Bizarre Patents
User-operated amusement apparatus for kicking the user's buttocks
An apparatus including a user-operated and controlled apparatus for self-infliction of repetitive blows to the user's buttocks by a plurality of elongated arms bearing flexible extensions that rotate under the user's control.
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| Number | Title | Issue Date |
| 8110992 | Controlled plasma power supply A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a ... | 02/07/2012 |
| 8110990 | Atmospheric pressure plasma apparatus Disclosed is an atmospheric pressure plasma apparatus for enhancing and or controlling the dissociation of a secondary gas by converting a source gas into a plasma state at atmospheric pressure and controlling the interaction between that plasma and the secondary ga... | 02/07/2012 |
| 8110993 | Methods for inductively-coupled RF power source A method for tracking a variable resonance condition in a plasma coil during creation of plasma from a gas flowing in a plasma torch adjacent to the plasma coil comprises: providing a radio-frequency (RF) power source comprising a power amplifier that generates a ra... | 02/07/2012 |
| 8110991 | Phase and frequency control of a radio frequency generator from an external source Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit c... | 02/07/2012 |
| 8098016 | Plasma generating apparatus and plasma generating method An impedance matching device is provided with a basic element having variable characteristic parameters for impedance matching, and an auxiliary element having variable characteristic parameters. At the time of generating plasma by using the impedance matching devic... | 01/17/2012 |
| 8084947 | Pulsed dielectric barrier discharge A method of generating a glow discharge plasma involves providing a pair of electrodes spaced apart by an electrode gap, and having a dielectric disposed in the electrode gap between the electrodes; placing the electrodes within an environment, wherein the electrode... | 12/27/2011 |
| RE42917 | RF power control device for RF plasma applications There is provided by this invention an improved rf power control device for plasma applications for optimization of the feedback control voltage in the presence of harmonic and non-harmonic spurious frequencies. In this system, an oscillator and mixer, similar to th... | 11/15/2011 |
| 8053991 | Impedance matching methods and systems performing the same Provided are an impedance matching method and a matching system performing the same. The method includes: measuring an electrical characteristic of the power transmission line including the matching system and the load; extracting a control parameter for impedance m... | 11/08/2011 |
| 8053992 | Plasma reactor and plasma reaction apparatus A plasma reactor includes a honeycomb electrode in which a plurality of cells that function as gas passages are partitioned by a partition wall, and a discharge electrode. The honeycomb electrode includes a first gas circulation section that allows a first gas to pa... | 11/08/2011 |
| 8044595 | Operating a plasma process A method for operating one or more plasma processes in a plasma chamber, with at least two power supplies, the method comprising the following process steps: a. carrying out an arc detection for at least one of the power supplies; | 10/25/2011 |
| 8044594 | Power supply ignition system and method One embodiment comprises a plasma processing system having a plasma chamber, a generator, a feedback component, and a controller. The feedback component is adapted to receive at least one first signal having a level dependent upon the power signal supplied from the ... | 10/25/2011 |
| 8040068 | Radio frequency power control system A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one ... | 10/18/2011 |
| 8030849 | Pulsed plasma device and method for generating pulsed plasma A device and a method for generating a truly pulsed plasma flow are disclosed. The device includes a cathode assembly comprising a cathode and a cathode holder, an anode, and two or more intermediate electrodes, the anode and the intermediate electrodes forming a pl... | 10/04/2011 |
| 8018163 | Capacitively coupled plasma reactor A capacitively coupled plasma reactor includes a plasma reactor, a capacitive coupling electrode assembly including a plurality of capacitive coupling electrodes to induce plasma discharge inside the plasma reactor, a main power supply source to supply radio-frequen... | 09/13/2011 |
| 8018164 | Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources Fluctuations in a plasma characteristic such as load impedance are compensated by a controller that modulates a stabilization RF generator coupled to the plasma having a frequency suitable for stabilizing the plasma characteristic, the controller being responsive to... | 09/13/2011 |
| 8018162 | Surface wave excitation plasma processing system To sustain uniform generation of plasma constantly over a large area. In the surface wave excitation plasma processing device, a plasma source includes: a microwave generator, a microwave waveguide and a dielectric block; and a plasma source also includes: a microwa... | 09/13/2011 |
| 7994724 | Inductive plasma applicator An inductive plasma applicator comprises a ferromagnetic inductively coupled source and an electrode with a hole pattern centered with respect to the plasma source. Such plasma applicator provides an efficient energy transfer to the plasma. The plasma applicator is ... | 08/09/2011 |
| 7969096 | Inductively-coupled plasma source A method and apparatus for exciting gas that involves generating an alternating magnetic field unidirectionally through a magnetic core defining a gap, across the gap and through a plasma vessel that includes dielectric material. The magnetic field induces an electr... | 06/28/2011 |
| 7969095 | Method of and arrangement for removing contaminants from a substrate surface using an atmospheric pressure glow plasma The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of ... | 06/28/2011 |
| 7956543 | Optimization of the excitation frequency of a resonator A radio frequency plasma generator power supply, including: an interface that receives a request to determine an optimal control frequency; an output interface configured to be connected to a plasma generation resonator; a power supply module configured to apply a v... | 06/07/2011 |
| 7948185 | Inductively-driven plasma light source An apparatus for producing light includes a chamber that has a plasma discharge region and that contains an ionizable medium. The apparatus also includes a magnetic core that surrounds a portion of the plasma discharge region. The apparatus also includes a pulse pow... | 05/24/2011 |
| 7940008 | Inductively-coupled RF power source A system and method are disclosed for implementing a power source including a power amplifier that generates a radio-frequency power signal with an adjustable operating frequency. The power amplifier also generates a reference phase signal that is derived from the r... | 05/10/2011 |
| 7940009 | Plasma processing apparatus A plasma processing apparatus includes a chamber for carrying out plasma processing inside, a top plate made of a dielectric material for sealing the upper side of this chamber, and an antenna section that serves as a high frequency supply for supplying high frequen... | 05/10/2011 |
| 7932678 | Magnetic mirror plasma source and method using same A magnetic mirror plasma source includes a gap separating a substrate from a cathode. A mirror magnetic field extends between the substrate and the cathode through the gap. The magnetic field lines at a proximal surface of the substrate are at least two times as str... | 04/26/2011 |
| 7898183 | Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities A strongly-ionized plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. An output of a pulsed power supply is electrically connected betwee... | 03/01/2011 |
| 7884551 | RF plasma source with quasi-closed solenoidal inductor The present invention pertains to RF (radio frequency) inductive coupling plasma (ICP) sources exciting and maintaining plasma within a closed and vacuum sealed discharge chamber filled with a gaseous medium at a controllable pressure in the range from 1 mTorr to at... | 02/08/2011 |
| 7880392 | Plasma producing method and apparatus as well as plasma processing apparatus Plasma producing method and apparatus wherein a plurality of high-frequency antennas are arranged in a plasma producing chamber, and a high-frequency power supplied from a high-frequency power supply device (including a power source, a phase controller and the like)... | 02/01/2011 |
| 7868556 | RF matching network of a vacuum processing chamber and corresponding configuration methods A RF matching network is described, and which includes a 1st to nth RF generators, and wherein each RF generator has a different frequency, and wherein the frequencies of the 1st to the nth RF input ports decline in sequence, and wherein betwee... | 01/11/2011 |
| 7847485 | Aurora curtain generation device and aurora curtain generation method A method and a device for artificially generating and showing an aurora and for generating and changing a true-to-life curtain-shaped discharge light emission by using a simple device. In a pressure-reduced chamber, two electrodes are arranged in the X direction and... | 12/07/2010 |
| 7812542 | Arrangement and method for the generation of extreme ultraviolet radiation by means of an electrically operated gas discharge The object of an arrangement and a method for generating extreme ultraviolet radiation by an electrically operated gas discharge is to improve the adjustment of the layer thickness and, in particular, to prevent an uncontrolled accumulation of the metal layer to be ... | 10/12/2010 |
| 7808184 | Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode and a cathode assembly are positioned inside the chamber. A pulsed powe... | 10/05/2010 |
| 7804250 | Apparatus and method to generate plasma An apparatus and method to generate plasma which can be applied to semiconductor processing. The apparatus includes a chamber having a plasma generating space defined therein, a lower electrode positioned within the chamber, an upper electrode facing the lower elect... | 09/28/2010 |
| 7795816 | High speed phase scrambling of a coherent beam using plasma A laser beam is modulated at a very high frequency to produce uniform radiant flux densities on substrate surface processing regions during thermal processing. Beam modulation is achieved by passing the laser beam through a plasma which causes phase randomization wi... | 09/14/2010 |
| 7795818 | Microwave plasma generation method and microwave plasma generator A microwave plasma generator in which the generating amount of radicals can be regulated easily with higher reaction efficiency while reducing gas consumption. The microwave plasma generator comprises an outer conductor (2), an inner conductor (3) arra... | 09/14/2010 |
| 7795817 | Controlled plasma power supply A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a ... | 09/14/2010 |
| 7791281 | Method and apparatus for stabilizing a glow discharge plasma under atmospheric conditions Method and apparatus for generating and sustaining a glow discharge plasma in a plasma discharge space comprising at least two spaced electrodes. The method and apparatus are arranged for performing the steps of introducing in the discharge space a gas or gas mixtur... | 09/07/2010 |
| 7759874 | Apparatus for effecting plasma chemical vapor deposition (PCVD) The present invention relates to an apparatus for carrying out a plasma chemical vapor deposition process by which one or more layers of doped or undoped silica can be deposited on the interior of an elongated glass substrate tube. The present invention further rela... | 07/20/2010 |
| 7750575 | High density plasma source The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first powe... | 07/06/2010 |
| 7750574 | Method of generating discharge plasma A pulse voltage is applied on a process gas to generate discharge plasma. The pulse voltage has a duty ratio controlled in a range of 0.001 percent or more and 8.0 percent or less. Preferably, the discharge plasma has an electron density of 1×1010 cm | 07/06/2010 |
| 7719199 | Controlled fusion in a field reversed configuration and direct energy conversion A system and apparatus for controlled fusion in a field reversed configuration (FRC) magnetic topology and conversion of fusion product energies directly to electric power. Preferably, plasma ions are magnetically confined in the FRC while plasma electrons are elect... | 05/18/2010 |
