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Pillow with retractable umbrella
A pillow assembly having a supporting assembly and a retractable umbrella assembly that is easily transportable and allows a user to support his/her head while covering their face from sunlight.
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| Number | Title | Issue Date |
| 8115140 | Heater assembly for high throughput chemical treatment system A heater assembly configured to elevate a temperature of a processing element in a chemical treatment system is described. The heater assembly may be configured to uniformly heat a large area processing element, such as a processing element that spans a plurality of... | 02/14/2012 |
| 8080765 | Apparatus and method for heating substrate and coating and developing system A substrate heating apparatus includes a top plate arranged above a hot plate so that a vertical space is formed between the hot plate and the top plate. The top plate has an evacuated internal chamber serving as a vacuum insulating layer that suppresses heat transf... | 12/20/2011 |
| 8076615 | Substrate processing apparatus and method of manufacturing semiconductor device A substrate processing apparatus comprises: an outer tube; a manifold connected to the outer tube and made of a non-metal material; an inner tube disposed in the manifold at a more inner side than the outer tube and configured to process a substrate therein; a heati... | 12/13/2011 |
| 8030599 | Substrate processing apparatus, heating device, and semiconductor device manufacturing method Provided are a substrate processing apparatus, a heating device, and a semiconductor device manufacturing method. The substrate processing apparatus comprises a process chamber configured to process a substrate. A heating element is installed at a peripheral side of... | 10/04/2011 |
| 8003920 | Substrate processing apparatus A substrate processing apparatus of which through holes in a mounting stage can be properly sealed. A substrate processing apparatus comprises a plate-like mounting stage having a plurality of first through holes, a base member including a plurality of second throug... | 08/23/2011 |
| 8003919 | Substrate heat treatment apparatus A heat-treating plate has support elements projecting from an upper surface thereof. The support elements are located at apexes of equilateral triangles arranged regularly and continually. The heat-treating plate and a substrate placed on the support elements form a... | 08/23/2011 |
| 7999210 | Heating device for manufacturing semiconductor A heating device for manufacturing semiconductor capable of uniformly heating a wafer or other materials to be treated, and in particular a heating device in a coater-developer used for heat-hardening of resin film for photolithography and for heat-calcining of low-... | 08/16/2011 |
| 7947926 | Heat treatment apparatus, heat treatment method, and recording medium recording program for practicing the method In a heat treatment method in which a semiconductor wafer is carried into a heat treatment chamber constituted of a heat plate and a cover body covering the heat plate and processed, until the wafer is carried into the heat treatment chamber, an opening and closing ... | 05/24/2011 |
| 7943886 | Heat treatment apparatus A heat treatment apparatus capable of ensuring a uniform temperature distribution on a substrate and reducing the generation of a sublimate includes a housing, a mounting table being arranged to move up and down within the housing, and a first heater being provided ... | 05/17/2011 |
| 7910860 | Fluid warmer A heat exchange apparatus including a heat exchanging portion capable of conforming to the outer surface of a heat exchange target. ... | 03/22/2011 |
| 7847218 | System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the... | 12/07/2010 |
| 7838800 | Temperature controlled substrate holder having erosion resistant insulating layer for a substrate processing system A substrate holder for supporting a substrate in a processing system includes a temperature controlled support base having a first temperature, a substrate support opposing the temperature controlled support base and configured to support the substrate, and one or m... | 11/23/2010 |
| 7812285 | Apparatus and method for heating substrate and coating and developing system A substrate heating apparatus includes a top plate arranged above a hot plate so that a vertical space is formed between the hot plate and the top plate. The top plate has an evacuated internal chamber serving as a vacuum insulating layer that suppresses heat transf... | 10/12/2010 |
| 7812286 | Rapid conductive cooling using a secondary process plane A method and apparatus for thermally processing a substrate is described. The apparatus includes a substrate support configured to move linearly and/or rotationally by a magnetic drive. The substrate support is also configured to receive a radiant heat source to pro... | 10/12/2010 |
| 7745762 | Optimizing the thermal budget during a pulsed heating process An approach for optimizing the thermal budget during a pulsed heating process is disclosed. A heat sink or thermal transfer plate is configured and positioned near an object, such as a semiconductor wafer, undergoing thermal treatment. The heat sink is configured to... | 06/29/2010 |
| 7741583 | Bake plate lid cleaner and cleaning method A method and system for positioning a wafer on a bake plate in a processing module that includes lowering a bake plate cover assembly over the wafer during a baking process, raising the bake plate cover assembly after the baking process, removing the wafer, determin... | 06/22/2010 |
| 7737385 | Selective reflectivity process chamber with customized wavelength response and method A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processing a treatment object having a... | 06/15/2010 |
| 7732739 | Substrate heat treatment apparatus and substrate transfer tray used in substrate heat treatment A degassing from a susceptor heated at a high temperature in a vacuum atmosphere is suppressed. The susceptor is disposed between a heater and a substrate and partitions a space in the chamber into a first chamber space where the heater is placed and a second chambe... | 06/08/2010 |
| 7723649 | Vacuum thermal annealer A vacuum thermal annealing device is provided having temperature control for use with various materials, such as semiconductor substrates. A vacuum is used to remove air and outgas residual materials. Heated gas is injected planar to a substrate as pressure is quick... | 05/25/2010 |
| 7723648 | Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing system A substrate holder for supporting a substrate in a processing system includes a temperature controlled support base having a first temperature, and a substrate support opposing the temperature controlled support base and configured to support the substrate. Also inc... | 05/25/2010 |
| 7718925 | Substrate heat treatment apparatus A heat-treating plate has, arranged on the upper surface thereof, support elements for supporting a substrate, and a first sealer for closing lateral areas of a first space formed between the heat-treating plate and the substrate supported. Further, second sealers r... | 05/18/2010 |
| 7700898 | Heat treatment equipment and method of driving the same Heat treatment equipment and a method of driving the same are provided. The heat treatment equipment includes: a process tube having an aperture at one side thereof; a sealing unit for opening or closing the aperture; and a pressure sensor for measuring sealing pres... | 04/20/2010 |
| 7652227 | Heating and cooling plate for a vacuum chamber A thin plate thermally coupled to a cooling tube is positioned between a heating plate and a substrate and is adapted to serve as a heating plate or a cooling plate for the substrate. The thin plate and heating plate may be positioned in a load lock for the expediti... | 01/26/2010 |
| 7629557 | Heat treatment apparatus using a lamp for rapidly and uniformly heating a wafer A heat treatment apparatus enables a rapid temperature rise of an object to be processed while giving an excellent economical efficiency. A heating unit heats an object to be heated by irradiating a light onto the object. A plurality of lamps are provided in a lamp ... | 12/08/2009 |
| 7608802 | Heating device for heating semiconductor wafers in thermal processing chambers An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly of light energy sources for emitting light energy onto a wafer. The light energy sources can be placed in various configurations. In ... | 10/27/2009 |
| 7598477 | Vacuum muffle quench furnace A vacuum furnace adapted to cool a load. The vacuum furnace has one or more means for cooling a fluid and a muffle substantially containing the load. The fluid flows in a substantially unidirectional flow substantially within the muffle. ... | 10/06/2009 |
| 7534977 | Heat treatment apparatus and method of manufacturing a semiconductor device A heat treatment apparatus of the present invention includes a reaction tube, an exhaust unit for reducing the pressure in the reaction tube, a unit for introducing gas for heating or cooling a subject substrate disposed in the reaction tube, a light source for heat... | 05/19/2009 |
| 7534978 | Process chamber of an installation for the thermal treatment of printed circuit boards A process chamber of an installation for the thermal treatment of printed circuit boards is described. The process chamber may include a fan wheel supported on a shaft parallel to the printed circuit boards, the fan wheel being disposed between two walls of the proc... | 05/19/2009 |
| 7531769 | Carbon fiber composite muffle A vacuum furnace adapted to cool a load. The vacuum furnace has one or more means for cooling a fluid and a muffle substantially comprised of carbon fiber composite and substantially containing the load. The fluid flows in a substantially unidirectional flow substan... | 05/12/2009 |
| 7528347 | Cooling device and heat treating device using the same A heat treating device (50) has a cooling sleeve that covers a treating vessel (56) and a heater (100). The cooling sleeve has a cylindrical base member (110) and a cooling pipe (112) spirally wound on the outer peripheral surface ... | 05/05/2009 |
| 7525068 | Heating system of batch type reaction chamber and method thereof A heating system of a batch type reaction chamber for semiconductor device and a method thereof are disclosed. Each heat unit of heating groups has different height and caloric value at right angles according to the divided areas, thereby it can control an uniform t... | 04/28/2009 |
| 7491913 | Bake apparatus for use in spin-coating equipment Bake apparatus for use in baking a substrate, such as a semiconductor wafer, includes a chamber, a hot plate installed within the chamber, and first and second buffer plates for uniformly dispersing hot gas. The hot plate is configured to support the semiconductor w... | 02/17/2009 |
| 7488918 | Method and apparatus for manufacturing printed light guide plate An apparatus for manufacturing a printed light guide plate includes a working platform (23), and a heater (24) coupled to the working platform. A transparent slab (21) is disposed on the working platform. The purpose of coupling the heater to th... | 02/10/2009 |
| 7482555 | Substrate transportation device (air) A substrate transportation device includes a housing for transporting substrates. The housing is formed of an upper surface, a lower surface, and opposing sidewalls. The housing has a rear opening through which the substrates enter the housing and a front opening th... | 01/27/2009 |
| 7479619 | Thermal processing unit The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a heating unit provided on an inside wall of the heating-furnace body; a reaction container consisting of a single tube contained in the heating-furn... | 01/20/2009 |
| 7453051 | System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the... | 11/18/2008 |
| 7442900 | Chamber for uniform heating of large area substrates Embodiments of the present invention generally provide an apparatus for providing a uniform thermal profile to a plurality of large area substrates during thermal processing. In one embodiment, an apparatus for thermal processing large area substrates includes a cha... | 10/28/2008 |
| 7431585 | Apparatus and method for heating substrates An apparatus for processing substrates is disclosed. In one embodiment, the apparatus includes a housing and a plurality of stacked cell structures in the housing. An actuator is adapted to move the plurality of stacked cell structures inside of the housing while su... | 10/07/2008 |
| 7432475 | Vertical heat treatment device and method controlling the same A vertical heat processing apparatus includes a process chamber (5) defining a process field (A1) configured to accommodate a plurality of target substrates (W) supported at intervals in a vertical direction. The apparatus further includes a heating fu... | 10/07/2008 |
| 7429718 | Heating and cooling of substrate support A substrate support assembly and method for controlling the temperature of a substrate within a process chamber are provided. A substrate support assembly includes an thermally conductive body comprising a stainless steel material, a substrate support surface on the... | 09/30/2008 |
