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| Number | Title | Issue Date |
| 7439521 | Ion source with removable anode assembly An ion source has a removable anode assembly that is separable and from a base assembly to allow for ease of servicing the consumable components of the anode assembly. Such consumables may include a gas distributor, a thermal control plate, an anode, and one or more... | 10/21/2008 |
| 7425711 | Thermal control plate for ion source A thermal control plate is easily removable and replaceable in an ion source. The ion source has a removable anode assembly, including the thermal control plate, that is separable and from a base assembly to allow for ease of servicing consumable components of the a... | 09/16/2008 |
| 7420182 | Combined radio frequency and hall effect ion source and plasma accelerator system This invention features a combined radio frequency (RF) and Hall Effect ion source and plasma accelerator system including a plasma accelerator having an anode and a discharge zone, the plasma accelerator for providing plasma discharge. A gas distributor introduces ... | 09/02/2008 |
| 7382087 | Ozone generator system and ozone generating method An ozone generating system and an ozone generating method producing ozone at a high concentration and operating at high efficiency, in which a raw material gas with no nitrogen added and mainly containing oxygen is used. The amount of generation of NOX by... | 06/03/2008 |
| 7372195 | Electron beam source having an extraction electrode provided with a magnetic disk element An electron beam source for use in an electron gun. The electron beam source includes an emitter terminating in a tip. The emitter is configured to generate an electron beam. The electron beam source further includes a suppressor electrode laterally surrounding the ... | 05/13/2008 |
| 7368727 | Atomic level ion source and method of manufacture and operation Ion source and method of making and sharpening. The ion source is a single crystal metal conductor having a substantially conical tip portion with substantial rotational symmetry. The tip portion terminates with a tip radius of curvature in the range of 50–100 nan... | 05/06/2008 |
| 7359177 | Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output A plasma reactor has a dual frequency plasma RF bias power supply furnishing RF bias power comprising first and second frequency components, f(1), f(2), respectively, and an RF power path having an input end coupled to the plasma RF bias power supply a... | 04/15/2008 |
| 7342236 | Fluid-cooled ion source An ion source is cooled using a cooling plate that is separate and independent of the anode. The cooling plate forms a coolant cavity through which a fluid coolant (e.g., liquid or gas) can flow to cool the anode. In such configurations, the magnet may be thermally ... | 03/11/2008 |
| 7335896 | Emitter for an ion source An emitter for an ion source, such as a liquid metal alloy ion source (LMAIS). The emitter includes a binary alloy PrSi as a source material. ... | 02/26/2008 |
| 7279846 | Image display apparatus Provided is an image display apparatus including: a vacuum container having an electron source enclosed therein for displaying an image; an ion pump communicating with the vacuum container for discharging air therefrom and decreasing pressure therein; and a resistor... | 10/09/2007 |
| 7262555 | Method and system for discretely controllable plasma processing A method and system for plasma generation and processing includes a plurality of beam generators each locally controllable and configured for operation upon a single substrate. A control circuit couples to each of the plurality of beam generators with the control ci... | 08/28/2007 |
| 7247218 | Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power A plasma reactor process measurement instrument includes an input phase processor receiving wafer bias voltage, current and power and computing an input impedance, an input current and an input voltage to the transmission line; a transmission line processor for comp... | 07/24/2007 |
| 7238952 | Metal ion emission device and process for producing the same, ion beam irradiation device, processing apparatus and analyzing apparatus provided with emission device A metal ion emission device for emitting a metal ion by applying voltage to a molten liquid metal includes a needle-like part having an internal opening in which the liquid metal can be moved. The needle-like part has a first opening for supplying the liquid metal t... | 07/03/2007 |
| 7230256 | Ion doping system, ion doping method and semiconductor device An ion doping system includes a chamber 11, an exhausting section 13 for exhausting gases from the chamber, an ion source 12 provided for the chamber, and an accelerating section 23 for extracting the ions, generated in the ion source ... | 06/12/2007 |
| 7220937 | Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination A gas distribution ceiling electrode for use as a capacitive source power applicator and gas distribution showerhead in a plasma reactor includes a metal base and a process-compatible protective layer on the interior surface of he electrode having a dopant impurity ... | 05/22/2007 |
| 7196283 | Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface An overhead gas distribution electrode forming at least a portion of the ceiling of a plasma reactor has a bottom surface facing a processing zone of the reactor. The electrode includes a gas supply manifold for receiving process gas at a supply pressure at a top po... | 03/27/2007 |
| 7186943 | MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor support, the electrode comprising a portion of the chamber wall, an RF power generator for su... | 03/06/2007 |
| 7175687 | Advanced erosion-corrosion resistant boride cermets A cermet composition represented by the formula (PQ)(RS) comprising: a ceramic phase (PQ) and binder phase (RS) wherein, P is at least one metal selected from the group consisting of Group IV, Group V, Group VI elements, Q is boride, ... | 02/13/2007 |
| 7174703 | Ion thrusting system An ion thrusting system is disclosed comprising an ionization membrane having at least one area through which a gas is passed, and which ionizes the gas molecules passing therethrough to form ions and electrons, and an accelerator element which accelerates the ions ... | 02/13/2007 |
| 7164227 | Hall effect thruster with anode having magnetic field barrier An efficiency enhancing anode-magnetic structure of a Hall effect thruster produces a radially directed magnetic field between inner and outer poles at the exit portion of a gas distribution channel. The field-shaping structure includes magnetic material extending a... | 01/16/2007 |
| 7141757 | Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent A plasma reactor operable over a very wide process window of pressure, source power and bias power includes a resonant circuit consisting of an overhead electrode having a first impedance, a wafer support pedestal having a second impedance and a bulk plasma having a... | 11/28/2006 |
| 7132618 | MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression A plasma reactor for processing a semiconductor workpiece, includes reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor support, the electrode comprising a portion of the chamber wall, an RF power generator for supp... | 11/07/2006 |
| 7115012 | Method for manufacturing discharge tube using heat for oxidation of adhension area of electrode lead In a discharge tube manufacture line, electrode clamps are attached to both sides of an electrode lead except on a predetermined adhesion area to fix a glass bead. Then, a power section is driven to energize the area between the electrode clamps. The surface of the ... | 10/03/2006 |
| 7084572 | Plasma-accelerator configuration The invention relates to various advantageous embodiments of a plasma-accelerator configuration, especially for the configuration and design of electron sources used for ionizing the working gas and/or neutralizing the discharged plasma jet. ... | 08/01/2006 |
| 7084407 | Ion beam extractor with counterbore An extractor system for a plasma ion source has a single (first) electrode with one or more apertures, or a pair of spaced electrodes, a first or plasma forming electrode and a second or extraction electrode, with one or more aligned apertures. The aperture(s) in th... | 08/01/2006 |
| 7074253 | Advanced erosion resistant carbide cermets with superior high temperature corrosion resistance Cermets are provided in which a substantially stoichiometric metal carbide ceramic phase along with a reprecipitated metal carbide phase, represented by the formula MxCy, is dispersed in a metal binder phase. In MxCy M is ... | 07/11/2006 |
| 7062017 | Integral cathode An integral cathode for use with x-ray devices. The integral cathode includes an emitter made of a refractory metal such as tungsten, preferably doped with rhenium to afford malleability during construction and assembly. The integral cathode also includes a support ... | 06/13/2006 |
| 7049736 | Method of trapping accelerating electrons in plasma Background plasma electrons in a laser wake field are trapped and accelerated using a sharp downward density transition. A short and intense laser pulse travels through low density plasma with a sharp downward density transition. The density transition scale length ... | 05/23/2006 |
| 7042145 | Electron beam projector provided with a linear thermionic emitting cathode for electron beam heating An electron beam gun comprises a beam waveguide and an accelerating anode fixed thereto. The accelerating anode is connected with the aid of high-voltage insulators and through a cathode plate to a cathode assembly. The cathode assembly comprises a linear hot cathod... | 05/09/2006 |
| 7030335 | Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor workpiece, an overhead electrode overlying said workpiece support, the electrode comprising a... | 04/18/2006 |
| 7029637 | Apparatus for ozone production, employing line and grooved electrodes An ozone generation cell has a first conductor generally having a line geometry and a second conductor having a first groove formed in a surface thereof, and having first and second flanks on opposite sides of the first groove. The second conductor and the first gro... | 04/18/2006 |
| 7005651 | Liquid metal ion gun An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion source... | 02/28/2006 |
| 6982520 | Hall effect thruster with anode having magnetic field barrier An efficiency enhancing anode-magnetic structure of a Hall effect thruster produces a radially directed magnetic field between inner and outer poles at the exit portion of a gas distribution channel. The field-shaping structure includes magnetic material extending a... | 01/03/2006 |
| 6964396 | Automatic accel voltage tracking system for an ion thruster A voltage tracking system for an ion thruster includes a discharge chamber, a screen grid, an accelerator grid, and an accelerator grid voltage controller. The discharge chamber contains plasma at a given potential. The screen grid is adjacent to the discharge chamb... | 11/15/2005 |
| 6963162 | Gas distributor for an ion source A gas distributor for an ion source includes a plate having a recess and a series of apertures spaced radially outward from the recess. The apertures define paths for the flow of a gas through the plate, and the gas distributor further includes a sacrificial element... | 11/08/2005 |
| 6960888 | Method of producing and accelerating an ion beam A method of producing and accelerating an ion beam comprising the steps of: providing a magnetic field with a cusp that opens in an outward direction along a centerline that passes through a vertex of the cusp: providing an ionizing gas that sprays outward through a... | 11/01/2005 |
| 6936144 | High frequency plasma source A high frequency plasma source includes a support element, on which a magnetic field coil arrangement, a gas distribution system and a unit for extraction of a plasma beam are arranged. Additionally a high frequency matching network is arranged within the plasma sou... | 08/30/2005 |
| 6914386 | Source of liquid metal ions and a method for controlling the source The invention provides a system and method for controlling a source of liquid metal ions, the source comprises a tip a first electrode and a second electrode, the method includes the steps of: (i) maintaining the first electrode at a first voltage level range and ma... | 07/05/2005 |
| 6909087 | Method of processing a surface of a workpiece A plasma generator generates positive ions and negative ions in a plasma. An ion extracting portion (4, 5) selectively extracts the generated positive ions and negative ions from the plasma, and accelerates the extracted ions in a predetermined direction. The... | 06/21/2005 |
| 6909086 | Neutral particle beam processing apparatus A neutral particle beam processing apparatus comprises a workpiece holder (20) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (3) by applying a high-frequency electric field, an orifice electrode (4) ... | 06/21/2005 |
