Did You Know...
...that the video game, Pong, was invented by a guy who graduated at the bottom of his engineering class? Nolan Bushnell spent more time running the games at a local amusement park than he did on his studies at the University of Utah. His dreams of working for Disney's amusement empire were dashed when the company wouldn't hire him. Taking a boring job, Nolan daydreamed about electronic versions of popular games. He invented Pong, the first video game, and went on to found Atari Co.
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| Number | Title | Issue Date |
| 8101920 | Spin isolation apparatus, spin asymmetric material producing method, current source, and signal processing method A spin isolation apparatus comprising a particle source for emitting particles having spins, a receiving section for receiving the particles emitted by the particle source, a magnet for separating the particles into first particles having positive spins and second p... | 01/24/2012 |
| 7923699 | Tracking control method and electron beam writing system Control data for a main deflector is calculated based on position data that specifies the position of a region to be irradiated with the electron beam on the subfield, data on the number of all beam shots on the subfield, data on a time required for all the beam sho... | 04/12/2011 |
| 7884334 | Charged particle beam imaging method and system thereof The method includes scanning a sample in at least one first scan line using a first charged particle beam probe; scanning the sample in at least one second scan line using a second charged particle beam probe, and scanning the sample in at least one third scan line ... | 02/08/2011 |
| 7868301 | Deflecting a beam of electrically charged particles onto a curved particle path A device for deflecting a beam of electrically charged particles onto a curved particle path is provided. The device includes at least one beam guidance magnet having a coil system which has at least one coil that is curved along the particle path for the purpose of... | 01/11/2011 |
| 7750311 | Positron emission detectors and configurations A three-dimensional detector module for use in detecting annihilation photons generated by positrons emitted from radio-labeled sites within a body is formed from multiple solid state photo-detectors attached to one or more scintillators. Each photo-detector can be ... | 07/06/2010 |
| 7598499 | Charged-particle exposure apparatus In a particle-beam projection processing apparatus a target (41) is irradiated by means of a beam (pb) of energetic electrically charged particles, using a projection system (103) to image a pattern presented in a pattern definition means (102) ... | 10/06/2009 |
| 7598498 | Electric field lens and ion implanter having the same An electric field lens includes an entrance electrode, an intermediate electrode, and an exit electrode that are arranged in a traveling direction of ion beams. The intermediate electrode is maintained in a positive potential, and the entrance electrode and the exit... | 10/06/2009 |
| 7592604 | Charged particle beam apparatus The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscope 100 illuminates a specimen 21 with a charged particle beam via a... | 09/22/2009 |
| 7557357 | D/A conversion device and method and charged particle beam exposure apparatus and method The present invention is related to a D/A conversion device, it is provided with a first D/A conversion circuit which receives input of digital data composed of plural bits and outputs a corresponding electric output signal, and a second D/A conversion circuit which... | 07/07/2009 |
| 7521692 | TDI detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the ... | 04/21/2009 |
| 7439502 | Electron beam apparatus and device production method using the electron beam apparatus The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, e... | 10/21/2008 |
| 7435956 | Apparatus and method for inspection and testing of flat panel display substrates A charged particle optical system for testing, imaging or inspecting substrates comprises: a charged particle optical assembly configured to produce a line of charged particle beams equally spaced along a main scan axis, each beam being deflectable through a large a... | 10/14/2008 |
| 7435949 | Mass spectrometric analysis method and system using the method A tandem analysis system is provided for ionizing a substance, performing mass spectrometric analysis of various ion types generated, selecting and dissociating an ion type, the ion type having a specific mass-to-charge ratio, and thereby, repeating mass spectrometr... | 10/14/2008 |
| 7427765 | Electron beam column for writing shaped electron beams An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters ... | 09/23/2008 |
| 7423277 | Ion beam monitoring in an ion implanter using an imaging device An image monitor system monitors characteristics of an ion beam employed in ion implantation. The monitored characteristics can include particle count, particle information, beam current intensity, beam shape, and the like. The system includes one or more image sens... | 09/09/2008 |
| 7420179 | Electron microscope An electron microscope has a spherical aberration correction system having transfer optics inserted between a spherical aberration corrector and the objective lens. The transfer optics consists of first and second lenses each of which is made of a magnetic lens. Ele... | 09/02/2008 |
| 7417233 | Beam exposure correction system and method A system and method of determining shape and position corrections of a beam such as a particle or other beam used in a system such as a particle beam lithography. The method of providing corrected deflector voltages may include determining a voltage step value by su... | 08/26/2008 |
| 7417242 | Method of measuring ion beam position A system, apparatus, and method for determining position and two angles of incidence of an ion beam to a surface of a workpiece is provided. A measurement apparatus having an elongate first and second sensor is coupled to a translation mechanism, wherein the first s... | 08/26/2008 |
| 7408172 | Charged particle beam apparatus and charged particle beam irradiation method A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a p... | 08/05/2008 |
| 7394071 | Micro column electron beam apparatus formed in low temperature co-fired ceramic substrate A micro column electron beam apparatus having a reduced number of interconnections is provided. The micro column electron beam apparatus includes: a low temperature co-fired ceramic (LTCC) substrate; a plurality of deflector electrodes attached to a predetermined to... | 07/01/2008 |
| 7394082 | Ion beam delivery equipment and an ion beam delivery method The invention is intended to confirm whether the SOBP (spread-out Bragg peak) width is a desired value in real time during beam irradiation, and to improve safety in treatment. Ion beam delivery equipment comprises a beam generator including a synchrotron, an RMW (r... | 07/01/2008 |
| 7391037 | Apparatus for generating a plurality of beamlets The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens ar... | 06/24/2008 |
| 7391034 | Electron imaging beam with reduced space charge defocusing One embodiment pertains to an apparatus which impinges a focused electron beam onto a substrate. The apparatus includes an irradiation source and at least two non-axisymmetric lenses. The irradiation source is configured to originate electrons for an incident electr... | 06/24/2008 |
| 7391033 | Skew-oriented multiple electron beam apparatus and method One embodiment described relates to a multiple electron beam apparatus. Multiple columns are arranged in a row configured to generate multiple electron beams. A mechanism is included for translating a substrate so as to be impinged upon by the multiple electron beam... | 06/24/2008 |
| 7385202 | Divergent charged particle implantation for improved transistor symmetry The present invention provides a method for implanting charged particles in a substrate and a method for manufacturing an integrated circuit. The method for implanting charged particles in a substrate, among other steps, includes projecting a beam of charged particl... | 06/10/2008 |
| 7385208 | Systems and methods for implant dosage control A system for implantation dosage control. A first interface receives scan position information. A second interface receives beam current information specifying a first beam current value between scans and a plurality of second beam current values during one of the s... | 06/10/2008 |
| 7378668 | Method and apparatus for applying charged particle beam In a charged particle beam applying apparatus such as an electron beams lithography system, there is a technology that facilitates positional adjustment of a crossover and improves throughput of the apparatus. A front focal plane of a condenser lens is provided with... | 05/27/2008 |
| 7378667 | Particle-optical appliance provided with aberration-correcting means Quadrupole-octupole aberration corrector for application in a TEM, STEM or SEM. A known corrector for correcting third-order and fifth-order aberrations of the objective is embodied with eight quadrupoles and three octupoles. The corrector according to the invention... | 05/27/2008 |
| 7375357 | Permanent magnet radiation dose delivery enhancement The present invention provides a plurality of permanent magnets to enhance radiation dose delivery of a high energy particle beam. The direction of the magnetic field from the permanent magnets may be changed by moving the permanent magnets. ... | 05/20/2008 |
| 7372053 | Rotating gantry of particle beam therapy system A rotating gantry includes a link frame for supporting a plurality of rollers which rotatably support the rotating gantry, a brake for releasing a braking force applied to at least one of the rollers upon supply of air and applying the braking force to the one rolle... | 05/13/2008 |
| 7368738 | Advanced pattern definition for particle-beam exposure In a pattern definition device for use in a particle-beam exposure apparatus a plurality of blanking openings (910) are arranged within a pattern definition field (bf) composed of a plurality of staggered lines (bl) of blanking openings, each provided with a ... | 05/06/2008 |
| 7365348 | Adjusting device of an apparatus for generating a beam of charged particles An adjusting device of an apparatus for generating a beam of charged particles, wherein said beam is for interacting with a target and wherein said adjusting device comprises interface means for receiving, from a user of the apparatus, a set of desired values of cha... | 04/29/2008 |
| 7365338 | Apparatus for generating a plurality of beamlets The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens ar... | 04/29/2008 |
| 7365346 | Ion-implanting apparatus, ion-implanting method, and device manufactured thereby An ion-implanting apparatus and method can dynamically control a beam current value with time and does not change energy. This ion-implanting apparatus controls a dynamic change in beam current value with time by giving feedback on the beam current value measured wi... | 04/29/2008 |
| 7365325 | Method and apparatus for observing a specimen A method and device for observing a specimen in which an electron beam is irradiated and scanned from an oblique direction, onto a surface of a calibration substrate on which a pattern with a known shape is formed, and an SEM image of the surface of the calibration ... | 04/29/2008 |
| 7361914 | Means to establish orientation of ion beam to wafer and correct angle errors One or more aspects of the present invention pertain to a measurement component that facilitates determining a relative orientation between an ion beam and a workpiece. The measurement component is sensitive to ion radiation and allows a relative orientation between... | 04/22/2008 |
| 7358510 | Ion implanter with variable scan frequency An ion implanter includes an ion beam generator configured to generate an ion beam, a scanner configured to scan the ion beam in at least one direction at a scan frequency, and a controller. The controller is configured to control the scan frequency in response to a... | 04/15/2008 |
| 7358512 | Dynamic pattern generator for controllably reflecting charged-particles One embodiment relates to a dynamic pattern generator for controllably reflecting charged particles. The generator includes at least a controllable light emitter array, an optical lens, and an array of light-sensitive devices. The controllable light emitter array is... | 04/15/2008 |
| 7358493 | Method and apparatus for automated beam optimization in a scanning electron microscope A method and apparatus according to the present invention define optimal conditions for a scanning electron microscope (SEM), preferably a critical dimension scanning electron microscope (CDSEM). The present invention provides an image quality monitor that utilizes ... | 04/15/2008 |
| 7355174 | Charged particle beam emitting device and method for adjusting the optical axis A charged-particle beam emitting device which includes the following configuration devices so that a lowering in the image resolution will be suppressed even if a primary beam is tilted relative to a sample: A device for causing orbit of the primary beam to pass thr... | 04/08/2008 |
