Did You Know...
...that in 1800 ether was first used by partyers as a fun diversion? Sniffing the gas led to hilarious and raucous laughter as people watched each other become more and more intoxicated and silly. Several doctors independently realized the value ether would have to anesthetize surgery patients. Of those who claimed rights to the "discovery," none had a happy ending. One had a seizure and died defending his rights. Another spent his life in an asylum because he had been denied acclaim. A third became addicted to chloroform and, in a New York City jail, he soaked a cloth in the drug, severed an artery and bled to death.
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| Number | Title | Issue Date |
| 7765714 | Moist organic product drying system having a rotary waste heat evaporator A method and apparatus are provided for reducing the VOC and CO content of dryer offgas that is discharged into the atmosphere from a moist organic product drying process using thermal oxidizing apparatus that includes a furnace, mixing chamber, thermal oxidizer, te... | 08/03/2010 |
| 7654011 | Two-stage thermal oxidation of dryer offgas A method and apparatus are provided for reducing the VOC, CO, and, alternatively, the NOx content of dryer offgas that is discharged into the atmosphere from a moist organic product drying process using thermal oxidizing apparatus that includes a burner, furnace, mi... | 02/02/2010 |
| 7343699 | Method and apparatus for drying The method of removing moisture from a material contained within a dryer (3) comprises heating a first stream of gas (A3); passing the heated stream of gas through a dryer (3) to extract moisture from the material to be dried; returning a first ... | 03/18/2008 |
| 7337553 | Lint detector methods and apparatuses Methods and apparatuses of for detecting lint are disclosed. In one embodiment, a light is directed to a plate. The light can be being emitted by a light source. A reflectometer is calibrated to a specific thermal emissivity of the plate. The thermal emission result... | 03/04/2008 |
| 7255115 | Apparatus for cleaning semiconductor wafers An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the chamber, a gas supply nozzle for spraying gas into the chamber to dry th... | 08/14/2007 |
| 7228647 | Drying machine and drying machine with washing function and method of controlling the same Disclosed herein is a drying machine or a drying machine with washing function. The drying machine or the drying machine with washing function comprises a heater for heating air introduced into an inlet channel of a drum, an outlet channel for allowing air in the dr... | 06/12/2007 |
| 7210246 | Methods and systems for handling a workpiece in vacuum-based material handling system Methods and systems are provided for handling an item in a vacuum-based handling system for semiconductor manufacturing. The methods include providing a heater or dryer for the load lock of the handling system that dries a semiconductor wafer during the pumping down... | 05/01/2007 |
| 7191557 | Firearms, grips for firearms, and methods for using the same Firearms, grips for firearms and methods of using the same are disclosed. An example grip includes an exterior grip defining an inner bore; a slider located within the bore for axial movement relative to the exterior grip, the slider having a projection to selective... | 03/20/2007 |
| 7160358 | Pollution control in wood products dryer Contaminant laden gas streams from wood product dryer operations, and other sources, are purified. The gas stream first is saturated with moisture by contacting the gas stream with fine liquid droplets which entrain particulates. The gas stream then is subjected to ... | 01/09/2007 |
| 6904702 | Method and apparatus for drying substrate The substrate drying apparatus has a substrate processing vessel 1, a substrate supporting section for supporting plural substrates 2 in a standing condition and lined up condition in the interior of the substrate processing vessel 1, fluid rese... | 06/14/2005 |
| 6745494 | Method and apparatus for processing wafers under pressure A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlled draining ... | 06/08/2004 |
| 6742281 | Apparatus for drying semiconductor wafer using vapor dry method A semiconductor wafer drying apparatus is provided. In one embodiment, this apparatus includes a bath which can contain much deionized water so that semiconductor wafers soak in the deionized water; a chamber providing a space where vapor flows over the bath; a vapo... | 06/01/2004 |
| 6725565 | Method for vacuum drying of substrate A method for vacuum drying of a substrate which can eliminate not only the moisture adhered to the substrate surface but also the moisture impregnated inside of the films which form the devices in a shot time without deforming nor deteriorating the devices formed on... | 04/27/2004 |
| 6722056 | Drying vapor generation Drying semiconductor wafers or substrates by introducing an polar organic compound in liquid form into or onto means for enhancing evaporation within a process chamber and allowing the liquid to evaporate and form a drying vapor within the process chamber. ... | 04/20/2004 |
| 6681499 | Substrate drying method for use with a surface tension effect dryer with porous vessel walls A processor and method for rinsing and drying of semiconductor substrates includes a process vessel contained within an outer containment vessel. A diluted organic vapor creates a Marangoni effect flow along the surface of processing liquid contained with... | 01/27/2004 |
| 6649883 | Method of calibrating a semiconductor wafer drying apparatus A method for calibrating a semiconductor wafer drying apparatus including a heater and a vessel containing a solvent and capable of receiving semiconductor wafers comprises selecting a test heater temperature and a test processing time. A first set of waf... | 11/18/2003 |
| 6647641 | Device and method for the treatment of substrates in a fluid container A device for the treatment of substrates has a fluid container and two substrate transport devices positionable above the fluid container. Each substrate transport device is a hood for receiving multiple substrates. Each substrate transport device has at ... | 11/18/2003 |
| 6589359 | Cleaning method and cleaning apparatus for substrate A cleaning method is provided for cleaning a semiconductor wafer. In this method, after removing adhering substances from the wafer by using a chemical liquid of organic amine type, there is carried out a pure-water cleaning capable of prevention of elect... | 07/08/2003 |
| 6550158 | Substrate handling chamber An apparatus and method for reducing particles in reactors. The apparatus includes an enclosure with a wafer handling chamber connected by an isolation gate valve to a processing chamber. Pipes deliver purge gas into the wafer handling chamber to eliminat... | 04/22/2003 |
| 6543156 | Method and apparatus for high-pressure wafer processing and drying A system for high-pressure drying of semiconductor wafers includes the insertion of a wafer into an open vessel, the immersion of the wafer in a liquid, pressure-sealing of the vessel, pressurization of the vessel with an inert gas, and then the controlle... | 04/08/2003 |
| 6536135 | Carbon-enhanced fluoride ion cleaning A method and system for cleaning a metal article. The system is used to employ a method that comprises placing the article in a means defining a chamber; subjecting the article to a gaseous atmosphere in the means defining a chamber, where the gaseous atm... | 03/25/2003 |
| 6508014 | Method of drying substrates A method of removing water from the surface of a silicon wafer or other substrate subjected to wet processing which includes a step of water rinsing. In this method a silicon wafer whose surface includes liquid water is disposed in an atmosphere saturated... | 01/21/2003 |
| 6457259 | Portable apparatus for drying stator windings and related process A transportable skid for drying and testing generator stator windings includes a platform supporting a compressor adapted to supply compressed air to the stator winding; a dryer arranged to receive and dry compressed air from the compressor; a buffer tank... | 10/01/2002 |
| 6449873 | Apparatus and method for dry cleaning of substrates using clusters Disclosed is a dry cleaning apparatus and method using cluster for cleaning a surface of a specimen such as semiconductor wafer. The cleaning method first forms a neutral cluster no having polarity by passing a cleaning gas such as argon, nitrogen, or car... | 09/17/2002 |
| 6446355 | Disk drying apparatus and method Liquid is removed from disks by apparatus and methods for drying a disk that has been wet in a liquid bath. The disk and the bath are separated at a controlled rate to form a monolayer of liquid on the disk as the disk is positioned in a gas-filled volume... | 09/10/2002 |
| 6430840 | Method of and apparatus for drying a wafer using isopropyl alcohol A method of and an apparatus for drying a wafer using the Marangoni effect quickly forms an isopropyl alcohol layer on a cleaning liquid in which the wafer is submerged. The isopropyl alcohol is first heated and then supplied in a fluid state onto the cle... | 08/13/2002 |
| 6405452 | Method and apparatus for drying wafers after wet bench A method for drying wafers after a wet bench process is disclosed. In the method, a wafer is first immersed in a volume of DI water held in a container. A mixture of alcohol vapor/inert gas is then flown into the upper portion of the container that is not... | 06/18/2002 |
| 6401361 | Apparatus and method for drying wafers by a solvent An apparatus for drying semiconductor wafers in a solvent drying chamber and a method for drying are disclosed. The apparatus is equipped with an alarm/interlocking system such that when a flow of the solvent vapor into the drying chamber is stopped, the ... | 06/11/2002 |
| 6398875 | Process of drying semiconductor wafers using liquid or supercritical carbon dioxide A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer with a composition which includes liquid or supercritical car... | 06/04/2002 |
| 6357144 | Two stage process for drying of raw wood material Method for drying wood raw material (10) by means of hot gases (20) supplied to the drying process, in which VOC, apart from water, evaporate from the wood raw material into the gases. The drying process is divided and carried out in at least two sub-step... | 03/19/2002 |
| 6334266 | Supercritical fluid drying system and method of use A method and apparatus for fabricating and drying wafers, including micro-electro-mechanical system (MEMS) structures, in a second, supercritical processing fluid environment. The apparatus utilizes an inverted pressure vessel connected to a supercritical... | 01/01/2002 |
| 6249990 | Method and apparatus for transporting articles In one embodiment, a cart (5) having a first vessel (10) which fits within a second vessel (90) is used to transport and store an integrated circuit substrate. The integrated circuit substrate is placed within the first vessel (10) and the door (18) of th... | 06/26/2001 |
| 6223454 | Method of drying moist organic material A method for drying a moist organic material which is continuously supplied in a stream includes passing hot air through the moist organic material in a part of the stream to absorb an amount of moisture, whereby the moist organic material cools the hot a... | 05/01/2001 |
| 6192601 | Method and apparatus for reducing particle contamination during wafer transport The present invention provides method and apparatus for reducing particulate contamination during the processing of a substrate. In one embodiment, the step of preheating a substrate in a preheater to a desired temperature. The preheated substrate is tran... | 02/27/2001 |
| 6176023 | Device for transporting flat objects and process for transferring said objects between said device and a processing machine The present invention relates to a device and process for transporting flat objects confined in a specific atmosphere. The device comprises at least one assembly provided with several thin, flat cells (31) that open onto a lateral face (33) of said assemb... | 01/23/2001 |
| 6134807 | Drying processing method and apparatus using same A drying processing apparatus for supplying a dry gas to a processing chamber 35, which houses therein semiconductor wafers W, to dry the semiconductor wafers W, including a heater 32 for heating N2 gas serving as a carrier gas; a vapor generat... | 10/24/2000 |
| 6032384 | Method of drying moist organic material A method for drying a moist organic material which is continuously supplied in a stream includes passing hot air through the moist organic material in a part of the stream to absorb an amount of moisture, whereby the moist organic material cools the hot a... | 03/07/2000 |
| 5983521 | Process for splitting recycled combustion gases in a drying system A process for drying a wet material in a drying system includes supplying a current of heated gas to a dryer from a combustion chamber. The material is exposed to the current in the dryer. The dried material is separated from the current of heated gas. Th... | 11/16/1999 |
| 5966838 | Process and apparatus for drying material with indirectly heated driers and for decontaminating waste gas A process and apparatus for drying material, particularly sludges, with indirectly heated driers includes a system for the thermal decontamination of exhaust air from the drier. Excess exhaust air from the drier loop is fed as secondary air to the heating... | 10/19/1999 |
| 5826128 | Apparatus for processing photosensitive material A processing apparatus including a drying part provided with at least a drying fan and a drying heater to automatically develop a photosensitive material wherein the drying part further includes a means for detecting reduction in air amount of the drying ... | 10/20/1998 |
