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Class 257/E21.153 - Using diffusion into or out of a solid from or into a liquid phase, e.g., alloy diffusion process (EPO)


Subclass of Class 257 - Active solid-state devices (e.g., transistors, solid-state diodes)
Definition: This subclass is indented under subclass E21.135. This subclass
No. of patents: 12
Last issue date: 12/04/2007


NumberTitleIssue Date
7303967Method for fabricating transistor of semiconductor device
Disclosed is a method for fabricating a transistor of a semiconductor device, the method comprising the steps of: providing a semiconductor; forming a gate electrode; performing a low-density ion implantation process with respect to the substrate, thereby forming an...
12/04/2007
6703295Method and apparatus for self-doping contacts to a semiconductor
The present invention provides a system and method for creating self-doping contacts to silicon devices in which the contact metal is coated with a layer of dopant and subjected to high temperature, thereby alloying the silver with the silicon and simulta...
03/09/2004
6664631Apparatus for self-doping contacts to a semiconductor
The present invention provides a system for self-doping contacts to silicon devices in which the contact metal is coated with a layer of dopant and subjected to high temperature, thereby alloying the silver with the silicon and simultaneously doping the s...
12/16/2003
6632730Method for self-doping contacts to a semiconductor
The present invention provides a system and method for creating self-doping contacts to silicon devices in which the contact metal is coated with a layer of dopant and subjected to high temperature, thereby alloying the silver with the silicon and simulta...
10/14/2003
6383286Method of making semiconductor super-atom and aggregate thereof
The present invention probides a novel method for fabricating a semiconductor super-atom and an aggregate thereof, which allows the formation of a semiconductor nano-structure with a diameter in the order of 10 nm, which is meant for constituting a core, ...
05/07/2002
4364778Formation of multilayer dopant distributions in a semiconductor
A method of making solid state devices having multilayer dopant distributions, including p-p+ and n-n+ junctions, etc. A semiconductor body is rapidly melted, typically by a laser, electron beam, or ion beam. Present in the melt is a first dopant having a...
12/21/1982
4211587Process for producing a metal to compound semiconductor contact having a potential barrier of predetermined height
A process for producing a "metal to compound semiconductor" contact having a potential barrier of predetermined height. By this is meant a Schottky contact or an ohmic contact. The process comprises, before deposition of the metal, perfectly cleaning the ...
07/08/1980
4157559Coaxial nuclear radiation detector with deep junction and radial field gradient
Germanium radiation detectors are manufactured by diffusing lithium into high purity p-type germanium. The diffusion is most readily accomplished from a lithium-lead-bismuth alloy at approximately 430° and is monitored by a quartz half cell containing a ...
06/05/1979
4060432Method for manufacturing nuclear radiation detector with deep diffused junction
Germanium radiation detectors are manufactured by diffusing lithium into high purity p-type germanium. The diffusion is most readily accomplished from a lithium-lead-bismuth alloy at approximately 430° C. and is monitored by a quartz half cell containing...
11/29/1977
4024029Electrodeposition
The invention concerns a method of electrodeposition onto a semiconductor. The surface lattice structure of the semiconductor is first disturbed, by an ion beam or otherwise, and then the semiconductor is immersed in an electroplating solution. When the s...
05/17/1977
4021269Post diffusion after temperature gradient zone melting
Disclosed is a technique useful in the manufacture of semiconductor devices. When a semiconductor device is manufactured by the temperature gradient zone melting process, it is subjected to a short diffusion cycle following thermomigration. The cycle smoo...
05/03/1977
3972741Multiple p-n junction formation with an alloy droplet
A droplet of alloy material containing at least two semiconductor dopant type elements, each of which has a different ratio of diffusivity, is thermomigrated by a thermal gradient zone melting process through a body of semiconductor material leaving behin...
08/03/1976
 
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