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Class 257/E21.414 - Lateral single gate single channel transistor with inverted structure, i.e., channel layer is formed after gate (EPO)


Subclass of Class 257 - Active solid-state devices (e.g., transistors, solid-state diodes)
Definition: This subclass is indented under subclass E21.412. This
No. of patents: 672
Last issue date: 10/28/2008


1                      
NumberTitleIssue Date
7442588Method for fabricating thin film transistor using local oxidation and transparent thin film transistor
Disclosed is a method for fabricating a thin film transistor. Specifically, the method uses local oxidation wherein a portion of a transparent metal oxide layer is locally oxidized to be converted into a semiconductor layer so that the oxidized portion of the transp...
10/28/2008
7439107Laser irradiation apparatus, method of irradiating laser light, and method of manufacturing a semiconductor device
When the laser light is irradiated with high output in the manufacturing process for a semiconductor device, an attenuator is heated and cause a deformation due to the laser light scattered in the attenuator. As a result, the attenuation ratio of the attenuator fluc...
10/21/2008
7432564Pixel structure
A method for fabricating a pixel structure is provided. First, a gate, a scan line, and a first terminal are formed on a substrate. A gate insulating layer is formed over the substrate to cover the gate, the scan line, and the first terminal. After defining the semi...
10/07/2008
7425479Method of manufacturing a thin film transistor array panel
The present invention provides a thin film transistor array panel comprising: an insulating substrate; a first signal line formed on the insulating substrate and extending in a first direction; a second signal line formed on the insulating substrate, extending in a ...
09/16/2008
7425490Reducing reactions between polysilicon gate electrodes and high dielectric constant gate dielectrics
In a metal gate replacement process, a gate electrode stack may be formed of a dielectric covered by a sacrificial metal layer covered by a polysilicon gate electrode. In subsequent processing of the source/drains, high temperature steps may be utilized. The sacrifi...
09/16/2008
7420209Semiconductor device
The present invention has an object to provide an active-matrix liquid crystal display device that realizes the improvement in productivity as well as in yield. In the present invention, a laminate film comprising the conductive film comprising metallic material and...
09/02/2008
7416928Manufacturing method of semiconductor device
An amorphous semiconductor film and a semiconductor film including an element selected from Group 15 of the periodic table are formed over a substrate. An island-shaped region including an island-shaped amorphous semiconductor film and an island-shaped semiconductor...
08/26/2008
7413940Thin-film transistor and fabrication method thereof
A fabrication method of a TFT includes successively forming four thin films containing a first conductive layer, an insulation layer, a semiconductor layer, and a second conductive layer on a substrate, performing a first PEP process to pattern the four thin films f...
08/19/2008
7410847Semiconductor device having semiconductor circuit formed by semiconductor elements and method for manufacturing the same
There is provided a semiconductor device including a semiconductor circuit formed by semiconductor elements having an LDD structure which has high reproducibility, improves the stability of TFTs and provides high productivity and a method for manufacturing the same....
08/12/2008
7410839Thin film transistor and manufacturing method thereof
The present invention provides a thin film transistor in which a substantial length of a channel is shortened to miniaturize a semiconductor device and a manufacturing method thereof. In addition, the present invention provides a semiconductor device which realizes ...
08/12/2008
7397063Semiconductor device
A semiconductor device comprises a glass substrate serving as a substrate having an insulated surface and a silicon layer located on a position overlapping with this glass substrate. The silicon layer includes an amorphous gettering region. Preferably, the silicon l...
07/08/2008
7390703Method for through-plating field effect transistors with a self-assembled monolayer of an organic compound as gate dielectric
A method for through-plating field effect transistors with a self-assembled monolayer of an organic compound as gate dielectric includes through-plating by patterning a gate electrode material, and bringing an organic compound having dielectric properties into conta...
06/24/2008
7371621Thin film transistor array panel and fabrication
The present invention provides a manufacturing method of a thin film transistor array panel, which includes forming a gate line on a substrate; forming a gate insulating layer, a semiconductor layer, and an ohmic contact on the gate line; forming a first conducting ...
05/13/2008
7371625Semiconductor device and manufacturing method thereof, liquid crystal television system, and EL television system
The present invention provides a method for a semiconductor device, which comprises the steps of forming a first conductive layer in contact with a semiconductor region, forming an insulating layer on the first conductive layer by one of droplet discharge and applic...
05/13/2008
7368753Thin film transistor array substrate and fabricating method thereof
A thin film transistor array substrate includes a first conductive pattern group including a gate electrode of a thin film transistor and a gate line connected to the gate electrode; a semiconductor pattern defining a channel of the thin film transistor; a second co...
05/06/2008
7365817Multi-domain liquid crystal display and method for manufacturing the same
The present invention relates to a multi-domain, specifically 4-domain, liquid crystal display and a method for manufacturing the same. In one aspect, the liquid crystal display includes a pair of opposed substrates and a liquid crystal injected and sealed between t...
04/29/2008
7361929Field-effect transistors with weakly coupled layered inorganic semiconductors
A field-effect transistor includes source, drain, and gate electrodes; a crystalline or polycrystalline layer of inorganic semiconductor; and a dielectric layer. The layer of inorganic semiconductor has an active channel portion physically extending from the source ...
04/22/2008
7348197Liquid crystal display device and fabrication method thereof
A method for fabricating a liquid crystal display device includes providing first and second substrates; forming an active layer on the first substrate, wherein the active layer includes a source region, a drain region, a channel region, and a storage region; formin...
03/25/2008
7338845Fabrication method of a low-temperature polysilicon thin film transistor
An LTPS-TFT structure comprises a gate, a gate dielectric layer, a patterned silicon layer, a patterned insulating layer, an ohmic contact layer and a source/drain layer. The gate and the gate dielectric layer are disposed on the substrate. The patterned silicon lay...
03/04/2008
7338846Fabricating method of pixel structure
A method for fabricating a pixel structure is provided. First, a gate, a scan line, and a first terminal are formed on a substrate. A gate insulating layer is formed over the substrate to cover the gate, the scan line, and the first terminal. After defining the semi...
03/04/2008
7323369Fabrication method for thin film transistor array substrate
Scan lines are formed on a substrate. A patterned dielectric layer and a patterned semiconductor layer are formed to cover portions of the scan lines. A patterned transparent conductive layer and a patterned metal layer are sequentially formed to define data lines, ...
01/29/2008
7319239Substrate for display device having a protective layer provided between the pixel electrodes and wirings of the active matrix substrate, manufacturing method for same, and display device
The present invention provides the substrate for a display device, comprising a scan line, a signal line and a switching element on an insulating substrate, and further comprising an interlayer insulation film and a pixel electrode, the switching element is provided...
01/15/2008
7316944Fabricating method of a liquid crystal display device
A horizontal electric field applying type thin film transistor substrate of a LCD device having an increased aperture ratio as well as a simplified manufacturing process. The device includes a gate line having a double layered structure including a transparent first...
01/08/2008
7317207Semiconductor device, method of making the same and liquid crystal display device
To provide TFT of improved low-temperature polycrystalline layer that has higher electron mobility and assures less fluctuation in manufacture in view of realizing a liquid-crystal display device having a large display area by utilizing a glass substrate. A T...
01/08/2008
7291522Semiconductor devices and methods of making
In one method of forming a semiconductor device, a first electrode is formed electrically coupled with a semiconductor material. After the first electrode is formed, an insulator is formed over the semiconductor material adjoining the first electrode and extending a...
11/06/2007
7273773Display device, method for manufacturing thereof, and television device
The invention provides a display device and a method for manufacturing thereof by increasing a material efficiently as well as simplifying steps. Also, the invention provides a technique for forming a pattern such as a wiring, that is used for forming a display devi...
09/25/2007
7238556Thin film transistor structure and method of manufacturing the same
The present invention improves the quality of the TFT structure by avoiding photo-induced current, and lowers manufacturing costs by decreasing the number of masks required in the process, wherein the former is achieved by the stacked structure including a gate laye...
07/03/2007
7202165Electronic device having a stacked wiring layer including Al and Ti
In the case that a stacked layer, in which another metal layer is stacked on an Al layer or Al alloy layer having a low resistance, is used as a wiring material, an etchant is provided which can etch to a substantially equal etching rate by executing only one etchin...
04/10/2007
7176496Thin film transistor array panels for a liquid crystal display and a method for manufacturing the same
A conductive layer, including a lower layer made of refractory metal such as chromium, molybdenum, and molybdenum alloy and an upper layer made of aluminum or aluminum alloy, is deposited and patterned to form a gate wire including a gate line, a gate pad, and a gat...
02/13/2007
7157319Method of patterning a thin film transistor that includes simultaneously forming a gate electrode and a pixel electrode
A high-precision patterning is conducted with a half-tone resist thickness being prevented from varying due to the presence/absence of a base film. A transmitting portion and two kinds of semi-transmitting portions, providing different quantities of transmitted ligh...
01/02/2007
7078298Silicon-on-nothing fabrication process
A method to fabricate a silicon-on-nothing device on a silicon substrate is provided. The disclosed silicon-on-nothing device is fabricated on an isolated floating silicon active area, thus completely isolated from the silicon substrate by an air gap. The isolated f...
07/18/2006
7049163Manufacture method of pixel structure
A manufacture method of a pixel structure is provided. A gate is formed over a substrate, and a gate insulator layer is formed over the substrate covering the gate. A semiconductor layer is formed over the gate insulator layer and a metal layer is formed over the se...
05/23/2006
6700134Semiconductor device provided with semiconductor circuit consisting of semiconductor element and method of manufacturing the same
The present invention provides a semiconductor device and a method of manufacturing the same, the device being provided with a semiconductor circuit consisting of a semiconductor element that is capable of improving characteristics of a TFT and has unifor...
03/02/2004
6693258Process for producing thin film semiconductor device and laser irradiation apparatus
A polycrystalline thin film of good quality is obtained by improving a crystallization process of a semiconductor thin film using laser light. After conducting a film forming step of forming a non-single crystal semiconductor thin film on a surface of a s...
02/17/2004
6693044Semiconductor device and method of manufacturing the same
A semiconductor device, which uses a crystalline silicon film having high crystallinity and a flat surface with few ridges and has high characteristics, and a method of manufacturing the semiconductor device are provided. According to the manufacturing me...
02/17/2004
6693297Thin film transistor formed by an etching process with high anisotropy
The present invention discloses a thin film transistor and a process for forming thereof by a high anisotropy etching process. A thin film transistor according to the present invention comprises a transistor element including a gate electrode, a gate insu...
02/17/2004
6686230Semiconducting devices and method of making thereof
A process for providing a semiconducting device including the steps of depositing a semiconducting layer onto a substrate by means of heating a gas to a predetermined dissociation temperature so that the gas dissociates into fractions, whereby those fract...
02/03/2004
6683333Fabrication of electronic circuit elements using unpatterned semiconductor layers
A thin-film transistor array comprises at least first and second transistors. Each of the first and second transistors include a shared silicon layer, i.e., an active layer. The shared semiconductor layer extends continuously between the first and second ...
01/27/2004
6680223Semiconductor device and method of manufacturing the same
In a bottom gate type semiconductor device made of a semiconductor layer with crystal structure, source/drain regions are constructed by a lamination layer structure including a first conductive layer (n+ layer), a second conductive layer (n
01/20/2004
6678018Thin film transistor array substrate for a liquid crystal display and the method for fabricating the same
A method for fabricating a thin film array substrate for a liquid crystal display includes steps of forming a gate line assembly and a common electrode line assembly on a first substrate. The gate line assembly includes a plurality of gate lines and gate ...
01/13/2004
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