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Class 34/92 - Vacuum


Subclass of Class 34 - Drying and gas or vapor contact with solids
Definition: Apparatus for treating material under less than atmospheric
No. of patents: 508
Last issue date: 03/13/2012


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NumberTitleIssue Date
8132336Device and method for drying synthetic resin pellet
Resin molding work is efficiently carried out in accordance with a consumption amount of resin pellets of a resin molding machine by sequentially supplying small amounts of dried resin pellets in short period of time. When changeover of a molded product is carried o...
03/13/2012
7594342Spherical desiccator
A spherical vacuum desiccator consists of two substantially identical shells which are connected together at an engagement region. A receiving segment and connecting segment are positioned in a spaced-apart relationship within the engaging region of each hemispheric...
09/29/2009
7437832Reduced pressure drying apparatus
A reduced pressure drying apparatus includes a chamber that closes in an airtight manner during a reduced pressure drying operation, a stage on which a substrate is mounted; and an exhaust unit having an exhaust tube that opens at exhaust openings within the chamber...
10/21/2008
7421801Method and apparatus freeze-drying chamber loading and unloading devices using charging plates, conveyors, sliders
A freeze-drying apparatus has a chamber (3) in which are located superposed charging plates (4) as well as loading and unloading equipment. The chamber has a loading aperture (2) equipped with closing doors (11, 12) through which the char...
09/09/2008
7415780Method and apparatus for removing liquid from substrate surfaces using suction
A cost effective and environmentally sound method for quickly removing liquid from surfaces of a substrate under manufacture without leaving behind substantial residue (e.g., silicon elements from the substrate, commonly known in the field as “water marks”). The...
08/26/2008
7387689Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces
Methods for processing substrate through a head that is configured to be placed in close non-contact proximity to a surface of a substrate are provided. One method includes applying a first fluid onto the surface of the substrate from conduits in the head when the h...
06/17/2008
7370436Dual apparatus and process for quick freezing and/or freeze drying produce
An apparatus capable of performing consecutively, independently and/or simultaneously the processes of quick freezing and/or freeze drying of produce. The apparatus is characterized by a central vacuum system operating over one or more independent vacuum chambers (
05/13/2008
7370957Ink jet recording apparatus
An ink jet recording apparatus which includes a recording head, and forms an image by ejecting printing liquid including a volatile organic compound (VOC) from the recording head onto a recording medium, wherein the ink jet recording apparatus includes a volatile or...
05/13/2008
7367139Vacuum processing apparatus and method operation thereof
This vacuum processing apparatus has a fixed processing chamber 24 and two movable load lock chambers 28a and 28b. A gate valve 26 is provided on the processing chamber 24, and gate valves 30 are respectively p...
05/06/2008
7364028Glass substrate transporting facility
Glass substrates are transported to a plurality of processing devices to be processed. Certain of the processing devices have associated storage shelf for storing glass substrates and a transfer device. The transfer device is adapted to move the glass substrate betw...
04/29/2008
7350560Heat exchangers
The invention concerns a heat exchanger with a large number of U-shaped tubes (3), preferably brought together to form at least one tubular bundle and arranged in a housing 2, and several partitions (4) subdividing the housing (2) into se...
04/01/2008
7350315Edge wheel dry manifold
A apparatus for drying a substrate includes a vacuum manifold positioned adjacent to an edge wheel. The edge wheel includes an edge wheel groove for receiving a peripheral edge of a substrate, and the edge wheel is capable of rotating the substrate at a desired set ...
04/01/2008
7347006Processing apparatus and method for removing particles therefrom
A processing apparatus includes a first detection unit for detecting a temperature of an inner wall of the vacuum vessel, a second detection unit for detecting a temperature of the processing unit, and a first control unit for controlling a temperature of the gas. T...
03/25/2008
7347007Low pressure high capacity dryer for resins and other granular and powdery materials
A vacuum dryer and method for drying granular or powdery material including at least one canister for holding said material being movable among a series of locations including material heating and vacuum drying locations, means for moving said canister among said lo...
03/25/2008
7347004Freeze drying apparatus and method
A lyophilization apparatus includes a chamber and plural drying shelves arranged in vertically spaced apart relation. Each shelf has an inlet, outlet, and flow passageway therebetween. Plural sets of shelves are independently coupled to separate sources of circulati...
03/25/2008
7343695Vacuum drying apparatus and vacuum drying method
A vacuum drying apparatus and a vacuum drying method are provided wherein it is possible to reduce the drying time of an object to be dried and the surface condition of the object to be dried after drying is extremely satisfactory. A vacuum pump is connected to an e...
03/18/2008
7343696Device for loading and unloading containers
A device (1) for loading and unloading containers (2) into and out of an enclosure of an installation (3) for treating substances contained in containers (2). The device includes a support structure (17) and a third means (16, 1...
03/18/2008
7334346Device and method for controlling dehydration during freeze-drying
A device for controlling dehydration during freeze-drying in an enclosure connected to a vacuum line includes an analyzer for analyzing the gases contained in the enclosure, the gas analyzer comprising a system for ionizing the gases comprising a plasma source in co...
02/26/2008
7321073Process for treating low solids content hazardous materials
A high temperature and high pressure process utilizes dehaloganation, oxidation, or similar reactions to chemically alter hazardous organic chemicals to render them non-hazardous. The method is particularly adaptable to the treatment of sediments in bodies of water ...
01/22/2008
7313262Apparatus for visualization of process chamber conditions
An apparatus and method for visualization of process conditions in a process chamber or chambers, particularly during the fabrication of integrated circuits on substrates in the process chambers. The apparatus includes an inspection chamber which is installed adjace...
12/25/2007
RE39824Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chamber are dry-cleaned, dummy substrates are transferred i...
09/11/2007
7256862Repairing method for a liquid crystal display panel
A repairing method of a liquid crystal display panel having a gravity defect includes steps of removing the sealant outside the liquid crystal injection hole and providing a first pressure to the liquid crystal display panel. Next, a second pressure is continuously ...
08/14/2007
RE39756Vacuum processing operating method with wafers, substrates and/or semiconductors
This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred ...
08/07/2007
7243442Apparatus for drying ground
A method for drying a surface comprises supporting a fabric cover above the surface, and holding side edges of the fabric cover against the surface such that an air channel is formed between the fabric cover and the surface. The air channel has an inlet end and a di...
07/17/2007
7235137Conductor treating single-wafer type treating device and method for semi-conductor treating
A single-substrate processing apparatus (20) has a worktable (40) disposed in a process chamber (24), which accommodates a target substrate (W). The worktable (40) has a thermally conductive mount surface (41) to place the target s...
06/26/2007
7234247Low pressure dryer
A low pressure dryer for granular or powdery material includes a plurality of canisters rotatable about a common vertical axis serially among material heating, vacuum drying and material inventory discharge positions; pneumatic piston-cylinder means for rotating the...
06/26/2007
7229645Spray freeze-dried compositions
A process for producing a powder comprises spray freeze-drying an aqueous solution or suspension comprising a pharmaceutical agent, said solution or suspension having a solids content of 20% by weight or more. The spray freeze-dried powder may be administered to a s...
06/12/2007
7210246Methods and systems for handling a workpiece in vacuum-based material handling system
Methods and systems are provided for handling an item in a vacuum-based handling system for semiconductor manufacturing. The methods include providing a heater or dryer for the load lock of the handling system that dries a semiconductor wafer during the pumping down...
05/01/2007
7192494Method and apparatus for annealing copper films
A method and apparatus for annealing copper. The method comprises forming a copper layer by electroplating on a substrate in an integrated processing system and annealing the copper layer in a chamber inside the integrated processing system. ...
03/20/2007
7182334Air diffusing vacuum transport belt
An air diffusing vacuum transport belt including a first perforated layer and a second non-perforated layer is provided for transporting image carrying substrates without vacuum belt induced image defects. The first perforated layer includes a top surface and a bott...
02/27/2007
7179334System and method for performing semiconductor processing on substrate being processed
A semiconductor process system (10) includes a measuring section (40), an information processing section (51), and a control section (52). The measuring section (40) measures a characteristic of a test target film formed on a targe...
02/20/2007
7159407Atomized liquid jet refrigeration system
A system for controlling temperature includes an atomizer that forms micron-sized hydrogen-bonded refrigerant droplets within a chamber. A vacuum pump is coupled to the chamber to lower its interior pressure. Under these conditions, the refrigerant droplets evaporat...
01/09/2007
7156027Method for producing soil, soil-processing unit, method for processing and unit for processing
An object to be treated such as soil, burned fly ashes, or the like containing organic halides is introduced to a hermetically sealable thermal decomposition furnace 310 and heated under reduced pressure. Emitted gases of the object to be treated are treated ...
01/02/2007
7145653In situ particle monitoring for defect reduction
A system and method is provided for monitoring and controlling the contaminant particle count contained in an aerosol during a photoresist coating and/or development process of a semiconductor. The monitoring system monitors the contaminate particle count present in...
12/05/2006
7140122Vacuum treatment of waste stream with anti-incrustation measures
A method of treating a waste stream comprises a vacuum treatment to promote disintegration of the waste material by “flash vapor” production, causing a swiftly vaporizing fraction inside the material to literally explode or shred apart the matrix of the material...
11/28/2006
7125912Doped sol-gel materials and method of manufacture utilizing reduced mixing temperatures
A method of preparing a solution for forming a doped gel monolith includes providing a first substance including a metal alkoxide. The method further includes providing a second substance including a catalyst. The method further includes providing a chemical includi...
10/24/2006
7093375Apparatus and method for utilizing a meniscus in substrate processing
An apparatus for processing a substrate is provided which includes a proximity head proximate to a surface of the substrate when in operation. The apparatus also includes an opening on a surface of the proximity head to a cavity defined in the proximity head where t...
08/22/2006
7089681Method and apparatus for filtering and drying a product
The present invention relates to a method and apparatus for filtering and drying a product. In a preferred embodiment, the apparatus comprises a container having a plurality of porous walls and a plurality of solid walls that divide the container into a plurality of...
08/15/2006
7089680Vacuum processing apparatus and operating method therefor
A vacuum processing apparatus which includes a means for transferring substrates from a loader, with a transferring device, to a double lock chamber; and, then to a selected vacuum processing chamber. The substrates are returned to a substrate, by the vacuum loader,...
08/15/2006
7086175Method of manufacturing liquid crystal panel and gap adjusting apparatus therefor
In a method of manufacturing a liquid crystal panel including a panel assembly, a nozzle mechanism is located at a vicinity of a liquid crystal filling port of the panel assembly with leaving a space between an intake of the nozzle mechanism and the liquid crystal f...
08/08/2006
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