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User-operated amusement apparatus for kicking the user's buttocks
An apparatus including a user-operated and controlled apparatus for self-infliction of repetitive blows to the user's buttocks by a plurality of elongated arms bearing flexible extensions that rotate under the user's control.
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| Number | Title | Issue Date |
| 8115903 | Lithographic apparatus and device manufacturing method An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap. ... | 02/14/2012 |
| 8111377 | Lithographic apparatus with an encoder arranged for defining a zero level A lithographic apparatus includes a position measuring system configured to measure a position of a moveable object with respect to a reference frame of the lithographic apparatus, in at least one direction of an orthogonal x-y-z coordinate system of the moveable ob... | 02/07/2012 |
| 8111374 | Analysis method, exposure method, and device manufacturing method An analysis method includes a developing process (SA60), which develops the substrate, a first measuring process (SA50), which measures the abnormalities of the pre-development substrate, a second measuring process (SA70), which measures the abn... | 02/07/2012 |
| 8111373 | Exposure apparatus and device fabrication method An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure apparatus is provided with a nozzle member (70) having a supply outlet... | 02/07/2012 |
| 8111376 | Feedforward/feedback litho process control of stress and overlay A method and apparatus for process control in a lithographic process are described. Metrology may be performed on a substrate either before or after performing a lithographic patterning process on the substrate. One or more correctables to the lithographic patternin... | 02/07/2012 |
| 8111375 | Exposure apparatus and method for manufacturing device An exposure apparatus wherein an image of a pattern is projected onto a substrate via a projection optical system to expose the substrate, includes: a substrate moving device that is movable while holding the substrate above the projection optical system; and a liqu... | 02/07/2012 |
| 8107053 | Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid An apparatus configured to de-gas a liquid includes a semi-permeable membrane having a first side on which the liquid is provided; and (i) a vaporizer configured to provide vapor of the liquid to a second side of the membrane; or (ii) a gas inlet configured to provi... | 01/31/2012 |
| 8107052 | Exposure apparatus and device manufacturing method An exposure apparatus is configured to expose a substrate to light while the substrate is scanned. The apparatus comprises a stage configured to hold the substrate and to move, a measuring device configured to measure a position of a surface of the substrate held by... | 01/31/2012 |
| 8102507 | Lithographic apparatus and device manufacturing method A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system c... | 01/24/2012 |
| 8102504 | Exposure apparatus, exposure method, and method for producing device A lithographic apparatus includes an illuminator configured to condition a radiation beam; a support constructed to hold a patterning device, the patterning device configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiat... | 01/24/2012 |
| 8102506 | Method and device for controlling a plurality of actuators and an illumination device for lithography The present invention relates to a method and a device for controlling multiple actuators with a controller and multiple actuators controllable by the controller. At least several groups of actuators are individually controllable by the controller and to each actuat... | 01/24/2012 |
| 8102505 | Lithographic apparatus comprising a vibration isolation support device A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a ... | 01/24/2012 |
| 8098362 | Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method By irradiating a detection beam from an irradiation system of a detection device to a scale used for measuring the position of a wafer stage, and detecting the detection beam via the scale by a photodetection system, a surface state (an existence state of foreign su... | 01/17/2012 |
| 8098363 | Exposure apparatus and method of manufacturing a device An exposure apparatus that exposes a shot region on a substrate to radiant energy based on an obtained position of a surface of the shot region. A projecting optical system obliquely projects detection light to a surface of a shot region on a substrate. A receiving ... | 01/17/2012 |
| 8094288 | Lithographic apparatus and device manufacturing method A lithographic apparatus includes an illumination system configured to transmit a beam of radiation, the beam of radiation comprising desired radiation having a predetermined wavelength or a predetermined wavelength range, and undesired radiation having another wave... | 01/10/2012 |
| 8094289 | Scanning exposure apparatus and device manufacturing method A scanning exposure apparatus is configured to project a pattern of an original onto a substrate by a projection optical system while scanning the original and the substrate, thereby scanning-exposing the substrate, the apparatus including a barycentric position adj... | 01/10/2012 |
| 8089611 | Exposure apparatus and method for producing device A vacuum system for an immersion exposure apparatus includes a flow passage connected to a vacuum source, and a separator provided on the flow passage. The separator separates any gas from a liquid sucked into the flow passage together with the gas. ... | 01/03/2012 |
| 8089612 | Position detection apparatus, position detection method, exposure apparatus, and device fabrication method The present invention provides a position detection apparatus including a first obtaining unit configured to obtain imaging characteristics of an imaging optical system for a plurality of light beams, having different wavelength with each other, of the light having ... | 01/03/2012 |
| 8089610 | Environmental system including vacuum scavenge for an immersion lithography apparatus A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. Th... | 01/03/2012 |
| 8072576 | Exposure apparatus and method for producing device There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an i... | 12/06/2011 |
| 8068210 | Lithographic apparatus, device manufacturing method and computer program product Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity. ... | 11/29/2011 |
| 8068211 | Exposure apparatus and method for manufacturing device An exposure apparatus for exposing a shot region on a substrate includes a movable stage, a projection optical system, a measuring device configured to measure a position of a partial region of a surface of the substrate, and a controller configured to cause the mea... | 11/29/2011 |
| 8068209 | Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on ... | 11/29/2011 |
| 8064038 | Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample The invention relates to an inspection apparatus and a method for inspecting a sample, such as a lithographic patterning device or mask, for anomalies, such as contamination particles or defects. The inspection apparatus includes a support structure constructed and ... | 11/22/2011 |
| 8064039 | Exposure method, exposure apparatus, and device manufacturing method A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical sys... | 11/22/2011 |
| 8059259 | Damping arrangement, active damping system, lithographic apparatus, and projection assembly An active damping system assembly is configured to dampen a vibration of at least part of a structure. The assembly includes a plurality of active dampers each including a sensor configured to measure a position quantity of an interface mass mounted on the structure... | 11/15/2011 |
| 8059258 | Liquid jet and recovery system for immersion lithography A liquid immersion lithography apparatus includes a projection system having a last element. The projection system projects an image onto a workpiece to expose the workpiece through a liquid filled in a space between the last element and the workpiece. A liquid supp... | 11/15/2011 |
| 8054448 | Apparatus and method for providing fluid for immersion lithography An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity in a direction that is different than a direction in which the nozzle moves. The immersion fluid can also be injected at different r... | 11/08/2011 |
| 8054447 | Exposure apparatus, exposure method, method for producing device, and optical part An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the su... | 11/08/2011 |
| 8054449 | Enhancing the image contrast of a high resolution exposure tool A system and method are utilized to equalize intensity or energy in various diffraction order portions of a patterned beam. The patterned beam is formed using a diffractive patterning device. An attenuator is placed at a pupil of a projection system to attenuate res... | 11/08/2011 |
| 8049864 | Device manufacturing method and lithographic apparatus A device manufacturing method includes a measurement phase and an exposure phase. The measurement phase includes conditioning a radiation beam with a first beam condition, forming the patterned radiation beam by imparting the radiation beam with the first beam condi... | 11/01/2011 |
| 8045136 | Stage drive method and stage unit, exposure apparatus, and device manufacturing method A lithographic projection apparatus includes a substrate table to hold a substrate, a projection system to project a patterned beam of radiation onto the substrate and a liquid confinement structure to confine a liquid in a space between the projection system and th... | 10/25/2011 |
| 8045138 | Support plate, exposure apparatus having the support plate, and a device manufacturing method using the exposure apparatus An exposure apparatus exposes a substrate through a liquid. The apparatus includes a stage that holds the substrate and moves, and a support plate disposed on the stage and around the periphery of the substrate and supporting the liquid together with the substrate. ... | 10/25/2011 |
| 8045137 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane sub... | 10/25/2011 |
| 8035797 | Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method A projection exposure apparatus that exposes a substrate with a liquid interposed between a surface of the substrate and an optical element on the substrate side of a projection optical system; includes liquid supply and discharge mechanisms, which supply the liquid... | 10/11/2011 |
| 8035798 | Lithographic apparatus and device manufacturing method A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between ... | 10/11/2011 |
| 8035800 | Exposure apparatus, maintenance method, exposure method, and method for producing device An exposure apparatus EX includes a liquid immersion system and an exchange system which performs exchange of the liquid immersion member. The exchange system has a holding device which holds the liquid immersion member detachably and a transport device. By using th... | 10/11/2011 |
| 8035799 | Exposure apparatus, exposure method, and device producing method An exposure apparatus is provided with a measuring unit which measures at least one of property and components of a liquid in a state that a liquid immersion area is formed on an object different from a substrate P to be exposed. There is provided an exposure appara... | 10/11/2011 |
| 8027021 | Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method Position information of a movable body within an XY plane is measured with high accuracy by an encoder system whose measurement values have favorable short-term stability, without being affected by air fluctuations, and also position information of the movable body ... | 09/27/2011 |
| 8027020 | Exposure apparatus, exposure method, and method for producing device An exposure apparatus includes a projection optical system which forms an image of a first pattern in a first exposure area and which forms an image of a second pattern in a second exposure area; and an adjusting device which adjusts a surface positional relationshi... | 09/27/2011 |
