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| Number | Title | Issue Date |
| 7385174 | Apparatus and method for measuring sidewall thickness of non-round transparent containers An apparatus for inspecting sidewall thickness of non-round transparent containers includes a conveyor for holding a container in stationary position and rotating the container around an axis. A light source directs light energy onto a sidewall of the container on t... | 06/10/2008 |
| 7319531 | Method for measuring a thickness of a coating A method for measuring a thickness of a coating of a constructional unit, in particular a heat-compatible coating on a component of a gas turbine, includes measuring coordinates of the constructional unit three-dimensionally with a measuring device, in particular an... | 01/15/2008 |
| 7208749 | System and method for locating and positioning an ultrasonic signal generator for testing purposes The invention is directed to an ultrasonic testing system. The system tests a manufactured part for various physical attributes, including specific flaws, defects, or composition of materials. The part can be housed in a gantry system that holds the part stable. An ... | 04/24/2007 |
| 7187456 | Method and apparatus for measurements of patterned structures A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two metal-containing regions... | 03/06/2007 |
| 7119336 | Method of measuring coating using two-wavelength infrared reflectance A non-destructive method is provided for measuring a non-scattering coating on a non-specular or specular surface of a metallic substrate. The surface may be a rough surface, such as a chemically milled surface. Infrared energy is transmitted into an integrating sph... | 10/10/2006 |
| 7091427 | Apparatus using resonance of a cavity to determine mass of a load A scale is provided, the scale including a cavity having a resonant frequency which is alterable with variations in mass of a load applied to the cavity. The scale also typically includes a comparator operatively coupled with the cavity to detect actual resonant fre... | 08/15/2006 |
| 7088456 | Thin film thickness measurement using multichannel infrared sensor A system and method for analyzing the characteristics of a thin film is provided. The current invention extends the capability of IR sensors to measure thin films through configuring a plurality of detection channels with appropriately chosen filters. With the multi... | 08/08/2006 |
| 7073789 | Sheet feeding apparatus and image forming apparatus An image forming apparatus includes a sheet tray configured to accommodate stacked sheets and a sheet feeding device configured to feed the stacked sheets in the sheet tray. A light emitting device emits light toward the stacked sheets, and the emitted light include... | 07/11/2006 |
| 7046373 | Interferometric system for the simultaneous measurement of the index of refraction and of the thickness of transparent materials, and related procedure Interferometric system for the simultaneous measurement of the index of refraction and of the thickness of transparent materials with a single measurement operation. The system employs an interferometer as a “shear interferometer” with the advantage of varying t... | 05/16/2006 |
| 7012249 | High capacity and scanning speed system for sample handling and analysis Disclosed is an apparatus for examining and inspecting at least one sample in order to determine characteristics of the sample having the a support for receiving a compact disc, the compact disc having deposited on a surface thereof at least one sample, inspection m... | 03/14/2006 |
| 7012699 | Method of and apparatus for measuring thickness of thin film or thin layer The present invention provides a method of measuring the thickness of a thin film or thin layer by a spectroscopic measurement, which is applicable to the measurement of a multiple layered film whose layers have different refractive indices. According to the method,... | 03/14/2006 |
| 6992758 | Birefringence measurement of large-format samples The disclosure is directed to systems and methods for precisely measuring birefringence properties of large-format samples of optical elements. A gantry-like configuration is employed for precise movement of birefringence measurement system components relative to th... | 01/31/2006 |
| 6984839 | Wafer processing apparatus capable of mapping wafers A wafer processing apparatus on which a pod having an opening is detachably mounted is provided with a door unit and a mapping unit provided with a transmitting type sensor having an emitter and a detector forming a slot therebetween. The emitter and the detector ar... | 01/10/2006 |
| 6930765 | Multiple spot size optical profilometer, ellipsometer, reflectometer and scatterometer A combined optical profiler, ellipsometer, reflectometer and scatterometer is described which is configured to have user selectable spot sizes. An attached computer allows the user to select via software the desired spot size on the substrate. ... | 08/16/2005 |
| 6903340 | Thin film analyzer A thin film analyzer capable of static and dynamic measurements is disclosed. The apparatus collects and analyzes spectral reflectance data as a function of time. It is especially useful for measuring the changing thickness of a transparent, organic thin film as it ... | 06/07/2005 |
| 6849859 | Fabrication of precision optics using an imbedded reference surface The figure of a substrate is very precisely measured and a figured-correcting layer is provided on the substrate. The thickness of the figure-correcting layer is locally measured and compared to the first measurement. The local measurement of the figure-correcting l... | 02/01/2005 |
| 6806459 | Measurement of transparent container sidewall thickness Apparatus for measuring sidewall thickness of a container includes a conveyor for moving the container transversely of its axis through an inspection station and simultaneously rotating the container about its axis. A light source and an illumination lens system dir... | 10/19/2004 |
| 6791681 | Apparatus and method for determining existence range of foreign substance An apparatus for determining an existence range of a foreign substance which is present on a surface of an object, includes: an optical system including a light source for emitting a light beam on to the surface of the object; a movement section for relatively movin... | 09/14/2004 |
| 6762838 | Method and apparatus for production line screening The use of an intensity spectrum as a fingerprint to determine the layer structure of a semiconductor wafer product or partial product, thereby to determine the routing history of the product through a production line and prevent routing errors. Also, a production l... | 07/13/2004 |
| 6710890 | Substrate thickness determination An apparatus for measuring a thickness of a substrate having an upper surface, without contacting the upper surface of the substrate. A platen having a base surface receives the substrate, and a reference surface is disposed at a known first height from the platen s... | 03/23/2004 |
| 6693275 | Method and apparatus for inspecting blow molded containers A method and apparatus (16) for inspecting the thickness of conveyed blow molded containers (18) utilizes a laser source (22) for directing a laser beam (24) upwardly from the exterior of the conveyed containers toward the container bottoms so as to be re... | 02/17/2004 |
| 6515293 | Method and apparatus for detecting thickness of thin layer formed on a wafer A method of measuring the thickness of a thin layer, by which the thickness of a top layer formed on the surface of a wafer can be detected in real time, and an apparatus therefor. This method includes irradiating light onto a cell and obtaining luminance... | 02/04/2003 |
| 6268919 | System and method for measuring thin film properties and analyzing two-dimensional histograms using and/not operations A system and method for measuring lubricant thickness and degradation, carbon wear and carbon thickness, and surface roughness of thin film magnetic disks at angles that are not substantially Brewster's angle of the thin film (carbon) protective overcoat.... | 07/31/2001 |
| 6229610 | System and method for measuring thin film properties and analyzing two-dimensional histograms using substraction operation A system and method for measuring lubricant thickness and degradation, carbon wear and carbon thickness, and surface roughness of thin film magnetic disks at angles that are not substantially Brewster's angle of the thin film (carbon) protective overcoat.... | 05/08/2001 |
| 6198533 | High temperature thin film property measurement system and method A system and method for measuring lubricant thickness and degradation, carbon wear and carbon thickness, and surface roughness and debris on thin film magnetic disks at angles that are not substantially Brewster's angle of the thin film (carbon) protectiv... | 03/06/2001 |
| 6091485 | Method and apparatus for optically determining physical parameters of underlayers A method and apparatus for optically determining a physical parameter of an underlayer such as the underlayer refractive index Nu, extinction coefficient ku and/or thickness tu through a top layer having a first top layer ... | 07/18/2000 |
| 6091500 | Method and apparatus for measuring overclad tubes A method and apparatus for measuring and determining certain parameters of an overclad tube measures the OD and the wall thickness of the tube at a plurality of longitudinal points and a plurality of angles at each point or longitudinal position. A laser ... | 07/18/2000 |
| 6046463 | Apparatus and method for regulating the cross-linking density of glass coatings An apparatus and method measures and controls crosslinking treatments on a glass surface from the measurement of reflection of polarized radiation from the surface of the glass.... | 04/04/2000 |
| 6031615 | System and method for simultaneously measuring lubricant thickness and degradation, thin film thickness and wear, and surface roughness A system and method for measuring lubricant thickness and degradation, carbon wear and carbon thickness, and surface roughness of thin film magnetic disks at angles that are not substantially Brewster's angle of the thin film (carbon) protective overcoat.... | 02/29/2000 |
| 5956142 | Method of end point detection using a sinusoidal interference signal for a wet etch process A process for monitoring and determining the end point of a wet etch process for removing a thin solid film 116 from a substrate by directing a light beam onto the substrate and monitoring the intensity of reflected beams, including the step of selecting ... | 09/21/1999 |
| 5898181 | Thin film optical measurement system A method and apparatus for inspecting a reflective surface, or material on such surface, such as lubricant and planarizing layers on a substrate surface. A beam of controlled polarization impinges obliquely at a spot in the plane of the substrate. A colle... | 04/27/1999 |
| 5866917 | Method and apparatus for evaluating the layers Light is led from a light source to the surface of a detecting area on an intermediate product by way of a route of an optical fiber and a probe. After reaching the detecting area, light successively passes through the layers formed on a conductive substr... | 02/02/1999 |
| 5789756 | Apparatus for measuring the flying height and orientation of a magnetic head relative to transparent medium based on frustrated total internal reflection The invention provides an apparatus for measuring the flying height and orientation of a magnetic head (54) relative to a transparent disk (20) based on frustrated total internal reflection. The apparatus comprises a housing (10) that mounts an electric m... | 08/04/1998 |
| 5773173 | Film thickness inspection method and apparatus A color filter thickness uniformity is evaluated quantitatively and accurately at high sensitivity by using a wavelength deviating by a predetermined wavelength from a central wavelength. The whole output of a screen is unified into one color tone by a mo... | 06/30/1998 |
| 5760413 | Method and apparatus for inspecting pipe thickness A plurality of radiation receiving elements disposed outside a pipe at equal distances from the axis thereof so that radiation from a radiation source is received through the pipe wall. As the thickness of the pipe wall varies, the received radiation vari... | 06/02/1998 |
| 5748319 | Method for sensing complete removal of oxide layer from substrate by thermal etching with real time A method for sensing the completion of removal of an oxide layer from a semiconductor substrate or a super conductor by a thermal etching in real time. In the method, the time of removal of the oxide layer on the semiconductor substrate or the super condu... | 05/05/1998 |
| 5726455 | Disk film optical measurement system A method and apparatus for inspecting a reflective surface, or material on such surface, such as lubricant and planarizing layers on a magnetic media storage disk. A beam of controlled polarization impinges obliquely at a spot in the plane of the disk. A ... | 03/10/1998 |
| 5724145 | Optical film thickness measurement method, film formation method, and semiconductor laser fabrication method An optical film thickness measurement method and film formation method uses a method of measuring the optical thickness of films by radiating a monitor light beam towards a substrate during the formation of a stack of films on the substrate and measuring ... | 03/03/1998 |
| 5684574 | In-process film thickness monitoring system A beam emitted from a light source including the characteristic wavelength of flown particles in a film forming system is interrupted by a beam chopper in a predetermined cycle, and is then divided into a probing beam and a reference beam by a beam divide... | 11/04/1997 |
| 5658183 | System for real-time control of semiconductor wafer polishing including optical monitoring A system for polishing a semiconductor wafer, the system comprising a wafer polishing assembly for polishing a face of a semiconductor wafer at a polishing rate and a polishing uniformity, the wafer polishing assembly including a platen subassembly defini... | 08/19/1997 |
