Bizarre Patents
Crispy Chip Sandwich and Process of Producing a Sandwich Product
A food product comprising a multilayer cookie or snack having outer layers formed from a crispy type edible food product such as a potato chip or corn chip, etc. with an intermediate marshmallow layer being in contact with the inner surface of each crispy chip and one or more filler substances.
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| Number | Title | Issue Date |
| 7359177 | Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output A plasma reactor has a dual frequency plasma RF bias power supply furnishing RF bias power comprising first and second frequency components, f(1), f(2), respectively, and an RF power path having an input end coupled to the plasma RF bias power supply a... | 04/15/2008 |
| 7291360 | Chemical vapor deposition plasma process using plural ion shower grids A chemical vapor deposition process is carried out in a reactor chamber having a set of plural parallel ion shower grids that divide the chamber into an upper ion generation region and a lower process region, each of the ion shower grids having plural orifices in mu... | 11/06/2007 |
| 7256132 | Substrate centering apparatus and method A semiconductor substrate centering mechanism includes a plurality of substrate support pins, each pin having a top surface. The top surfaces of the pins define a plane in which the substrate is supported. Each pin has a tab mounted eccentrically at the top surface ... | 08/14/2007 |
| 7247218 | Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power A plasma reactor process measurement instrument includes an input phase processor receiving wafer bias voltage, current and power and computing an input impedance, an input current and an input voltage to the transmission line; a transmission line processor for comp... | 07/24/2007 |
| 7244474 | Chemical vapor deposition plasma process using an ion shower grid A chemical vapor deposition process is carried out in a reactor chamber with an ion shower grid that divides the chamber into an upper ion generation region and a lower process region, the ion shower grid having plural orifices oriented in a non-parallel direction r... | 07/17/2007 |
| 7220937 | Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination A gas distribution ceiling electrode for use as a capacitive source power applicator and gas distribution showerhead in a plasma reactor includes a metal base and a process-compatible protective layer on the interior surface of he electrode having a dopant impurity ... | 05/22/2007 |
| 7196283 | Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface An overhead gas distribution electrode forming at least a portion of the ceiling of a plasma reactor has a bottom surface facing a processing zone of the reactor. The electrode includes a gas supply manifold for receiving process gas at a supply pressure at a top po... | 03/27/2007 |
| 7186943 | MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor support, the electrode comprising a portion of the chamber wall, an RF power generator for su... | 03/06/2007 |
| 7161789 | Ion chip The ion chip has an ionizing structure in intimate electrical and physical contact with a conductor. The ionizing structure is either a carbon fiber layer or ionizing needles or both. The conductor may be a bare metal wire, a metal plate or a metal layer on a base i... | 01/09/2007 |
| 7141757 | Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent A plasma reactor operable over a very wide process window of pressure, source power and bias power includes a resonant circuit consisting of an overhead electrode having a first impedance, a wafer support pedestal having a second impedance and a bulk plasma having a... | 11/28/2006 |
| 7138771 | Apparatus for pre-acceleration of ion beams used in a heavy ion beam application system The present invention relates to an apparatus for pre-acceleration of ions and optimized matching of beam parameters used in a heavy ion application comprising a radio frequency quadruple accelerator (RFQ) having two mini-vane pairs supported by a plurality of alter... | 11/21/2006 |
| 7112891 | Mobile-power system with solar-powered hydrogen liberator, fuel cell, turbine, and capacitors The present invention is a mobile-energy generating system. It comprises a turbine, a fuel cell, commercial electrical power hookups, capacitors used for bridging purposes, and hydrogen-storage tanks. Pressurized hydrogen is maintained in the tanks using a hydrogen ... | 09/26/2006 |
| 7045793 | Multi-grid ion beam source for generating a highly collimated ion beam A multi-grid ion beam source has an extraction grid, an acceleration grid, a focus grid, and a shield grid to produce a highly collimated ion beam. A five grid ion beam source is also disclosed having two shield grids. The extraction grid has a high positive potenti... | 05/16/2006 |
| 7042145 | Electron beam projector provided with a linear thermionic emitting cathode for electron beam heating An electron beam gun comprises a beam waveguide and an accelerating anode fixed thereto. The accelerating anode is connected with the aid of high-voltage insulators and through a cathode plate to a cathode assembly. The cathode assembly comprises a linear hot cathod... | 05/09/2006 |
| 7009342 | Plasma electron-emitting source The invention relates to the field of gaseous-discharge high-vacuum apparatuses. The engineering effect attainable thereby consists in improving the efficiency of extracting the electron beam as well as the gas and power efficiency. The disclosed plasma electron sou... | 03/07/2006 |
| 7005651 | Liquid metal ion gun An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion source... | 02/28/2006 |
| 7005782 | Charged particle beam extraction and formation apparatus A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits ... | 02/28/2006 |
| 6978537 | Method of transferring electric charge using a micrometer-scaled device A charged species source and a charged species drain are provided. A moveable component is positioned proximate to the charged species source and the charged species drain. A first protrusion and a second protrusion are provided in contact with the moveable componen... | 12/27/2005 |
| 6964396 | Automatic accel voltage tracking system for an ion thruster A voltage tracking system for an ion thruster includes a discharge chamber, a screen grid, an accelerator grid, and an accelerator grid voltage controller. The discharge chamber contains plasma at a given potential. The screen grid is adjacent to the discharge chamb... | 11/15/2005 |
| 6962052 | Energy generation mechanism device and system The present invention is converting any environmental heat into a useful form of energy, by utilizing kinetic energy of randomly moving particles, by use a mechanism which selectively block particles by their direction related said mechanism, for creating a force, o... | 11/08/2005 |
| 6864485 | Ion optics with shallow dished grids In accordance with one specific embodiment of the present invention, the ion optics for use with an ion source have a plurality of electrically conductive grids that are mutually spaced apart and have mutually aligned respective pluralities of apertures through whic... | 03/08/2005 |
| 6864486 | Ion sources A closed loop exit hole is formed in a magnetically permeable end wall (2) of an enclosure (1) of a closed electron drift ion source. Parts of this end wall separated by the exit hole serve as pole pieces (7 and 8) of the magnetic system ... | 03/08/2005 |
| 6858854 | Method and apparatus for measuring inclination angle of ion beam A method and an apparatus for measuring an inclination angle of an ion beam when ions are implanted into a semiconductor wafer include an ion current measuring section having a Faraday cup assembly which is rotatably installed, an angle varying section for adjusting... | 02/22/2005 |
| 6849846 | Precision multiple electrode ion mirror A method of constructing an ion mirror having an axial axis which includes arranging electrode plate elements in parallel alignment along the axial axis and attaching a rigid structure to all of the electrode plate elements with adhesive, thereby fixing the electrod... | 02/01/2005 |
| 6833553 | Apparatuses, devices, systems and methods employing far infrared radiation and negative ions Apparatuses, devices, systems and methods employing a material or combination of materials capable of emitting both far infared radiation and negative ions are provided. The material at least include a first part of, for example, a bio-ceramic, and a second part tha... | 12/21/2004 |
| 6777695 | Rotating beam ion implanter Methods and apparatus are provided for ion implantation of a workpiece. The apparatus includes an ion beam generator for generating an ion beam, a deflection device for deflecting the ion beam to produce a deflected ion beam, and a drive device for rotating the defl... | 08/17/2004 |
| 6774550 | Charged particle beam extraction and formation apparatus A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits ... | 08/10/2004 |
| 6661014 | Methods and apparatus for oxygen implantation An oxygen ion containing plasma is generated using a hot filament ion source. The oxygen ions in the plasma come from an oxide source (e.g., a metal oxide) which has a lower free energy of formation than that of the filament metal oxide (e.g., WO3 | 12/09/2003 |
| 6653803 | Integrated resonator and amplifier system An integrated RF amplifier and resonator is provided for use with an ion accelerator. The amplifier includes an output substantially directly coupled with a resonator coil. The amplifier output may be coupled capacitively or inductively. In addition, an a... | 11/25/2003 |
| 6614037 | Electron beam irradiating apparatus Disclosed is an electron beam irradiating apparatus including an electron beam source; an accelerating unit for accelerating electrons emitted from the electron beam source; a deflecting unit for deflecting a highly energized electron beam generated by th... | 09/02/2003 |
| 6590324 | Charged particle beam extraction and formation apparatus A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputte... | 07/08/2003 |
| 6545398 | Electron accelerator having a wide electron beam that extends further out and is wider than the outer periphery of the device An electron accelerator for generating an electron beam includes a vacuum chamber having an outer perimeter and an electron beam exit window. The exit window has a central region and a first end region. An electron generator is positioned within the vacuu... | 04/08/2003 |
| 6346768 | Low energy ion gun having multiple multi-aperture electrode grids with specific spacing requirements A low energy ion gun for ion beam processing. The ion gun includes a plasma chamber having an open ended, conductive, non-magnetic body, a first end of which is closed by a flat or minimally dished dielectric member and with electrodes at a second end the... | 02/12/2002 |
| 6337537 | Vacuum diode with high saturation current density and quick response time for detecting of electromagnetic radiation A vacuum diode with a high saturation current density and a rapid response time for the detection of electromagnetic radiation. This diode comprises a grid (6) in the shape of a cylinder and a photo-cathode (4) which extends along the axis (X) of the cylinder.... | 01/08/2002 |
| 6318069 | Ion thruster having grids made of oriented pyrolytic graphite An ion thruster includes a source of a plasma of ions and electrons, and an ion-optics system located in sufficient proximity to the source of the plasma to extract ions therefrom. The ion-optics system has at least two domed grids arranged in a facing-bu... | 11/20/2001 |
| 6250070 | Ion thruster with ion-extraction grids having compound contour shapes An ion thruster has a source of a plasma, and an ion-optics system located in sufficient proximity to the source of the plasma to extract ions therefrom. The ion-optics system includes at least two grids arranged in a facing-but-spaced-apart relationship ... | 06/26/2001 |
| 6246162 | Ion optics In one embodiment of the present invention, the ion optics for use with an ion source have first and second electrically conductive grids having mutually aligned respective pluralities of apertures through which ions may be accelerated and wherein each ha... | 06/12/2001 |
| 6242749 | Ion-beam source with uniform distribution of ion-current density on the surface of an object being treated The invention provides a multiple-cell ion-beam source in which magnetic poles of all adjacent cells have alternating polarities, i.e., the cells arranged in a single row from the center to the periphery of the cathode plate have polarities in the order o... | 06/05/2001 |
| 6239541 | RFQ accelerator and ion implanter to guide beam through electrode-defined passage using radio frequency electric fields RFQ electrodes for use as an acceleration tube of a high energy ion implanter, capable of accelerating an ion beam of large current without divergence are arranged, with respect to a low resonance frequency of substantially 33 MHz suitable for heavy ions ... | 05/29/2001 |
| 6072269 | Ceramic member with an electrode and a plurality of tapered through holes for controlling the ejection of particles by switching the sign of a charge on the electrode A ceramic member has a flat or curved ceramic plate having a plurality of minute through holes of a maximum pore diameter of 150 μm or less, and having electrodes installed on one surface of the plate. The ceramic member controls the ejection of ions car... | 06/06/2000 |
