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| Number | Title | Issue Date |
| 8188450 | Multiple beam charged particle optical system The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ... | 05/29/2012 |
| 7985958 | Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program According to an aspect of the invention, there is provided an electron beam drawing apparatus comprising at least one stage of a deflection amplifier and a deflection unit, a first storage section which stores shot information at a drawing time, a second storage sec... | 07/26/2011 |
| 7964856 | Ion implanting apparatus In an ion implanting apparatus 10 including a separation slit 20 which receives an ion beam 1 having passed through a mass-separation electromagnet 17 and allows a desired type of ion to selectively pass therethrough, the separation slit ... | 06/21/2011 |
| 7928414 | Charged particle beam writing apparatus and charged particle beam writing method A charged particle beam writing apparatus includes an irradiation part configured to irradiate a charged particle beam; a first shaping aperture member having passing areas, that the charged particle beam passes through, on both sides of an area blocking the charged... | 04/19/2011 |
| 7923704 | Charged particle beam writing method A charged particle beam writing method includes writing a pattern on a first target object by using a charged particle beam in a writing apparatus; and conveying a second target object after having written the pattern on the first target object, wherein even though ... | 04/12/2011 |
| 7838851 | Method and device for fabricating nano-structure with patterned particle beam The present invention provides a method and an apparatus for producing a two-dimensional patterned beam, e.g. a two-dimensional patterned and focused ion beam, for fabricating a nano-structure on a substrate with the precursor gas. In comparison with the conventiona... | 11/23/2010 |
| 7786454 | Optics for generation of high current density patterned charged particle beams A direct-write electron beam lithography system employing a patterned beam-defining aperture to enable the generation of high current-density shaped beams without the need for multiple beam-shaping apertures, lenses and deflectors is disclosed. Beam blanking is acco... | 08/31/2010 |
| 7772575 | Stencil design and method for cell projection particle beam lithography A method and system for particle beam lithography, such as electron beam (EB) lithography, is disclosed. The method and system include selecting one of a plurality of cell patterns from a stencil mask and partially exposing the cell pattern to a particle beam, such ... | 08/10/2010 |
| 7763866 | Charged particle beam device with aperture The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus t... | 07/27/2010 |
| 7759660 | Electron beam lithography system Methods to reduce the write time for forming mask patterns having angled and non-angled features using electron beam lithography are disclosed. In one exemplary embodiment, non-angled features of the mask pattern are formed by exposure to an electron beam. The orien... | 07/20/2010 |
| 7714308 | Variable shaped electron beam lithography system and method for manufacturing substrate This VSB lithography system includes a first, second and third aperture for forming a single electron beam in each of the rectangular opening portion that are provided, and draws a figure pattern using the single electron beam formed by passing the beam through the ... | 05/11/2010 |
| 7692167 | High-fidelity reflection electron beam lithography One embodiment pertains to an apparatus for reflection electron beam lithography, including at least illumination electron-optics, an electron-reflective pattern generator, projection electron-optics, a moving stage holding a target substrate, control circuitry, and... | 04/06/2010 |
| 7633074 | Arrangement and method for compensating emitter tip vibrations A charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip and a supporting member for supporting the emitter is provided. Further, the apparatus includes an emitter location measuring device for repeatedly measuri... | 12/15/2009 |
| 7582884 | Charged particle beam exposure method and charged particle beam exposure device When a space, sandwiched by large patterns having a predetermined size or more, is exposed using a charged particle beam, the space sandwiched by the large patterns is exposed using a common block mask having the space and edge portions of the large patterns on both... | 09/01/2009 |
| 7462848 | Optics for generation of high current density patterned charged particle beams A direct-write electron beam lithography system employing a patterned beam-defining aperture to enable the generation of high current-density shaped beams without the need for multiple beam-shaping apertures, lenses and deflectors is disclosed. Beam blanking is acco... | 12/09/2008 |
| 7442946 | Nonuniform ion implantation apparatus and method using a wide beam A nonuniform ion implantation apparatus comprises a wide ion beam generator for generating a wide ion beam including a plurality of wide ion beams irradiated on at least two sections among a plurality of sections into which a wafer is divided, and a wafer drive unit... | 10/28/2008 |
| 7442947 | Electron-beam exposure system and electron-beam exposure method A multicolumn electron-beam exposure system includes: a plurality of column cells, which are arranged above a wafer, and each of which includes an electron gun and deflection means which deflects an electron beam irradiated from the electron gun; common storage mean... | 10/28/2008 |
| 7432515 | Charged particle beam lithography apparatus and method A charged particle beam lithography apparatus includes a charged particle beam generation source; a charged particle beam forming portion through which the charged particle beam is transmitted; a first deflector arranged between the charged particle beam forming por... | 10/07/2008 |
| 7427765 | Electron beam column for writing shaped electron beams An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters ... | 09/23/2008 |
| 7425715 | Digital parallel electron beam lithography stamp An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed for use as a lithographic stamp. Crosswire addressing is used to generate electron emission from particular nanotips within the array. The nanotip array may be us... | 09/16/2008 |
| 7423277 | Ion beam monitoring in an ion implanter using an imaging device An image monitor system monitors characteristics of an ion beam employed in ion implantation. The monitored characteristics can include particle count, particle information, beam current intensity, beam shape, and the like. The system includes one or more image sens... | 09/09/2008 |
| 7417234 | Spatial-phase locking of energy beams for determining two-dimensional location and beam shape A method or system of spatial-phase locking a beam used in maskless lithography provides a fiducial grid with a single spatial-period, the fiducial grid being rotated at an angle with respect to a direction of scanning the beam; detects a signal generated in respons... | 08/26/2008 |
| 7414240 | Particle remover, exposure apparatus having the same, and device manufacturing method A particle remover includes an irradiation unit for irradiating plural lights onto a target from different directions, and for scanning the lights on the target, and a collector for collecting particles carried as a result of scanning of the lights. ... | 08/19/2008 |
| 7410508 | Apparatus for crystallizing semiconductor with laser beams Laser beams emitted by a plurality of laser sources are divided into a plurality of sub-beams, which are irradiated onto selected portions of an amorphous semiconductor on a substrate to crystallize the amorphous semiconductor. A difference in diverging angles betwe... | 08/12/2008 |
| 7405407 | Ion beam therapy system and its couch positioning method A therapy system using an ion beam, which can shorten the time required for positioning a couch (patient). The therapy system using the ion beam comprises a rotating gantry provided with an ion beam delivery unit including an X-ray tube. An X-ray detecting device ha... | 07/29/2008 |
| 7405414 | Method and apparatus for patterning a workpiece The present invention relates to a method for creating a pattern on a workpiece sensitive to electromagnetic radiation. Electromagnetic radiation is emitted onto a computer controlled reticle having a multitude of modulating elements (pixels). The pixels are arrange... | 07/29/2008 |
| 7388217 | Particle-optical projection system In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; i... | 06/17/2008 |
| 7388215 | Pattern drawing method, stamper manufacturing method, and pattern drawing apparatus A pattern drawing method capable of drawing a pattern such that opposite ends of a formation region on an inner periphery side and an outer periphery side are substantially linearly formed. A drawing beam is intermittently irradiated N times onto a generally belt-sh... | 06/17/2008 |
| 7388214 | Charged-particle beam exposure apparatus and method A charged particle beam exposure apparatus which splits a charged-particle beam from a charged-particle beam source into a plurality of charged-particle beams by a plurality of apertures formed in an aperture array to expose a wafer using the plurality of charged-pa... | 06/17/2008 |
| 7385194 | Charged particle beam application system An object of the present invention is to measure a landing angle even in a multi electron beam lithography system in which current amount of each beam is small. Another object thereof is to measure an absolute value of the landing angle and a relative landing angle ... | 06/10/2008 |
| 7385209 | Micromachining process, system and product Ion beam lithography technique wherein a higher amount of radiation energy is deposited to predetermined regions in the bulk if a suitable substrate. By selecting the radiation nature, its energy and the irradiation parameters a structure can be created in the bulk ... | 06/10/2008 |
| 7381979 | Rotating irradiation apparatus A rotating irradiation apparatus includes a rotating gantry 3 including a front ring 19 and a rear ring 20 and is provided with a beam delivery device 11 and an irradiation device 4. The beam delivery device 11 delivers an i... | 06/03/2008 |
| 7377228 | System for and method of gas cluster ion beam processing System and method of gas-cluster ion beam processing is realized by incorporating improved beam and workpiece neutralizing components. Larger GCIB current transport is enabled by low energy electron neutralization of space charge of the GCIB. The larger currents tra... | 05/27/2008 |
| 7372049 | Lithographic apparatus including a cleaning device and method for cleaning an optical element An EUV lithographic apparatus includes an EUV radiation source, an optical element and a cleaning device. The cleaning device includes a hydrogen radical source and a flow tube in communication with the hydrogen radical source. The cleaning device is configured to p... | 05/13/2008 |
| 7368737 | Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method An electron beam writing method is disclosed, which includes preparing electron beam writing data structured from writing pattern data expressed by both data of VSB shots which are units of shaping beams at the time of carrying out writing a pattern and data of CP s... | 05/06/2008 |
| 7368731 | Method and apparatus which enable high resolution particle beam profile measurement The PSF for a metrology array for high resolution particle beam profile measurement has been improved by improving five major elements of the metrology array. While improvement in each of the five elements provides and improved PSF, a combination of all five of the ... | 05/06/2008 |
| 7368738 | Advanced pattern definition for particle-beam exposure In a pattern definition device for use in a particle-beam exposure apparatus a plurality of blanking openings (910) are arranged within a pattern definition field (bf) composed of a plurality of staggered lines (bl) of blanking openings, each provided with a ... | 05/06/2008 |
| 7368736 | Charged beam exposure apparatus and method for manufacturing mask and semiconductor device A exposure apparatus includes a charged beam radiating unit configured to radiate a charged beam, a shaping unit including an opening for shaping the beam, a storage unit to store a history of data concerning a beam area of the beam on the shaping unit, a predicting... | 05/06/2008 |
| 7361909 | Method and apparatus for correcting drift during automated FIB processing A method and apparatus for correcting drift of the beam irradiation position during automated FIB (focused ion beam) processing with a reference image-setting unit, an image read-in unit for reading in images of the reference image region during the FIB processing, ... | 04/22/2008 |
| 7358658 | Amorphous diamond materials and associated methods for the use and manufacture thereof An electroluminescence device having improved luminescence per volt input is provided. The device can include a first electrode, a second electrode, a diamond-like carbon layer electrically coupled to at least one of the first electrode or the second electrode, and ... | 04/15/2008 |
