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| Number | Title | Issue Date |
| 8153991 | Direct write lithography system A direct write lithography system. The system includes a converter having an array of light controllable electron sources, each field emitter being arranged for converting light into an electron beam, the field emitters having an element distance between each two ad... | 04/10/2012 |
| 7741614 | Lithography system and lithography method using the same The window-frame judgment unit judges that a section to be drawn has entered a window-frame area according to the main deflector data and the stage position information to output judgment signal. The main deflector calculator receives the main deflector data and cal... | 06/22/2010 |
| 7679068 | Method of calculating deflection aberration correcting voltage and charged particle beam writing method A method of obtaining a deflection aberration correcting voltage. The method includes writing predetermined patterns at a plurality of focus height positions such that a dose is used as a variable. Dimensional variations of width sizes of the predetermined patterns ... | 03/16/2010 |
| 7569836 | Transmission of data between microchips using a particle beam A device includes first and second chips, each chip containing at least one electronic circuit. The second chip has one or more receivers. A deflection mechanism operationally connected to an electronic circuit of the first chip directs a charged particle beam to di... | 08/04/2009 |
| 7566882 | Reflection lithography using rotating platter One embodiment pertains to a method of electron beam lithography. An illumination electron beam is formed, and a dynamic pattern generating device is used to generate an electron-reflective pattern of pixels and to reflect the illumination electron beam from said pa... | 07/28/2009 |
| 7435969 | Method of manufacturing electrostatic deflector, and electrostatic deflector An electrostatic deflector that can be manufactured easily and very accurately without using a member for positioning is provided. After multiple slits 81d to 88d have been formed in the same direction as that of the bus bar of an approxi... | 10/14/2008 |
| 7423276 | Irradiation system with ion beam/charged particle beam In an irradiation system with an ion beam/charged particle beam, an ion beam/charged particle beam is deflected by an energy filter for the energy analysis and then a wafer irradiated with the beam. The energy filter controls the spread of magnetic field distributio... | 09/09/2008 |
| 7397026 | Efficient electron transfer dissociation for mass spectrometry The present invention relates to, inter alia, methods and apparatuses for electron transfer dissociation (ETD) that vary the internal energy of precursor ions for ETD. The methods and apparatuses are particularly useful in mass spectrometry. ... | 07/08/2008 |
| 7397039 | Real-time compensation of mechanical position error in pattern generation or imaging applications Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in “real time”) are provided. For some embodiments, rather than rely on two dimensional position measurements, measurem... | 07/08/2008 |
| 7385203 | Charged particle beam extraction system and method A charged particle beam extraction system and method capable of ensuring higher safety when extraction of an ion beam is on/off-controlled during irradiation of the ion beam for treatment. The charged particle beam extraction system comprises a charged particle beam... | 06/10/2008 |
| 7385185 | Molecular activation for tandem mass spectroscopy In a tandem mass spectrometer means are provided for molecular activation of ions prior to fragmentation. An embodiment of a tandem mass spectrometer comprises a first collision cell receiving analyte ions having an internal energy and a second collision cell situat... | 06/10/2008 |
| 7375357 | Permanent magnet radiation dose delivery enhancement The present invention provides a plurality of permanent magnets to enhance radiation dose delivery of a high energy particle beam. The direction of the magnetic field from the permanent magnets may be changed by moving the permanent magnets. ... | 05/20/2008 |
| 7361916 | Coupled nano-resonating energy emitting structures A coupled nano-resonating structure includes a plurality of a nano-resonating substructures constructed and adapted to couple energy from a beam of charged particles into said nano-resonating structure and to transmit the coupled energy outside said nano-resonating ... | 04/22/2008 |
| 7348569 | Acceleration of charged particles using spatially and temporally shaped electromagnetic radiation A method and apparatus for accelerating charged particles are disclosed, wherein the method comprises using at least a transverse component of a temporally and spatially shaped electromagnetic field to accelerate one or more charged particles. ... | 03/25/2008 |
| 7317192 | High energy polyenergetic ion selection systems, ion beam therapy systems, and ion beam treatment centers Devices and methods are provided for generating laser-accelerated high energy polyenergetic positive ion beams that are spatially separated and modulated based on energy level. The spatially separated and modulated high energy polyenergetic positive ion beams are us... | 01/08/2008 |
| 7294844 | Lithographic apparatus, device manufacturing method, and device manufactured thereby A lithographic apparatus is presented that provides versatile processing time and accuracy selection. The apparatus includes a substrate holder configured to hold a substrate; a radiation system configured to condition a beam of radiation; a support structure config... | 11/13/2007 |
| 7285787 | Epi-illumination microscope and fluorescence filter set A microscope has a light source that emits light to illuminate a sample, a first wavelength selection member that selectively transmits the light from the light source, a light splitter that reflects the light from the first wavelength selection member to epi-illumi... | 10/23/2007 |
| 7282707 | Method and apparatus for handling a sample plate for use in mass analysis A new sample plate handling apparatus for use with mass analysis, and methods for use the same have been developed. The sampling plate handling apparatus comprises a sample plate receiver which receives the sample plate in a first plane, a rotating device for rotati... | 10/16/2007 |
| 7247848 | Electron beam apparatus and method of manufacturing semiconductor device using the apparatus The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing seco... | 07/24/2007 |
| 7230240 | Enhanced scanning control of charged particle beam systems A charged particle beam system and scanning control method capable of imaging, and possibly editing, a device under test (DUT). The charged particle beam system contains a charged particle beam generation unit, such as a focused ion beam (FIB) column, which emits a ... | 06/12/2007 |
| 7227925 | Gantry mounted stereoscopic imaging system A radiation therapy treatment machine that has a stereoscopic imaging system, which includes a rotatable open gantry on which is placed a first diagnostic radiation source, a first diagnostic imager, and a therapeutic radiation source. ... | 06/05/2007 |
| 7205541 | Charged particle beam apparatus An object of this invention is to provide a charged particle beam apparatus that is capable of handling samples without adhering impurities onto the samples. In a scanning electron microscope in which a lubricant was coated on a sliding portion of a movable member t... | 04/17/2007 |
| 7173253 | Object-moving method, object-moving apparatus, production process and produced apparatus A method of moving an object includes a step of fixing the object to an object-moving device, a step of moving the object to a prescribed position by the object-moving device, and a step of releasing the object from the object-moving device. The fixing step includes... | 02/06/2007 |
| 7138642 | Ion source with controlled superposition of electrostatic and gas flow fields Ion source devices with controlled superposition of electrostatic and gas flow fields to effect rapid collisional cooling with improved ion collection and collimation, analytical apparatus comprising such ion source devices, and methods for use are presented. ... | 11/21/2006 |
| 7109481 | Matrix-assisted laser desorption and ionization (MALDI) sample plate releasably coupled to a sample plate adapter Embodiments of the present invention describe a MALDI (matrix-assisted laser desorption and ionization) sample plate body that includes a reusable sample plate and a sample plate adapter that are releasably coupled to one another. In one particular embodiment, the s... | 09/19/2006 |
| 7067827 | Apparatus and method for electron beam irradiation having improved dose uniformity ratio The present invention is related to an apparatus and method for irradiating a product package, comprising a radiation source directing a radiation beam along a beam direction towards said product package, conveying means for transporting said product package past sa... | 06/27/2006 |
| 7026635 | Particle beam processing apparatus and materials treatable using the apparatus Methods, and materials made by the methods, are provided herein for treating materials with a particle beam processing device. According to one illustrative embodiment, a method for treating a material with a particle beam processing device is provided that includes... | 04/11/2006 |
| 6894435 | Method and device for rastering source redundancy A method for scanning a specimen 105 with beams 102 of charged particles of a source group. Thereby, a plurality of target points 402 is scanned with a charged particle beam emitted by a source 106 and the same plurality of target points ... | 05/17/2005 |
| 6888139 | Electron microscope The present invention provides an analysis of displacement by calculating the phase variance image P′ (k, l) between Fourier transformed images of paired images S1 (n, m) and S2 (n, m) to determine the center of gravity of δ peak appearing on the in... | 05/03/2005 |
| 6872942 | High-speed inspection of flat substrates with underlying visible topology One embodiment disclosed relates to a method for inspecting a substrate. The method includes exposing the substrate to an incident beam, inducing relative motion between the incident beam and the substrate, and detecting charged particles emitted from the substrate.... | 03/29/2005 |
| 6855926 | Instrument and method for combined surface topography and spectroscopic analysis A combined surface topography and spectroscopic analysis instrument comprises a scanning tunnelling microscope tip (12); and a sample carrier (58) which supports a sample (10) so that a surface thereto to be analyzed is presented towards the tip... | 02/15/2005 |
| 6740894 | Adjustable implantation angle workpiece support structure for an ion beam implanter utilizing a linear scan motor An ion beam implanter includes an ion beam source for generating an ion beam moving along a beam line and a vacuum or implantation chamber wherein a workpiece is positioned to intersect the ion beam for ion implantation of a surface of the workpiece by the ion beam.... | 05/25/2004 |
| 6710353 | Actuator and transducer An actuator comprises a magnet yoke (10a, 10b) and a carrier member (2) movable relative to the magnet yoke. The magnet yoke (10a, 10b) has at least one permanent magnet (14) and the carrier membe... | 03/23/2004 |
| 6703627 | Real time monitor method and system for extraction electrode A method and apparatus for monitoring an extraction electrode utilized in the implantation of charged particles (i.e., ions) on a semiconductor wafer. A signal may be generated from an encoder associated with the extraction electrode, wherein the signal c... | 03/09/2004 |
| 6674073 | Scattering target-holding mechanism and an electron spin analyzer A scattering target constituting an electron spin analyzer is supported by a scattering target-holding member made of a conductive material from the outside of the space formed by an accelerating electrode and an electrode supporter. Then, the scattering ... | 01/06/2004 |
| 6657204 | Cooling of voice coil motors in lithographic projection apparatus A voice coil motor used in a positioning means associated with either a first object table or a second object table in which the coil is cooled with a cooling jacket in thermal contact with the coil, the cooling jacket comprising at least one channel for ... | 12/02/2003 |
| 6559463 | Mask pattern transfer method, mask pattern transfer apparatus using the method, and device manufacturing method A mask stage speed |Vm|, a wafer stage speed |Vw|, and an absolute value |ƊS| of a beam deflection value are determined (step 101). Then, it is judged whether a stripe number is even or odd (step 108) and deflective directions of a mask stage, a waf... | 05/06/2003 |
| 6542219 | Optical correction plate, and its application in a lithographic projection apparatus A plate with substantially constant thickness is used to compensate for the residual distortion in the image projected by a high-quality projection lens for lithography. The two surfaces of the plate have an identical aspherical profile, whose shape has b... | 04/01/2003 |
| 6528798 | Technique for manufacturing an electrostatic element for steering a charged particle beam A process for manufacturing an electrostatic element for steering a charged particle beam. A cylindrical, non-conductive body having a bore therethrough is assembled with a cylindrical, conductive core also having a bore therethrough and sized to fit with... | 03/04/2003 |
| 6239543 | Electron beam plasma formation for surface chemistry One or more electron beam tubes are arranged to direct electron beams in air or other ambient gas toward a target object. The electron beams ionize air producing a plasma or glow discharge. An electric or magnetic field in the beam trajectory sustains the... | 05/29/2001 |
