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| Number | Title | Issue Date |
| 8056253 | Systems and methods for drying a rotating substrate A system of drying a surface of a substrate is provided. The system includes a rotary support for supporting a substrate; and an assembly comprising a first dispenser, a second dispenser, and a third dispenser, the assembly positioned above the surface of the substr... | 11/15/2011 |
| 7992318 | Heating apparatus, heating method, and computer readable storage medium A disclosed heating apparatus for heating a substrate on which a film is coated includes a process chamber having a gas supply opening for supplying a first gas to the process chamber and a gas evacuation opening for evacuating the first gas from the process chamber... | 08/09/2011 |
| 7877895 | Substrate processing apparatus A substrate processing method is arranged to perform a heat process on a substrate with a coating film formed thereon to bake and cure the coating film. At first, the substrate, with the coating film formed thereon, is held at a preparatory temperature lower than a ... | 02/01/2011 |
| 7797855 | Heating apparatus, and coating and developing apparatus A heating apparatus 2 comprises a housing 20; a flat heating chamber 4 which is provided in the housing 2 and adapted to heat a wafer W used as a substrate, with one side of the heating chamber 4 opening for carrying in and carryin... | 09/21/2010 |
| 7644511 | Heating and blowing apparatus A heating and blowing apparatus includes a main body housing having an inlet port and a discharge port. An air flow path extends from the inlet pod to the discharge port. A rotatingly driven fan and a heating unit are arranged on the air flow path. A bypass flow pat... | 01/12/2010 |
| 7637029 | Vapor drying method, apparatus and recording medium for use in the method A vapor drying apparatus comprises a processing chamber 1a adapted to contain semiconductor wafers W; a supply nozzle 2 adapted to supply IPA vapor or N2 gas into the processing chamber 1a; a two-fluid nozzle 3 connected to ... | 12/29/2009 |
| 7493705 | Reduced-pressure drying apparatus A reduced-pressure drying apparatus for drying a solvent in a liquid under a reduced pressure by evaporation of the solvent, includes a chamber including a first chamber and a second chamber, the first chamber accommodating work to which a liquid containing a film f... | 02/24/2009 |
| 7437832 | Reduced pressure drying apparatus A reduced pressure drying apparatus includes a chamber that closes in an airtight manner during a reduced pressure drying operation, a stage on which a substrate is mounted; and an exhaust unit having an exhaust tube that opens at exhaust openings within the chamber... | 10/21/2008 |
| 7325333 | Heat pump device and drying machine There are disclosed a heat pump device and a drying machine using the device in which abnormal water supplying into a water-cooling heat exchanger for use in water-cooling of a heat pump can be easily detected without disposing any water amount gauge particularly. T... | 02/05/2008 |
| 7310224 | Electronic apparatus with thermal module An electronic apparatus includes a package, a circuit board, a thermal dissipating module and a thermal transmitting module. The package includes a substrate, a heat source and a plurality of electric terminals electrically connected to the circuit board. The heat s... | 12/18/2007 |
| 7299566 | Substrate-placing mechanism having substrate-heating function The present invention is a substrate-placing mechanism to be provided in a processing container of a substrate-processing apparatus including: a stage having: a base body on which a substrate is placed, a heat-generating body for heating the substrate placed on the ... | 11/27/2007 |
| 7278534 | Compact-grid conveyor belt A wire belt includes a plurality of interconnected links that form a belt having a small mesh size, large percent open-area, and high strength, without the use of transverse rods or complex weaving patterns. Each of the links includes a hinge portion and hanger port... | 10/09/2007 |
| 7272961 | Washing machine A washing machine including a casing provided with an opening for introducing laundry into the washing machine; a tub supportably installed in the casing; a drum rotatably located in the tub; driving means for rotating the drum; and a door installed at the casing fo... | 09/25/2007 |
| 7254900 | Wafer edge wheel with drying function An edge wheel for supporting and rotating a disk-shaped substrate includes a wheel body having a peripheral groove configured to support an edge of a substrate and at least one radial channel extending into said wheel body from said peripheral groove. An edge wheel ... | 08/14/2007 |
| 7252719 | High pressure processing method A high-pressure processing apparatus includes a processing vessel including a processing chamber formed therein to perform a certain process onto an object in the processing chamber; fluid feeding means which feeds a high-pressure fluid into the processing chamber; ... | 08/07/2007 |
| 7244315 | Microelectronic device drying devices and techniques Improved methods of rinsing and drying microelectronic devices by way of an immersion processing apparatus are provided for effectively cleaning microelectronic devices. Methods and arrangements control the separation of one or more microelectronic devices from a li... | 07/17/2007 |
| 7210246 | Methods and systems for handling a workpiece in vacuum-based material handling system Methods and systems are provided for handling an item in a vacuum-based handling system for semiconductor manufacturing. The methods include providing a heater or dryer for the load lock of the handling system that dries a semiconductor wafer during the pumping down... | 05/01/2007 |
| 7194821 | Vacuum processing apparatus and vacuum processing method The downtime of a vacuum processing apparatus due to wet cleaning is reduced. In a vacuum processing apparatus that requires aging for its chamber or process container after vacuum evacuation of the apparatus and before actual processing of a workpiece, when the cha... | 03/27/2007 |
| 7187856 | Compact integrated forced air drying system A fully integrated drying or heating system for the printing, coating, or painting industries that utilizes forced air and electrical heaters. The method for heating the forced air incorporates a solid cartridge heater within a specially designed air distribution sy... | 03/06/2007 |
| 7186299 | Method of rinsing and drying semiconductor substrates A method for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to IPA vapor. In addition, a quick drain process is employed to improve p... | 03/06/2007 |
| 7181863 | Wafer dryer and method for drying a wafer A wafer dryer and method featuring a nebulizer which emits a pressurized drying liquid stream that converges with an opposed pressurized non-reactive carrier gas stream to produce a drying liquid fog. The pressurized non-reactive gas spray device is disposed partial... | 02/27/2007 |
| 7156927 | Transition flow treatment process and apparatus A method is provided for treating an object. In this method, a treating chemical is introduced to a bath under conditions effective to at least partially envelop the object to be treated in eddy currents of the bath liquid, followed by introducing non-treating liqui... | 01/02/2007 |
| 7143527 | System and method for modulating flow through multiple ports in a proximity head A method of forming a dynamic liquid meniscus includes forming a meniscus at a first size, the meniscus being formed between a proximity head and a first surface and changing the meniscus to a second size by modulating a flow through at least one of a set of ports o... | 12/05/2006 |
| 7127830 | Reticle carrier apparatus and method that tilts reticle for drying A method and apparatus for cleaning, rinsing and drying a reticle used in semiconductor device manufacturing, tilts the reticle during the drying process to prevent water from the rinsing process from collecting and remaining on the reticle. The rectangularly shaped... | 10/31/2006 |
| 7085616 | Atomic layer deposition apparatus A method and apparatus for atomic layer deposition (ALD) is described. The apparatus comprises a deposition chamber and a wafer support. The deposition chamber is divided into two or more deposition regions that are integrally connected one to another. The wafer sup... | 08/01/2006 |
| 7065898 | Module for transferring a substrate A module for transferring a substrate includes a load port for supporting a container to receive a plurality of substrates, a substrate transfer chamber disposed between the load port and a substrate process module, a substrate transfer robot disposed in the substra... | 06/27/2006 |
| 7062161 | Photoirradiation thermal processing apparatus and thermal processing susceptor employed therefor A susceptor is formed with a cavity having a tapered surface and a receiving surface. The gradient α of the tapered surface with respect to the receiving surface is set to at least 5° and less than 30°, so that a semiconductor wafer received by the susceptor can ... | 06/13/2006 |
| 7024799 | Method for treating products with air, a product treatment device and the products thus treated The invention relates to a method for treating products with air in order to enable the conservation, storage and use thereof. Said invention also relates to a device for treating such products and the products obtained using said treatment method. The products (P) ... | 04/11/2006 |
| 7007496 | Internal temperature difference preventing structure for refrigerator An internal temperature difference preventing structure for a refrigerator, including an evaporator installed in an upper portion of a refrigerating space inside a main body of the refrigerator, an air blast fan installed in front of the evaporator for blowing air t... | 03/07/2006 |
| 6964882 | Fabricating complex micro-electromechanical systems using a flip bonding technique A flip-bonding technique is used to fabricate complex micro-electromechanical systems. Various micromachined structures are fabricated on the front side of each of two wafers. One of the wafers is flipped over and bonded to the other wafer so that the front sides of... | 11/15/2005 |
| 6962003 | High-speed drying apparatus Disclosed is a high-speed drying apparatus for drying objects which are rinsed with non-volatile or volatile liquid. The drying apparatus is capable of quickly drying such objects at a reduced cost, not permitting their oxidation. First, the rinsing liquid remaining... | 11/08/2005 |
| 6940636 | Optical switching apparatus and method of assembling same In an optical switching apparatus having a mirror structure bonded to a substrate, the gap between the mirror structure and the substrate is controlled by mechanical standoffs placed between the mirror structure and the substrate. The mirror structure is bonded to t... | 09/06/2005 |
| 6932871 | Multi-station deposition apparatus and method A multi-station deposition apparatus capable of simultaneous processing multiple substrates using a plurality of stations, where a gas curtain separates the stations. The apparatus further comprises a multi-station platen that supports a plurality of wafers and rota... | 08/23/2005 |
| 6933163 | Fabricating integrated micro-electromechanical systems using an intermediate electrode layer An intermediate electrode layer is used to fabricate an integrated micro-electromechanical system. An intermediate electrode layer is formed on an integrated circuit wafer. The intermediate electrode layer places drive electrodes a predetermined height above the sur... | 08/23/2005 |
| 6928746 | Drying resist with a solvent bath and supercritical CO2 A method for drying an object, having a polymeric film, wherein the object is submerged in a rinse liquid. The object is removed from the rinse liquid and the object is placed in a solvent bath before a sufficient amount of the rinse liquid can evaporate from the ob... | 08/16/2005 |
| 6928748 | Method to improve post wafer etch cleaning process A method and apparatus for performing a semiconductor process wafer drying process, the method provides a semiconductor wafer having a process surface disposed in an enclosed drying space following exposure of the process surface to water; supplying a solvent vapor ... | 08/16/2005 |
| 6928750 | Membrane dryer A system, method, and apparatus for supplying a gas-liquid vapor to a process tank for performing semiconductor manufacturing. In one aspect, the invention is a method of supplying a gas-liquid vapor to a process tank comprising: supplying a gas stream through at le... | 08/16/2005 |
| 6918192 | Substrate drying system A substrate drying system for drying substrates after the substrates are washed typically using deionized water, is disclosed. The substrate drying system comprises a substrate cleaning tank in which the substrates are washed. A dry pump is provided in fluid communi... | 07/19/2005 |
| 6908512 | Temperature-controlled substrate holder for processing in fluids A substrate holder has a disk-like body with a central recess having diameter smaller than the diameter of the substrate placed onto the upper surface of the holder. The substrate can be clamped in place by the clamps of the edge-grip mechanism or placed into a seat... | 06/21/2005 |
| 6904702 | Method and apparatus for drying substrate The substrate drying apparatus has a substrate processing vessel 1, a substrate supporting section for supporting plural substrates 2 in a standing condition and lined up condition in the interior of the substrate processing vessel 1, fluid rese... | 06/14/2005 |
