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| Number | Title | Issue Date |
| 7777195 | Charged particle beam instrument and method of detecting charged particles A charged particle beam instrument (10) is provided, the instrument comprising a charged particle optical column (12), a voltage source, a detector (14) and a sample holder (18), the column (12) being operable to direct a beam of p... | 08/17/2010 |
| 7723698 | Top metal layer shield for ultra-small resonant structures When using micro-resonant structures which are being excited and caused to resonate by use of a charged particle beam, whether as emitters or receivers, especially in a chip or circuit board environment, it is important to prevent the charged particle beam from coup... | 05/25/2010 |
| 7696488 | Irradiating device and method for controlling the same An irradiating device and a method for controlling it are provided. The device comprises an electron accelerator and a scanning box connected to the electron accelerator, wherein the scanning box is provided with a target, an electron beam exit window positioned at ... | 04/13/2010 |
| 7573045 | Plasmon wave propagation devices and methods Nanoantennas are formed on a substrate (e.g., silicon) and generate light via interactions with a charged particle beam, where the frequency of the generated light is based in large part on the periodicity of the “fingers” that make up the nanoantennas. Each fin... | 08/11/2009 |
| 7425708 | Secondary electron detector unit for a scanning electron microscope The secondary electron detector unit for a scanning electron microscope is mounted in a head body (1). In the lower part of the head body (1), a lower throttling aperture (2) is placed. Above the lower throttling aperture (2), the micropo... | 09/16/2008 |
| 7417235 | Particle detector for secondary ions and direct and or indirect secondary electrons A multi-purpose efficient charge particle detector that by switching bias voltages measures either secondary ions, or secondary electrons (SE) from a sample, or secondary electrons that originate from back scattered electrons (SE3), is described. The basic version o... | 08/26/2008 |
| 7408154 | Scanning electron microscope, method for measuring a dimension of a pattern using the same, and apparatus for correcting difference between scanning electron microscopes As measurement accuracy required for the scanning electron microscope (SEM) for measuring a pattern width becomes stringent, a technique of reducing the difference in a measured dimension between the SEM's is desired. However, the conventional technique of evaluatin... | 08/05/2008 |
| 7375329 | Scanning electron microscope In a scanning electron microscope, slimming is reduced by reducing a frame count. As the frame count is reduced, the amount of detected secondary electrons decreases, so that a probe current amount is increased to emit an increased amount of detected secondary elect... | 05/20/2008 |
| 7368713 | Method and apparatus for inspecting semiconductor device A method and apparatus for inspecting a wafer during a semiconductor device fabrication process. The apparatus performs, only via observation from the wafer's top surface, inspection and quantitative evaluation of a portion that is in the shadow of an incident elect... | 05/06/2008 |
| 7361896 | Scanning electron microscope and a method for adjusting a focal point of an electron beam of said scanning electron microscope In a scanning electron microscope, scanning region is set to be narrow, upon which focused electron beam is scanned, so that the focused electron beam can be irradiated at the almost same position by plural numbers of times, irrespective of movement of the stage or ... | 04/22/2008 |
| 7304320 | Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device A charged beam exposure apparatus includes: a first shaping aperture provided with a plurality of rectangular openings which are different from each other in at least one of area and shape thereof; a second shaping aperture provided with a pattern having a shape cor... | 12/04/2007 |
| 7297966 | Utilizing an integrated plasmon detector to measure a metal deposit roughness on a semiconductor surface A method for monitoring the surface roughness of a metal, comprises impinging a laser beam onto the surface of a metal layer to induce the formation of a plasmon therein, and monitoring a current of decay electrons emitted by the plasmon. ... | 11/20/2007 |
| 7230243 | Method and apparatus for measuring three-dimensional shape of specimen by using SEM The present invention relates to a method and apparatus for measuring a three-dimensional profile using a SEM, capable of accurately measuring the three-dimensional profile of even a flat surface or a nearly vertical surface based on the inclination angle dependence... | 06/12/2007 |
| 7208889 | Particle accelerator having wide energy control range A particle accelerator system for producing a charged particle beam having pulses of charged particles that have different energy levels from pulse to pulse. The system enables independent adjustment of the RF power delivered to first and second accelerating section... | 04/24/2007 |
| 7183563 | Irradiation apparatus An apparatus for irradiating surfaces includes an electron beam generator for generating a beam of electrons. The beam of electrons exits the electron beam generator through an exit window. A robotic device moves the beam of electrons over the surfaces to irradiate ... | 02/27/2007 |
| 7176468 | Method for charging substrate to a potential A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron be... | 02/13/2007 |
| 7161159 | Dual beam system A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not... | 01/09/2007 |
| 7095031 | Method of automatically correcting aberrations in charged-particle beam and apparatus therefor The present invention provides method and apparatus for automatically correcting aberrations in a charged-particle beam. The apparatus extracts line profiles from the probe profile of the charged-particle beam. Features indicative of the line profile, i.e., μ, σ, ... | 08/22/2006 |
| 7081756 | Substrate inspection apparatus, substrate inspection method, method of manufacturing semiconductor device and recording medium A substrate inspection apparatus includes a first waveform measurer which acquires a first amplitude waveform that is the amplitude waveform of an AC voltage obtained from a semiconductor of a semiconductor substrate which is being inspected when an external AC powe... | 07/25/2006 |
| 7072772 | Method and apparatus for modeling mass spectrometer lineshapes Methods and apparatuses are disclosed that model the lineshapes of mass spectrometry data. Ions can be modeled with an initial distribution that models molecules as having multiple positions and/or energies prior to traveling in the mass spectrometer. These initial ... | 07/04/2006 |
| 7071604 | Electron source An electron gun (10) includes an electron multiplier (22, 22′, 22″, 110) has a receiving end (50, 50′, 50″) for receiving primary electrons and an output end (54, 54′, 54″) that emits secondary electrons responsive to primary ... | 07/04/2006 |
| 7050543 | Microfocus X-ray tube A microfocus X-ray tube is provided, and comprises a head that during operation of the X-ray tube faces an object that is to be inspected. The head has an outer surface with a cross-section that tapers toward a free end of the head. A target is disposed on or in the... | 05/23/2006 |
| 7030388 | Illuminant, and, electron beam detector, scanning electron microscope and mass spectroscope each including the same The present invention relates to an illuminant, etc., having a high response speed and a high luminous intensity. The illuminant comprises a substrate and a nitride semiconductor layer provided on one surface of the substrate. The nitride semiconductor layer emits f... | 04/18/2006 |
| 7030389 | Electron beam apparatus having electron analyzer and method of controlling lenses An electron beam apparatus having an electron analyzer is achieved which can control the illumination lens system by feedback without adversely affecting the imaging action even if a specimen is positioned within the magnetic field of the objective lens. The apparat... | 04/18/2006 |
| 7009187 | Particle detector suitable for detecting ions and electrons A particle detector switchable from an ion detector to an electron detector includes an ion-to-electron converter and a scintillator detector. With one set of voltages on the components, the converter has minimal impact on the electron trajectories so the electrons ... | 03/07/2006 |
| 6979822 | Charged particle beam system A charged particle beam system uses an ion generator for charge neutralization. In some embodiments, the ion generator is configured to maintain an adequate gas pressure at the ion generator to generate ions, but a reduced pressure in the remainder of the vacuum cha... | 12/27/2005 |
| 6949744 | Electron microscopy system, electron microscopy method and focusing system for charged particles An electron microscopy system and an electron microscopy method for detection of time dependencies of secondary electrons generated by primary electrons is provided, in which the primary electron pulses are directed onto a sample surface and electrons emanating from... | 09/27/2005 |
| 6943349 | Multi beam charged particle device The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that ... | 09/13/2005 |
| 6933500 | Electron microscope An electron microscope is provided, which enables an observation with high resolution. The electron microscope is able to detect the deviation of an electron beam relative to the opening of a slit quantitatively, thereby shifting the electron beam accurately to the ... | 08/23/2005 |
| 6888139 | Electron microscope The present invention provides an analysis of displacement by calculating the phase variance image P′ (k, l) between Fourier transformed images of paired images S1 (n, m) and S2 (n, m) to determine the center of gravity of δ peak appearing on the in... | 05/03/2005 |
| 6861650 | Electron beam detector, scanning type electron microscope, mass spectrometer, and ion detector In an electron beam detector, a light guide optically couples a fluorescence emitting surface of the compound semiconductor substrate to a light incident surface of the photodetector, and physically connects the compound semiconductor substrate with the photodetecto... | 03/01/2005 |
| 6855931 | Scanning electron microscope and sample observation method using the same According to the present invention, there are newly provided in a scanning electron microscope with an in-lens system a first low-magnification mode that sets the current of the object lens to be zero or in a weak excitation state, and a second low-magnification mod... | 02/15/2005 |
| 6855926 | Instrument and method for combined surface topography and spectroscopic analysis A combined surface topography and spectroscopic analysis instrument comprises a scanning tunnelling microscope tip (12); and a sample carrier (58) which supports a sample (10) so that a surface thereto to be analyzed is presented towards the tip... | 02/15/2005 |
| 6815689 | Mass spectrometry with enhanced particle flux range A system and method for suppressing secondary electron counts in systems that count particles. The secondary electrons are produced in a foil or other secondary electron emitting surface. A suppression grid is placed in front of the particle detector. The grid is he... | 11/09/2004 |
| 6784438 | Electron projection lithography apparatus using secondary electrons An electron projection lithography apparatus using secondary electrons includes a secondary electron emitter which is spaced apart from a substrate holder by a first predetermined interval and has a patterned mask formed on a surface thereof to face the substrate ho... | 08/31/2004 |
| 6784426 | Electron beam irradiation apparatus, electron beam exposure apparatus, and defect detection method An electron beam irradiation apparatus which irradiates an electron beam to an object for easily detecting a defect of a backscattered electron detector, including: an electron beam generating section for generating an electron beam; a plurality of backscattered ele... | 08/31/2004 |
| 6770889 | Method of controlling electrostatic lens and ion implantation apparatus The ion implantation apparatus deals with an ion beam as a charged particle beam and has an accelerating tube 8 incorporating an electrostatic lens for converging/diverging it. The control of the electrostatic lens is carried out as follows. The swept ion bea... | 08/03/2004 |
| 6740888 | Electron beam apparatus In order to ensure that an electromagnetic field lens is capable of high-resolution observation using a magnetic field lens without leakage of magnetic flux, there is provided a magnetic field superimposing-type lens 1 for focusing an electron beam onto a sam... | 05/25/2004 |
| 6642519 | Fine pattern inspection apparatus and method and managing apparatus and method of critical dimension scanning electron microscope device A fine pattern inspection apparatus includes: a first calculation unit which receives data of a first secondary electron signal obtained by irradiating a plurality of test patterns formed on a test substrate with an electron beam and receives data of an c... | 11/04/2003 |
| 6586753 | Electron beam apparatus and electron beam adjusting method An electron beam apparatus for irradiating a target with an electron beam includes a reference sample including at least one reference pattern which has a plurality of lattice structures arranged along the circumference of a circle in a evaluation surface... | 07/01/2003 |
