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| Number | Title | Issue Date |
| 8184263 | Measurement apparatus and exposure apparatus A measurement apparatus which measures spatial coherence in an illuminated plane illuminated by an illumination system, comprises a measurement mask which has at least three pinholes and is arranged on the illuminated plane, a detector configured to detect an interf... | 05/22/2012 |
| 8179519 | Adjusting device with a laser light source and a reflector for aligning a microlithography projection exposure installation An adjusting device used to align two components of a microlithography projection exposure installation relative to each other. The adjusting device has an autocollimating device with a light source and a reflector. The light source and the reflector are each rigidl... | 05/15/2012 |
| 8179518 | Exposure apparatus to correct position between reticle and substrate according to propagation time and shifting rate A scanning exposure apparatus projects a pattern of an original onto a substrate via a projection optical system and shifts the original and the substrate in synchronization with each other with respect to an optical axis of the projection optical system so as to tr... | 05/15/2012 |
| 8174670 | Measurement method and exposure apparatus A method of measuring an optical characteristic of an optical system using a measurement apparatus, comprises determining a position of each of object points by arranging, on a side of the object plane, an object point measurement device array, and sequentially inse... | 05/08/2012 |
| 8159647 | Lithographic apparatus and device manufacturing method A maskless lithography system has a patterning array assembly formed by a plurality of patterning arrays, each patterning array having a substrate. Each patterning array has a plurality of individually controllable elements to endow an incoming radiation beam with a... | 04/17/2012 |
| 8159648 | Method and device for the correction of imaging defects The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and components. ... | 04/17/2012 |
| 8149380 | Exposure apparatus and correction apparatus An exposure apparatus is configured to expose a pattern of an original on a substrate by using light from a light source. The exposure apparatus includes an illumination optical system configured to illuminate the original by polarized light by using the light from ... | 04/03/2012 |
| 8130360 | Exposure apparatus and device manufacturing method An exposure apparatus includes an image sensor, a measurement optical system configured to guide measurement light to obliquely enter the projection optical system, and further, to guide the measurement light returned from the projection optical system to the image ... | 03/06/2012 |
| 8107051 | Exposure apparatus with improved alignment mark position measurement condition setting feature, and device manufacturing method using the same An exposure apparatus exposes each of a plurality of regions arranged on a substrate. The apparatus includes a processor configured to i) cause a measurement device to acquire an image signal of an alignment mark formed in each of plural regions which are at least a... | 01/31/2012 |
| 8102503 | Exposure apparatus and method of manufacturing device The present invention provides an exposure apparatus comprising a projection optical system including an optical element of which at least one of a position, orientation, and shape can be regulated, a regulator configured to regulate the at least one of the position... | 01/24/2012 |
| 8013976 | Exposure apparatus, exposure method, and device fabrication method The present invention provides an exposure apparatus which exposes a substrate via a liquid, comprising a measurement substrate including a transmission part configured to transmit a light beam having passed through a projection optical system, a light-receiving uni... | 09/06/2011 |
| 7982851 | Method for measuring flare amount, mask for measuring flare amount, and method for manufacturing device An amount is flare is measured by a method including steps of applying a photosensitive material to a substrate; exposing a part of the photosensitive material using a mask including a transmitting section which has no pattern so that the part of the photosensitive ... | 07/19/2011 |
| 7952683 | Exposure apparatus and device manufacturing method An exposure apparatus includes a projection optical system, an original stage having a first reference mark, a substrate stage, and a measurement instrument configured to measure first image properties of a mark formed on the original with the projection optical sys... | 05/31/2011 |
| 7924402 | Exposure apparatus and device manufacturing method An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate via a projection optical system and a liquid. The exposure apparatus includes a liquid supply device which supplies liquid onto the substrate from above the substrate through ... | 04/12/2011 |
| 7884918 | Exposure apparatus and method of manufacturing device An exposure apparatus includes a first measurement device, a second measurement device, and a controller. The first measurement device measures the position of a substrate stage in the optical axis direction when the substrate stage is scanned in the first direction... | 02/08/2011 |
| 7855776 | Methods of compensating lens heating, lithographic projection system and photo mask Embodiments relate to compensating for lens heating, lithographic projection system and photo mask. Accordingly, lens heating is compensated by providing a layout pattern including a regular pattern being arranged substantially symmetrical in a first region and a su... | 12/21/2010 |
| 7852458 | Exposure apparatus An exposure apparatus includes a projection optical system for projecting light from a reticle onto a substrate, and exposes a shot region of the substrate to radiant energy via the reticle and the projection optical system. The exposure apparatus comprises a substr... | 12/14/2010 |
| 7843549 | Light attenuating filter for correcting field dependent ellipticity and uniformity Ellipticity in an illumination beam may be corrected by measuring an ellipticity of the illumination beam and substantially eliminating the ellipticity using a light attenuating filter at a defocus position of the illumination beam, wherein the light attenuating fil... | 11/30/2010 |
| 7782441 | Alignment method and apparatus of mask pattern An alignment method of mask patterns includes forming a first layer by transferring a first mask pattern onto a wafer, forming a second layer by transferring a second mask pattern onto the first layer, and particularly a first alignment step, forming the first layer... | 08/24/2010 |
| 7768624 | Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques The present invention is directed towards a method for determining deformation parameters that a patterned device would undergo to minimize dimensional variations between a recorded pattern thereon and a reference pattern, the method including, inter alia, comparing... | 08/03/2010 |
| 7760326 | Exposure apparatus and aberration correction method An exposure apparatus for exposing a wafer to light through a pattern of a mask. The apparatus includes a projection optical system configured to project the pattern onto the wafer, a first barometer configured to measure pressure of an atmosphere in the apparatus, ... | 07/20/2010 |
| 7710539 | Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device The invention provides a method for correcting thermally-induced field deformations of a lithographically exposed substrate. First, a model is provided to predict thermally-induced field deformation information of a plurality of fields of the substrate. The pre-spec... | 05/04/2010 |
| 7710538 | Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate The invention provides a method for correcting thermally-induced field deformations of a lithographically exposed substrate. First, a model is provided to predict thermally-induced field deformation information of a plurality of fields of the substrate. The pre-spec... | 05/04/2010 |
| 7643125 | Exposure apparatus and device manufacturing method An exposure apparatus includes a first driving mechanism which drives a first optical element, a second driving mechanism which drives a second optical element, and a control unit which controls the first driving mechanism and the second driving mechanism so as to a... | 01/05/2010 |
| 7626680 | Exposure apparatus and device fabrication method using the same An exposure apparatus includes an original-form stage for holding an original form, a projection optical system for introducing light from the original form into an object to be exposed, and a detection optical system for detecting positions at plural points on the ... | 12/01/2009 |
| 7605905 | Method for distortion correction in a microlithographic projection exposure apparatus For the correction of anamorphism in the case of a projection lens of an EUV projection exposure apparatus for wafers it is proposed to tilt the reticle bearing the pattern to be projected and preferably also the wafer by a small angle about an axis that is perpendi... | 10/20/2009 |
| 7593091 | Imaging or exposure device, in particular for making an electronic microcircuit The imaging or exposure device comprises a radiation source (1), a reticle (3) mounted between the radiation source and an optical projection system (4) for shaping the radiation downstream from the reticle (3), the optical projection sys... | 09/22/2009 |
| 7583356 | Exposure apparatus and device manufacturing method An exposure apparatus includes a stage configured to hold a substrate; a projection optical system configured to project light from an original onto the substrate; a measurement device configured to measure a position of a surface of the substrate in an optical axis... | 09/01/2009 |
| 7538853 | Exposure process and apparatus using glass photomasks An exposure process using photomasks, the process includes the steps of: providing a plurality of glass photomasks for optical lithography with respect to a target substrate to be processed, the photomasks having identical exposure patterns, and exposing the target ... | 05/26/2009 |
| 7535549 | System and method for improvement of alignment and overlay for microlithography The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment. ... | 05/19/2009 |
| 7532305 | Lithographic apparatus and device manufacturing method using overlay measurement A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes a reference set of gratings provided in the substrate, the reference set including two reference gratings having line elements in a first direction and one ref... | 05/12/2009 |
| 7522260 | Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components A method for correcting a field-constant astigmatism of a projection objective of a microlithography projection exposure apparatus, the projection objective having an arrangement composed of a plurality of optical elements that images at least a part of an object on... | 04/21/2009 |
| 7495742 | Measuring method and apparatus, exposure method and apparatus using the same, and device manufacturing method A method for measuring an optical performance of a projection optical system in an exposure apparatus that exposes a pattern on a reticle onto a substrate includes the steps of determining an pupil area in the projection optical system, scanning a test reticle or a ... | 02/24/2009 |
| 7463333 | Multi-exposure lithography system providing increased overlay accuracy Multi-exposure lithography systems are provided for improved overlay accuracy. In one aspect, a method for multi-exposure lithography operates by determining overlay parameters corresponding to each of a plurality of sub-layouts, inputting the overlay parameters int... | 12/09/2008 |
| 7446852 | Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program project A projection exposure mask acceptance decision system includes assurance object measuring unit to measure quality assurance objects relating to projection exposure mask, first exposure characteristic deterioration quantity calculating unit to calculate first exposur... | 11/04/2008 |
| 7443484 | Method for exposing a semiconductor wafer by applying periodic movement to a component A method of focus variation is described herein to achieve a one-step exposure of a wafer without the limitation of applying a complex y-tilt to a wafer stage. The position of the wafer surface to be exposed is periodically varied with respect to the focal plane, or... | 10/28/2008 |
| 7442474 | Reticle for determining rotational error A method for determining rotational error portion of total misalignment error in a stepper. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of receiving a wafer, having a first pattern and an error-free fine alignment t... | 10/28/2008 |
| 7440083 | Printing a mask with maximum possible process window through adjustment of the source distribution A lithographic mask is illuminated with light from different directions such that intensities of a plurality of incident beams of light provide a largest possible integrated process window defined in terms of an allowed range for defining shapes. Constrained sets of... | 10/21/2008 |
| 7440079 | Lithographic apparatus, alignment system, and device manufacturing method A lithographic apparatus according to one embodiment includes an alignment system for aligning a substrate. The alignment system comprises an illuminator system configured to illuminate an alignment mark on the substrate with an illumination spot, the alignment mark... | 10/21/2008 |
| 7440080 | Method and apparatus for automatic correction of direct exposure apparatus An automatic correction method for a direct exposure apparatus illuminates two exposure elements, which are included in adjacent exposure heads separately and which are to expose an identical line on an exposure target, among exposure elements arranged in a two-dime... | 10/21/2008 |
