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| Number | Title | Issue Date |
| 8174272 | Analysis of a material with capacitive technology Several apparatuses and a method for enabling of analysis of a material based on capacitive technology are disclosed. In an embodiment, the apparatus includes a first conductive surface. A second conductive surface is located substantially parallel to the first cond... | 05/08/2012 |
| 8058883 | Method and apparatus for detecting capacitance using a plurality of time division frequencies Disclosed herein is a method for detecting capacitance including: allowing an oscillator to output a plurality of time division oscillation frequencies according to the capacitance detected by a capacitance detection plate; counting the plurality of time division os... | 11/15/2011 |
| 7372056 | LPP EUV plasma source material target delivery system An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt... | 05/13/2008 |
| 7368741 | Extreme ultraviolet light source The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line wit... | 05/06/2008 |
| 7365351 | Systems for protecting internal components of a EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 04/29/2008 |
| 7361918 | High repetition rate laser produced plasma EUV light source An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interva... | 04/22/2008 |
| 7355191 | Systems and methods for cleaning a chamber window of an EUV light source Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation.... | 04/08/2008 |
| 7343274 | Sensor and method for detecting electric contact degradation A probe cell monitors conditions within electrical power transmission and switchgear apparatus to detect degradation of stressed components. The probe cell is a hardware simulation of components of a specific unit of electrical power apparatus, including electrodes ... | 03/11/2008 |
| 7323703 | EUV light source An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape ha... | 01/29/2008 |
| 7319301 | Differential anti-pinch capacitive sensor A proximity sensor for sensing an object in the path of or proximate to a closure panel such as a vehicle window. First and second electrodes encased in a non-conductive casing are mounted on the metallic structure near the closing edge of the aperture. The two elec... | 01/15/2008 |
| 7317318 | FEXT cancellation of mated RJ45 interconnect A network test instrument provides maximum compensation of FEXT by use of mutual inductance between one or more signals. The inductance is suitably formed as a PCB trace component, or as discrete components. ... | 01/08/2008 |
| 7317196 | LPP EUV light source An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target wi... | 01/08/2008 |
| 7291853 | Discharge produced plasma EUV light source An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members... | 11/06/2007 |
| 7247870 | Systems for protecting internal components of an EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 07/24/2007 |
| 7245985 | Process and apparatus for improving and controlling the vulcanization of natural and synthetic rubber compounds A process for curing a natural or synthetic rubber compound under a plurality of curing conditions by: (1) obtaining time dependent data streams of dielectric or impedance values from a non-bridged impedance sensing circuit and a capacitor having the rubber compound... | 07/17/2007 |
| 7217940 | Collector for EUV light source A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second... | 05/15/2007 |
| 7217941 | Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one ... | 05/15/2007 |
| 7202674 | Integrated non-contact/contact capacitance sensor A capacitance sensor of the present invention is equipped with a sensor unit that comprises a pair of detection electrodes, which are connected to respective reference capacitors, are provided with being oppositely separated, and can contact each other; and an insul... | 04/10/2007 |
| 7196342 | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a... | 03/27/2007 |
| 7193228 | EUV light source optical elements Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in pla... | 03/20/2007 |
| 7191044 | Judgment lock for occupant detection air bag control Systems and methods for controlling the sensing of an occupant in a seating area are provided. The occupant is characterized as one of an adult, child or other category. One characterization change parameter, such as a hysteresis time period or thresholds for charac... | 03/13/2007 |
| 7180081 | Discharge produced plasma EUV light source An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members... | 02/20/2007 |
| 7172340 | X-ray imaging apparatus and method for moving X-ray detector An X-ray imaging apparatus includes an X-ray irradiating unit configured to irradiate an X-ray to an object, an X-ray detecting unit configured to detect the irradiated X-ray, an image creating unit configured to create X-ray image data based on data detected by the... | 02/06/2007 |
| 7170303 | Fuel sensor A sensor (20) includes a single capacitor (30) that operates in two different modes to obtain capacitance and conductance information when a mixture flows between the electrodes (32, 34) of the capacitor. Two different oscillators (180, 182 | 01/30/2007 |
| 7164144 | EUV light source A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiati... | 01/16/2007 |
| 7162342 | Electronic control unit and passenger detection apparatus for vehicle In a passenger detection apparatus for a vehicle, a microcomputer conducts a timer counting operation using a sub-clock signal fed from an CR oscillation circuit in a stand-by state and carries out a zero-point correction on a load sensor in an activated state. In a... | 01/09/2007 |
| 7141988 | Capacitive position sensor and sensing methodology A simple and robust variable coaxial capacitive sensor and detection method for monitoring the position of a rapidly reciprocating member such as a piston or displacer in a free piston Stirling engine. The coaxial capacitor of the present invention in a preferred em... | 11/28/2006 |
| 7122816 | Method and apparatus for EUV light source target material handling An EUV light source plasma source material handling system and method is disclosed which may comprise a droplet generator having a droplet generator plasma source material reservoir in fluid communication with a droplet formation capillary and maintained within a se... | 10/17/2006 |
| 7116117 | Capacitive sensor A capacitive sensor includes: a first sensing electrode connected to a first reference capacitor in which is stored reference electric charge; a second sensing electrode connected to a second reference capacitor in which is stored reference electric charge; and a sh... | 10/03/2006 |
| 7114399 | Shaped non-contact capacitive displacement sensors for measuring shaped targets An improved non-contact capacitive displacement sensor that may be employed for accurately measuring small distances between the sensor and shaped targets. The non-contact capacitive displacement sensor includes a probe having a sensor element and a guard element. T... | 10/03/2006 |
| 7109503 | Systems for protecting internal components of an EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 09/19/2006 |
| 7098674 | Occupant sensor An oscillatory or pulsed first signal is operatively coupled to a first electrode placed between a conductive heating element and a seating region of a seat containing the heating element. A second signal substantially equal to the first signal is operatively couple... | 08/29/2006 |
| 7091727 | Method and IC for detecting capacitance variation A method and an integrated circuit for detecting capacitance variation includes the steps of: generating a detection frequency for capacitance variation and a detection frequency which lags the detection frequency by k times, wherein the detection frequencies are ba... | 08/15/2006 |
| 7092257 | Bendable low voltage contact rail for track lighting systems A lighting track apparatus includes elongated colored tubes which are easily bent into stable curved shapes to custom shape and fit sections of the apparatus into a track lighting system. Plural elongated electrical conductors are mechanically flexible and able to s... | 08/15/2006 |
| 7087914 | High repetition rate laser produced plasma EUV light source An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interva... | 08/08/2006 |
| 7088758 | Relax gas discharge laser lithography light source An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a disp... | 08/08/2006 |
| 7084643 | Capacitive sensor for non-contacting gap and dielectric medium measurement A non-contact capacitive sensor including: a sensor plate configured to be displaced from a surface and to measure a capacitance of a gap between the surface and sensor plate; an active shield plate over the sensor plate and insulated from said sensor plate, wherein... | 08/01/2006 |
| 7043398 | Method for operating a position measuring device A system for determining a signal running time between a position measuring system and an evaluation unit. The system includes a position measuring system that has a graduation connected to a moving element, a scanning unit that scans the graduation, wherein scannin... | 05/09/2006 |
| 7042230 | Multi-parameter sensing system Systems and methodologies that provide for multi-parameter sensing via micro fabricated sensing structures operatively connected to oscillators, each micro-fabricated sensing structure in part defines a frequency of a respective associated oscillator. Output from su... | 05/09/2006 |
| 6982560 | Method and system for determining cross-talk effects According to an aspect of the invention, a method for determining near-end cross-talk effects is provided. A periodic test signal having a frequency increasing in predetermined steps is input into a conductor of a transmission cable. A raw cross-talk signal is recei... | 01/03/2006 |
