Did You Know...
...that two musicians were responsible for the invention of color print film? Fascinated by photography, Leopold Godowsky and Leopold Mannes worked together to produce an easy-to-use, practical color film. They worked full time as music teachers and gave concerts while experimenting during their off hours in Mannes' kitchen. Their success earned them full-time, well-paying jobs at Kodak and their efforts resulted in Kodachrome film, which was introduced in 1935.
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| Number | Title | Issue Date |
| 8134130 | Ion source with corner cathode An ion source may include first, second, and third electrodes. The first electrode may be a repeller having a V-shaped groove. The second electrode may be an electron emitter filament disposed adjacent the base of the V-shaped groove. The third electrode may be an a... | 03/13/2012 |
| 8071958 | Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions A method of manufacturing a semiconductor device includes the steps of: providing a supply of molecules containing a plurality of dopant atoms into an ionization chamber, ionizing said molecules into dopant cluster ions, extracting and accelerating the dopant cluste... | 12/06/2011 |
| 7947966 | Double plasma ion source An ion source includes a first plasma chamber including a plasma generating component and a first gas inlet for receiving a first gas such that said plasma generating component and said first gas interact to generate a first plasma within said first plasma chamber, ... | 05/24/2011 |
| 7855374 | Gas cluster ion beam emitting apparatus and method for ionization of gas cluster An emitting apparatus 50 has a gas cluster generation chamber 2 and a nozzle 3 as means for generating a gas cluster and emitting the gas cluster to a processing object 10. A group of gas clusters jetted from the nozzle 3 is shaped... | 12/21/2010 |
| 7791042 | Method and apparatus for selectively performing chemical ionization or electron ionization An ion source includes structure having separate first and second ion volumes therein, and electron source structure having first and second portions that selectively supply electrons to the first and second ion volumes, respectively. The electron source structure h... | 09/07/2010 |
| 7772564 | Particle-optical apparatus equipped with a gas ion source The invention relates to an electron impact gas ion with high brightness and low energy spread. This high brightness is achieved by injecting electrons in a small ionization volume (from less than 1 μm to several tens of micrometers in size) from one side and extra... | 08/10/2010 |
| 7759655 | Pulsed ion source for quadrupole mass spectrometer and method A variable duty cycle ion source assembly is coupled to a continuous beam mass spectrometer. The duty cycle can be adjusted based on previous scan data or real time sampling of ion intensities during mass analysis. This provides the ability to dynamically control th... | 07/20/2010 |
| 7683342 | Plasma source A plasma source, particularly for disinfection of wounds, comprising: an ionization chamber having an inlet for introducing a gas into the ionization chamber and further having an outlet for dispensing the ionized gas onto an object; several ionization electrodes be... | 03/23/2010 |
| 7544952 | Multivalent ion generating source and charged particle beam apparatus using such ion generating source A multicharged ions generating source that is easy to manufacture, excellent in controllability and maintainability, high in degree of ionization and large in beam intensity and a charged particle beam apparatus using the same are disclosed. The multicharged ions ge... | 06/09/2009 |
| 7521694 | Ion source section for ion implantation equipment An ion source section of ion implantation equipment for ionizing reaction gas in an ion implantation process of semiconductor manufacturing processes is disclosed. The ion source section includes a source aperture member separable from an arc chamber and having an i... | 04/21/2009 |
| 7442941 | Ion generator An ion generator (10) generally includes: a shielding shell (11), a cathode device (16), and an annular anode (14). The shielding shell has a first end (113), an opposite second end (115) and a main body (111) therebe... | 10/28/2008 |
| 7435971 | Ion source An exemplary ion source for creating a stream of ions has an aluminum alloy arc chamber body that at least partially bounds an ionization region of the arc chamber. The arc chamber body is used with a hot filament arc chamber housing that either directly or indirect... | 10/14/2008 |
| 7420182 | Combined radio frequency and hall effect ion source and plasma accelerator system This invention features a combined radio frequency (RF) and Hall Effect ion source and plasma accelerator system including a plasma accelerator having an anode and a discharge zone, the plasma accelerator for providing plasma discharge. A gas distributor introduces ... | 09/02/2008 |
| 7411186 | Multimode ion source with improved ionization A multimode ionization source with improved ionization characteristics that comprises an electrospray ionization source for providing a charged aerosol, an atmospheric pressure chemical ionization (APCI) source including a corona needle having an end positioned down... | 08/12/2008 |
| 7405411 | Ion source with multi-piece outer cathode In certain example embodiments of this invention, there is provided an ion source including an anode and a cathode. In certain example embodiments, a multi-piece outer cathode is provided. The multi-piece outer cathode allows precision adjustments to be made, thereb... | 07/29/2008 |
| 7381943 | Neutral particle beam processing apparatus The present invention relates to a neutral particle beam processing apparatus. More specifically, the present invention relates to a neutral particle beam processing apparatus comprising a plasma discharging space inside which processing gases are converted to plasm... | 06/03/2008 |
| 7365346 | Ion-implanting apparatus, ion-implanting method, and device manufactured thereby An ion-implanting apparatus and method can dynamically control a beam current value with time and does not change energy. This ion-implanting apparatus controls a dynamic change in beam current value with time by giving feedback on the beam current value measured wi... | 04/29/2008 |
| 7365341 | Gas cluster ion beam emitting apparatus and method for ionization of gas cluster An emitting apparatus 50 has a gas cluster generation chamber 2 and a nozzle 3 as means for generating a gas cluster and emitting the gas cluster to a processing object 10. A group of gas clusters jetted from the nozzle 3 is shaped... | 04/29/2008 |
| 7365340 | Resonance method for production of intense low-impurity ion beams of atoms and molecules The present invention comprehends a compact and economical apparatus for producing high intensities of a wide variety of wanted positive and negative molecular and atomic ion beams that have been previously impossible to previously produce at useful intensities. In ... | 04/29/2008 |
| 7365339 | Ion source A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber with a tip of the cathode holder positioned outward from an inner wall surface of the plasma generating chamber. The cathode is held in the cathode holder so... | 04/29/2008 |
| 7361915 | Beam current stabilization utilizing gas feed control loop One or more aspects of the present invention pertain to stabilizing the current or density of an ion beam within an ion implantation system by selectively adjusting a lone parameter of feed gas flow. Adjusting the gas flow does not necessitate adjustments to other o... | 04/22/2008 |
| 7332345 | Chemical sensor system A chemical sensing apparatus and method for the detection of sub parts-per-trillion concentrations of molecules in a sample by optimizing electron utilization in the formation of negative ions is provided. A variety of media may be sampled including air, seawater, d... | 02/19/2008 |
| 7332714 | Quadrupole mass spectrometer and vacuum device using the same In a quadrupole mass spectrometer which measures partial pressure strength according to a gas type in a vacuum system from ion current intensity, a quadrupole mass spectrometer with a total pressure measurement electrode has a total pressure measurement electrode fo... | 02/19/2008 |
| 7321116 | Ionization source for mass spectrometer An apparatus and method for regenerating ion samples for a mass spectrometer are provided. Source samples are loaded on a support which is heated by a laser beam, desorbing the sample without ionization. The desorbed sample is carried by a carrier gas flow through a... | 01/22/2008 |
| 7320733 | Electron bombardment heating apparatus and temperature controlling apparatus and control method thereof An electron bombardment heating apparatus, in which thermions emitted from filaments 9 are accelerated and impinge upon a heating plate 2, so as to heat the heating plate 2, wherein a peripheral wall of a heated material supporting member 1 | 01/22/2008 |
| 7314574 | Etching method and apparatus An etching apparatus comprises a workpiece holder (21) for holding a workpiece (X), a plasma generator (10, 20) for generating a plasma (30) in a vacuum chamber (3), an orifice electrode (4) disposed between the workpiece holder ( | 01/01/2008 |
| 7301160 | Ion sources The invention relates to methods of controlling the effect of ions of an ionisable source gas that can react with interior surfaces of an arc chamber, by introducing ions of a displacement gas into the arc chamber, where the displacement gas ions are more chemically... | 11/27/2007 |
| 7291845 | Method for controlling space charge-driven ion instabilities in electron impact ion sources In a method for inhibiting space charge-related effects in an ion source, an electron beam is directed into a chamber to produce ions from sample material in the chamber. A voltage pulse is applied to the chamber to perturb an electron space charge present in the ch... | 11/06/2007 |
| 7271397 | Combined chemical/biological agent detection system and method utilizing mass spectrometry A mass spectrometer is provided herein and is configured to have two ionization sources, in which a first ionization source, such as MALDI, ESI and the like, which is capable of providing in addition to ions a set of normally intractable desorbed neutrals that are i... | 09/18/2007 |
| 7271401 | Extreme ultra violet light source device An EUV light source device for protecting a collection mirror from debris that is considered harmful to a mirror coating. The EUV light source device includes: a chamber in which extreme ultra violet light is generated; a target injection unit and a target injection... | 09/18/2007 |
| 7259379 | On-axis electron impact ion source An electron impact ion source includes an ionization chamber in which a first rf multipole field can be generated and an ion guide positioned downstream from the ionization chamber in which a second rf multipole field can be generated wherein electrons are injected ... | 08/21/2007 |
| 7247495 | Mass spectrometer method and apparatus for analyzing a sample in a solution The invention provides a mass spectrometric method for analyzing a sample in a solution, including the steps of directing a flow of a solution containing sample compounds to be analyzed towards a supersonic nozzle having an input end and an output end; vaporizing th... | 07/24/2007 |
| 7247863 | System and method for rapidly controlling the output of an ion source for ion implantation An apparatus and a method are disclosed for rapidly controlling the rate of ion generation in an ion source. The ion source includes an ion chamber, filament-cathode, a mirror electrode, and a grid. The ion source is operable to generate an ion beam from the ionizat... | 07/24/2007 |
| 7220976 | Ion source and ion implanter having the same A filament includes a filament rod having an electron-emitting portion, a pair of leads, and a pair of connection portions. The electron-emitting portion is disposed in the arc chamber. The leads extend from the sidewall of the arc chamber to the outside of the arc ... | 05/22/2007 |
| 7205540 | Electron beam apparatus and device manufacturing method using same An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate... | 04/17/2007 |
| 7205552 | Monatomic boron ion source and method Monotomic boron ions for ion implantation are supplied from decaborane vapour. The vapour is fed to a plasma chamber and a plasma produced in the chamber with sufficient energy density to disassociate the decaborane molecules to produce monatomic boron ions in the p... | 04/17/2007 |
| 7204921 | Vacuum apparatus and vacuum processing method A vacuum apparatus which can easily regenerate plasma is provided. A matching box used in the vacuum apparatus can vary the impedance thereof by varying the magnitudes of the inductance of variable inductance elements. Controlling the magnitude of direct current mak... | 04/17/2007 |
| 7196337 | Particle processing apparatus and methods This invention relates to an apparatus for processing particles. The apparatus comprises a particle source having an exist aperture; an extraction electrode located at the exist aperture; an acceleration electrode adjacent to the extraction electrode; a processing c... | 03/27/2007 |
| 7193223 | Desorption and ionization of analyte molecules at atmospheric pressure The invention relates to the ionization of analyte molecules on a solid surface close to atmospheric pressure as an ion source for mass spectrometers. The invention uses a spray mist from an electrospray apparatus to ionize the analyte molecules, for example a spray... | 03/20/2007 |
| 7183559 | Ion source with substantially planar design In certain example embodiments of this invention, there is provide an ion source including an anode and a cathode. In certain example embodiments, the cathode does not overhang over the anode, or vice versa. Since no, or fewer, areas of overhang are provided between... | 02/27/2007 |
