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| Number | Title | Issue Date |
| 8003960 | Reflective optical element, optical system and EUV lithography device In order to obtain optimal reflectivity on optical elements for the EUV and the soft X-ray range, multilayers constructed of a number of layers are used. Contamination or degradation of the surface leads to imaging defects and transmission losses. In the prior art, ... | 08/23/2011 |
| 7989786 | Laser-driven light source An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser ... | 08/02/2011 |
| 7825390 | Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed betwe... | 11/02/2010 |
| 7781749 | Beam irradiation apparatus with deep ultraviolet light emission device for lithographic pattern inspection system An illumination beam irradiation apparatus for use in pattern inspection systems is disclosed, which is less in deterioration of optical components and in attenuation of illumination light. The illumination apparatus includes a light source which yields a fundamenta... | 08/24/2010 |
| 7718982 | Programmable particle scatterer for radiation therapy beam formation Interposing a programmable path length of one or more materials into a particle beam modulates scattering angle and beam range in a predetermined manner to create a predetermined spread out Bragg peak at a predetermined range. Materials can be “low Z” and “hig... | 05/18/2010 |
| 7663127 | EUV debris mitigation filter and method for fabricating semiconductor dies using same According to one exemplary embodiment, an extreme ultraviolet (EUV) source collector module for use in a lithographic tool comprises an EUV debris mitigation filter. The EUV debris mitigation filter can be in the form of an aerogel film, and can be used in combinati... | 02/16/2010 |
| 7566889 | Reflective dynamic plasma steering apparatus for radiant electromagnetic energy A combination of radio frequency energy responsive and infrared energy responsive reflection based plasma radiant energy steering apparatus usable in directing radiant energy originating in for example an antenna array or an infrared source in order to direct the en... | 07/28/2009 |
| 7557365 | Structures and methods for coupling energy from an electromagnetic wave A device couples energy from an electromagnetic wave to charged particles in a beam. The device includes a micro-resonant structure and a cathode for providing electrons along a path. The micro-resonant structure, on receiving the electromagnetic wave, generates a v... | 07/07/2009 |
| 7443577 | Reflecting filtering cover A filter for use with an array of ultra-small resonant structures that are producing encoded EMR wherein the filter is designed to either reflect encoded EMR beams or to permit certain frequencies to pass there through so that the encoded EMR beam and its encoded da... | 10/28/2008 |
| 7439530 | LPP EUV light source drive laser system An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive la... | 10/21/2008 |
| 7432517 | Pulse modifier, lithographic apparatus, and device manufacturing method A pulse modifying unit is provided in the illumination system of the lithographic apparatus to reduce the degradation of the expensive lens elements by billions of the high intensity ultraviolet pulses from the laser is configured to receive an input pulse of radiat... | 10/07/2008 |
| 7427766 | Method and apparatus for producing extreme ultraviolet radiation or soft X-ray radiation A method of producing extreme ultraviolet radiation (EUV) or soft X-ray radiation by means of an electrically operated discharge, in particular for EUV lithography or for metrology, in which a plasma (22) is ignited in a gaseous medium between at least two el... | 09/23/2008 |
| 7411202 | Irradiating apparatus An irradiating apparatus includes a support member and a reflector supported by the support member to define a concave light energy reflector surface. A light source of radiating energy is disposed generally at the source focal point of the reflector. The support me... | 08/12/2008 |
| 7402825 | LPP EUV drive laser input system A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source and method of operating same is disclosed which may comprise an EUV plasma production chamber having a chamber wall; a drive laser entrance window in the chamber wall; a drive laser ent... | 07/22/2008 |
| 7399981 | Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography The device comprises a device (2) for creating an essentially linear target (4) in an evacuated space where laser beams (1) are focused, the target being suitable for interacting with the focused laser beams (1) to emit a plasma emitting ... | 07/15/2008 |
| 7397056 | Lithographic apparatus, contaminant trap, and device manufacturing method A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels ... | 07/08/2008 |
| 7391040 | Thermal image beacons A heat emitting beacon having a rotating parabolic mirror to concentrate the heat from a gas heat source, said mirror back being coated with a passive cold emission material comprised of a metalized plastic film creased and crumpled to form a multitude of reflective... | 06/24/2008 |
| 7378669 | Lithographic apparatus, device manufacturing method, and device manufactured thereby A lithographic projection apparatus includes a beam path for a beam of radiation, a projection system, a support structure for supporting a patterning device and a substrate holder for holding a substrate. The beam path includes a radiation system for providing the ... | 05/27/2008 |
| 7378673 | Source material dispenser for EUV light source A source material dispenser for an EUV light source is disclosed that comprises a source material reservoir, e.g. tube, that has a wall and is formed with an orifice. The dispenser may comprise an electro-actuatable element, e.g. PZT material, that is spaced from th... | 05/27/2008 |
| 7378672 | Particle beam therapeutic apparatus A particle beam therapeutic apparatus can ensure the uniformity of dose distribution by overlapping the desired loci of the irradiation of a particle beam a reduced number of times. A flow of a particle beam transported so as to be irradiated to a diseased part is c... | 05/27/2008 |
| 7372056 | LPP EUV plasma source material target delivery system An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt... | 05/13/2008 |
| 7368716 | Infrared imaging system and lens module for use with the same An IR imaging system includes a lens module and an imaging module coupled to the lens module. The lens module includes a barrel defining a through hole, at least one lens received in the through hole and an IR bandpass filter received in the barrel and configured fo... | 05/06/2008 |
| 7365351 | Systems for protecting internal components of a EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 04/29/2008 |
| 7355191 | Systems and methods for cleaning a chamber window of an EUV light source Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation.... | 04/08/2008 |
| 7355189 | Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device The invention provides a charged particle therapy system capable of increasing the number of patients treated. An irradiation filed forming apparatus for irradiating a charged particle beam extracted from a charged particle beam generator to an irradiation target in... | 04/08/2008 |
| 7354500 | Mask and apparatus using it to prepare sample by ion milling A mask for use with a sample preparation apparatus that prepares an ion-milled sample adapted to be observed by an electron microscope is offered. It is possible to prepare the sample having a desired cross section by the use of the mask. The mask, which defines the... | 04/08/2008 |
| 7355192 | Adjustable suspension assembly for a collimating lattice According to one aspect of the invention a plasma-based substrate processing apparatus comprises a collimator holding device, which efficiently and accurately positions a collimator over a substrate to enable the plasma-based substrate processing apparatus to select... | 04/08/2008 |
| 7282706 | Advanced optics for rapidly patterned laser profiles in analytical spectrometry The present invention is directed to a novel arrangement of optical devices for the rapid patterning of laser profiles used for desorption and/or ionization sources in analytical mass spectrometry. Specifically, the new optical arrangement provides for a user-define... | 10/16/2007 |
| 7263165 | Flat panel detector with KV/MV integration A radiation imaging device includes a detector capable of detecting radiation from either a KV source or an MV source. The detector includes a photodetector assembly, a scintillator adjacent to a first side of the photodetector, and a metal plate adjacent to a secon... | 08/28/2007 |
| 7250620 | EUV lithography filter Filters for EUV lithography, methods of manufacture thereof, and methods of filtering in an EUV lithography system are disclosed. The filter comprises a nanotube material layer sandwiched by two thin material layers that are highly transmissive and provide structura... | 07/31/2007 |
| 7247869 | Particle therapy system A particle therapy system capable of measuring energy of a charged particle beam even during irradiation of the charged particle beam is provided. A beam delivery (irradiation) system comprises a block collimator constituted by a pair of collimator members, and an e... | 07/24/2007 |
| 7247870 | Systems for protecting internal components of an EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 07/24/2007 |
| 7230258 | Plasma-based debris mitigation for extreme ultraviolet (EUV) light source A light source chamber in an Extreme Ultraviolet (EUV) lithography system may include a secondary plasma to ionize debris particles created by the light source and a foil trap to trap the ionize particles to avoid contamination of the collector optics in the chamber... | 06/12/2007 |
| 7169481 | Radiation image conversion panel and manufacturing method therefor A radiation image conversion panel that has a phosphor layer. The phosphor layer contains a binding agent, a phosphor particle, and at least aryl carboxylic acid or alicyclic carboxylic acid, expressed by the following general Formula: R—R1—... | 01/30/2007 |
| 7148497 | Variable wavelength ultraviolet lamp A variable wavelength ultraviolet lamp. An apparatus for selectively producing one or more of a plurality of wavelength distributions of light is provided, comprising a primary light source having a primary wavelength distribution, at least one wavelength-transformi... | 12/12/2006 |
| 7126110 | Optronic passive surveillance device The present invention relates to an optronic passive surveillance device, especially for infrared surveillance. It comprises a front optic (1) of given useful instantaneous field, means (2) for scanning a scene with a given total field of observ... | 10/24/2006 |
| 7122812 | Leak detection lamp A light source for examining sites in heating, ventilating, and air conditioning systems for leaks using a fluorescent dye is described. The light source can include a low voltage lamp or a low heat generating lamp. ... | 10/17/2006 |
| 7109503 | Systems for protecting internal components of an EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 09/19/2006 |
| 7056389 | Method and device for thermal treatment of substrates The object of the invention is to measure temperature using pyrometers, in a simple and economic way, enabling precise temperature measurement, even for low temperatures. The invention presents a device and method for thermally treating substrates, wherein the subst... | 06/06/2006 |
| 7022382 | UV-cure of coatings for an optical fiber with a laser An apparatus and method efficiently focuses laser light to a target fiber to rapidly and evenly cure a coating on the fiber and to increase a draw rate for the fiber. The laser light is expanded and refocused to a strip of light having a diameter that is a multiple ... | 04/04/2006 |
