Bizarre Patents
Mountable Printable Placard With Headband
A resilient headband in a shape for being mounted on the head of the user. The headband is equipped with a longitudinal slotted member for holding a placard.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7876113 | Method of inspecting pattern and inspecting instrument Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias... | 01/25/2011 |
| 7847566 | Configurable prober for TFT LCD array test A method of testing electronic devices on substrates is described. The method includes placing a configurable prober over a first substrate, testing the first substrate, re-configuring the configurable prober, placing the configurable prober over a second substrate,... | 12/07/2010 |
| 7795886 | Surface voltmeter In a surface voltmeter (1), a surface voltage on a measurement area on a semiconductor substrate (9) on which an insulating film is formed is measured while applying light to the measurement area. With this operation, a voltage induced on a main body o... | 09/14/2010 |
| 7733099 | Monitoring pattern for detecting a defect in a semiconductor device and method for detecting a defect A monitoring pattern for detecting a defect in a semiconductor device allows a voltage contrast inspection which may be verified by an electrical test where no special test pattern is required for the electrical test. The monitoring pattern includes a test pattern w... | 06/08/2010 |
| 7675300 | Charged particle beam device probe operation An apparatus including a positioner control device, a measuring device and a control routine. The positioner control device is communicatively coupled to a chamber of a charged particle beam device (CPBD) and is configured to individually manipulate each of a plural... | 03/09/2010 |
| 7656171 | Method and apparatus for reviewing defects by detecting images having voltage contrast A method and apparatus for detecting defects includes irradiating and scanning an electron beam focused on an area of a sample, detecting charged particles generated from the sample by the irradiating and scanning of the electron beam with a first detector which det... | 02/02/2010 |
| 7656170 | Multiple directional scans of test structures on semiconductor integrated circuits Disclosed is a method of inspecting a sample. The sample is scanned in a first direction with at least one particle beam. The sample is scanned in a second direction with at least one particle beam. The second direction is at an angle to the first direction. The num... | 02/02/2010 |
| 7633303 | Semiconductor wafer inspection apparatus Efficiency of a charging processing of an insulator sample is improved. And, an electron optical system is adjusted according to a contact resistance value of the insulator sample. Breakdown of a sample is performed before the charging processing, and then, the char... | 12/15/2009 |
| 7612570 | Surface-potential distribution measuring apparatus, image carrier, and image forming apparatus A surface-potential distribution measuring apparatus includes an electron gun, an electron-beam optical system, an electron-emission panel, a detector, and a control system. The electron-beam optical system is located between the electron gun and a sample, and focus... | 11/03/2009 |
| 7602197 | High current electron beam inspection A method and apparatus for wafer inspection. The apparatus is capable of testing a sample having a first layer that is at least partly conductive and a second, dielectric layer formed over the first layer, following production of contact openings in the second layer... | 10/13/2009 |
| 7560939 | Electrical defect detection using pre-charge and sense scanning with prescribed delays One embodiment relates to an electron beam apparatus. The apparatus includes a mechanism for moving a substrate relative to the electron beam column at a controlled speed. A probe beam gun is configured to generate a probe beam through the column, and a pre-charging... | 07/14/2009 |
| 7550982 | Semiconductor device test method for comparing a first area with a second area A defective position of a sample to be tested is detected by irradiating the test sample and another test sample with electron beam while scanning the test samples, storing values of current generated in the test samples correspondingly to election beam irradiation ... | 06/23/2009 |
| 7525325 | System and method for floating-substrate passive voltage contrast A passive voltage contrast (PVC) system and method are disclosed for analyzing ICs to locate defects and failure mechanisms. During analysis a device side of a semiconductor die containing the IC is maintained in an electrically-floating condition without any ground... | 04/28/2009 |
| 7518383 | Inspection apparatus and inspection method using electron beam A visual inspection apparatus and method using the scanning electron microscope are disclosed. An electron beam is scanned repeatedly on a sample, and an inspection and a reference image are generated by the secondary electrons generated from the sample or reflected... | 04/14/2009 |
| 7495457 | Semiconductor device evaluation method and apparatus using the same In order to provide a semiconductor device evaluation method and a semiconductor device evaluation apparatus for correctly detecting an error position and providing a substrate for observing a cross section without difficulties, a transport unit of a SEM apparatus m... | 02/24/2009 |
| 7474107 | Buried short location determination using voltage contrast inspection Structure and methods of determining the complete location of a buried short using voltage contrast inspection are disclosed. In one embodiment, a method includes providing a test structure having a PN junction thereunder; and using the PN junction to determine the ... | 01/06/2009 |
| 7474108 | Apparatus and method for contacting of test objects The invention relates to methods for positioning of a substrate and contacting of the test object for testing with a test apparatus with an optical axis and corresponding devices. Thereby, the substrate is put on the holder. The substrate is positioned relative to t... | 01/06/2009 |
| 7453274 | Detection of defects using transient contrast One embodiment relates to a method for detecting defects in circuitry formed on a semiconductor substrate. A first scan of said circuitry is performed by scanning a primary electron beam in a first scan direction relative to said circuitry, and secondary electrons e... | 11/18/2008 |
| 7449898 | Method and apparatus for reviewing defects by detecting images having voltage contrast In a traditional method for automatically obtaining high-magnification images of defects by using an electron microscope for defect-reviewing of a semiconductor wafer, high-magnification images of a voltage contrast changing part are obtained in the case of defects ... | 11/11/2008 |
| 7443189 | Method to detect and predict metal silicide defects in a microelectronic device during the manufacture of an integrated circuit The present teachings provide methods for detection of metal silicide defects in a microelectronic device. In an exemplary embodiment, a portion of a semiconductor substrate may be positioned in a field of view of an inspection tool. The method also includes produci... | 10/28/2008 |
| 7425704 | Inspection method and apparatus using an electron beam An inspection method and apparatus irradiates a sample on which a pattern is formed with an electron beam, so that an inspection image and a reference image can be generated on the basis of a secondary electron or a reflected electron emitted by the sample. An abnor... | 09/16/2008 |
| 7420379 | Semiconductor device test method and semiconductor device tester A defective position of a sample to be tested is detected by irradiating the test sample and another test sample with electron beam while scanning the test samples, storing values of current generated in the test samples correspondingly to electron beam irradiation ... | 09/02/2008 |
| 7420163 | Determining layer thickness using photoelectron spectroscopy According to one embodiment of the invention, photoelectron spectroscopy is used to determine the thickness of one or more layers in a single or multi-layer structure on a substrate. The thickness may be determined by measuring the intensities of two photoelectron s... | 09/02/2008 |
| 7417444 | Method and apparatus for inspecting integrated circuit pattern A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the portion to be inspected is irradiated with an image-forming high-density el... | 08/26/2008 |
| 7403022 | Method for measuring peak carrier concentration in ultra-shallow junctions A method is disclosed for determining peak carrier concentration in ultra shallow junctions of semiconductor samples. A region of the surface of the sample is periodically excited. The effects of the excitation are monitored by a probe beam. Synchronous detection pr... | 07/22/2008 |
| 7385195 | Semiconductor device tester A system and method is disclosed for obtaining information regarding one or more contact and/or via holes on a semiconductor wafer. In one embodiment, the method obtains information regarding one or more holes (for example, via or contact) that are disposed in a sem... | 06/10/2008 |
| 7381978 | Contact opening metrology A method for process monitoring includes receiving a sample having a first layer that is at least partially conductive and a second layer formed over the first layer, following production of contact openings in the second layer by an etch process, the contact openin... | 06/03/2008 |
| 7378830 | Miniature modified Faraday cup for micro electron beams A micro beam Faraday cup assembly includes a refractory metal layer with an odd number of thin, radially positioned traces in this refractory metal layer. Some of the radially positioned traces are located at the edge of the micro modified Faraday cup body and some ... | 05/27/2008 |
| 7375538 | Method of inspecting pattern and inspecting instrument Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias... | 05/20/2008 |
| 7375505 | Method and apparatus for testing function of active microstructural elements and method for producing microstructural elements using the test method A method and an apparatus for testing the function of a plurality of microstructural elements by irradiation with particle radiation. All of the microstructural elements detected as malfunctioning are listed in a first error list in a first test sequence. The micros... | 05/20/2008 |
| 7372051 | Electric charged particle beam microscopy, electric charged particle beam microscope, critical dimension measurement and critical dimension measurement system Magnification errors are reduced in the required range of magnification in electric charged particle beam application apparatuses and critical dimension measurement instruments. To achieve this, a first image, whose magnification for the specimen is actually measure... | 05/13/2008 |
| 7372283 | Probe navigation method and device and defect inspection device A probe navigation method, a navigation device, and a defect inspection device wherein in a charged particle beam system provided with probes for electrical characteristics evaluation, probing can be easily carried out regardless of the equipment user's level of ski... | 05/13/2008 |
| 7368713 | Method and apparatus for inspecting semiconductor device A method and apparatus for inspecting a wafer during a semiconductor device fabrication process. The apparatus performs, only via observation from the wafer's top surface, inspection and quantitative evaluation of a portion that is in the shadow of an incident elect... | 05/06/2008 |
| 7368925 | Probe station with two platens A probe station for testing a device under test. A first platen supporting an electrical probe. A chuck supporting the device under test. A second platen supporting an optical probe. The first platen and the second platen positioned above the device under test. A pe... | 05/06/2008 |
| 7365324 | Testing apparatus using charged particles and device manufacturing method using the testing apparatus A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, th... | 04/29/2008 |
| 7365322 | Method and apparatus for arranging recipe of scanning electron microscope and apparatus for evaluating shape of semiconductor device pattern In order to provide an imaging-recipe arranging or creating apparatus and method adapted so that selection rules for automatic arrangement of an imaging recipe can be optimized by teaching in a SEM apparatus or the like, the imaging-recipe arranging or creating appa... | 04/29/2008 |
| 7362123 | Inspection apparatus for thin film transistor substrate An inspection apparatus for a TFT substrate formed with a plurality of pixels, includes a reference substrate being opposite to and spaced from the TFT substrate and formed with a plurality of reference patterns corresponding to the pixels, a power supply to supply ... | 04/22/2008 |
| 7358748 | Methods and systems for determining a property of an insulating film A method for determining a property of an insulating film is provided. The method may include obtaining a charge density measurement of the film, a surface voltage potential of the film relative to a bulk voltage potential of the substrate, and a rate of voltage dec... | 04/15/2008 |
| 7358877 | Obsolescence mitigation for electron bombarded semiconductor tubes in programmable waveform digitizers Method for replacing Electron Bombarded Semiconductor (EBS) tubes in a waveform digitizer having an analog input interface and a digital output interface, the EBS tubes being interposed between the analog input interface and the digital output interface, in which th... | 04/15/2008 |
| 7355418 | Configurable prober for TFT LCD array test An improved prober for an electronic devices test system is provided. The prober is “configurable,” meaning that it can be adapted for different device layouts and substrate sizes. The prober generally includes a frame, at least one prober bar having a first end... | 04/08/2008 |
