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| Number | Title | Issue Date |
| 8445876 | Extreme ultraviolet light source apparatus An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irr... | 05/21/2013 |
| 8445877 | Extreme ultraviolet light source apparatus and target supply device A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed w... | 05/21/2013 |
| 8440988 | Pulsed discharge extreme ultraviolet source with magnetic shield A magnetically shielded, efficient plasma generation configuration for a pulsed discharge extreme ultraviolet (EUV) light source comprises two opposed convex electrodes mounted with axes parallel to a static magnetic field. A limiter aperture disposed between the el... | 05/14/2013 |
| 8436328 | Extreme ultraviolet light source apparatus In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the... | 05/07/2013 |
| 8431916 | Radiation source and lithographic apparatus A source configured to generate EUV radiation includes a fuel droplet generator configured to deliver a droplet of fuel to an interaction point, optics configured to deliver fuel vaporizing and exciting radiation to the interaction point to generate a plasma, and a ... | 04/30/2013 |
| 8426834 | Method and apparatus for the generation of EUV radiation from a gas discharge plasma The invention relates to a method and an apparatus for generating EUV radiation from a gas discharge plasma. The object of the invention, to generate EUV radiation from a gas discharge plasma by with is optimized conversion efficiency of the EUV emission while local... | 04/23/2013 |
| 8421043 | Solid state radiation source array A solid state radiation source array is provided, the array comprising at least one solid state ultraviolet radiation source and at least one solid state infrared radiation source. ... | 04/16/2013 |
| 8410460 | Pattern defect inspection method and its apparatus The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser li... | 04/02/2013 |
| 8405055 | Source module, radiation source and lithographic apparatus A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a fuel supply configured to supply a fuel to a plasma formation site; a laser configured to emit a beam of radiation to the plasma formation site so that a plas... | 03/26/2013 |
| 8399867 | Extreme ultraviolet light source apparatus An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by gen... | 03/19/2013 |
| 8399868 | Tools, methods and devices for mitigating extreme ultraviolet optics contamination Devices, tools, and methods for mitigating contamination of an optics surface used in extreme ultraviolet (EUV) applications disclosed. The method may include providing an optically reflective surface configured to reflect EUV radiation. The method may further inclu... | 03/19/2013 |
| 8399870 | Extreme ultraviolet light source device and control method for extreme ultraviolet light source device A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam... | 03/19/2013 |
| 8399869 | UV luminaire having a plurality of UV lamps, particularly for technical product processing In various embodiments, a UV luminaire may include a housing which is designed for accommodating a plurality of UV lamps and a protective atmosphere, wherein the housing is subdivided in such a manner into chambers respectively containing some of the UV lamps and ca... | 03/19/2013 |
| 8395135 | Device and a method for curing patterns of a substance at a surface of a foil A device is described for curing patterns of a substance at a surface of a foil. The device a carrier facility for carrying the foil within an object plane, a photon radiation source arranged at a first side of the object plane for emitting photon radiation in a wav... | 03/12/2013 |
| 8395133 | Apparatus and method of adjusting a laser light source for an EUV source device An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (dire... | 03/12/2013 |
| 8395134 | Radiation source cartridge and module containing same There is disclosed an elongate radiation source cartridge. The cartridge comprises: (i) an elongate radiation source assembly having a proximal portion and distal portion, the distal portion of the elongate radiation source assembly being unsupported, (ii) a housing... | 03/12/2013 |
| 8378323 | Sterilizing toybox apparatus The sterilizing toybox apparatus addresses illness risk, especially with children, by providing UV light sterilization within. UV lighting is offered both above and beyond toys within the apparatus. A time-release latch ensures exposure for a time determined to be o... | 02/19/2013 |
| 8368040 | Radiation system and lithographic apparatus A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the ampl... | 02/05/2013 |
| 8368039 | EUV light source glint reduction system An apparatus includes a light source having a gain medium for producing an amplified light beam of a source wavelength along a beam path to irradiate a target material in a chamber and to generate extreme ultraviolet light; and a subsystem overlying at least a porti... | 02/05/2013 |
| 8368041 | System and method for compensating for thermal effects in an EUV light source A method and apparatus for compensating for thermal effects on the focal spot of a lens used to focus a laser beam on a target material at an irradiation site in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. The EUV energy output... | 02/05/2013 |
| 8354657 | Extreme ultra violet light source apparatus In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The apparatus includes a chamber, a target supply unit for supplying a target mate... | 01/15/2013 |
| 8350239 | Pen specific for erasable media usage Exemplary embodiments provide materials and methods for a pen that can include a writing end for writing an image on an erasable medium and an erasing end for locally erasing an image from the erasable medium. ... | 01/08/2013 |
| 8350240 | Device and method for generating and detecting coherent electromagnetic radiation in the THz frequency range The present invention concerns a device for generating and detecting coherent electromagnetic radiation (8) in the THz frequency range, comprising an optically parametric oscillator (2) for generating electromagnetic radiation in the THz frequency rang... | 01/08/2013 |
| 8350238 | Device patterning using irradiation In one embodiment, a method for creating a pattern in a layer of an organic electronic device that includes selectively irradiating a portion of the layer is provided, and devices and sub-assemblies made by the same. ... | 01/08/2013 |
| 8344339 | Source-collector module with GIC mirror and tin rod EUV LPP target system A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target sys... | 01/01/2013 |
| 8338808 | Ultraviolet radiation lamp and source module and treatment system containing same The present invention relates to an ultraviolet radiation lamp. The lamp comprises: (i) a substantially sealed cavity comprising a mercury-containing material; and (ii) a heating unit disposed exteriorly with respect to the cavity. The heating unit is disposed in co... | 12/25/2012 |
| 8338809 | Ultraviolet reflector with coolant gas holes and method A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second ... | 12/25/2012 |
| 8330131 | Source-collector module with GIC mirror and LPP EUV light source A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an out... | 12/11/2012 |
| 8324600 | Apparatus and method for measuring and controlling target trajectory in chamber apparatus An apparatus for measuring and controlling a target trajectory within a chamber apparatus for generating extreme ultraviolet light from plasma generated by irradiating a droplet target supplied from a target injection nozzle with a driver laser beam from an external... | 12/04/2012 |
| 8324601 | Extreme ultra violet light source apparatus An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser... | 12/04/2012 |
| 8319201 | Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave A plasma generating system is disclosed having a source of target material droplets, e.g. tin droplets, and a laser, e.g. a pulsed CO2 laser, producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation. For the d... | 11/27/2012 |
| 8319200 | Radiation source, lithographic apparatus and device manufacturing method A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a laser constructed and arranged to generate a beam of radiation directed to a plasma generation site where a plasma is generated when the beam of radiation int... | 11/27/2012 |
| 8309944 | Grazing incidence neutron optics Neutron optics based on the two-reflection geometries are capable of controlling beams of long wavelength neutrons with low angular divergence. The preferred mirror fabrication technique is a replication process with electroform nickel replication process being pref... | 11/13/2012 |
| 8304752 | EUV light producing system and method utilizing an alignment laser A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the am... | 11/06/2012 |
| 8294129 | Extreme ultraviolet light source apparatus An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a ... | 10/23/2012 |
| 8288743 | Apparatus for and method of withdrawing ions in EUV light production apparatus An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdraw... | 10/16/2012 |
| 8283644 | Measuring in-situ UV intensity in UV cure tool Provided are improved apparatus and methods for radiative treatment. In some embodiments, a semiconductor processing apparatus for radiative cure includes a process chamber and a radiation assembly external to the process chamber. The radiation assembly transmits ra... | 10/09/2012 |
| 8283643 | Systems and methods for drive laser beam delivery in an EUV light source An EUV light source device is described herein which may comprise a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis; a material for interaction with the laser beam at an irradiation site to create an EUV light... | 10/09/2012 |
| 8274064 | System and apparatus for dermatological treatment Exemplary embodiments of system and apparatus can be provided for treating various dermatological and biological conditions using electromagnetic energy in the form of optical radiation. For example, energy can be provided by a chemical reaction, such as by combusti... | 09/25/2012 |
| 8269199 | Laser heated discharge plasma EUV source A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and ... | 09/18/2012 |
