...that it was melting ice cream that inspired the invention of the outboard motor? It was a lovely August day and Ole Evinrude was rowing his boat to his favorite island picnic spot. As he rowed, he watched his ice cream melt and wished he had a faster way to get to the island. At that moment the idea for the outboard motor was born!
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7388274 | Capacitor below the buried oxide of SOI CMOS technologies for protection against soft errors Disclosed is a semiconductor structure that incorporates a capacitor for reducing the soft error rate of a device within the structure. The multi-layer semiconductor structure includes an insulator-filled deep trench isolation structure that is formed through an act... | 06/17/2008 |
| 7262452 | Method of forming DRAM device having capacitor and DRAM device so formed In a method of forming a DRAM device having a capacitor and a DRAM device so formed, an interlayer dielectric having at least one layer is formed on a semiconductor substrate. The interlayer dielectric layer and a predetermined portion of the semiconductor substrate... | 08/28/2007 |
| 7247905 | Offset vertical device The present invention includes a method for forming a memory array and the memory array produced therefrom. Specifically, the memory array includes at least one first-type memory device, each of the at least one first-type memory device comprising a first transistor... | 07/24/2007 |
| 7199416 | Systems and methods for a memory and/or selection element formed within a recess in a metal line The subject invention provides systems and methodologies for fabrication of memory and/or selection (e.g., diodes) elements in a recession in a semiconductor layer. In particular, a trench of varying width is created in the semiconductor layer by employing various e... | 04/03/2007 |
| 7129130 | Out of the box vertical transistor for eDRAM on SOI The present invention provides a vertical memory device formed in a silicon-on-insulator substrate, where a bitline contacting the upper surface of the silicon-on-insulator substrate is electrically connected to the vertical memory device through an upper strap diff... | 10/31/2006 |
| 6066869 | Circuit and method for a folded bit line memory cell with vertical transistor and trench capacitor A memory cell for a memory array in a folded bit line configuration. The memory cell includes an access transistor formed in a pillar of single crystal semiconductor material. The access transistor has first and second source/drain regions and a body regi... | 05/23/2000 |
| 5502320 | Dynamic random access memory (DRAM) semiconductor device A semiconductor device comprising a semiconductor substrate of first conductivity type, a trench type element isolation region formed in a preset depth from the semiconductor substrate surface, an element region of the first conductivity type surrounded b... | 03/26/1996 |
| 5164917 | Vertical one-transistor DRAM with enhanced capacitance and process for fabricating One embodiment of the present invention is a one transistor DRAM cell having enhanced capacitance and minimized soft error rate by providing an ungrounded cell capacitor plate which is insulated from the substrate. The structure includes a vertical transi... | 11/17/1992 |
| 5021355 | Method of fabricating cross-point lightly-doped drain-source trench transistor A structure and fabrication process for a self-aligned, lightly-doped drain/source n-channel field-effect transistor wherein a trench is formed in a well region in a wafer including an epitaxial layer on a substrate. A first, heavily doped drain region an... | 06/04/1991 |
| 4954854 | Cross-point lightly-doped drain-source trench transistor and fabrication process therefor A structure and fabrication process for a self-aligned, lightly-doped drain/source n-channel field-effect transistor wherein a trench is formed in a well region in a wafer including an epitaxial layer on a substrate. A first, heavily doped drain region an... | 09/04/1990 |