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| Number | Title | Issue Date |
| 7372056 | LPP EUV plasma source material target delivery system An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt... | 05/13/2008 |
| 7368741 | Extreme ultraviolet light source The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line wit... | 05/06/2008 |
| 7365351 | Systems for protecting internal components of a EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 04/29/2008 |
| 7365349 | EUV light source collector lifetime improvements An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plas... | 04/29/2008 |
| 7361918 | High repetition rate laser produced plasma EUV light source An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interva... | 04/22/2008 |
| 7355191 | Systems and methods for cleaning a chamber window of an EUV light source Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation.... | 04/08/2008 |
| 7332992 | Transformer Disclosed herein is a transformer including: an iron core; and a winding wound around the iron core; wherein the iron core includes a column-shaped output side iron core part, a plurality of column-shaped input side iron core parts, and a connecting iron core part, ... | 02/19/2008 |
| 7323703 | EUV light source An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape ha... | 01/29/2008 |
| 7317179 | Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective el... | 01/08/2008 |
| 7317196 | LPP EUV light source An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target wi... | 01/08/2008 |
| 7295591 | Long-pulse pulse power system for gas discharge laser A long pulse pulse power system for gas discharge lasers. The system includes a sustainer capacitor for accepting a charge from a high voltage pulse power source. A peaking capacitor with a capacitance value of less than half the sustainer capacitance provides the h... | 11/13/2007 |
| 7291853 | Discharge produced plasma EUV light source An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members... | 11/06/2007 |
| 7277188 | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate Systems and methods are disclosed for focusing a beam for an interaction with a film deposited on a substrate wherein the focused beam defines a short axis and a long axis. In one aspect, the system may include a detecting system to analyze light reflected from the ... | 10/02/2007 |
| 7256505 | Shaft mounted energy harvesting for wireless sensor operation and data transmission A device for monitoring a rotating shaft is provided. The device measures strain in the shaft and provides angular velocity and torque in the shaft. The device includes a sensor, sensor conditioning circuitry, a microprocessor, and a transmitter, all located on a ro... | 08/14/2007 |
| 7247870 | Systems for protecting internal components of an EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 07/24/2007 |
| 7217940 | Collector for EUV light source A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second... | 05/15/2007 |
| 7217941 | Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one ... | 05/15/2007 |
| 7215697 | Matched impedance controlled avalanche driver Controlled avalanche driver circuits and apparatuses for gas lasers. One embodiment typically delivers short, rapid, high voltage ionizing pulses in combination with an electric field whose magnitude is too low to sustain a normal glow discharge. The plasma is typic... | 05/08/2007 |
| 7196342 | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a... | 03/27/2007 |
| 7193228 | EUV light source optical elements Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in pla... | 03/20/2007 |
| 7180083 | EUV light source collector erosion mitigation An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interac... | 02/20/2007 |
| 7180081 | Discharge produced plasma EUV light source An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members... | 02/20/2007 |
| 7164144 | EUV light source A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiati... | 01/16/2007 |
| 7149234 | High repetition rate gas discharge laser with precise pulse timing control A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred... | 12/12/2006 |
| 7141806 | EUV light source collector erosion mitigation An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials creat... | 11/28/2006 |
| 7138188 | Magnetic implement using magnetic metal ribbon coated with insulator A magnetic ribbon or sheet is coated with an electrical insulator prior to formation of a magnetic implement. Manufacture of the magnetic implement is accomplished in a single process without a need for co-winding magnetic and insulator ribbons. Thermal property dif... | 11/21/2006 |
| 7122816 | Method and apparatus for EUV light source target material handling An EUV light source plasma source material handling system and method is disclosed which may comprise a droplet generator having a droplet generator plasma source material reservoir in fluid communication with a droplet formation capillary and maintained within a se... | 10/17/2006 |
| 7109503 | Systems for protecting internal components of an EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 09/19/2006 |
| 7095179 | Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode and a cathode assembly are positioned inside the chamber. A pulsed powe... | 08/22/2006 |
| 7088758 | Relax gas discharge laser lithography light source An apparatus and method are disclosed for operating a narrow band short pulse duration gas discharge laser output light pulse beam producing system, producing a beam comprising laser output light pulses at a selected pulse repetition rate, which may comprise: a disp... | 08/08/2006 |
| 7087914 | High repetition rate laser produced plasma EUV light source An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interva... | 08/08/2006 |
| 7056595 | Magnetic implement using magnetic metal ribbon coated with insulator A magnetic ribbon or sheet is coated with an electrical insulator prior to formation of a magnetic implement. Manufacture of the magnetic implement is accomplished in a single process without need for co-winding magnetic and insulator ribbons. Thermal property diffe... | 06/06/2006 |
| 7002443 | Method and apparatus for cooling magnetic circuit elements An apparatus and method for providing cooling to a magnetic circuit element having a magnetic core disposed around a centrally located core support member having at least one core support member wall is disclosed which may comprise a core support coolant inlet; a co... | 02/21/2006 |
| 6999492 | Reduced-maintenance excimer laser with oil-free solid state pulser An oil-free pulser design can be used to produce an excimer or molecular fluorine laser system that is lighter, cheaper to produce, and simpler than existing systems. Such designs allow a relatively low DC voltage to be applied to a main transformer, allowing the pu... | 02/14/2006 |
| 6972421 | Extreme ultraviolet light source The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line wit... | 12/06/2005 |
| 6756558 | High current, low impedance resistance welding device A resistance welding apparatus characterized by very low output impedance, and providing a substantially constant voltage source to low impedance (e.g., resistances on the order of 1-100 micro-ohms) materials-to-be-joined. The welding apparatus includes one or more ... | 06/29/2004 |
| 6744153 | Apparatus for and method of generating a pulse signal A pulse signal generator comprising a magnetic element able (1) to cause a large Barkhausen jump; a detection member (2) for detecting a magnetic change in the magnetic element to generate a pulse signal; and a pair of magnetic field sources (3, 4, ... | 06/01/2004 |
| 6594292 | Saturable reactor and power source apparatus for pulse laser utilizing same A saturable reactor is in a conductive state or has a magnetic switching function depending on the direction of the current flowing through it. Also provided is a power source apparatus for pulse laser utilizing the satiable reactor. The saturable reactor... | 07/15/2003 |
| 6355992 | High voltage pulse generator A high voltage pulse generator provides a short, fast rise, high voltage pulse from a very low impedance suitable for initiating high energy electrical discharges in liquids and high pressure gases. Its low impedance allows extremely high currents from ex... | 03/12/2002 |
| 6229300 | Wiegand tilt sensor A tilt sensor utilizes the "Wiegand Effect" to sense the occurrence of a tilting of the sensor from one inclined position to a horizontal position to another inclined position. The tilt sensor includes within a plastic or other non-magnetic body a non-mag... | 05/08/2001 |
