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| Number | Title | Issue Date |
| 7384322 | Apparatus and method for manufacturing liquid crystal display devices An apparatus for manufacturing a liquid crystal display device includes a unitary vacuum processing chamber, upper and lower stages confronting each other at upper and lower spaces inside the vacuum processing chamber to bond a first and second substrates, and a fir... | 06/10/2008 |
| 7372564 | Light source A light source for an atomizing device, specifically an atom absorption spectrometer comprising one, two, or more lamps, whose ray can be selected by means of at least one two-dimensionally moveable optical selection element, and which can be directed in the directi... | 05/13/2008 |
| 7372482 | System and method of capturing and providing supplemental data associated with a digital image A method and system of capturing an image comprises extracting image characterization information from an image file, extracting digital image data from the image file, printing a visually perceptible image described by the digital image data on one side of a medium... | 05/13/2008 |
| 7370313 | Method for optimizing a photolithographic mask The invention relates to a method for optimizing a mask layout pattern comprising at least one structural feature. First a desired layout pattern is provided. Based on the desired layout pattern, an optimized reference diffraction coefficient is provided. After sele... | 05/06/2008 |
| 7355187 | Position detection apparatus, position detection method, exposure apparatus, device manufacturing method, and substrate An apparatus which exposes a substrate to radiant energy includes a unit which holds a first mask having a pattern which includes a pattern of a target mark, a unit which projects a pattern of radiant energy to the substrate through the first mask, a unit which hold... | 04/08/2008 |
| 7355679 | Lithography arrangement and procedure that produces a lithography A lithography arrangement and lithographic method is described which permits exposure of a substrate with radiation simultaneously with good intensity and contrast. A means for generating electromagnetic radiation and for directing the electromagnetic radiation onto... | 04/08/2008 |
| 7317675 | Method of manufacturing optical head An integrated unit in which a light source and a light emitting diode are combined into one component is fixed to an optical bench. Then, relative position adjustment of an objective lens actuator is carried out with respect to the optical bench so that a desired de... | 01/08/2008 |
| 7309869 | Lithographic apparatus, device manufacturing method and radiation system A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; ... | 12/18/2007 |
| 7304737 | Rotating or rotatable compensator system providing aberation corrected electromagnetic raadiation to a spot on a sample at multiple angles of a incidence Spectroscopic ellipsometer systems which include polarizer and analyzer elements which remain fixed in position during data acquisition while at least one continuously rotating or step-wise rotatable compensator imposes a continuously variable or plurality of sequen... | 12/04/2007 |
| 7304792 | System for sequentially providing aberation corrected electromagnetic radiation to a spot on a sample at multiple angles of incidence A system for sequentially providing electromagnetic radiation to a spot on a sample at different angles of incidence, and after reflection therefrom into a detector. The system includes a plurality of spherical mirrors, and a refractive element for correcting aberra... | 12/04/2007 |
| 7289212 | Lithographic apparatus, device manufacturing method and device manufacturing thereby The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be... | 10/30/2007 |
| 7285435 | Active matrix organic electroluminescence display device and method for manufacturing the same An active matrix organic electroluminescence display device and a method for manufacturing the same are disclosed. The active matrix organic electroluminescence display device includes a scan line in one direction, a data line substantially perpendicular to the scan... | 10/23/2007 |
| 7283575 | Narrow band electric discharge gas laser having improved beam direction stability An electric discharge, narrow band gas laser with improvements in wavelength stability. Improvements result from reduced laser beam directional fluctuations or fast correction of those fluctuations. Applicant has discovered, using an extremely sensitive knife edge o... | 10/16/2007 |
| 7280129 | Pixel position specifying method, method of correcting image offset, and image forming device A pixel position specifying method in an image forming device, the method measuring positions of exposure beams of the respective exposure heads and specifying pixel positions of junctures of the exposure heads, the method includes: using a beam position detecting m... | 10/09/2007 |
| 7262852 | Wafer-level testing of optical and optoelectronic chips This application describes, among others, wafer designs, testing systems and techniques for wafer-level optical testing by coupling probe light from top of the wafer. ... | 08/28/2007 |
| 7245352 | Alignment using latent images Systems and techniques for alignment with latent images. In one implementation, a method includes detecting a location of a latent image on a substrate, repositioning the substrate based on the detected location of the latent image, and patterning the substrate.... | 07/17/2007 |
| 7239446 | Optical reduction system with control of illumination polarization An optical reduction system with polarization dose sensitive output for use in the photolithographic manufacture of semiconductor devices having variable compensation for reticle retardation before the long conjugate end. The variable compensation component(s) befor... | 07/03/2007 |
| 7224450 | Method and apparatus for position-dependent optical metrology calibration A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent qu... | 05/29/2007 |
| 7224430 | Optical component, optical system including such an optical component, lithographic apparatus, method of correcting apodization in an optical system, device manufacturing method, and device manufactured thereby A method of correcting apodization in an optical system includes determining effects of apodization on an intensity distribution of a beam of radiation in a predetermined plane of the optical system; determining a more desirable intensity distribution of the beam of... | 05/29/2007 |
| 7219843 | Optical reader having a plurality of imaging modules The invention is an optical reader having a plurality of image sensors. Each image sensor of a plural image sensor optical reader can be disposed on an imaging module that can include a light source. In one embodiment, a frame of image data captured via actuation of... | 05/22/2007 |
| 7215419 | Method and apparatus for position-dependent optical metrology calibration A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent qu... | 05/08/2007 |
| 7209411 | Method of manufacturing optical head An integrated unit in which a light source and a light emitting diode are combined into one component is fixed to an optical bench. Then, relative position adjustment of an objective lens actuator is carried out with respect to the optical bench so that a desired de... | 04/24/2007 |
| 7203217 | Narrow band electric discharge gas laser having improved beam direction stability An electric discharge, narrow band gas laser with improvements in wavelength stability. Improvements result from reduced laser beam directional fluctuations or fast correction of those fluctuations. Applicant has discovered, using an extremely sensitive knife edge o... | 04/10/2007 |
| 7181057 | Overlay marks, methods of overlay mark design and methods of overlay measurements An overlay mark for determining the relative position between two or more successive layers of a substrate or between two or more separately generated patterns on a single layer of a substrate is disclosed. The overlay mark includes a plurality of working zones, whi... | 02/20/2007 |
| 7177457 | Overlay marks, methods of overlay mark design and methods of overlay measurements An overlay mark for determining the relative shift between two or more successive layers of a substrate via scanning is disclosed. The overlay mark includes at least one test pattern for determining the relative shift between a first and a second layer of the substr... | 02/13/2007 |
| 7177099 | Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus A 1× projection optical system for deep ultra-violet (DUV) photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a relatively large field at high numerical apertures at DUV wavelengths. The optical system includes a lens gr... | 02/13/2007 |
| 7173417 | Eddy current sensor with concentric confocal distance sensor A metrology instrument includes an eddy current sensor that is mounted to and concentric with a confocal distance sensor. By measuring the precise vertical placement of the eddy current probe with respect to the surface of the sample using the confocal distance sens... | 02/06/2007 |
| 7171035 | Alignment mark for e-beam inspection of a semiconductor wafer An alignment mark to be used in conjunction with e-beam imaging to identify specific feature locations on a chip including a unique “L” shaped pattern of geometric features, which is easily detected by the recognition system of e-beam imaging equipment, and is l... | 01/30/2007 |
| 7158738 | Image reader apparatus and cylinder shaped lamp used for the same An image reader apparatus for lighting a manuscript surface of a manuscript in a line state, and for image-forming a reflection light from a reading part of the manuscript surface lighted in the line state, to an image sensor, by an image forming lens which forms a ... | 01/02/2007 |
| 7158215 | Large field of view protection optical system with aberration correctability for flat panel displays An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted adapted to image the reticle onto the substrate. The re... | 01/02/2007 |
| 7148948 | Scanning exposure apparatus, and device manufacturing method A scanning exposure apparatus includes an illumination optical system for illuminating a pattern of an original through an opening being conjugate or approximately conjugate with the pattern of the original, and a changing mechanism for changing a width of the openi... | 12/12/2006 |
| 7148973 | Position detecting method and apparatus, exposure apparatus and device manufacturing method A method of determining relative position between a reflective reticle and a substrate includes a detection step of detecting relative position between a transmissive reference mark on a reticle stage and a substrate alignment mark on a substrate stage through a ref... | 12/12/2006 |
| 7148953 | Apochromatic unit-magnification projection optical system A projection optical system suitable for projection photolithography is disclosed. The projection optical system is a modified Wynne-Dyson system capable of imaging a large field over both a narrow and a broad spectral range. The projection optical system includes a... | 12/12/2006 |
| 7137801 | Three-dimensional stereolithographic apparatus A stereolithographic method which comprises irradiating the surface of a photohardenable resin composition with light through an image drawing mask capable of changing its mask image with the image drawing mask being moved in parallel to the surface of the photohard... | 11/21/2006 |
| 7136149 | Lithographic apparatus with autofocus system A lithographic apparatus having a projection system that includes a plurality of mirrors arranged to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an autofocus system having a light source, a... | 11/14/2006 |
| 7130024 | Exposure apparatus An exposure apparatus includes an illumination optical system for illuminating an reticle using light from a light source, a projection optical system for projecting a pattern of the reticle onto a substrate, and a variable stop having an opening for regulating an i... | 10/31/2006 |
| 7119882 | Apparatus and method for projection exposure An apparatus for projection exposure which projects a pattern of a mask onto a work is provided. The apparatus has a base, a source of light, an optical system, a mask support mechanism, a work support mechanism and an alignment mechanism. The optical system constit... | 10/10/2006 |
| 7110020 | Film digitizer A method for producing electronic signals representative of images on a source film includes the following steps: illuminating the film with a light source to obtain an illuminated frame; providing an electronic image sensor; providing a lens array for projecting th... | 09/19/2006 |
| 7110103 | Apparatus for and method of aligning a structure An apparatus for determining the orientation and/or position of a structure comprises a light source (28) for generating a light beam. A structure (31) is mounted in the optical path of the light beam such that the position and/or orientation of the st... | 09/19/2006 |
| 7103210 | Position detection apparatus and exposure apparatus A position detection apparatus for detecting a position of a mark on an object includes a camera which captures an image of the mark, an extraction section which extracts a plurality of edge positions of the mark based on a signal derived from the image of the mark,... | 09/05/2006 |
