second integrator disposed in order from the light source, a diaphragm having an aperture of constant area and disposed betw... | 01/17/2012 |
| 8094290 | Illumination optical apparatus, exposure apparatus, and device manufacturing method An illumination optical system with a simple structure reduces the effects of illumination variations caused by a spatial coherency of illumination light, while maintaining a high usage efficiency of illumination light that is emitted in pulses. The illumination opt... | 01/10/2012 |
| 8089613 | Lithographic apparatus, excimer laser and device manufacturing method A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch... | 01/03/2012 |
| 8085382 | Microlithographic projection exposure apparatus illumination optics Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed. ... | 12/27/2011 |
| 8081293 | Illumination system of a microlithographic projection exposure apparatus The disclosure provides an illumination system of a microlithographic projection exposure apparatus, as well as related methods and components. In some embodiments, the illumination system includes an optical element configured so that, when a linearly polarized ent... | 12/20/2011 |
| 8077288 | Exposure apparatus An exposure apparatus for exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate via a projection optical system includes an illumination optical system for illuminating the reticle via a slit that has a longitudinal direction cor... | 12/13/2011 |
| 8077289 | Device and method for influencing the polarization distribution in an optical system The disclosure relates to a device and a method for influencing the polarization distribution in an optical system, in particular in a microlithographic projection exposure apparatus. A device according to the disclosure includes a plurality of polarization-influenc... | 12/13/2011 |
| 8072580 | Maskless exposure apparatus and method of manufacturing substrate for display using the same The present invention relates to a maskless exposure apparatus and a method of manufacturing a substrate for a display using the same. In the present invention, a substrate 22 is disposed on a scan stage 20 that can be moved in horizontal and vertical ... | 12/06/2011 |
| 8064041 | Projection objective for a microlithographic projection exposure apparatus A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N≧2 successive sections A1 to AN of the projection objective which are separated from one another by pupil planes... | 11/22/2011 |
| 8064042 | Exposure apparatus and device fabrication method The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate a reticle with a light beam from a light source, and a projection optical system which is configured to project a pattern of the reticle onto a su... | 11/22/2011 |
| 8049865 | Lithographic system, device manufacturing method, and mask optimization method A lithographic system comprises an array of individually controllable elements, a projection system, datapath hardware, and a conversion system. The array of individually controllable elements is capable of modulating a radiation beam. The projection system is confi... | 11/01/2011 |
| 8040492 | Illumination system of a microlithographic projection exposure apparatus An illumination system of a microlithographic projection exposure apparatus, as well as related systems, methods and components are disclosed. The illumination system can include a polarization manipulator configured to variably adjust a change in the polarization s... | 10/18/2011 |
| 8035802 | Method and apparatus for lithographic imaging using asymmetric illumination According to one aspect of the present invention, a method and apparatus for processing a substrate may be provided. A reticle may be positioned relative to a substrate. The reticle may have a plurality of features with dimensions extending in a first and a second d... | 10/11/2011 |
| 8031327 | Illumination system of a microlithographic projection exposure apparatus The disclosure relates an illumination system that has an optical axis and a polarization-influencing arrangement. The arrangement can include a first wedge plate with a first wedge direction which extends perpendicularly to the optical axis in the direction of a ma... | 10/04/2011 |
| 8031326 | Illumination system or projection lens of a microlithographic exposure system In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each ... | 10/04/2011 |
| 8027025 | Exposure apparatus and device manufacturing method An exposure apparatus which exposes a substrate with exposure light, includes a projection optical system which projects a pattern image of an original onto the substrate; a first illumination unit which illuminates the original with the exposure light; and a second... | 09/27/2011 |
| 8027026 | Lithographic apparatus and device manufacturing method A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to... | 09/27/2011 |
| 8027024 | Replacement device for an optical element Replacement devices for at least one replaceable optical element mounted at least indirectly in a lithographic projection exposure apparatus are disclosed. Lithography objectives and illumination systems are also disclosed. Methods for positioning a replaceable opti... | 09/27/2011 |
| 8018577 | Illumination-sensor calibration methods, and exposure methods and apparatus and device-manufacturing methods including same, and reflective masks used in same Exposure apparatus are disclosed that can control, to high precision, exposure doses on a photosensitive substrate of a mask pattern defined on a reflective mask as the pattern is being exposed on the substrate using a projection-optical system. An exemplary apparat... | 09/13/2011 |
| 8013980 | Exposure apparatus equipped with interferometer and exposure apparatus using the same An exposure apparatus includes a projection optical system for projecting an exposure pattern, onto an object to be exposed, and a measuring apparatus for measuring, as an interference fringe, optical performance of the projection optical system, wherein the measuri... | 09/06/2011 |
| 8013979 | Illumination system with low telecentricity error and dynamic telecentricity correction An illuminator with substantially reduced telecentricity error relative to conventional illuminators includes one or more modules having movable optical elements with low telecentricity error that may be adjusted to compensate for telecentricity errors. The modules ... | 09/06/2011 |
| 8004656 | Illumination system for a microlithographic projection exposure apparatus An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination sys... | 08/23/2011 |
| 8004657 | Exposure apparatus, control method for the same, and device manufacturing method An exposure apparatus that includes a chamber in which an optical element, including a capping layer, is arranged, and that exposes a substrate to exposure light via the optical element. The apparatus includes a supply unit configured to supply a material into the c... | 08/23/2011 |
| 7999916 | Microlithographic projection exposure apparatus A microlithographic projection exposure apparatus is disclosed. The apparatus can have an illumination system for generating projection light, an absorption filter which has a varying absorption coefficient distribution, and a mask which is illuminated by the projec... | 08/16/2011 |
