Did You Know...
...that Robert Adler has the dubious distinction of being the Father of the Couch Potato? Back in 1955 Adler was employed by what was then Zenith Radio Corp., where he was charged to invent something that would allow viewers to turn down the TV volume without leaving their chairs. After a series of flops (such as a wired contraption that people tripped over), Adler hit on the idea of using sound waves. Thus the Remote Control was born...
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| Number | Title | Issue Date |
| 7291565 | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the substrate surface. The process chemistry comprises fl... | 11/06/2007 |
| 7268323 | Heat treating apparatus and heat treating method for sheet-like article To be provided are a heat treatment apparatus having blocking members which block gaps between the side walls of nozzle boxes provided with slit nozzles, whose size in the lengthwise direction is greater than the width of a sheet, and the side walls of a heat treatm... | 09/11/2007 |
| 7254902 | Sheet dryer A sheet dryer includes sprockets and a delivery chain, at least one heat-resistant glass plate, at least one lower-surface drying lamp, a guide plate, a plurality of first discharge holes, and a plurality of second discharge holes. The sprockets and delivery chain c... | 08/14/2007 |
| 7255772 | High pressure processing chamber for semiconductor substrate A high pressure chamber comprises a chamber housing, a platen, and a mechanical drive mechanism. The chamber housing comprises a first sealing surface. The platen comprises a region for holding the semiconductor substrate and a second sealing surface. The mechanical... | 08/14/2007 |
| 7250374 | System and method for processing a substrate using supercritical carbon dioxide processing A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feat... | 07/31/2007 |
| 7244465 | Method for manufacturing coated sheet, optical functional layer, optical element, and image display device A method for manufacturing a coated sheet that may form a coated layer having a uniform film thickness by a coating liquid even when a substrate has a large area. A method for manufacturing a coated sheet to form a coated layer by a process including a process (1) f... | 07/17/2007 |
| 7233494 | Cooling apparatus, cooled electronic module and methods of fabrication thereof employing an integrated manifold and a plurality of thermally conductive fins A cooling apparatus and method of fabrication are provided for facilitating removal of heat from a heat generating electronic device. The cooling apparatus includes a plurality of thermally conductive fins coupled to and projecting away from a surface to be cooled. ... | 06/19/2007 |
| 7225560 | Computer to plate curing system A system for curing printing plates with controlled radiant energy sources. A conveyor moves a printing plate through a chamber having energy radiators above and below the conveyor. Power to the radiators is controlled for each radiator or to groups of radiators def... | 06/05/2007 |
| 7181863 | Wafer dryer and method for drying a wafer A wafer dryer and method featuring a nebulizer which emits a pressurized drying liquid stream that converges with an opposed pressurized non-reactive carrier gas stream to produce a drying liquid fog. The pressurized non-reactive gas spray device is disposed partial... | 02/27/2007 |
| 7168274 | Combination washer/dryer having common heat source The combination washer/dryer and method for operating a combination washer/dryer. The washer/dryer has a containment drum which receives wash water, and includes a perforated clothes drum which rotates within the containment drum. A heat plenum is provided in heat t... | 01/30/2007 |
| 7140393 | Non-contact shuttle valve for flow diversion in high pressure systems A valve for redirecting flow in a supercritical fluid or other high pressure processing system is disclosed. In high pressure supercritical carbon dioxide (SCCO2) equipment for semiconductor wafer processing, a major hurtle in providing clean equipment and clean waf... | 11/28/2006 |
| 7125473 | Apparatus and method for conditioning a web on a papermaking machine An apparatus and method for conditioning a moving porous web on a papermaking machine is disclosed. The web has a first and a second surface and a high temperature gaseous boundary layer adjacent at least the second surface. The apparatus contains means for conveyin... | 10/24/2006 |
| 7074458 | Method of drying a web coated with a solution A coating device for coating a coating solution on a web has a roller and a weir which partially constructs a solution store space. In the solution store space the coating solution is stored. When the web sequentially moves in a direction, the roller rotates and the... | 07/11/2006 |
| 7067039 | Method and equipment in connection with a paper machine or a paper web finishing apparatus A variable representing runnability of a paper web to be manufactured with a paper machine or processed with a finishing apparatus is measured and the speed difference between operational groups of the paper machine and/or the finishing apparatus is adjusted on the ... | 06/27/2006 |
| 7060653 | Method of producing gas occluding material The gas storage method comprises a step of keeping a gas to be stored and an adsorbent in a vessel at a low temperature below the liquefaction temperature of the gas to be stored so that the gas to be stored is adsorbed onto the adsorbent in a liquefied state, a ste... | 06/13/2006 |
| 7044662 | Developing photoresist with supercritical fluid and developer An apparatus for developing a polymeric film without the need for a water rinse step is disclosed. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber of the apparatus. A fluid and developer is introduced ... | 05/16/2006 |
| 6998021 | Arrangement for paper machine, and blow box In a paper machine which comprises process elements and a measuring beam, the measuring beam is arranged at least at one paper machine process element so that a measuring device for measuring quality properties of a paper web is arrangeable in the measuring beam. Th... | 02/14/2006 |
| 6994533 | Extruder with condenser A method and apparatus for producing microporous films. The method utilizes a casting surface and a condensing surface. The condensing surface is spaced from the casting surface to form a gap. The distance between the surfaces forming the gap is relatively small and... | 02/07/2006 |
| 6978625 | System for forming aerosols and cooling device incorporated therein The present invention relates to a cooling device (30) of the reverse Carnot cycle-type using a refrigerant, and an areosol generation system including it. The cooling device (30) includes a refrigerator (310, 320) of the reverse Carnot cycle-ty... | 12/27/2005 |
| 6962007 | Method and device for drying substrate A device for drying substrates which stores a plurality of substrate (1) and which comprises a processing container (3) to which cleaning fluid (2) after cleaning the substrates (1) is drained and an injection nozzle (5) for inject... | 11/08/2005 |
| 6954994 | Moisture removal mechanism A moisture removal mechanism comprises a drying zone through which product to be dried passes. A fluid circulation path is in fluid communication with the drying zone. A forced fluid feed device directs drying fluid to and from the drying zone, the fluid feed device... | 10/18/2005 |
| 6912356 | Method and apparatus for fracturing brittle materials by thermal stressing A method of fracturing or breaking rock includes the step of directing high intensity white light (radiation) at the rock to induce thermal stress sufficient to fracture the rock. The intensity of the energy source may be varied to control the manner in which the ro... | 06/28/2005 |
| 6869506 | Apparatus for dewatering a paper web and associated system and method An apparatus for decreasing heat emission and enhancing a vacuum system in a papermaking machine is provided. Such an apparatus includes a drying device having an inlet for receiving heated air for removing moisture from a paper web and an outlet for exhausting the ... | 03/22/2005 |
| 6783602 | Multistep single chamber parts processing method The present invention is directed to a method for controlled environment processing of parts in a chamber or chambers wherein solvents and/or solutions used for processing the parts can be introduced. The process includes applying a negative gauge pressure to the ch... | 08/31/2004 |
| 6775925 | Water spray web cooling apparatus for web dryer Apparatus and a method for the evaporative cooling of a web within a dryer in a compact manner. Excess fluid overspray is controlled, thereby avoiding problems with fluid depositing on internal surfaces of the dryer, which can cause mineral build-up and can result i... | 08/17/2004 |
| 6742280 | Method in drying of paper A method in consolidation and drying of paper. A wet web is contacted with superheated steam, whose temperature is 200-600° C. for the purpose of reducing, by heat transfer from the superheated stream, the water content of the web by evaporation of a substantial pa... | 06/01/2004 |
| 6715217 | Microfilm jacket drying device and method A microfilm drying device and method are presented for salvaging and drying microfilm which has become wet due to excessive moisture resulting from high water, floods and the like. The device includes a needle assembly which is slidably affixed within a frame to dir... | 04/06/2004 |
| 6615510 | Wafer drying apparatus and method Liquid is removed from wafers for drying a wafer that has been wet in a liquid bath. The wafer and the bath are separated at a controlled rate as the wafer is positioned in a gas-filled volume. The controlled rate is generally not less than the maximum ra... | 09/09/2003 |
| 6606802 | Cleaning efficiency improvement in a high density plasma process chamber using thermally hot gas Method and apparatus are disclosed for improving the cleaning efficiency of a high density plasma system by introducing thermally hot gases to heat downstream chamber walls to improve the fluorine attack on deposit coatings. In certain embodiments of the ... | 08/19/2003 |
| 6598312 | Wafer drying apparatus A wafer drying apparatus of increased efficiency in which isopropyl alcohol (IPA) supplied to a hood is activated by heat, thereby increasing its diffusion efficiency and enabling it to vaporize pure water on a wafer quickly, includes a washing tank for s... | 07/29/2003 |
| 6589359 | Cleaning method and cleaning apparatus for substrate A cleaning method is provided for cleaning a semiconductor wafer. In this method, after removing adhering substances from the wafer by using a chemical liquid of organic amine type, there is carried out a pure-water cleaning capable of prevention of elect... | 07/08/2003 |
| 6584703 | Method for controlling the moisture of a web in machine direction on a coating machine and calender The invention relates to a method by means of which the machine-direction moisture of a web being calendered or coated and calendered can be controlled in an optimal manner that takes into account moisture content changes along the entire path of the coat... | 07/01/2003 |
| 6576066 | Supercritical drying method and supercritical drying apparatus According to a supercritical drying method of this invention, a substrate having a pattern is dipped in water and rinsed with water. Then, the substrate is placed in the reaction chamber of a predetermined sealable vessel, and surfactant-added liquid carb... | 06/10/2003 |
| 6553689 | Vapor collection method and apparatus A vapor collection method and apparatus capable of capturing vapor compositions without substantial dilution. The method and apparatus utilize a material that has a surface with an adjacent gas phase. A chamber is positioned in close proximity to a surfac... | 04/29/2003 |
| 6519869 | Method and apparatus for drying semiconductor wafers A method and an apparatus for drying semiconductor wafers by using an IPA drying apparatus. The present invention uses a vapor generator to generate an IPA vapor. The IPA vapor is generated and saved in a closed surrounding and then transferred in a porou... | 02/18/2003 |
| 6511708 | Controlling float height of moving substrate over curved plate A system, such as a gap drying system, moves a substrate having a substrate tension over a curved plate at a substrate speed such that the substrate floats over at least a region of substantially constant clearance (H0) between the substrate an... | 01/28/2003 |
| 6491761 | Process for removing stains from steel sheet in a continuous pickling line The present invention is directed to a mothod for preventing the formation of additional surface stains on destained steel sheet processed in a continuous pickle line operation.... | 12/10/2002 |
| 6473997 | Method and drying section for dewatering a fibrous web The invention relates to a method and a drying section for dewatering a fibrous web (9), the drying section preferably being intended to dry fibrous webs in a paper machine, and the drying section comprising a number of drying cylinders (8), by which an i... | 11/05/2002 |
| 6449873 | Apparatus and method for dry cleaning of substrates using clusters Disclosed is a dry cleaning apparatus and method using cluster for cleaning a surface of a specimen such as semiconductor wafer. The cleaning method first forms a neutral cluster no having polarity by passing a cleaning gas such as argon, nitrogen, or car... | 09/17/2002 |
| 6446356 | Method of controlling the drying process in a drying section of a paper machine or the like A method for controlling the drying process taking place in the dryer section of a paper machine. The dryer section comprises at least one drying cylinder unit and at least one air impingement unit. Optimal evaporation is first compiled in a manner known,... | 09/10/2002 |
