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| Number | Title | Issue Date |
| 8093883 | Ion current measurement device The invention provides an ion current measurement device for a tool having an ion source. The ion current measurement device comprises an ion collecting cup and a replaceable liner. The ion collecting cup is disposed in the tool and the ion collecting cup possesses ... | 01/10/2012 |
| 7435970 | Beam current meter It is possible to simplify the cooling mechanism of a superconductor, significantly reduce the cost, simplify the measurement work, and reduce the time required for measurement. A beam current meter includes: a cylindrical super conductor beam current sensor arrange... | 10/14/2008 |
| 7378830 | Miniature modified Faraday cup for micro electron beams A micro beam Faraday cup assembly includes a refractory metal layer with an odd number of thin, radially positioned traces in this refractory metal layer. Some of the radially positioned traces are located at the edge of the micro modified Faraday cup body and some ... | 05/27/2008 |
| 7368731 | Method and apparatus which enable high resolution particle beam profile measurement The PSF for a metrology array for high resolution particle beam profile measurement has been improved by improving five major elements of the metrology array. While improvement in each of the five elements provides and improved PSF, a combination of all five of the ... | 05/06/2008 |
| 7348568 | Electron beam diagnostic for profiling high power beams A system for characterizing high power electron beams at power levels of 10 kW and above is described. This system is comprised of a slit disk assembly having a multitude of radial slits, a conducting disk with the same number of radial slits located below the slit ... | 03/25/2008 |
| 7288772 | Diagnostic system for profiling micro-beams An apparatus for characterization of a micro beam comprising a micro modified Faraday cup assembly including a first layer of material, a second layer of material operatively connected to the first layer of material, a third layer of material operatively connected t... | 10/30/2007 |
| 7279882 | Method and apparatus for measuring properties of particle beams using thermo-resistive material properties A beam position detector for measuring the properties of a charged particle beam, including the beam's position, size, shape, and intensity. One or more absorbers are constructed of thermo-resistive material and positioned to intercept and absorb a portion of the in... | 10/09/2007 |
| 7244950 | Trigger probe for determining the orientation of the power distribution of an electron beam The present invention relates to a probe for determining the orientation of electron beams being profiled. To accurately time the location of an electron beam, the probe is designed to accept electrons from only a narrowly defined area. The signal produced from the ... | 07/17/2007 |
| 7191805 | Fueling nozzle with integral molecular leak sensor A method for detecting the undesirable entry of oxygen into a transfer system that transfers liquid hydrogen from a liquid hydrogen source into a container. A nozzle for use in the transfer system for dispensing liquid hydrogen comprises a housing and an oxygen sens... | 03/20/2007 |
| 7170067 | Ion beam measurement apparatus and method The present invention provides a combined electrostatically suppressed Faraday and energy contamination monitor and related methods for its use. The apparatus of the present invention is capable of selectively measuring two properties of an ion beam, including, for ... | 01/30/2007 |
| 7161352 | Beam current measuring device and apparatus using the same A beam current measuring device (BMD) capable of measuring beam current while radiating the beam on a target, such as a semiconductor wafer. The BMD at least includes: (a) a detecting part operable to detect or collect a magnetic field corresponding to the beam curr... | 01/09/2007 |
| 7106233 | Integrated galvanomagnetic sensor array system Galvanomagnetic sensor array system and method for providing data interface to a basic sensor array are provided. The sensor system includes an array of galvanomagnetic elements, and a processor coupled to receive each output signal from the array of galvanomagnetic... | 09/12/2006 |
| 7106236 | Method for converting A/D, and an A/D converting apparatus An analog-to-digital converting method for converting an analog signal into a digital signal is provided, wherein the analog-to-digital converting method includes a measuring step of measuring a frequency characteristic of each of analog-to-digital converters in adv... | 09/12/2006 |
| 7067828 | Method of and apparatus for measurement and control of a gas cluster ion beam Methods and apparatus are disclosed for measuring controlling characteristics of clusters in a cluster ion beam, including average cluster ion velocity {overscore (v)}, average cluster ion mass {overscore (m)}, average cluster ion energy Ē, average cluster ion char... | 06/27/2006 |
| 7046012 | Ionization devices An ionization detector includes a third (fence) electrode (55) between the counter electrode (53) and the sensing electrode (54). The fence electrode (53) is maintained at or near the potential of the sensing electrode (54) and tra... | 05/16/2006 |
| 7045384 | Method for determining metal work function by formation of Schottky diodes with shadow mask A method of determining a work function of a metal to be used as a metal gate material provides a metal-on-silicon (MS) Schottky diode on a silicon substrate. The MS Schottky diode is formed by deposition of the metal in a single step deposition through a shadow mas... | 05/16/2006 |
| 7028724 | Fueling nozzle with integral molecular leak sensor An apparatus and process for measuring the concentration of hydrogen gas being transferred through a nozzle from a source container to a destination container and for providing an alert and/or taking action where hydrogen gas leaks may create an unsafe condition. Th... | 04/18/2006 |
| 7030376 | Electron beam apparatus and method for production of its specimen chamber A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen... | 04/18/2006 |
| 7012419 | Fast Faraday cup with high bandwidth A circuit card stripline Fast Faraday cup quantitatively measures the picosecond time structure of a charged particle beam. The stripline configuration maintains signal integrity, and stitching of the stripline increases the bandwidth. A calibration procedure ensure... | 03/14/2006 |
| 7009411 | Charge amount measurement method, shift value measurement method of charged beam, charge amount measuring device and shift value measuring device of charged beam A charge amount measurement method comprises: interposing a measurement subject between a first substance and a second substance having a through hole; measuring a first collision position where a charged beam passed through the through hole and vicinity of the meas... | 03/07/2006 |
| 7005656 | Ion implanter with vacuum-maintaining circuit board providing connections to internal faraday cups An ion implanter has an elongated evacuated chamber having a distal end along the path of travel of an ion beam. A planar multilayer printed circuit board (PCB) is located at the distal end of the chamber. The PCB has a first portion sealingly covering the distal en... | 02/28/2006 |
| 6992308 | Modulating ion beam current The present invention is directed to modulating ion beam current in an ion implantation system to mitigate non-uniform ion implantations, for example. Multiple arrangements are revealed for modulating the intensity of the ion beam. For example, the volume or number ... | 01/31/2006 |
| 6972552 | Method for the precise measurement of dependency on amplitude and phase of a plurality of high frequency signals and a device for carrying out said method A method and device for measurement of dependency on amplitude and phase of a plurality of high frequency signals used primarily with a synchrotron accelerator of elementary particles, includes alternately directing, with a radio frequency (RF) switch, each analogue... | 12/06/2005 |
| 6972551 | Beam profile monitor with accurate horizontal and vertical beam profiles A widely used scanner device that rotates a single helically shaped wire probe in and out of a particle beam at different beamline positions to give a pair of mutually perpendicular beam profiles is modified by the addition of a second wire probe. As a result, a pai... | 12/06/2005 |
| 6963162 | Gas distributor for an ion source A gas distributor for an ion source includes a plate having a recess and a series of apertures spaced radially outward from the recess. The apertures define paths for the flow of a gas through the plate, and the gas distributor further includes a sacrificial element... | 11/08/2005 |
| 6919570 | Electron beam sensor A sensing device for sensing an electron beam includes a vacuum chamber having an electron permeable window for allowing electrons from the electron beam to enter vacuum chamber. An electrode extends within the vacuum chamber for receiving at least a portion of the ... | 07/19/2005 |
| 6914253 | System for measurement of absorbed doses of electron beams in an irradiated object A method and apparatus for measuring doses of electron beams that are absorbed by an object subjected to e-beam irradiation. The absorbed dose can be continuously measured during an irradiation process, and adjustment can be made to system parameters in accordance w... | 07/05/2005 |
| 6763316 | Method for measurement of beam emittance in a charged particle transport system A method determines ion beam emittance, i.e., the beam current density based on position and angle, in a charged particle transport system. The emittance is determined from variations in the current measured in a slot Faraday or sample cup as a straight-edged mechan... | 07/13/2004 |
| 6700122 | Wafer inspection system and wafer inspection process using charged particle beam The present invention provides a wafer inspection technique capable of detecting a defect in a wafer on which a pattern having a large step such as a contact hole being subjected to a semiconductor manufacturing process is formed and obtaining information... | 03/02/2004 |
| 6617596 | On-line measurement of absorbed electron beam dosage in irradiated product An accelerator (10) generates an electron beam (22) of selected energy that is swept (16) up and down. A conveyor (32) moves items (30) through the electron beam for irradiation treatment. An array (40a) of inductive electron beam strength detectors is di... | 09/09/2003 |
| 6531859 | Electronic arrangement for an electric component and as a support for sensors The invention relates to an electrode arrangement for an electronic component, also acting as a support for sensors. Said electrode arrangement is mounted on a substrate (1) as a suitably dimensioned surface-structure of two electro-conductive electrodes ... | 03/11/2003 |
| 6459283 | Method and system for testing an electrical component A method and a system for testing an electrical component in a non-contact manner at high speed with high reliability. The method includes the steps of positioning a primary particle beam onto the component, supplying an AC-signal to the electrode being p... | 10/01/2002 |
| 6429444 | Real time monitoring of electron beam radiation dose An accelerator (10) generates an electron beam that is swept (16) up and down to form an electron beam (22). A conveyor (32) moves items (30) through the electron beam for irradiation treatment. A first array of inductive electron beam strength detectors'... | 08/06/2002 |
| 6313474 | Method for measuring distribution of beams of charged particles and methods relating thereto Current density distributions of the ion beam in the scanning direction (the direction of X) at two points Zf and Zb on Z-coordinate are respectively measured by Faraday arrays. Using the thus measured current density distributions, ... | 11/06/2001 |
| 6300755 | Enhanced modified faraday cup for determination of power density distribution of electron beams An improved tomographic technique for determining the power distribution of an electron or ion beam using electron beam profile data acquired by an enhanced modified Faraday cup to create an image of the current density in high and low power ion or electr... | 10/09/2001 |
| 6259090 | Supported thin foil stripper and simple non-obstructing power meter for a space based neutral particle beam system A thin foil stripper and simple non-obstructing power meter for a space based neutral particle beam system consisting of a panel of thin foils supported by resistance wires and mounted on a wheel or disk in such a manner that the surface used for strippin... | 07/10/2001 |
| 5991707 | Method and system for predictive diagnosing of system reliability problems and/or system failure in a physical system A method and system diagnoses system reliability problems and/or system failure in a physical system through the predictive identification of errant fluctuations in one or more operating parameters of said physical system. The values of at least one kind ... | 11/23/1999 |
| 5844406 | Method and apparatus for testing and measuring for porosity and anomalies of materials using electron beams The porosity and integrity of a nonconductive material is determined using electron beams and electronic instrumentation. The electric corona discharge from holes in the nonconductive material is detected and analyzed in order to determine the presence of... | 12/01/1998 |
| 5793195 | Angular distribution probe Ion-beam probes of the planar, screened, and multilayer types are shown and described. These probes can detect the arrival of energetic ions and, in the latter type, also detect the arrival of energetic neutral molecules. A specific improvement is the use... | 08/11/1998 |
| 5714875 | Electron beam stop analyzer An electron beam stop for use with high power electron beam accelerators can be used to measure beam parameters including energy, current, scan width, scan offset and scan uniformity. The beam stop is split in two segments in the direction of electron tra... | 02/03/1998 |
