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| Number | Title | Issue Date |
| 8089050 | Method and apparatus for modifying a ribbon-shaped ion beam A ribbon-shaped ion beam is modified using multiple coil structures on a pair of opposed ferromagnetic bars. The coil structures comprise continuous windings which have predetermined variations along the length of the bar of turns per unit length. In an example, one... | 01/03/2012 |
| 8071955 | Magnetic deflector for an electron column The present invention relates, in general, to a deflector for microcolumns for generating electron beams, and, more particularly, to a deflector capable of scanning or shifting electron beams or functioning as a stigmator using a magnetic field. The deflector (10... | 12/06/2011 |
| 8067748 | Charged particle beam acceleration and extraction method and apparatus used in conjunction with a charged particle cancer therapy system The invention comprises a charged particle beam acceleration and optional extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. Novel design features of a synchrotron are described. Particularly, turnin... | 11/29/2011 |
| 8063381 | Achromatic and uncoupled medical gantry A medical gantry that focus the beam from the beginning of the gantry to the exit of the gantry independent of the rotation angle of the gantry by keeping the beam achromatic and uncoupled, thus, avoiding the use of collimators or rotators, or additional equipment t... | 11/22/2011 |
| 8058626 | Method and apparatus for modifying a ribbon-shaped ion beam A ribbon-shaped ion beam having an elongate cross-section normal to a beam direction is modified by generating, at a predetermined position along the ribbon-shaped beam, a magnetic field extending in an x-direction along an x-axis. The x-direction magnetic field has... | 11/15/2011 |
| 8049182 | Charged particle filter A charged particle filter comprises a magnetic deflector and an outer shield. The magnetic deflector has a bore along an axis thereof passing through the deflector from a specimen end to a detector end of the deflector and through which charged particles pass when i... | 11/01/2011 |
| 8044368 | Lens coil cooling of a magnetic lens A magnetic lens for a charged particle beam device and a charged particle beam device are provided. The magnetic lens includes a coil with coil windings to be excited for generation of a magnetic field, a pole piece to guide the magnetic field, a heat shield, which ... | 10/25/2011 |
| 8035087 | Open-ended electromagnetic corrector assembly and method for deflecting, focusing, and controlling the uniformity of a traveling ion beam The present invention is an electromagnetic controller assembly for use in ion implantation apparatus, and provides a structural construct and methodology which can be employed for three recognizably separate and distinct functions: (i) To adjust the trajectory of c... | 10/11/2011 |
| 8017918 | Charged-particle beam instrument A charged-particle beam instrument (such as a transmission electron microscope) which facilitates modifying the diameters of aperture stops installed above and below (on the beam entrance and exit sides) the specimen chamber and exchanging the aperture stops. The in... | 09/13/2011 |
| 8013311 | Dual beam system A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not... | 09/06/2011 |
| 8003953 | Multi-axis magnetic lens The present invention relates to a multi-axis magnetic lens for a charged particle beam system. The apparatus eliminates the undesired non-axisymmetric transverse magnetic field components from the magnetic field generated by a common excitation coil and leaves the ... | 08/23/2011 |
| 7989776 | Corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial, chromatic aberration A corrective for eliminating the third-order aperture aberration and the first-order, first-degree axial chromatic aberration includes two correction pieces, which are arranged one behind the other in the direction of the optical axis, in which each correction piece... | 08/02/2011 |
| 7947964 | Charged particle beam orbit corrector and charged particle beam apparatus The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a char... | 05/24/2011 |
| 7932501 | Particle-beam exposure apparatus and particle-beam therapeutic apparatus A particle-beam exposure apparatus and a particle-beam therapeutic apparatus are obtained, in which, by reducing diameter increase, due to scattering in a range shifter, of a charged particle beam, the charged particle beam whose diameter is so narrow that spatially... | 04/26/2011 |
| 7928405 | Magnetic lens assembly A lens assembly having a magnetic lens assembly for a charged particle beam system is provided. The lens assembly includes: a first pole piece having a connecting portion of the first pole piece and a gap portion of the first pole piece, a second pole piece having a... | 04/19/2011 |
| 7919759 | Charged particle beam irradiator and rotary gantry A charged particle beam 2 which enters a final bending electromagnet 7 after traveling through quadrupole electromagnets 4, 5, 6 travels through the final bending electromagnet 7 in an arc shape path by increasing or decreasing a bending ... | 04/05/2011 |
| 7893406 | Electron gun with magnetic immersion double condenser lenses An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. I... | 02/22/2011 |
| 7888652 | Ion implantation apparatus An ion implantation apparatus is provided with first and second magnets arranged so as to face each other in a Y direction across a path for a ribbon-shaped ion beam. The first and second magnets cross a traveling direction of the ribbon-shaped ion beam. Each of the... | 02/15/2011 |
| 7875858 | Charged particle beam trajectory corrector and charged particle beam apparatus The invention relates to a trajectory correction method for a charged particle beam, and provides a low-cost, high accuracy and high-resolution converging optical system for use with a charged particle beam to solve problems with conventional aberration correction s... | 01/25/2011 |
| 7858951 | Skew chicane based betatron eigenmode exchange module A skewed chicane eigenmode exchange module (SCEEM) that combines in a single beamline segment the separate functionalities of a skew quad eigenmode exchange module and a magnetic chicane. This module allows the exchange of independent betatron eigenmodes, alters ele... | 12/28/2010 |
| 7834326 | Aberration corrector and charged particle beam apparatus using the same The present invention provides an aberration corrector giving excellent assembly accuracy but having fewer parts and fewer adjustment locations in number. In order to achieve it, a multistage multipole is formed by arranging plural combinations of electrodes around ... | 11/16/2010 |
| 7829866 | Broad energy-range ribbon ion beam collimation using a variable-gradient dipole A method and apparatus satisfying growing demands for improving the intensity of implanting ions that impact a semiconductor wafer as it passes under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-opti... | 11/09/2010 |
| 7825386 | System and method for a charged particle beam System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at le... | 11/02/2010 |
| 7812319 | Beam guiding magnet for deflecting a particle beam A beam guiding magnet includes a first and second coil system, which are designed such that the dipole moments of the first and second coil systems point in opposite directions. Since the dipole moments of the first and second coil systems point in opposite directio... | 10/12/2010 |
| 7786450 | Multipole coils Multipole coils (1, 2, 3, 4, 5, 6) for influencing particle beams have at least two coils (1, 2) which concentrically enclose an imaginary axis (10), wherein a winding (7) made from a flexible circuit board (8) is formed by means o... | 08/31/2010 |
| 7759653 | Electron beam apparatus The present invention includes an electron beam device for examining defects on semiconductor devices. The device includes an electron source for generating a primary electron beam, wherein the total acceleration potential is divided and is provided across the groun... | 07/20/2010 |
| 7759652 | Electron lens and charged particle beam apparatus The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole ... | 07/20/2010 |
| 7755060 | Multipole lens and method of fabricating same There is disclosed a multipole lens that can be machined with improved accuracy. A method of fabricating this lens is also disclosed. The multipole lens has a blank material from which polar elements will be fabricated. The blank material is sandwiched vertically be... | 07/13/2010 |
| 7667208 | Technique for confining secondary electrons in plasma-based ion implantation A technique for confining secondary electrons on a wafer is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus and method for confining secondary electrons in plasma-based ion implantation. The apparatus and method may c... | 02/23/2010 |
| 7655922 | Techniques for confining electrons in an ion implanter Techniques for confining electrons in an ion implanter are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for confining electrons in an ion implanter. The apparatus may comprise a first array of magnets and a second... | 02/02/2010 |
| 7633069 | Dual-mode electron beam column A dual-mode electron beam column (10) for selectably providing, in an electron beam lithography machine, a Gaussian beam for enhanced writing resolution and a variable shaped beam for enhanced writing throughput comprises a first aperture (13) for conf... | 12/15/2009 |
| 7612346 | Non-axisymmetric charged-particle beam system The charged-particle beam system includes a non-axisymmetric diode forms a non-axisymmetric beam having an elliptic cross-section. A focusing element utilizes a magnetic field for focusing and transporting the non-axisymmetric beam, wherein the non-axisymmetric beam... | 11/03/2009 |
| 7608838 | Electron optical component An electron optical component used to improve the spatial resolution in magnetic projection electron lenses or other electron optical devices by filtering the cyclotron orbit radii of electron trajectories in the lens magnetic field. ... | 10/27/2009 |
| 7601969 | Illumination condenser for a particle optical projection system An illumination condenser for a particle optics projection system is disclosed. The illumination condenser is formed of a magnetic lens comprising a plurality of gaps. The magnetic lens is formed of a sequence of a plurality of partial lenses. ... | 10/13/2009 |
| 7579602 | Ion implantation with a collimator magnet and a neutral filter magnet This disclosure describes an ion implanter having a collimator magnet that is configured to shape an ion beam. A first deceleration stage is configured to manipulate energy of the ion beam shaped by the collimator magnet. A neutral filter magnet is configured to fil... | 08/25/2009 |
| 7569834 | High resolution charged particle projection lens array using magnetic elements A charged particle optic apparatus for improvement in resolution of an electrostatic, multi-beam column is disclosed. The charged particle optic apparatus includes an electrostatic lens array having a first plurality of apertures and a first magnetic pole piece disp... | 08/04/2009 |
| 7554094 | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements An electron-optical arrangement provides a primary beam path for a beam of primary electrons and a secondary beam path for secondary electrons. The electron-optical arrangement includes a magnet arrangement having first, second and third magnetic field regions. The ... | 06/30/2009 |
| 7550740 | Focused ION beam apparatus A focused ion beam apparatus enables an ion beam to be focused highly accurately on a sample at the beam spot position of the case of the absence of magnetic field without causing isotope separation of the ion beam on the sample, even when there is a magnetic field ... | 06/23/2009 |
| 7525103 | Technique for improving uniformity of a ribbon beam A technique for improving uniformity of a ribbon beam is disclosed. In one particular exemplary embodiment, an apparatus may comprise a first corrector-bar assembly and a second corrector-bar assembly, wherein the second corrector-bar assembly is located at a predet... | 04/28/2009 |
| 7521688 | Charged-particle beam instrument A charged-particle beam instrument is offered which can cancel out deflection aberrations arising from a first deflector or oblique incidence on the surface of a workpiece without (i) increasing the electrode length, (ii) reducing the inside diameter of the electrod... | 04/21/2009 |
