Famous Patents
British merchant Peter Durand invented the tin can in 1810.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7361916 | Coupled nano-resonating energy emitting structures A coupled nano-resonating structure includes a plurality of a nano-resonating substructures constructed and adapted to couple energy from a beam of charged particles into said nano-resonating structure and to transmit the coupled energy outside said nano-resonating ... | 04/22/2008 |
| 7358512 | Dynamic pattern generator for controllably reflecting charged-particles One embodiment relates to a dynamic pattern generator for controllably reflecting charged particles. The generator includes at least a controllable light emitter array, an optical lens, and an array of light-sensitive devices. The controllable light emitter array is... | 04/15/2008 |
| 7322287 | Apparatus for fluid pressure imprint lithography Improved apparatus for imprint lithography involves using direct fluid pressure to press a mold into a substrate-supported film. Advantageously the mold and/or substrate are sufficiently flexible to provide wide area contact under the fluid pressure. Fluid pressing ... | 01/29/2008 |
| 7301263 | Multiple electron beam system with electron transmission gates A multiple electron beam source comprises a photon source to generate a photon beam, a lens to focus the photon beam, a photocathode having a photon receiving surface and an electron emitting surface, and an array of electron transmission gates spaced apart from the... | 11/27/2007 |
| 7282706 | Advanced optics for rapidly patterned laser profiles in analytical spectrometry The present invention is directed to a novel arrangement of optical devices for the rapid patterning of laser profiles used for desorption and/or ionization sources in analytical mass spectrometry. Specifically, the new optical arrangement provides for a user-define... | 10/16/2007 |
| 7276707 | Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive... | 10/02/2007 |
| 7265713 | Overlapping subarray architecture An embodiment of an electronically scanned array antenna includes an array of radiative elements having an array height. A plurality of separate subarrays of the radiative elements include a first row comprising a first plurality of subarrays, wherein subarrays of t... | 09/04/2007 |
| 7256406 | Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitter An emitter for an electron-beam projection lithography system includes a photoconductor substrate, an insulating layer formed on a front surface of the photoconductor substrate, a gate electrode layer formed on the insulating layer, and a base electrode layer formed... | 08/14/2007 |
| 7253426 | Structures and methods for coupling energy from an electromagnetic wave A device couples energy from an electromagnetic wave to charged particles in a beam. The device includes a micro-resonant structure and a cathode for providing electrons along a path. The micro-resonant structure, on receiving the electromagnetic wave, generates a v... | 08/07/2007 |
| 7253424 | Method of implanting a substrate and an ion implanter for performing the method An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the... | 08/07/2007 |
| 7250618 | Radiantly heated cathode for an electron gun and heating assembly A heating assembly (36) for heating a cathode (38) of an electron gun (30) of an exposure apparatus (10) includes a radiation source (42) and a beam shaper (44). The radiation source (42) generates a source beam (4... | 07/31/2007 |
| 7227618 | Pattern generating systems A pattern generating system for generating two-dimensional images on a surface includes a light source and one or more Zone Plate Modulator (ZPM) arrays. The ZPM arrays comprise diffractive zone plate modulating elements that are capable of either diffracting or ref... | 06/05/2007 |
| 7208712 | Structures and methods for coupling energy from an electromagnetic wave A device couples energy from an electromagnetic wave to charged particles in a beam. The device includes a micro-resonant structure and a cathode for providing electrons along a path. The micro-resonant structure, on receiving the electromagnetic wave, generates a v... | 04/24/2007 |
| 7189979 | Electron gun An electron gun includes a cathode portion which emits electrons, an anode portion which accelerates the emission electrons, a bias portion which is arranged between the cathode portion and the anode portion and controls trajectories of the emission electrons, a shi... | 03/13/2007 |
| 7184137 | Aerial reticle inspection with particle beam conversion One embodiment disclosed relates to an apparatus for inspecting or revieiwing a mask or reticle. The apparatus includes at least an optical system, a converter plate, and an electron system. The optical system projects an optical illumination onto the mask. The opti... | 02/27/2007 |
| 7173263 | Optical switching in lithography system A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator generates a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls each of the modulators. T... | 02/06/2007 |
| 7161162 | Electron beam pattern generator with photocathode comprising low work function cesium halide An electron beam pattern generator comprises a laser beam generator to generate a laser beam. A photocathode receives the laser beam and generates one or more electron beams. The photocathode comprises cesium halide material, such as for example, cesium bromide or i... | 01/09/2007 |
| 7126672 | Lithographic apparatus and device manufacturing method A lithography apparatus including a projection system configured to project a beam of radiation onto a substrate as an array of sub-beams of radiation and an array of individually controllable elements configured to modulate the sub-beams of radiation. The apparatus... | 10/24/2006 |
| 7105841 | Photolithographic techniques for producing angled lines The present subject matter allows non-orthogonal lines to be formed at the same thickness as the orthogonal lines so as to promote compact designs, to be formed with even line edges, and to be formed efficiently. One aspect of the present subject matter relates to a... | 09/12/2006 |
| 7105808 | Plasma ion mobility spectrometer Ion mobility spectrometer. The spectrometer includes an enclosure for receiving a sample therewithin and an electron beam window admits an electron beam into the enclosure to ionize the sample in an ionization region. A shutter grid is spaced apart from the ionizati... | 09/12/2006 |
| 7095036 | Electron beam lithography apparatus using a patterned emitter and method of fabricating the patterned emitter An electron beam lithography apparatus for providing one-to-one or x-to-one projection of a pattern includes a pyroelectric emitter, which is disposed a predetermined distance apart from a substrate holder, the pyroelectric emitter including a pyroelectric plate hav... | 08/22/2006 |
| 7095037 | Electron beam lithography system having improved electron gun An electron beam lithography system has an electron gun including at least one laser that is operable in a first mode to generate electrons for lithography. The electron beam lithography system is operable in a second mode to regenerate the photocathode of the elect... | 08/22/2006 |
| 7081851 | Overlapping subarray architecture An embodiment of an electronically scanned array antenna includes an array of radiative elements having an array height. A plurality of separate subarrays of the radiative elements include a first row comprising a first plurality of subarrays, wherein subarrays of t... | 07/25/2006 |
| 7057193 | Exposure apparatus An exposure apparatus which draws a pattern on a substrate with electron beams. The apparatus includes a substrate stage which supports the substrate, a transfer stage which moves the substrate stage, an electromagnetic actuator which moves the substrate stage relat... | 06/06/2006 |
| 7045791 | Column simultaneously focusing a partilce beam and an optical beam The invention concerns a column for producing a focused particle beam comprising: a device (100) focusing particles including an output electrode (130) with an output hole (131) for allowing through a particle beam (A); an optical focusing devic... | 05/16/2006 |
| 7031508 | Reflectometry system with compensation for specimen holder topography and with lock-rejection of system noise A self-contained system uses light reflectivity to examine intensity of a dyed spot on a device membrane surrounded by background area to discern information about the specimen that produced the spot. In a preferred embodiment, a master clock alternatively drives on... | 04/18/2006 |
| 7019312 | Adjustment in a MAPPER system The present invention relates to a lithography system comprising: means for generating a plurality of light beamlets, and an electron source, arranged to be illuminated by said light beamlets, said electron source ... | 03/28/2006 |
| 7011927 | Electron beam duplication lithography method and apparatus An electron beam duplication lithography apparatus and method for focusing electrons emitted from a mask plate as a result of an application of an electric field between a mask plate and a duplication plate. Irradiation of electrons from the mask plate is assisted t... | 03/14/2006 |
| 7005658 | Charged particle beam exposure apparatus and method A multi-charged-particle beam drawing apparatus and method that can correct a change in positional relationship, caused by the Coulomb effect, among charged particle beams are provided. The focal lengths of two electron lenses (21, 22) that form a condenser l... | 02/28/2006 |
| 6967711 | Lithographic apparatus and device manufacturing method A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops tha... | 11/22/2005 |
| 6953938 | Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus A deflector which deflects a charged particle beam includes a substrate having an opening through which the charged particle beam should pass, and a deflection electrode which is arranged in the opening to deflect the charged particle beam and has a first conductive... | 10/11/2005 |
| 6946665 | Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus A charged particle beam exposure apparatus which exposes a substrate using a plurality of charged particle beams includes a first measurement member for making the plurality of charged particle beams come incident and measuring a total current value of the charged p... | 09/20/2005 |
| 6936981 | Retarding electron beams in multiple electron beam pattern generation A multiple electron beam pattern generator includes a multiple electron beam source to generate a plurality of electron beams that are modulated according to a pattern. An anode accelerates the electron beams, and then a beam retarding system generates a retarding e... | 08/30/2005 |
| 6930756 | Electron beam exposure apparatus and semiconductor device manufacturing method An electron beam exposure apparatus which exposes a substrate with a predetermined pattern using one or a plurality of electron beams. The apparatus includes a substrate stage on which a substrate is mounted, a transfer stage which drives the substrate stage on an X... | 08/16/2005 |
| 6919952 | Direct write lithography system The mask-less lithography system has a converter that includes an array of light controllable electron sources. Each electron source is arranged for converting light into an electron beam and has an activation area. Individually controllable light sources are includ... | 07/19/2005 |
| 6909104 | Miniaturized terahertz radiation source A miniaturized terahertz radiation source based on the Smith-Purcell effect is provided, in which, from a focused electron source, a high-energy bundle of electrons is transmitted at a defined distance over a reflection diffraction grating composed of transversely d... | 06/21/2005 |
| 6903348 | Wafer holding apparatus for ion implanting system An ion implanting system and a wafer holding apparatus therefor are provided. The ion implanting system includes x- and y-axis rotating parts; first and second angle measuring circuits; and a controller. The x-axis rotating part rotates a main surface of a wafer abo... | 06/07/2005 |
| 6903353 | Charged particle beam exposure apparatus, device manufacturing method, and charged particle beam applied apparatus A high-precision multi-charged-particle-beam exposure apparatus has a charged particle source (ES) that emits a charged particle beam. An aperture array (AA) having plural apertures divides the charged particle beam from the charged particle source (ES) into plural ... | 06/07/2005 |
| 6891176 | Planar electron emitter with extended lifetime and system using same Metal-insulator-metal planar electron emitters (PEES) have potential for use in advanced lithography for future generations of semiconductor devices. The PEE has, however, a limited lifetime, which restricts its commercial applicability. It is believed that the limi... | 05/10/2005 |
| 6870171 | Exposure apparatus An electron beam exposure apparatus which exposes a wafer (118) by using a plurality of electron beams corrects the positional error of the electron beams by using multi-deflector arrays (105, 106) capable of independently deflecting the positions of t... | 03/22/2005 |
