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| Number | Title | Issue Date |
| 8101928 | Deflection signal compensation for charged particle beam Charged particles that are in transit through a deflection system when the beam is repositioned do not received the correct deflection force and are misdirected. By independently applying signals to the multiple stages of a deflection system, the number of misdirect... | 01/24/2012 |
| 8076656 | Writing apparatus and writing data conversion method A writing apparatus includes a storage unit configured to store writing data, an acquiring unit configured to acquire information on a pattern defined based on the writing data, a selecting unit configured to select a format of a plurality of formats having differen... | 12/13/2011 |
| 8067752 | Semiconductor testing method and semiconductor tester A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pa... | 11/29/2011 |
| 8049192 | Apparatus and system for controlling ion ribbon beam uniformity in an ion implanter An ion beam blocking array configured to provide a mechanical means for adjusting the beam current profile of an ion ribbon beam by blocking the beam current at one or more locations across the ribbon beam. The ion beam blocking array includes a drive motor, an axle... | 11/01/2011 |
| 8049191 | Method of transferring pattern of reticle, computer readable storage medium, and method of manufacturing device A method includes setting a target pattern to be formed on a substrate using a reticle, obtaining a first pattern using the reticle and a first illumination condition, calculating, a second illumination condition under which the target pattern is transferred onto th... | 11/01/2011 |
| 8049189 | Charged particle system A charged particle system comprises a particle source for generating a beam of charged particles and a particle-optical projection system. The particle-optical projection system comprises a focusing first magnetic lens (403) comprising an outer pole piece ( | 11/01/2011 |
| 8049190 | Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium When writing the shapes of elements of a fine pattern on a substrate by microscopically vibrating the electron beam back and forth in a radial direction of the substrate or in a direction orthogonal to the radial direction and deflecting the electron beam in a direc... | 11/01/2011 |
| 8030625 | Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium When writing element shapes of a fine pattern on a substrate applied with a resist by scanning an electron beam thereon, ON/OFF control is performed for emitting the electron beam at a predetermined rotational position of the substrate by a blanking-OFF signal, perf... | 10/04/2011 |
| 8030626 | Apparatus and method for charged-particle beam writing An average write speed M is calculated by averaging write speeds for blocks of a tentative block size La, and write speed variation σ of the blocks with respect to the average write speed M is calculated (Step S12). A maximum speed Vmax is calculated by acce... | 10/04/2011 |
| 8026495 | Charged particle beam exposure system A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged... | 09/27/2011 |
| 8022376 | Method for manufacturing semiconductor device or photomask A method for manufacturing a semiconductor device or a photomask by exposing a pattern while scanning a plurality of deflection regions determined depending on a deflection width of an exposure device on an exposure target with electron beams, enables a computer to ... | 09/20/2011 |
| 8013315 | Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same A charged particle beam apparatus 300 for observing and estimating a sample W by applying a charged particle beam to sample W to detect secondary charged particles, such as electrons emitted from the sample, reflected electrons and backscattered electrons com... | 09/06/2011 |
| 7985957 | Methods for concealing surface defects Methods for removing random or uncontrolled surface defects from a work piece surface are provided, by applying a plurality of induced controlled defects over the random defects to alter the surface texture. ... | 07/26/2011 |
| 7977655 | Method and system of monitoring E-beam overlay and providing advanced process control A method for monitoring overlay of a direct-write system. The method includes providing a substrate having a pattern formed thereon by the direct-write system, generating data associated with the substrate pattern, decomposing the data by applying a transformation m... | 07/12/2011 |
| 7977653 | Semiconductor device fabrication method and fabrication apparatus using a stencil mask A semiconductor device fabrication method includes preparing a substrate having a first circuit pattern of a semiconductor device; providing a mask with at least part of second circuit pattern of the semiconductor device; collimating incident direction of particles;... | 07/12/2011 |
| 7977654 | Writing apparatus and writing method A writing apparatus includes a writing unit configured to a write a pattern onto a target workpiece, based on a writing data of the pattern to be written on the target workpiece, and a generation unit configured generate, after the pattern has been written, writing ... | 07/12/2011 |
| 7956337 | Scribe process monitoring methodology One embodiment of the present invention sets forth a computer-implemented method for tuning laser scribe parameters during the fabrication of a solar module. The method includes analyzing the visual appearance of a laser scribe to extract various morphological param... | 06/07/2011 |
| 7939813 | E-beam exposure apparatus An e-beam exposure apparatus includes an electron gun provide an e-beam for exposure to a resist layer formed on a substrate; an e-beam column part inducing the path of the e-beam generated from the electron gun; and an electron collecting part disposed at the perip... | 05/10/2011 |
| 7923703 | Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus One of principal objects of the present invention is to provide a sample dimension measuring method for detecting the position of an edge of a two-dimensional pattern constantly with the same accuracy irrespective of the direction of the edge and a sample dimension ... | 04/12/2011 |
| 7902528 | Method and system for proximity effect and dose correction for a particle beam writing device A method of particle beam lithography includes selecting at least two cell patterns from a stencil, correcting proximity effect by dose control and by pattern modification for the at least two cell patterns, and writing the at least cell two patterns by one shot of ... | 03/08/2011 |
| 7897946 | Crystallization apparatus, crystallization method, device, and light modulation element A crystallization apparatus includes a light modulation element, and an image forming optical system that forms a light intensity distribution set based on light transmitted through the light modulation element on an irradiation surface. The crystallization apparatu... | 03/01/2011 |
| 7893411 | Charged-particle beam writing apparatus and charged-particle beam writing method A timing control circuit controls the timing for applying a voltage to a sub deflector when changing a position to be irradiated with the charged-particle beam. A control computer compares a target line width and a line width of a pattern written with the timing for... | 02/22/2011 |
| 7868308 | Electron beam writing method, fine pattern writing system, and manufacturing method of uneven pattern carrying substrate A fine pattern which includes servo patterns, each constituted by servo elements, and groove patterns, each for separating adjacent data tracks, is formed on a substrate applied with a resist and placed on a rotation stage by scanning an electron beam on the substra... | 01/11/2011 |
| 7868307 | Charged particle beam exposure system A charged particle beam exposure apparatus for transferring a pattern onto a surface of a target, comprising a beam generator comprising a plurality of n changed particle sources, substantially in one plane, each source adapted for generating a charged particle beam... | 01/11/2011 |
| 7863586 | Writing data creation method and charged particle beam writing apparatus A method of creating writing data for writing a pattern on a target workpiece by using a writing apparatus provided with a plurality of columns that emit charged particle beams includes inputting information on distance between optical centers of the plurality of co... | 01/04/2011 |
| 7851774 | System and method for direct writing to a wafer A direct-write (DW) exposure system is provided which includes a stage for holding a substrate and configured to scan the substrate along an axis during exposure, a data processing module for processing pattering data and generating instructions associated with the ... | 12/14/2010 |
| 7842935 | Raster frame beam system for electron beam lithography A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scann... | 11/30/2010 |
| 7842936 | Lithography system and projection method The present invention relates a probe forming lithography system for generating a pattern on to a target surface such as a wafer, using a black and white writing strategy, i.e. writing or not writing a grid cell, thereby dividing said pattern over a grid comprising ... | 11/30/2010 |
| 7834333 | Charged particle beam lithography system and method for evaluating the same In the charged particle beam lithography system, a pattern area to be drawn is divided into a plurality of frames, a main deflection positions a charged particle beam to a subfield within the frame, and an auxiliary deflection draws a pattern in units of the subfiel... | 11/16/2010 |
| 7800084 | System and method for charged-particle beam lithography A charged-particle beam lithography system is provided. A region to be patterned is divided into plural frames, a main deflection positions a beam to a subfield within the frame, and an auxiliary deflection draws a pattern in units of subfield. The deflection contro... | 09/21/2010 |
| 7786453 | Charged-particle beam pattern writing method and apparatus with a pipeline process to transfer data A charged-particle beam writing apparatus includes first and second storage devices, a transfer processor for sequentially sending to the first storage several design data files per pattern layout-defined region, a first data processor which sequentially reads desig... | 08/31/2010 |
| 7781748 | Particle-beam exposure apparatus with overall-modulation of a patterned beam In a charged-particle exposure apparatus for exposure of a target with a beam of electrically charged particles, the illumination system includes a deflector device adapted to vary the direction of incidence of the illuminating beam upon the pattern definition devic... | 08/24/2010 |
| 7777205 | Electron beam lithography system An electron beam lithography method is provided for sequentially irradiating an electron beam deflected by a deflector on a shot-by-shot basis to draw a pattern on a surface of a sample mounted on a stage. This method includes the step of irradiating the electron be... | 08/17/2010 |
| 7777204 | System and method of electron beam writing A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received info... | 08/17/2010 |
| 7772574 | Pattern lock system for particle-beam exposure apparatus In a pattern-lock system of particle-beam apparatus wherein the imaging of the pattern is done by means of at least two consecutive projector stages of the projecting system, reference marks are imaged upon registering means to determine the position of the particle... | 08/10/2010 |
| 7759659 | Charged particle beam writing method A writing method includes emitting a first charged particle beam formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece; and emitting a second charged particle beam formed to be a second shape by... | 07/20/2010 |
| 7750324 | Charged particle beam lithography apparatus and charged particle beam lithography method A charged particle beam lithography apparatus includes a first block area divider configured to divide a pattern forming area into a plurality of first block areas in order to make a number of shots when forming a pattern substantially equal; an area density calcula... | 07/06/2010 |
| 7741622 | Exposure device The present invention presents an exposure device, which includes an optical source for emitting a UV ray, a lighting system for shaping the UV ray into a collimated light beam, an aperture member for producing rectangular first and second light beams based on the l... | 06/22/2010 |
| 7737420 | Pixelated modulation of illumination pupil image The present invention describes a method of conditioning radiation upstream from a reticle including: pixelating the radiation, the pixelating involving partitioning into pixels; modulating a first set of the pixels to configure for openings; modulating a second set... | 06/15/2010 |
| 7737421 | Electron beam exposure apparatus and method for cleaning the same Provided is an electron beam exposure apparatus for forming a desired pattern on a sample mounted on a wafer stage by exposure with an electron beam generated form an electron gun. The electron beam exposure apparatus includes: supplying device of injecting a reduci... | 06/15/2010 |
